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公开(公告)号：US12085741B2
公开(公告)日：2024-09-10
申请号：US18575647
申请日：2021-12-22
发明人： Xiangang Luo , Yunfei Luo , Kaipeng Liu , Yu Gu , Ping Gao , Zeyu Zhao
CPC分类号： G02B5/1857 , G02B1/002
摘要： A method for preparing a metal-dielectric strip array based super-resolution lens includes: performing lithography on a first material layer on a first substrate to obtain a grating structure; alternately depositing second and third material layers until the grating structure is filled up, to obtain a first transition structure, one of the second and third material layers being of metal, and the other one being of dielectric; performing planarization on the first transition structure at least reach the top of the grating structure, to obtain a second transition structure; adhering an upper surface of the second transition structure to a second substrate; removing the first substrate, and performing overturning to make the second transition structure be on the second substrate to obtain a third transition structure; and performing planarization again to at least reach the top of finally deposited second or third material layer, to obtain the super-resolution lens.
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公开(公告)号：US20240280901A1
公开(公告)日：2024-08-22
申请号：US18575625
申请日：2022-11-03
发明人： Xiangang LUO , Dongxu YANG , Xian PENG , Kaixin SU , Zeyu ZHAO , Ping GAO , Changtao WANG
CPC分类号： G03F7/0045 , G03F7/0392
摘要： A photoresist composition is provided, including a chemical amplification matrix, wherein the chemical amplification matrix includes a polymer resin, a photoacid generator and a solvent; and a dissolution inhibitor, which is a small molecular material containing a diazo naphthoquinone structure. A method for using the photoresist composition is further provided.
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公开(公告)号：US20240264523A1
公开(公告)日：2024-08-08
申请号：US18575719
申请日：2022-11-14
发明人： Xiangang LUO , Kaipeng LIU , Yunfei LUO , Shuai MOU , Ping GAO , Zeyu ZHAO
摘要： A photolithography method includes: sequentially preparing a functional film layer, a reflective auxiliary imaging film layer and a first photoresist layer which are stacked, on a photolithography substrate; performing photolithography on the first photoresist layer to obtain a first photolithography structure; etching the reflective auxiliary imaging film layer with the first photolithography structure as a masking layer; on the pattern of the reflective auxiliary imaging film layer, sequentially preparing a second photoresist layer and a transmissive auxiliary imaging film layer which stacked; performing surface plasmon photolithography with the pattern of the reflective auxiliary imaging film layer as a mask, removing the transmissive auxiliary imaging film layer, and then developing the second photoresist layer, to obtain a second photolithography structure; and etching the functional film layer, with the second photolithography structure as a masking layer, to obtain a third photolithography structure.
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4.发明公开公开(公告)号：US20240264343A1
公开(公告)日：2024-08-08
申请号：US18575647
申请日：2021-12-22
发明人： Xiangang LUO , Yunfei LUO , Kaipeng LIU , Yu GU , Ping GAO , Zeyu ZHAO
CPC分类号： G02B5/1857 , G02B1/002
摘要： A method for preparing a super-resolution lens based on a metal-dielectric strip array, the method comprising: performing lithography on a first material layer (3) on a first substrate (1) to obtain a grating structure (S1); alternately depositing a second material layer (5) and a third material layer (6) until the grating structure is filled up and becomes even, so as to obtain a first transition structure, wherein one of the second material layer (5) and the third material layer (6) is metal, and the other one is dielectrics (S2); performing planarization on the first transition structure, wherein the planarization depth at least reaches the top of the grating structure, so as to obtain a second transition structure (S3); curing an upper surface of the second transition structure and a second substrate (9) (S4); removing the first substrate (1), so as to transfer the second transition structure onto the second substrate (9) to obtain a third transition structure (S5); and performing planarization again, wherein the planarization depth at least reaches the top of the second material layer (5) or third material layer (6) which is finally deposited, so as to obtain a super-resolution lens based on a metal-dielectric strip array (S6). In the super-resolution lens, incident light is only transmitted along a metal-dielectric interface, thereby effectively improving the utilization efficiency of energy.
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公开(公告)号：US20230132100A1
公开(公告)日：2023-04-27
申请号：US17997102
申请日：2021-04-28
发明人： Xiangang Luo , Yinghui Guo , Mingbo Pu , Xiong Li , Xiaoliang Ma , Ping Gao
摘要： Provided is a method of fabricating a micro-nano structure, including: forming a reflective layer and a fluid polymer layer sequentially on a surface of a substrate; pressurizing the substrate and a mask having a micro-nano pattern to attach to each other, squeezing the fluid polymer layer into a light-transmission area of the mask, and curing the fluid polymer layer; and exposing, wherein a fluid polymer in the light-transmission area is configured to sense light under a combined effect of a transmitted light and a light reflected by the reflective layer, such that a micro-nano structure is obtained. The method solves the problem of limited diffraction, improves the processing resolution by reducing the transmission loss of evanescent waves through reflective light field enhancement, and reduces the difficulty and cost of mask processing and pattern defects by using shallow pressurizing in combination with exposure.
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公开(公告)号：US11365964B2
公开(公告)日：2022-06-21
申请号：US16626864
申请日：2018-12-05
发明人： Fuchao Xu , Xin Jia , Dachun Gan , Tingwen Xing
摘要： Disclosed is a stitching-measurement device adapted for performing stitching-measurement on a surface of a concave spherical lens, including: an interferometer, a reference lens, a first plane mirror, a second plane mirror, a first adjustment mechanism, a second adjustment mechanism, a concave spherical object to be measured, a motion table and a control mechanism, the first plane mirror being mounted on the first adjustment mechanism configured to change a position of the first plane mirror; the second plane mirror being mounted on the second adjustment mechanism configured to change a position of the second plane mirror; the concave spherical object to be measured being placed on the motion table configured to change a position of the concave spherical object to be measured; the control mechanism communicating with the interferometer, the first adjustment mechanism, the second adjustment mechanism, and the motion table for issuing control signals, wherein by the first adjustment mechanism and the second adjustment mechanism, an included angle between the first plane mirror and the second plane mirror is adjusted in such a way that light beam incident on the concave spherical object to be measured is inclined by a first angle relative to light beam emitted from the reference lens, thereby avoiding an operation of inclining the concave spherical object to be measured during the stitching-measurement.
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公开(公告)号：US11268808B2
公开(公告)日：2022-03-08
申请号：US16626278
申请日：2019-03-05
发明人： Dachun Gan , Fuchao Xu , Xin Jia , Tingwen Xing
IPC分类号： G01M11/02 , G01B11/30 , G01B9/02015 , G01B11/24 , G01M11/04
摘要： A detection device adapted to detect lens surface and a stitching interferometer including the same are disclosed. The detection device includes: a cylindrical detection frame comprising support bosses arranged on an inner wall of the detection frame in a circumferential direction of the detection frame, the lens to be detected being placed on the support bosses; and a plurality of support units mounted at a bottom of the detection frame in the circumferential direction of the detection frame, each of the support units comprising: a support mechanism configured to be movable in an axial direction of the detection frame and cooperate with the support bosses so as to support the lens to be detected together; and a balance mechanism configured to provide a balancing force for balancing with force of the support mechanism for supporting the lens to be detected, so that axial support force of each supporting unit for the lens to be detected is equal to axial support force of each support boss for the lens to be detected in both cases where the axial direction of the detection frame is parallel to a gravity direction of the lens to be detected and inclined with respect to the gravity direction of the lens to be detected.
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8.发明申请公开(公告)号：US20210364278A1
公开(公告)日：2021-11-25
申请号：US16626952
申请日：2019-01-10
发明人： Gaofeng WU , Qiang Chen , Weihong Song , Xi Hou
IPC分类号： G01B11/255 , G01B11/24
摘要： The disclosure relates to a measuring method and a measuring device for measuring a radius of an optical element based on a computer-generated hologram, and belongs to the field of photoelectric technology detection. The present disclosure is characterized in that two conjugated wave surfaces, i.e. a confocal wavefront and a cat's eye wavefront, are simultaneously generated by one piece of computer-generated hologram, and at the same time, interferograms at the cat's eye position and at the confocal position are obtained and surface shape parameters are measured, and the radius of an optical element is solved according to the measurement result.
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公开(公告)号：US10962487B2
公开(公告)日：2021-03-30
申请号：US16681091
申请日：2019-11-12
发明人： Fuchao Xu , Haiyang Quan , Taotao Fu , Xiaochuan Hu , Xi Hou , Sheng Li
IPC分类号： G01N21/898 , D06H3/08 , G02B26/10
摘要： A flaw detecting apparatus and a method for a plane mirror based on line scanning and ring band stitching are provided. The flaw detecting apparatus comprises: a line scanning detector, an annular illumination source, a rotary table rotatable about a Z axis, a translation table translatable along an X axis and a processor. By translating and rotating the plane mirror to be detected, an entire surface of the plane mirror to be detected can be detected by the line scanning detector, and the flaw of the entire plane mirror to be detected is obtained by a ring band stitching method. The method of line scanning and ring band stitching reduces the imaging distortion, the intermediate data amount, the difficulty in the distortion correction and difficulty in stitching, and improves the detection speed and the detection quality.
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公开(公告)号：US10782248B2
公开(公告)日：2020-09-22
申请号：US16676779
申请日：2019-11-07
发明人： Haiyang Quan , Fuchao Xu , Taotao Fu , Xiaochuan Hu , Gaofeng Wu , Xi Hou , Fan Wu , Sheng Li
摘要： Embodiments of the present disclosure relate to a measuring method and device for measuring surface defects of a cambered optical element, which belongs to the field of photoelectric detection technology. The device includes a sensor measuring head, a rotatable workpiece table, an automatic sampling device, and a spraying device. The sensor measuring head includes an illumination sub-system and a line scan imaging sub-system, the illumination sub-system provides an illumination of high uniformity and high brightness for a surface of a sample to be detected, the rotatable workpiece table and the imaging sub-system are configured for performing a ring belt scanning and a high resolution scatter imaging to the defects on an optical surface region. The automatic sampling device is used as a mechanical arm in an automatic production for automatically clamping optical elements; the spraying device is activated once foreign matters such as dust and impurities are detected on the surface, so as to accurately remove false defects such as dust and impurities on the surface of the piece to be detected. Embodiments of the present disclosure effectively solve the problem that the surface defect detection of the large caliber optical element is difficult and the efficiency thereof is low, and can quickly measure surface defects of a large caliber planar, spherical and cambered optical element.
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