公开(公告)号：US20100065753A1

公开(公告)日：2010-03-18

申请号：US12554577

申请日：2009-09-04

Applicant: Momoyo ENYAMA ,  Hiroya Ohta ,  Osamu Kamimura

Inventor： Momoyo ENYAMA ,  Hiroya Ohta ,  Osamu Kamimura

IPC: H01J3/16

CPC classification number: H01J37/153 ,  H01J37/1472 ,  H01J2237/151 ,  H01J2237/1534

Abstract: With a multi-beam type charged particle beam apparatus, and a projection charged particle beam apparatus, in the case of off-axial aberration corrector, there is the need for preparing a multitude of multipoles, and power supply sources in numbers corresponding to the number of the multipoles need be prepared. In order to solve this problem as described, a charged particle beam apparatus is provided with at least one aberration corrector wherein the number of the multipoles required in the past is decreased by about a half by disposing an electrostatic mirror in an electron optical system.

Abstract translation: 使用多光束型带电粒子束装置和投影带电粒子束装置，在离轴像差校正器的情况下，需要准备多个多极，并且与数字对应的数量的电源 的多极需要准备。 为了解决上述问题，带电粒子束装置设置有至少一个像差校正器，其中通过在电子光学系统中设置静电镜，过去所需的多极数减少约一半。

公开(公告)号：US07679054B2

公开(公告)日：2010-03-16

申请号：US10571347

申请日：2004-09-02

Applicant: Jürgen Frosien ,  Ralf Degenhardt ,  Stefan Lanio

Inventor： Jürgen Frosien ,  Ralf Degenhardt ,  Stefan Lanio

IPC: H01J49/00

CPC classification number: H01J37/26 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/05 ,  H01J37/153 ,  H01J37/3174 ,  H01J2237/057 ,  H01J2237/1534 ,  H01J2237/1538

Abstract: The present invention relates to e.g. a charged particle beam energy width reduction system for a charged particle beam with a z-axis along the optical axis and a first and a second plane, comprising, a first element acting in a focusing and dispersive manner, a second element acting in a focusing and dispersive manner, a first quadrupole element being positioned such that, in operation, a field of the first quadrupole element overlaps with a field of the first element acting in a focusing and dispersive manner, a second quadrupole element being positioned such that, in operation, a field of the second quadrupole element overlaps with a field of the second element acting in a focusing and dispersive manner, a first charged particle selection element being positioned, in beam direction, before the first element acting in a focusing and dispersive manner, and a second charged particle selection element being positioned, in beam direction, after the first element acting in a focusing and dispersive manner. Thereby, a virtually dispersive source-like location without an inherent dispersion limitation can be realized.

Abstract translation: 本发明涉及例如 用于带有沿着光轴的z轴的带电粒子束的带电粒子束能量宽度减小系统以及包括以聚焦和分散方式起作用的第一元件的第一和第二平面， 第一四极元件被定位成使得在操作中，第一四极元件的场与以聚焦和分散方式作用的第一元件的场重叠，第二四极元件被定位成使得在操作中 第二四极元件的场与以聚焦和分散方式作用的第二元件的场重叠，第一带电粒子选择元件沿光束方向定位在第一元件以聚焦和分散方式作用之前，以及 第二带电粒子选择元件在光束方向上位于第一元件以聚焦和分散方式作用之后。 因此，可以实现没有固有分散限制的虚拟色散源状位置。

公开(公告)号：US07557347B2

公开(公告)日：2009-07-07

申请号：US11882701

申请日：2007-08-03

Applicant: Tomoyasu Shojo ,  Muneyuki Fukuda ,  Naomasa Suzuki

Inventor： Tomoyasu Shojo ,  Muneyuki Fukuda ,  Naomasa Suzuki

IPC: G01N23/00 ,  G21K7/00

CPC classification number: H01J37/244 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/057 ,  H01J2237/2448 ,  H01J2237/24485 ,  H01J2237/2449 ,  H01J2237/24592

Abstract: A charged particle beam apparatus for acquiring high-definition and highly contrasted observation images by detecting efficiently secondary signals without increasing aberration of the primary electron beam, detecting defects from observation images and thus increasing the inspection speed and enhancing the sensitivity of inspection. The desired area of the sample is scanned with a primary charged particle beam, and the secondary charged particles generated secondarily from the area by the irradiation of the primary charged particle beam are led to collide with the secondary electron conversing electrode, and then the secondary electrons generated by the first E×B deflector 31 arranged through an insulator on the surface of the secondary electron conversing electrode on the side of the sample is absorbed by the detector. At the same time, the deflection chromatic aberration that had been generated in the primary charged particle beam by the first E×B deflector is reduced by the second E×B deflector arranged on the first E×B deflector, to obtain high-definition and highly contrasted observation images free of shading.

Abstract translation: 一种带电粒子束装置，用于通过高效检测二次信号而不增加一次电子束的像差，从观察图像中检测缺陷，从而提高检查速度，提高检查灵敏度，从而获取高分辨率和高对比度的观察图像。 用初级带电粒子束扫描样品的期望面积，并且通过初级带电粒子束的照射从该区域二次生成的二次带电粒子被引导与二次电子转换电极碰撞，然后二次电子 由通过检测器侧面上的二次电子转换电极的表面上的绝缘体布置的第一ExB偏转器31产生的。 同时，通过布置在第一ExB偏转器上的第二ExB偏转器减少由第一ExB偏转器在一次带电粒子束中产生的偏转色差，以获得高清晰度和高对比度的观察图像， 阴影。

公开(公告)号：US20090095904A1

公开(公告)日：2009-04-16

申请号：US12285673

申请日：2008-10-10

Applicant: Hirotami Koike ,  Shinichi Okada

Inventor： Hirotami Koike ,  Shinichi Okada

IPC: G01N23/00 ,  H01J3/16

CPC classification number: H01J37/153 ,  H01J37/26 ,  H01J37/28 ,  H01J49/067 ,  H01J2237/1534

Abstract: A charged particle beam reflector device is configured to include at least two electrostatic mirrors arranged with a predetermined interval on a linear optical axis, each having a through hole through which a charged particle beam radiated from an electron gun along a linear optical axis passes, and having a function of reflecting the charged particle beam or allowing the charged particle beam to pass through the through hole in accordance with an applied voltage, and a controller controlling an applied voltage to the at least two electrostatic mirrors. The controller applies, to each of the electrostatic mirrors, a reflection voltage allowing the electrostatic mirrors to reflect the charged particle beam at a predetermined timing so that the charged particle beam from the electron gun is reflected by the at least two electrostatic mirrors a plurality of times.

Abstract translation: 带电粒子束反射器装置被配置为包括在线性光轴上以预定间隔布置的至少两个静电镜，每个具有通孔，沿着线性光轴从电子枪辐射的带电粒子通过该通孔，以及 具有反射带电粒子束或使带电粒子束根据施加电压通过通孔的功能，以及控制器对至少两个静电反射镜施加的电压的控制器。 控制器向每个静电反射镜施加反射电压，该反射电压允许静电镜在预定的定时反射带电粒子束，使得来自电子枪的带电粒子束被至少两个静电镜反射，多个 次

公开(公告)号：US20090032693A1

公开(公告)日：2009-02-05

申请号：US12182704

申请日：2008-07-30

Applicant: Junichi Kakuta ,  Kazuhiro Ueda ,  Tatsuya Maeda ,  Hiroyuki Saito ,  Katsuhiro Sasada

Inventor： Junichi Kakuta ,  Kazuhiro Ueda ,  Tatsuya Maeda ,  Hiroyuki Saito ,  Katsuhiro Sasada

IPC: G01D18/00 ,  G01N23/00

CPC classification number: G01N23/225 ,  H01J37/1471 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1501 ,  H01J2237/1532

Abstract: The present invention aims to provide an axis alignment method, astigmatism correction method and SEM for implementing these methods, which can prevent an alignment or correction error attributable to conditions of a specimen. A first aspect is to obtain the difference between the optimal values acquired from an automatic axis alignment result on a standard sample and from each of automatic axis alignment results on a observation target sample, and to correct an optimal value adjusted using the standard sample by use of the difference thus obtained. A second aspect is to acquire an optimal stigmator value (astigmatism correction signal) by using the standard sample, to store the optimal stigmator value as a default value, to add the optimal stigmator value and the default value depending on the height of an observation target sample pattern, and to perform an astigmatism correction on the basis of the resultant stigmator value.

Abstract translation: 本发明旨在提供一种用于实现这些方法的轴对准方法，像散校正方法和SEM，其可以防止由于样品的条件引起的对准或校正误差。 第一方面是获得从标准样品的自动轴对准结果获取的最佳值与观察目标样品上的自动轴对准结果中的每一种之间的差异，并且通过使用校正使用标准样品调整的最佳值 的差异。 第二方面是通过使用标准样本来获取最佳标称值（像散校正信号），以将最佳标称值作为默认值来存储，以根据观察目标的高度添加最优标示符值和默认值 样本图案，并且基于得到的标记值进行散光校正。

公开(公告)号：US07468517B2

公开(公告)日：2008-12-23

申请号：US10571345

申请日：2004-09-02

Applicant: Jürgen Frosien ,  Ralf Degenhardt ,  Stefan Lanio ,  Gerald Schönecker

Inventor： Jürgen Frosien ,  Ralf Degenhardt ,  Stefan Lanio ,  Gerald Schönecker

IPC: G21K1/08 ,  H01J37/21 ,  H01J37/20

CPC classification number: H01J37/153 ,  H01J49/288 ,  H01J49/466 ,  H01J2237/057 ,  H01J2237/1534 ,  H01J2237/2801

Abstract: The present invention provides a charged particle beam device. The device comprises a first lens generating a crossover a second lens positioned after the crossover and an element acting in a focusing and dispersive manner in an x-z-plane with a center of the element having essentially same z-position as the crossover. Further, a multipole element, which acts in the x-z-plane and a y-z-plane is provided. A first charged particle selection element and a second charged particle selection element are used for selecting a portion of the charged particles. Thereby, e.g. the energy width of the charged particle beam can be reduced.

Abstract translation: 本发明提供一种带电粒子束装置。 该装置包括产生交叉的第一透镜，位于交叉后的第二透镜和以聚焦和分散方式作用在x-z平面中的元件，其中元件的中心具有与交叉点基本相同的z位置。 此外，提供了作用于x-z平面和y-z平面的多极元件。 第一带电粒子选择元件和第二带电粒子选择元件用于选择一部分带电粒子。 因此，例如 可以减少带电粒子束的能量宽度。

公开(公告)号：US20080283749A1

公开(公告)日：2008-11-20

申请号：US12096579

申请日：2005-12-06

Applicant: Heiko Muller ,  Harald Rose

Inventor： Heiko Muller ,  Harald Rose

IPC: G01N23/00 ,  G02B9/00

CPC classification number: H01J37/153 ,  H01J37/26 ,  H01J2237/1534

Abstract: A corrective for eliminating the third-order aperture aberration and the first-order, first-degree axial chromatic aberration includes two correction pieces, which are arranged one behind the other in the direction of the optical axis, in which each correction piece has a plurality of quadrupole fields (QP) and at least one octupole field (OP.) Each correction piece is constructed such that it is symmetrical with respect to its central plane (S, S′) with each correction piece having an uneven number of at least five quadrupole fields (QP) and at least one octupole field (OP). Each correction piece is further constructed so that it is symmetrical with respect to its central plane. The central quadrupole field is arranged so that it is centered with respect to the central plane of the correction piece and is electromagnetic. The quadrupole fields of the two correction pieces are antisymmetrical and a transfer lens system is arranged such that it is symmetrical with respect to the central plane of the corrective between the correction pieces. The transfer lens system has two round lenses and the setting of the transfer lens system takes place so that the two round lenses image the central plane of the two correction pieces anamorphically onto one another, in which the enlargement in one main section is the reciprocal of the enlargement in the other main section and with an octupole field superimposed on the central quadrupole field.

Abstract translation: 用于消除三次孔径像差和一级一级轴向色差的校正方法包括两个校正片，其在光轴方向上一个接一个布置，其中每个校正片具有多个 四极场（QP）和至少一个八极场（OP）。每个校正片被构造成使得它相对于其中心平面（S，S'）是对称的，每个校正片具有不均匀数量的至少五个 四极场（QP）和至少一个八极场（OP）。 每个校正件进一步构造成使得它相对于其中心平面是对称的。 中心四极场被布置为使得其相对于校正件的中心平面居中并且是电磁的。 两个校正块的四极场是反对称的，并且转印透镜系统被布置成使得其相对于校正片之间的校正的中心平面对称。 转印透镜系统具有两个圆形透镜，并且传送透镜系统的设置发生，使得两个圆形透镜彼此变形地将两个校正片的中心平面成像，其中一个主要部分的放大是 另一个主要部分的放大和一个叠加在中心四极场上的八极场。

公开(公告)号：US20080116391A1

公开(公告)日：2008-05-22

申请号：US11943241

申请日：2007-11-20

Applicant: Hiroyuki Ito ,  Yuko Sasaki ,  Tohru Ishitani ,  Yoshinori Nakayama

Inventor： Hiroyuki Ito ,  Yuko Sasaki ,  Tohru Ishitani ,  Yoshinori Nakayama

IPC: G21K1/087 ,  G21K1/093

CPC classification number: H01J37/141 ,  H01J37/09 ,  H01J37/12 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/142 ,  H01J2237/1534 ,  H01J2237/303

Abstract: The present invention relates to an orbit correction method for a charged particle beam, and aims to solve problems inherent in conventional aberration correction systems and to provide a low-cost, high-precision, high-resolution optical converging system for a charged particle beam. To this end, employed is a configuration in which a beam orbit is limited in ring zone form to form a distribution of electromagnetic field converging toward the center of a beam orbit axis. Consequently, a nonlinear action outwardly augmented, typified by spherical aberration of an electron lens, can be cancelled out. Specifically, this effect can be achieved by an electron disposed on the axis and subjected to a voltage to facilitate the occurrence of electrostatic focusing. For a magnetic field, this effect can be achieved by forming a coil radially distributed-wound on a surface equiangularly divided in the direction of rotation to control convergence of a magnetic flux density.

Abstract translation: 本发明涉及一种用于带电粒子束的轨道校正方法，其目的在于解决常规像差校正系统中固有的问题，并提供一种用于带电粒子束的低成本，高精度，高分辨率的聚光系统。 为此，所采用的是波束轨道受环形形式限制以形成朝向光束轨道中心收敛的电磁场分布的结构。 因此，可以抵消以电子透镜的球面像差为代表的向外扩大的非线性动作。 具体地说，这种效果可以通过设置在轴上的电子元件实现，并且经受电压以便于静电聚焦的发生。 对于磁场，这种效果可以通过在旋转方向上等角地分割的表面上形成径向分布缠绕的线圈来实现，以控制磁通密度的收敛。

公开(公告)号：US07375323B2

公开(公告)日：2008-05-20

申请号：US11655946

申请日：2007-01-22

Applicant: Takeshi Kawasaki ,  Takaho Yoshida ,  Yoichi Ose ,  Hideo Todokoro

Inventor： Takeshi Kawasaki ,  Takaho Yoshida ,  Yoichi Ose ,  Hideo Todokoro

IPC: G21K1/08 ,  H01J3/14

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1471 ,  H01J37/153 ,  H01J37/265 ,  H01J37/28 ,  H01J37/302 ,  H01J2237/1501 ,  H01J2237/1534 ,  H01J2237/21 ,  H01J2237/2487 ,  H01J2237/2817 ,  H01J2237/31793

Abstract: An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.

Abstract translation: 提供具有使用多极透镜的像差校正器的电子束装置。 电子束装置具有能够进行像差校正器的操作的扫描模式和用于禁止像差校正器的操作的扫描模式，并且每个像差校正器，聚光透镜等的操作被控制，使得 物镜的物体在任一种扫描模式下都不会改变。 如果在两种模式中的样本的二次电子图像之间进行比较，则图像缩放因子和焦点保持不变，并且可以通过清楚地仅识别像差校正器的效果来进行评估和调整。 这减少了由于像差校正器固有的轴向对准缺陷而长时间调整光轴所需的时间以及像差校正器之外的不同于彼此混合的部分的轴向对准缺陷所需的时间。

公开(公告)号：US07351970B2

公开(公告)日：2008-04-01

申请号：US11344804

申请日：2006-02-01

Applicant: Hirofumi Miyao

Inventor： Hirofumi Miyao

IPC: H01J37/244

CPC classification number: H01J37/28 ,  G01N23/225 ,  H01J37/153 ,  H01J2237/0216 ,  H01J2237/20292 ,  H01J2237/221

Abstract: There is disclosed a scanning electron microscope capable of removing the effects of vibrations on image information easily and reliably by detecting variations in the relative position between a specimen chamber holding a specimen therein and the specimen stage. The microscope has an image-processing portion that obtains information about the relative position between the specimen stage and the specimen chamber from a measurement unit when the beam is scanned. Based on the information about the relative position, a pixel position-correcting unit makes corrections to pixel positions indicated by the image information obtained by the scanning. An image creation unit creates image elements to eliminate pixel dropouts or pixel duplication produced by the aforementioned corrections. An image extraction unit extracts an image to be displayed.

Abstract translation: 公开了一种扫描电子显微镜，其能够通过检测保持试样的样本室与样品台之间的相对位置的变化，容易且可靠地消除振动对图像信息的影响。 显微镜具有图像处理部，当扫描光束时，从测量单元获取关于样品台和样品室之间的相对位置的信息。 基于关于相对位置的信息，像素位置校正单元对由扫描获得的图像信息指示的像素位置进行修正。 图像创建单元创建图像元素以消除由上述校正产生的像素遗漏或像素复制。 图像提取单元提取要显示的图像。