公开(公告)号：US20240272559A1

公开(公告)日：2024-08-15

申请号：US18455277

申请日：2023-08-24

申请人： Samsung Electronics Co., Ltd.

发明人： Dong-Hyub LEE ,  Jeong-Gil KIM ,  Hyuck SHIN

IPC分类号： G03F7/00 ,  H01L21/66

CPC分类号： G03F7/70591 ,  G03F7/70033 ,  H01L22/12

摘要： A monitoring system for manufacturing a semiconductor device comprises a source module, an optical module including a collector collecting and reflecting extreme ultraviolet generated light from the source module, an illumination optical system including a field facet mirror, and a projection optical system transferring the extreme ultraviolet light reflected from a reticle to a substrate. A calculating module calculates a degradation rate of the optical module, and a method comprises respectively generating a reference image profile and an (N)th image profile through the second sensor module by correcting the far field image of the extreme ultraviolet with respect to the intensity of the extreme ultraviolet at a reference time point and an (N)th time point after the reference time point, and calculating the degradation rate of the optical module by using a ratio of the reference image profile and the (N)th image profile by the calculation module.

公开(公告)号：US20240184216A1

公开(公告)日：2024-06-06

申请号：US18242407

申请日：2023-09-05

申请人： Samsung Electronics Co., Ltd.

发明人： Yoon Sang LEE ,  Eun Hee JEANG ,  Dong Hyeong KIM ,  Teun BOEREN ,  Jeong-Gil KIM ,  Kyung Bin PARK ,  Hyuck SHIN

IPC分类号： G03F7/00

CPC分类号： G03F7/7055

摘要： A monitoring unit for measuring, in real time, the power of an EUV beam transmitted to a substrate and a substrate treating apparatus including the monitoring unit. The substrate treating apparatus comprising a source which generates an EUV beam, a scanner which transfers a mask pattern to a substrate by using the EUV beam, and a monitoring unit which comprises a detector for detecting the EUV beam and monitoring the power of the EUV beam in real time, wherein the detector is disposed on a path along which the EUV beam passes through a first mirror assembly provided in the scanner and moves to a reticle on which the mask pattern is formed.

公开(公告)号：US20230046424A1

公开(公告)日：2023-02-16

申请号：US17691471

申请日：2022-03-10

申请人： SAMSUNG ELECTRONICS CO., LTD.

发明人： Hyeon Jin KIM ,  Sung Hyup KIM ,  Jeong-Gil KIM ,  Jeong Du KIM ,  Sang Hoon LEE ,  In Jae LEE ,  Jong Gu LEE

IPC分类号： H05G2/00 ,  G03F7/20 ,  H01L21/3065 ,  H01L21/027

摘要： An extreme ultraviolet light generator includes a collector including a first focus and a second focus, a droplet feeder configured to provide a source droplet toward the first focus of the collector, a laser generator configured to irradiate a laser toward the first focus of the collector, an airflow controller between the first focus and the second focus of the collector, the airflow controller having a ring shape, and the airflow controller including at least one slit, and a first part and a second part hinged to each other, and a control gas feeder configured to provide a control gas towards the at least one slit of the airflow controller.