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公开(公告)号：US20100297541A1
公开(公告)日：2010-11-25
申请号：US12681786
申请日：2008-09-29
申请人： Pascal Hayoz , Hitoshi Yamato , Toshikage Asakura
发明人： Pascal Hayoz , Hitoshi Yamato , Toshikage Asakura
IPC分类号： G03F1/00 , G03F7/004 , G03F7/20 , C07D409/12 , C07D407/12 , C07C255/34 , C07C321/26
CPC分类号： G03F7/0045 , C07C381/12 , C07D307/64 , C07D333/34 , G03F7/0007 , G03F7/038
摘要： Compounds of the formula (I), wherein X is a single bond, CRaRbO, S, NRc or NCORc; Z is formula (II) or C3-C20heteroaryl; L, L1, L2, L3, L4, L5, L6, L7 and L8 for example independently of one another are hydrogen or an organic substituent; Ra, Rb and Rc independently of one another are hydrogen or an organic substituent; R is for example is C5-C20heteroaryl or C6-C14 aryl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.
摘要翻译： 式（I）化合物，其中X为单键，CRaRbO，S，NRc或NCORc; Z是式（II）或C 3 -C 20杂芳基; L，L1，L2，L3，L4，L5，L6，L7和L8例如彼此独立地为氢或有机取代基; R a，R b和R c彼此独立地是氢或有机取代基; R是例如C 5 -C 20杂芳基或C 6 -C 14芳基; Y为无机或有机阴离子; 适合作为光潜酸产生剂。
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公开(公告)号：US08652752B2
公开(公告)日：2014-02-18
申请号：US12681785
申请日：2008-09-22
申请人： Pascal Hayoz , Hitoshi Yamato , Toshikage Asakura
发明人： Pascal Hayoz , Hitoshi Yamato , Toshikage Asakura
IPC分类号： G03F7/00 , G03F7/004 , G03F7/029 , C07D333/00 , C07D495/00
CPC分类号： C07D307/83 , B33Y70/00 , C07D307/82 , C07D333/22 , C07D333/32 , C07D333/34 , C07D333/64
摘要： Compounds of the Formula (I), wherein L1, L′1, L″1, L2, L′2, L″2, L3, L′3, L″3, L4, L′4 and L″4 for example are hydrogen or COT; R, R′ and R″ for example are hydrogen, C6-C12aryl or C3-C20heteroaryl; X, X′ and X″ for example are O, S, single bond, NRa or NCORa, T is for example hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2-C20alkenyl, C5-C12cycloalkenyl, C7-C18cycloalkylenaryl, C5-C18cycloalkylenheteroaryl, C6-C14aryl, providedthat at least one of R, R′ or R″ is unsubstituted or substituted C3-C20heteroaryl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.
摘要翻译： 式（I）的化合物，其中L 1，L 1，L'1，L 2，L 2，L'2，L3，L'3，L'3， '4例如是氢或COT; R，R'和R“例如是氢，C 6 -C 12芳基或C 3 -C 20杂芳基; 例如，X，X'和X“是O，S，单键，NR a或NCOR a，T是例如氢，C 1 -C 20烷基，C 3 -C 12环烷基，C 2 -C 20链烯基，C 5 -C 12环烯基，C 7 -C 18环烷基芳基， C 18 -C 14芳基，其中R，R'或R“中的至少一个是未取代的或取代的C 3 -C 20杂芳基; Y为无机或有机阴离子; 适合作为光潜酸产生剂。
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公开(公告)号：US20100297540A1
公开(公告)日：2010-11-25
申请号：US12681785
申请日：2008-09-22
申请人： Pascal Hayoz , Hitoshi Yamato , Toshikage Asakura
发明人： Pascal Hayoz , Hitoshi Yamato , Toshikage Asakura
IPC分类号： G03F1/00 , C07D409/14 , C07D407/14 , G03F7/004 , G03F7/20
CPC分类号： C07D307/83 , B33Y70/00 , C07D307/82 , C07D333/22 , C07D333/32 , C07D333/34 , C07D333/64
摘要： Compounds of the Formula (I), wherein L1, L′1, L″1, L2, L′2, L″2, L3, L′3, L″3, L4, L′4 and L″4 for example are hydrogen or COT; R, R′ and R″ for example are hydrogen, C6-C12aryl or C3-C20heteroaryl; X, X′ and X″ for example are O, S, single bond, NRa or NCORa, T is for example hydrogen, C1-C20alkyl, C3-C12cycloalkyl, C2-C20alkenyl, C5-C12cycloalkenyl, C7-C18cycloalkylenaryl, C5-C18cycloalkylenheteroaryl, C6-C14aryl, providedthat at least one of R, R′ or R″ is unsubstituted or substituted C3-C20heteroaryl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.
摘要翻译： 例如式（I）的化合物，其中L1，L 1，L“1，L2，L'2，L”2，L3，L'3，L“3，L4，L'4和L”4 是氢或COT; R，R'和R“例如是氢，C 6 -C 12芳基或C 3 -C 20杂芳基; X，X'和X“例如是O，S，单键，NR a或NCOR a，T是例如氢，C 1 -C 20烷基，C 3 -C 12环烷基，C 2 -C 20烯基，C 5 -C 12环烯基，C 7 -C 18环烷基芳基，C 5 -C 18环烷基杂芳基 C 6 -C 14芳基，条件是R，R'或R“中的至少一个为未取代或取代的C 3 -C 20杂芳基; Y为无机或有机阴离子; 适合作为光潜酸产生剂。
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公开(公告)号：US06703182B1
公开(公告)日：2004-03-09
申请号：US09763016
申请日：2001-02-15
IPC分类号： G03C1492
CPC分类号： C09D11/38 , B33Y70/00 , C07C309/66 , C07C309/73 , C07C381/00 , C09D11/03 , C09D11/101 , G03F7/0045 , Y10S430/12 , Y10S430/122
摘要： Compounds of formulae I, II or III wherein m is zero or 1; n is 1, 2 or 3; R1 inter alia is unsubstituted or substituted phenyl, or naphthyl, anthracyl, phenanthryl, a heteroaryl radical, or C2-C12alkenyl; R′1 inter alia is vinylene, phenylene, naphthylene, diphenylene or oxydiphenylene; R2 inter alia is CN, C1-C4haloalkyl, C2-C6alkoxycarbonyl, phenoxycarbonyl, or benzoyl; R3 inter alia is C1-C18alkylsulfonyl, phenyl-C1-C3alkylsulfonyl, camphorylsulfonyl, or phenylsulfonyl; R′3 inter alia is C2-C12alkylenedisulfonyl, phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl; R4 and R5 inter alia are hydrogen, halogen, C1-C8alkyl, C1-C6alkoxy, C1-C4haloalkyl, CN, NO2, C2-C6alkanoyl, benzoyl, phenyl, —S-phenyl, OR6, SR9, NR7R8, C2-C6alkoxycarbonyl or phenoxycarbonyl; R6 inter alia is hydrogen, phenyl or C1-C12alkyl; R7 and R8 inter alia are hydrogen or C1-C12alkyl; R9 inter alia is C1-C12 alkyl; R10, R11 and R12 inter alia are C1-C6alkyl or phenyl; upon irradiation react as acid generating compounds and thus are suitable in photoresist applications.
摘要翻译： 其中m为式I，II或III的化合物为0或1; n为1,2或3; R 1特别是未取代或取代的苯基，或萘基，蒽基，菲基，杂芳基或C 2 -C 12烯基; 尤其是亚乙烯基，亚苯基，亚萘基，二亚苯基或氧联二苯基; R2特别是CN，C 1 -C 4卤代烷基，C 2 -C 6烷氧基羰基，苯氧基羰基或苯甲酰基; R3特别是C 1 -C 18烷基磺酰基，苯基-C 1 -C 3烷基磺酰基，樟脑磺酰基或苯基磺酰基; R'3特别是C 2 -C 12亚烷基二磺酰基，亚苯基二磺酰基，萘基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基; R4和R5特别是氢，卤素，C1-C8烷基，C1-C6烷氧基，C1-C4卤代烷基，CN，NO2，C2-C6烷酰基，苯甲酰基，苯基，-S-苯基，OR6，SR9，NR7R8，C2-C6烷氧基羰基或苯氧基羰基 ; R6尤其是氢，苯基或C 1 -C 12烷基; R 7和R 8尤其是氢或C 1 -C 12烷基; R9尤其是C1-C12烷基; R 10，R 11和R 12特别是C 1 -C 6烷基或苯基; 在照射时作为产生酸的化合物反应，因此适用于光刻胶应用。
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5.发明授权Photoinitiators having chain transfer groups polymerized to obtain macrophotoinitiators useful to give block copolymers 失效具有链转移基团的光引发剂被聚合以获得可用于产生嵌段共聚物的大分子引发剂公开(公告)号：US06458864B1
公开(公告)日：2002-10-01
申请号：US09701457
申请日：2000-11-27
申请人： Toshikage Asakura , Masaki Ohwa , Hitoshi Yamato , Asako Ito
发明人： Toshikage Asakura , Masaki Ohwa , Hitoshi Yamato , Asako Ito
IPC分类号： C08F250
CPC分类号： A61K6/083 , B33Y70/00 , C08F2/38 , C08F2/50 , C08K5/0025 , C09D7/45 , C09D7/65 , G03F7/031 , C08L53/00 , C08L33/00
摘要： Compounds with chain transfer groups of the formula I, II, III and IV wherein a is 1 or 2; Ar and Ar1 inter alia are phenyl; Ar2 inter alia is phenylene, these groups being unsubstituted or substituted; X is a direct bond, —O—, —S— or —N(R6)—; Y inter alia is hydrogen or C1-C12alkyl; M1 is —NR3R4 or —OH, or M1 is Ar when R1 and R2 are alkoxy, or aryloxy; R1 and R2 independently of one another e.g. are C1-C8alkyl; R3 and R4 for example are C1-C12alkyl, or together are C3-C7alkylene; R5 inter alia is C1-C6alkylene or a direct bond; R6 is for example hydrogen; and Z is a divalent radical, provided that at least one of the radicals Ar, Ar1, Ar2, R1, R2, R3, R4, R5 or Y is substituted by SH groups; are suitable for the thermal preparation of macrophotoinitiators which are polymerized photochemically to give block-copolymers.
摘要翻译： 具有式I，II，III和IV的链转移基团的化合物是1或2; Ar和Ar1特别是苯基; Ar2特别是亚苯基，这些基团是未取代的或取代的; X是直接键，-O - ， - S-或-N（R6） - ; Y尤其是氢或C 1 -C 12烷基; 当R1和R2为烷氧基时，M1为-NR3R4或-OH，或M1为Ar，或为芳氧基; R1和R2彼此独立地例如。 是C 1 -C 8烷基; R 3和R 4例如是C 1 -C 12烷基，或一起是C 3 -C 7亚烷基; R5尤其是C1-C6亚烷基或直接键; R6是例如氢; 并且Z是二价基团，条件是基团Ar，Ar 1，Ar 2，R 1，R 2，R 3，R 4，R 5或Y中的至少一个被SH基取代;适用于光化学聚合的高分子引发剂的热制备 得到嵌段共聚物。
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公开(公告)号：US6004724A
公开(公告)日：1999-12-21
申请号：US104676
申请日：1998-06-25
申请人： Hitoshi Yamato , Hartmut Bleier , Jean-Luc Birbaum , Martin Kunz , Kurt Dietliker , Christoph De Leo , Toshikage Asakura
发明人： Hitoshi Yamato , Hartmut Bleier , Jean-Luc Birbaum , Martin Kunz , Kurt Dietliker , Christoph De Leo , Toshikage Asakura
IPC分类号： C07C309/65 , C07C309/66 , C07C309/73 , C07C323/63 , C07C381/00 , C07D207/44 , C07D213/90 , C07D333/34 , C07D333/36 , C07D333/44 , G03F7/004 , G03C1/725 , C07C249/04 , C07C251/32 , G03C1/72
CPC分类号： C07D207/44 , C07C309/65 , C07C309/66 , C07C309/73 , C07C323/63 , C07C381/00 , C07D213/90 , C07D333/44 , G03F7/0045 , Y10S430/114 , Y10S430/117 , Y10S430/12 , Y10S430/122
摘要： New oximsulfonate compounds of the formulae I or II, ##STR1## wherein m is 0 or 1; x is 1 or 2; R.sub.1 is, for example phenyl, which is unsubstituted or substituted or R.sub.1 is a heteroaryl radical that is unsubstituted or substituted, or, if m is 0, R.sub.1 additionally is C.sub.2 -C.sub.6 alkoxycarbonyl, phenoxycarbonyl or CN; R'.sub.1 is for example C.sub.2 -C.sub.12 alkylene, phenylene; R.sub.2 has for example one of the meanings of R.sub.1 ; n is 1 or 2; R.sub.3 is for example C.sub.1 -C.sub.18 alkyl, R'.sub.3 when x is 1, has one of the meanings given for R.sub.3, or R'.sub.3 in the formula IV and when x is 2 in the formula 1, is for example C.sub.2 -C.sub.12 alkylene, phenylene; R.sub.4 and R.sub.5 are independently of each other for example hydrogen, halogen, C.sub.1 -C.sub.6 alkyl; R.sub.6 is for example hydrogen, phenyl; R.sub.7 and R.sub.8 are independently of each other for example hydrogen or C.sub.1 -C.sub.12 -alkyl; R.sub.9 is for example C.sub.1 -C.sub.12 alkyl; A is S, O, NR.sub.6, or a group of formula A1, A2, A3 or A4 ##STR2## R.sub.10 and R.sub.11 independently of each other have one of the meanings given for R.sub.4 ; R.sub.12, R.sub.13, R.sub.14 and R.sub.15 independently of one another are for example hydrogen, C.sub.1 -C.sub.4 alkyl; Z is CR.sub.11 or N; Z.sub.1 is --CH.sub.2 --, S, O or NR.sub.6, are useful as latent sulfonic acids, especially in photoresist applications.
摘要翻译： 式I或II的新的磺酸磺酸酯化合物，其中m为0或1; x为1或2; R1是例如未取代或取代的苯基，或R1是未取代或取代的杂芳基，或者如果m是0，则R1另外是C 2 -C 6烷氧基羰基，苯氧基羰基或CN; R'1例如为C 2 -C 12亚烷基，亚苯基; R2具有例如R1的含义之一; n为1或2; R3为例如C1-C18烷基，当x为1时为R'3，具有R3给出的含义之一，或式Ⅳ中的R'3，当式Ⅺ中x为2时，为例如C 2 -C 12亚烷基， 亚苯基; R4和R5彼此独立，例如氢，卤素，C1-C6烷基; R6是例如氢，苯基; R 7和R 8彼此独立地为氢或C 1 -C 12 - 烷基; R 9为例如C 1 -C 12烷基; A是S，O，NR6或式A1，A2，A3或A4的基团，R10和R11彼此独立地具有对R4给出的含义之一; R 12，R 13，R 14和R 15彼此独立地是例如氢，C 1 -C 4烷基; Z为CR11或N; Z1是-CH2-，S，O或NR6，可用作潜在的磺酸，特别是在光刻胶应用中。
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公开(公告)号：US09005871B2
公开(公告)日：2015-04-14
申请号：US13123723
申请日：2009-10-08
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , G03F7/20 , G03F7/30 , C07C317/04 , C07C381/12 , G03F7/00
CPC分类号： C07C381/12 , C07C317/04 , G03F7/0007 , G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/0382 , G03F7/0392 , Y10S430/122 , Y10S430/123 , Y10S430/124 , Y10S430/125 , Y10S430/126
摘要： Compounds of the formula (I), wherein Ar1 is for example phenylene or biphenylene both unsubstituted or substituted; Ar2 and Ar3 are for example independently of each other phenyl, naphthyl, biphenylylyl or heteroaryl, all optionally substituted; or Ar1 and Ar2 for example together with a direct bond, O, S or (CO), form a fused ring system; R is for example hydrogen, C3-C30cycloalkyl or C1-C18alkyl; and R1, R2 and R3 independently of each other are for example C1-C10haloalkyl; are effective photoacid generators (PAG).
摘要翻译： 式（I）的化合物，其中Ar1为未取代或取代的亚苯基或亚联苯; Ar2和Ar3例如彼此独立地为苯基，萘基，联苯基或杂芳基，全部为取代基; 或Ar1和Ar2与直接键O，S或（CO）一起形成稠环体系; R是例如氢，C 3 -C 30环烷基或C 1 -C 18烷基; 并且R 1，R 2和R 3彼此独立地是例如C 1 -C 10卤代烷基; 是有效的光酸产生剂（PAG）。
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公开(公告)号：US20080085458A1
公开(公告)日：2008-04-10
申请号：US11632687
申请日：2005-07-11
IPC分类号： C07C291/06 , C07D209/56 , G03F1/00
CPC分类号： C07C309/67 , B33Y70/00 , C07C309/65 , C07C309/73 , C07C309/74 , C07C309/75 , C07C381/00 , C07C2603/18 , C07C2603/20 , C07C2603/66 , C07D209/86 , C07F9/097 , G03F7/0007 , G03F7/0045 , G03F7/0382 , G03F7/0392 , Y10S430/12
摘要： The invention pertain to novel photoacid generator compounds of the formula I, II or III wherein R1 is for example C1-C18alkylsulfonyl or phenylsulfonyl, phenyl-C1-C3alkylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, all optionally substituted, or R1 is a group X1, X2 and X3 independently of each other are O or S; R′1, is e.g. phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, all optionally substituted; R2 is halogen or C1-C10haloalkyl; X is halogen; Ar1 is for example biphenylyl or fluorenyl, or is substituted naphthyl; Ar′1 is heteroarylene, optionally substituted; R8, R9, R10 and R11 for example are C1-C6alkyl which is unsubstituted or substituted by halogen; or R8, R9 and R10 are phenyl which is unsubstituted or substituted by C1-C4alkyl or halogen; or R10 and R11 together are 1,2-phenylene or C2-C6alkylene which is unsubstituted or substituted by C1-C4alkyl or halogen.
摘要翻译： 本发明涉及式I，II或III的新型光酸产生剂化合物，其中R 1是例如C 1 -C 18烷基磺酰基或 苯基磺酰基，苯基-C 1 -C 3烷基磺酰基，萘基磺酰基，蒽基磺酰基或菲基磺酰基，全部任意取代，或R 1是基团X， X 1，X 2和X 3 3彼此独立地为O或S; R'1，例如， 亚苯基二磺酰基，亚苯基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基，全部任选被取代; R 2是卤素或C 1 -C 10卤代烷基; X是卤素; Ar 1是例如联苯基或芴基，或者是取代的萘基; Ar'1'是亚杂芳基，任选被取代; R 8，R 9，R 10和R 11是例如C 1〜N 未取代或被卤素取代的C 1 -C 6烷基; 或R 8，R 9和R 10是未被取代或被C 1 -C 3烷基取代的苯基， 烷基或卤素; 或R 10和R 11一起是1,2-亚苯基或C 2 -C 6 -C 6亚烷基，其是 未取代或被C 1 -C 4烷基或卤素取代。
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公开(公告)号：US20060068325A1
公开(公告)日：2006-03-30
申请号：US11262104
申请日：2005-10-27
IPC分类号： G03C1/76
CPC分类号： G03F7/0392 , B33Y70/00 , G03F7/0045 , G03F7/0382
摘要： New oxime sulfonate compounds of the formula I, II, III, IV, V, VI and VII R1 is for example C1-C18alkylsulfonyl, R2 is halogen or C1-C10haloalkyl; R3 is for example unsubstitude or substituted phenylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl; Ar1 is for example a direct bond, C1-C12alkylene; —O—C-bond or a —O—Si—bond which cleaves upon the action of an acid; A1, A2, A3, A4, A5, A6, A7, A8, A9, A10, A11 and A12 are for example a direct bond, —O—, or —S—, or are C1-C12alkylene or phenylene unsubstituted or substituted; Y0 is C1-C12alkylene which is for example substituted by OR4, or SR7; Y2 is e.g. a trivalent radical of C1-C12alkylene; Y3 is e.g. a tetravalent radical of C1-C12alkylene; X is halogen; Ar′1 is for example C1-C12alkyl which is unsubstituted or substituted; Ar″1 is for example phenylene; provided that at least one of the radicals Ar′1, Ar″11 is substituted by 1 to 3 groups of example halogen; R15, R16, R17 and R18 e.g. hydrogen or phenyl; R19, R20, R21, R22 and R23 are e.g. phenyl; are especially suitable for the preparation of photoresists.
摘要翻译： 式I，II，III，IV，V，VI和VII的新的肟磺酸酯化合物
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公开(公告)号：US06986981B2
公开(公告)日：2006-01-17
申请号：US10380029
申请日：2001-09-18
IPC分类号： G03F7/031
CPC分类号： G03F7/0392 , B33Y70/00 , G03F7/0045 , G03F7/0382
摘要： New oxime sulfonate compounds of the formula I, II, III, IV, V, VI and VII wherein the substituents are defined in the specification
摘要翻译： 式I，II，III，IV，V，VI和VII的新的肟磺酸酯化合物，其中取代基在说明书中定义
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