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公开(公告)号：US20230137537A1
公开(公告)日：2023-05-04
申请号：US17918317
申请日：2021-04-01
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
IPC: G01N21/31 , G01N21/956 , G03F7/20
Abstract: An inspection system, a lithography apparatus, and an inspection method are provided. The inspection system includes an illumination system, a detection system, and processing circuitry. The illumination system generates a broadband beam and illuminates surface of an object with the broadband illumination beam. The broadband beam has a continuous spectral range. The detection system receives radiation scattered at the surface and by a structure near the surface. The detection system generates a detection signal based on an optical response to the broadband illumination beam. The processing circuitry analyzes the detection signal. The processing circuitry distinguishes between a spurious signal and a signal corresponding to a defect on the surface based on the analyzing The spurious signal is diminished for at least a portion of the continuous spectral range.
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2.发明公开公开(公告)号：US20240272058A1
公开(公告)日：2024-08-15
申请号：US18568585
申请日：2022-05-24
Applicant: ASML Netherlands B.V.
Inventor： Michal Emanuel PAWLOWSKI , Justin Lloyd KREUZER
IPC: G01N15/0205 , G01N15/075 , G03F7/00
CPC classification number: G01N15/0205 , G01N15/075 , G03F7/701 , G03F7/70116 , G03F7/70133 , G03F7/7025 , G03F7/70275
Abstract: An inspection system includes a projection system including a radiation source configured to transmit an illumination beam along an illumination path and an aperture stop configured to select a portion of the illumination beam. The inspection system also includes an aperture stop that selects a portion of the illumination beam and an optical system that transmits the selected portion of the illumination beam towards an object and transmit a signal beam scattered from the object. The inspection system also includes a detector that detects the signal beam.
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