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公开(公告)号：US12116421B2
公开(公告)日：2024-10-15
申请号：US18021645
申请日：2021-09-02
CPC分类号： C07K7/06 , C12N5/0062 , C12N5/0601 , C12N2513/00 , C12N2533/50
摘要： The present disclosure relates to Dopa containing ultrashort peptides capable of forming a gel, to a gel comprising a peptide in accordance with the present disclosure, and to a glue comprising a peptide in accordance with the present disclosure. Such gel is adhesive and is biocompatible. The peptides are suitable for building 3D structures, 3D printing, gluing as well as other applications.
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公开(公告)号：US12109327B2
公开(公告)日：2024-10-08
申请号：US17401542
申请日：2021-08-13
CPC分类号： A61L27/365 , A61L27/22 , B33Y10/00 , B33Y70/00 , B33Y80/00 , C12N5/0654 , A61L2430/02 , C12N2506/1353 , C12N2513/00 , C12N2533/50
摘要： The present disclosure relates generally to an osteo-tissue graft capable of promoting bone tissue growth and regeneration, comprising at least one self-assemble peptide and mesenchymal stem cells (MSCs) in accordance with the present invention and a method of preparing such an osteo-tissue graft. The grafts are suitable for treatment of bone disorder or damages through tissue engineering, cellular replacement therapies as well as other applications.
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公开(公告)号：USD1040867S1
公开(公告)日：2024-09-03
申请号：US29835579
申请日：2022-04-20
摘要： FIG. 1 is a perspective view of a hinged plate, showing a new design;
FIG. 2 is a front elevation view thereof;
FIG. 3. is a rear elevation view thereof;
FIG. 4. is a left elevation view thereof;
FIG. 5. is a right elevation view thereof;
FIG. 6. is a top plan view thereof;
FIG. 7. is a bottom plan view thereof; and,
FIG. 8. is a perspective view of the hinged plate in an open state.-
公开(公告)号：US12002692B2
公开(公告)日：2024-06-04
申请号：US17507932
申请日：2021-10-22
IPC分类号： H01L21/67 , H01L21/677
CPC分类号： H01L21/67184 , H01L21/67017 , H01L21/67161 , H01L21/67196 , H01L21/67201 , H01L21/67742
摘要： According to one embodiment, a vacuum processing device is provided which is capable of being controlled to create the most suitable gas flow under the situation where the device is placed by allowing a plurality of vacuum transfer chambers to communicate with each other via the intermediate chamber in an operation method of the vacuum processing device including the plurality of vacuum transfer chambers connected to each other via the intermediate chamber and a plurality of vacuum processing chambers respectively connected to the vacuum transfer chambers.
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公开(公告)号：US11982631B2
公开(公告)日：2024-05-14
申请号：US17437528
申请日：2019-03-12
发明人： Yuko Otani , Kazuo Aoki , Shunichi Matsumoto , Yuta Urano
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/8851 , G02B3/0006 , G02B5/20
摘要： A defect detection device including an illumination optical system, an image capturing optical system configured to capture an image of scattered light generated by the illumination optical system irradiating the wafer, and an image processing unit configured to process a picture of the image of the scattered light to extract a defect on the wafer. The image capturing optical system includes an objective lens, a filter unit configured to shield a part of light transmitted through the objective lens, and an imaging lens configured to form an image of light transmitted through the filter unit. The filter unit includes a first microlens array configured to condense parallel light transmitted through the objective lens, a shutter array including a light transmission unit at a focus position of the first microlens array, and a second microlens array disposed opposite to the first microlens array with respect to the shutter array.
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公开(公告)号：US11948776B2
公开(公告)日：2024-04-02
申请号：US17641503
申请日：2021-01-21
发明人： Chen Pin Hsu , Hitoshi Tamura
CPC分类号： H01J37/32229 , H01J37/32266 , H01J37/32495 , H05H1/46 , H01J37/32311 , H01J2237/334
摘要： A plasma processing apparatus adapted to reduce non-uniformity of plasma distribution in a process chamber and to adjust the plasma distribution to “centrally high density”, “circumferentially high density”, or “uniform density” in accordance with a desired etching process, a process chamber; a radio frequency power source; a rectangular waveguide; and a circular waveguide connected to the rectangular waveguide, in which the rectangular waveguide includes an upper rectangular waveguide and a lower rectangular waveguide formed by vertically dividing the rectangular waveguide; and a cutoff section which cuts off the microwave frequency power and which has a dielectric body. The circular waveguide includes an inner waveguide connected to the upper rectangular waveguide and formed inside; and an outer waveguide connected to the lower rectangular waveguide and formed on an outer side of the inner waveguide. The cutoff section has a width narrower than those of the rectangular waveguides except the cutoff section.
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公开(公告)号：US11879902B2
公开(公告)日：2024-01-23
申请号：US17268347
申请日：2019-08-05
CPC分类号： G01N35/00623 , G01N35/10 , G01N35/1004
摘要： An object of the present invention is to provide a test method capable of efficiently performing a step of evaluating a surface state of a dispensing probe provided in a dispensing apparatus. In the test method according to the present invention, a first solution in which a coloring matter is dissolved is dispensed to a first container in advance by a first dispensing probe, a second solution in which a coloring matter is not dissolved is dispensed to a second container in advance by the first dispensing probe and then the first solution and the second solution are respectively sucked and discharged by a second dispensing probe. After that, a surface state of the second dispensing probe is evaluated by acquiring an amount of the coloring matter collected by the second solution (see FIG. 2).
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公开(公告)号：US11869767B2
公开(公告)日：2024-01-09
申请号：US17799083
申请日：2020-11-24
发明人： Shugo Nitta , Kazuki Onishi , Yuki Amano , Naoki Fujimoto , Hiroshi Amano
CPC分类号： H01L21/0254 , C30B25/08 , C30B25/10 , C30B25/12 , C30B25/18 , C30B29/406 , H01L21/0262 , H01L21/02579
摘要： A gallium nitride vapor phase epitaxy apparatus capable of doping magnesium is provided. The apparatus is used in vapor phase epitaxy not using organic metal as a gallium raw material. The apparatus comprises a reactor vessel and a wafer holder. The apparatus comprises a first raw material gas supply pipe configured to supply a first raw material gas containing gallium. The apparatus comprises a second raw material gas supply pipe configured to supply a second raw material gas, which contains nitrogen and configured to react with the first raw material gas. The apparatus comprises a third raw material gas supply pipe configured to supply a third raw material gas containing magnesium. The third raw material gas supply pipe is configured capable of placing a magnesium-based oxide on its supply path. The apparatus comprises a first heating unit configured to heat the magnesium-based oxide in a first temperature range.
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公开(公告)号：US11842881B2
公开(公告)日：2023-12-12
申请号：US17413011
申请日：2018-12-18
发明人： Akio Yamamoto , Kazuki Ikeda , Wen Li , Shunsuke Mizutani , Hiroyuki Takahashi
IPC分类号： H01J37/28 , H01J37/244
CPC分类号： H01J37/28 , H01J37/244 , H01J2237/24495 , H01J2237/281
摘要： A measurement device that comprises a photoelectric conversion element and a signal processing part that receives, from the photoelectric conversion element, detected pulses that include dark pulses and signal pulses that are outputted in accordance with inputted photons. The signal processing part performs amplitude discrimination on the detected pulses on the basis of a pre-acquired dark pulse amplitude distribution for the photoelectric conversion element.
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公开(公告)号：US11835465B2
公开(公告)日：2023-12-05
申请号：US16646487
申请日：2019-02-15
发明人： Yoshifumi Ogawa , Yutaka Kouzuma , Masaru Izawa
CPC分类号： G01N21/73 , C23C16/52 , H01J37/32 , H01J37/32834 , H01L21/67253 , H05H1/24 , H01J2237/24592 , H01L21/67069 , H01L22/26
摘要： Provided is a detecting device of gas components that includes a gas component detecting unit for detection of a light emission of plasma that is formed by re-excitation downstream of an arrangement position of an object to be processed. The gas component detecting unit includes an introduced gas supply portion that supplies an introduced gas, a nozzle portion that is provided with a hole through which the introduced gas that is supplied from the introduced gas supply portion passes through and an opening through which a part of a gas to be analyzed flowing through an exhaust pipe portion is introduced into an inside of the hole, the opening being provided in an intermediate portion of the hole, a discharge electrode portion that generates plasma inside the nozzle portion by causing the gas to be analyzed that is introduced from the opening into an inside of the nozzle portion and the introduced gas that is supplied into the inside of the hole to discharge, and a light emission detecting unit that detects a light emission of the plasma generated inside the nozzle portion by the discharge electrode portion.
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