公开(公告)号：US12067340B2

公开(公告)日：2024-08-20

申请号：US17389682

申请日：2021-07-30

申请人： ASML NETHERLANDS B.V.

发明人： Christophe David Fouquet ,  Bernardo Kastrup ,  Arie Jeffrey Den Boef ,  Johannes Catharinus Hubertus Mulkens ,  James Benedict Kavanagh ,  James Patrick Koonmen ,  Neal Patrick Callan

IPC分类号： G06F7/00 ,  G03F7/00 ,  G06F30/20 ,  G06F30/398 ,  G06N7/01 ,  H01L21/66

CPC分类号： G06F30/398 ,  G03F7/705 ,  G03F7/70525 ,  G03F7/7065 ,  G06F30/20 ,  G06N7/01 ,  H01L22/20

摘要： A defect prediction method for a device manufacturing process involving processing a portion of a design layout onto a substrate, the method including: identifying a hot spot from the portion of the design layout; determining a range of values of a processing parameter of the device manufacturing process for the hot spot, wherein when the processing parameter has a value outside the range, a defect is produced from the hot spot with the device manufacturing process; determining an actual value of the processing parameter; determining or predicting, using the actual value, existence, probability of existence, a characteristic, or a combination thereof, of a defect produced from the hot spot with the device manufacturing process.

公开(公告)号：US20240272562A1

公开(公告)日：2024-08-15

申请号：US18644211

申请日：2024-04-24

申请人： CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED

发明人： Xiaosong LIU ,  Keqiang LI ,  Zhiyang WU ,  Yi LU

IPC分类号： G03F7/00 ,  B08B3/02 ,  C25F3/14 ,  G03F7/16 ,  H01M4/70

CPC分类号： G03F7/70991 ,  B08B3/02 ,  C25F3/14 ,  G03F7/168 ,  G03F7/7075 ,  B08B2203/02 ,  H01M4/70

摘要： A substrate treatment apparatus, comprising: a coating device configured to coat a substrate, which is conveyed at a first speed in a feeding direction, with a material; a drying device configured to receive the substrate, which is coated by means of the coating device, at the first speed and dry the material; an exposure device configured to receive the substrate, which is dried by means of the drying device, at the first speed and continuously convey a mask at the first speed in the feeding direction, the mask being used for regional shading during exposure of the material by means of the exposure device; and an etching device configured to receive the substrate, which is exposed by means of the exposure device, at the first speed and etch the material and a portion of the substrate in an unexposed region of the substrate.

公开(公告)号：US20240272559A1

公开(公告)日：2024-08-15

申请号：US18455277

申请日：2023-08-24

申请人： Samsung Electronics Co., Ltd.

发明人： Dong-Hyub LEE ,  Jeong-Gil KIM ,  Hyuck SHIN

IPC分类号： G03F7/00 ,  H01L21/66

CPC分类号： G03F7/70591 ,  G03F7/70033 ,  H01L22/12

摘要： A monitoring system for manufacturing a semiconductor device comprises a source module, an optical module including a collector collecting and reflecting extreme ultraviolet generated light from the source module, an illumination optical system including a field facet mirror, and a projection optical system transferring the extreme ultraviolet light reflected from a reticle to a substrate. A calculating module calculates a degradation rate of the optical module, and a method comprises respectively generating a reference image profile and an (N)th image profile through the second sensor module by correcting the far field image of the extreme ultraviolet with respect to the intensity of the extreme ultraviolet at a reference time point and an (N)th time point after the reference time point, and calculating the degradation rate of the optical module by using a ratio of the reference image profile and the (N)th image profile by the calculation module.

公开(公告)号：US20240272558A1

公开(公告)日：2024-08-15

申请号：US18287638

申请日：2022-04-15

申请人： The Institute of Optics and Electronics, The Chinese Academy of Sciences

发明人： Xiangang LUO ,  Chengwei ZHAO ,  Yanqin WANG ,  Changtao WANG ,  Zeyu ZHAO ,  Yunfei LUO ,  Mingbo PU ,  Yiyun ZHANG

IPC分类号： G03F7/00 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/2041

摘要： Provided is an near-field lithography immersion system, including: an immersion unit including: a liquid flow channel and a gas flow channel configured to apply gas to confine an immersion liquid provided by the liquid flow channel into an exposure field; at least two interface modules, the interface module includes a gas connector, a liquid connector and a brake connector, the gas connector and the liquid connector are correspondingly connected to the gas flow channel and the liquid flow channel, respectively, the brake connector is configured to control an assembly and a disassembly of the immersion unit, and the interface module is detachably connected to the immersion unit; and a mask loading module including a mask base plate and a mask, the immersion liquid is guided to an edge of the mask from below the mask base plate to form an immersion field between the mask and a substrate.

公开(公告)号：US20240272058A1

公开(公告)日：2024-08-15

申请号：US18568585

申请日：2022-05-24

申请人： ASML Netherlands B.V.

发明人： Michal Emanuel PAWLOWSKI ,  Justin Lloyd KREUZER

IPC分类号： G01N15/0205 ,  G01N15/075 ,  G03F7/00

CPC分类号： G01N15/0205 ,  G01N15/075 ,  G03F7/701 ,  G03F7/70116 ,  G03F7/70133 ,  G03F7/7025 ,  G03F7/70275

摘要： An inspection system includes a projection system including a radiation source configured to transmit an illumination beam along an illumination path and an aperture stop configured to select a portion of the illumination beam. The inspection system also includes an aperture stop that selects a portion of the illumination beam and an optical system that transmits the selected portion of the illumination beam towards an object and transmit a signal beam scattered from the object. The inspection system also includes a detector that detects the signal beam.

公开(公告)号：US12063734B2

公开(公告)日：2024-08-13

申请号：US17483298

申请日：2021-09-23

申请人： Taiwan Semiconductor Manufacturing Co., Ltd.

发明人： Yu-Kuang Sun ,  Ming-Hsun Tsai ,  Wei-Shin Cheng ,  Cheng-Hao Lai ,  Hsin-Feng Chen ,  Chiao-Hua Cheng ,  Cheng-Hsuan Wu ,  Yu-Fa Lo ,  Jou-Hsuan Lu ,  Shang-Chieh Chien ,  Li-Jui Chen ,  Heng-Hsin Liu

IPC分类号： H05G2/00 ,  G03F7/00 ,  G05D23/19

CPC分类号： H05G2/006 ,  G03F7/70033 ,  G05D23/19 ,  H05G2/005

摘要： The present disclosure is directed to a modularized vessel droplet generator assembly (MGDVA) including a droplet generator assembly (DGA). Under a normal operation, the liquid fuel moves along an operation pathway extending through the DGA to eject or discharge the liquid fuel (e.g., liquid tin) from a nozzle of the DGA into a vacuum chamber. The liquid fuel in the vacuum chamber is then exposed to a laser generating an extreme ultra-violet (EUV) light. Under a service operation, the operation pathway is closed and a service pathway extending through the DGA is opened. A gas is introduced into the service pathway forming a gas-liquid interface between the gas and the liquid fuel. The gas-liquid interface is driven to an isolation valve directly adjacent to the DGA. In other words, the gas pushes back the liquid fuel to the isolation valve. Once the gas-liquid interface reaches the isolation valve, the isolation valve is closed isolating the DGA from the liquid fuel.

公开(公告)号：US20240264541A1

公开(公告)日：2024-08-08

申请号：US18612799

申请日：2024-03-21

申请人： CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED

发明人： Xiaosong LIU ,  Keqiang LI ,  Zhiyang WU ,  Yi LU

IPC分类号： G03F7/00 ,  G03F7/20

CPC分类号： G03F7/70808 ,  G03F7/2002 ,  G03F7/2032 ,  G03F7/7005 ,  G03F7/7055 ,  G03F7/70733

摘要： An exposure apparatus includes a conveying mechanism and an exposure mechanism. The conveying mechanism is configured to convey a substrate, a surface of the substrate being coated with photoresist. The exposure mechanism includes an exposure source and an exposure member. The exposure source is configured to provide light to the substrate. The exposure member includes an exposure section opposite the substrate, where the exposure section is located between the exposure source and the substrate and disposed in close proximity to the substrate, the exposure section has a light-transmitting portion that allows light to be incident on the substrate and a light-shielding portion that prevents light from being incident on the substrate, and the exposure section is configured to keep the light-transmitting portion and the light-shielding portion in synchronized movement with the substrate.

公开(公告)号：US20240264534A1

公开(公告)日：2024-08-08

申请号：US17767416

申请日：2020-10-23

申请人： TSINGHUA UNIVERSITY ,  BEIJING U-PRECISION TECH CO., LTD.

发明人： Leijie WANG ,  Yu ZHU ,  Ming ZHANG ,  Jitao XU ,  Rong CHENG ,  Jiankun HAO ,  Kaiming YANG ,  Xin LI ,  Siqi GAO ,  Yujiao FAN

IPC分类号： G03F7/00

CPC分类号： G03F7/70408 ,  G03F7/70025 ,  G03F7/70191 ,  G03F7/7085

摘要： Disclosed is a scanning interference photolithography system, comprising a heterodyne optical path, a first interference optical path, a second interference optical path, a motion platform and a control subsystem, wherein a substrate is carried on the motion platform, a displacement measurement interferometer is used to measure the displacement of the motion platform, a first light beam and a second light beam are focused on the substrate for interference exposure; the control subsystem generates instructions according to various measurement information, adjusts angles of corresponding devices or the phase of a light beam, and locks the phase shift of interference exposure fringes of the first light beam and the second light beam. The system has a high precision of fringe pattern locking and a high laser utilization rate, and can be used for producing a large-area high-precision dense grating line gradient periodic grating.

公开(公告)号：US20240264524A1

公开(公告)日：2024-08-08

申请号：US18107093

申请日：2023-02-08

申请人： ASMPT Singapore Pte. Ltd.

发明人： Kai Siu LAM ,  Nim Tak WONG ,  Xiaodong CHEN ,  Kui Kam LAM

IPC分类号： G03F7/00 ,  G03F7/20

CPC分类号： G03F7/0002 ,  G03F7/70616 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70825 ,  G03F7/70975

摘要： An apparatus for applying an adhesive fluid onto a bonding surface during a bonding process includes a positioning table, a dispensing device, a stamping device and a switching member which are mounted on the positioning table. The dispensing device is configured to be positionable by the positioning table to dispense the adhesive fluid onto the bonding surface. The stamping device is configured to be positionable by the positioning table to stamp the adhesive fluid onto the bonding surface. The dispensing device and stamping device are operative to apply the adhesive fluid onto different bonding positions on the bonding surface. The switching member coupled to the stamping device is configured to move the stamping device to a first standby position when the dispensing device is dispensing the adhesive fluid and to a second standby position when the stamping device is stamping the adhesive fluid.

公开(公告)号：US12055866B2

公开(公告)日：2024-08-06

申请号：US17465293

申请日：2021-09-02

申请人： SEMES CO., LTD.

发明人： Kisang Eum ,  Chang Suk Oh ,  Sang Eun Noh

IPC分类号： B08B13/00 ,  B08B9/093 ,  G03F7/00

CPC分类号： G03F7/70925 ,  B08B9/0936 ,  B08B13/00 ,  B08B2209/08

摘要： The inventive concept relates to a substrate treating apparatus, and may include a substrate treating apparatus includes a rotatable spin head, a cup that surrounds the spin head, a cleaning jig seated on the spin head, and that discharges a cleaning liquid toward the cup through rotation of the spin head, and a nozzle unit located at an upper portion of the cleaning jig and that supplies the cleaning liquid to a center of an upper surface of the cleaning jig, and the cleaning jig includes spattering guide grooves formed to be recessed such that the cleaning liquid provided from the nozzle unit spatters toward the cup with a centrifugal force due to the rotation of the spin head.