公开(公告)号：US08637821B2

公开(公告)日：2014-01-28

申请号：US13168415

申请日：2011-06-24

Applicant: Bart Buijsse ,  Peter Christiaan Tiemeijer

Inventor： Bart Buijsse ,  Peter Christiaan Tiemeijer

IPC: G01N23/00 ,  G21K7/00

CPC classification number: H01J37/263 ,  H01J37/09 ,  H01J2237/043 ,  H01J2237/223 ,  H01J2237/2614 ,  H01J2237/2802

Abstract: The invention relates to a blocking member to be placed in the diffraction plane of a TEM. It resembles the knife edge used for single sideband imaging, but blocks only electrons deflected over a small angle. As a result the Contrast Transfer Function of the TEM according to this invention will equal that of a single sideband microscope at low frequencies and that of a normal microscope for high frequencies. Preferable the highest frequency blocked by the blocking member is such that a microscope without the blocking member would show a CTF of 0.5.

Abstract translation: 本发明涉及一种放置在TEM衍射平面中的阻挡构件。 它类似于用于单边带成像的刀刃，但仅阻挡在小角度偏转的电子。 结果，根据本发明的TEM的对比度传递函数将等于低频下的单边带显微镜的对比度传递函数，而与正常显微镜在低频下相同。 优选地，阻挡构件阻挡的最高频率使得没有阻挡构件的显微镜将显示为0.5的CTF。

公开(公告)号：US08618498B2

公开(公告)日：2013-12-31

申请号：US13197632

申请日：2011-08-03

Applicant: Gerrit Cornelis Van Hoften ,  Michael Alwin William Stekelenburg ,  Richard Henderson ,  Gregory James McMullan ,  Abdul Raffey Faruqi ,  Renato Andrea Danilo Turchetta ,  Nicola Carlo Guerrini ,  Joeri Lof ,  Frank Jeroen Pieter Schuurmans

Inventor： Gerrit Cornelis Van Hoften ,  Michael Alwin William Stekelenburg ,  Richard Henderson ,  Gregory James McMullan ,  Abdul Raffey Faruqi ,  Renato Andrea Danilo Turchetta ,  Nicola Carlo Guerrini ,  Joeri Lof ,  Frank Jeroen Pieter Schuurmans

IPC: H01J37/244

CPC classification number: H01J37/244 ,  H01J37/22 ,  H01J37/26 ,  H01J37/263 ,  H01J2237/2441 ,  H01J2237/24455 ,  H01J2237/2446 ,  H01J2237/2447 ,  H01J2237/24578 ,  H01J2237/26 ,  H01J2237/2802

Abstract: In a direct electron detector, backscattering of electrons into the detector volume from below the sensor is prevented. In some embodiments, an empty space is maintained below the sensor. In other embodiments, a structure below the sensor includes geometry, such as multiple high aspects ratio channels, either extending to or from the sensor to trap electrons, or a structure of angled surfaces to deflect the electrons that pass through the sensor.

Abstract translation: 在直接电子检测器中，防止电子从传感器下方向检测器体积的后向散射。 在一些实施例中，在传感器下面保持空的空间。 在其他实施例中，传感器下面的结构包括几何，例如多个高方面比例的通道，延伸到传感器或从传感器捕获电子，或倾斜表面的结构以偏转通过传感器的电子。

公开(公告)号：US08581186B2

公开(公告)日：2013-11-12

申请号：US13767822

申请日：2013-02-14

Applicant: Hitachi High-Technologies Corporation

Inventor： Makoto Suzuki ,  Kazunari Asao

IPC: H01J37/256 ,  H01J37/26

CPC classification number: H01J37/263 ,  H01J37/265 ,  H01J2237/221

Abstract: There is proposed a charged particle beam apparatus including: a plurality of noise removal filters that remove noise of an electrical signal; a measurement unit that measures the contrast-to-noise ratio after applying one of the noise removal filters; and a determination unit that determines a magnitude relationship between the contrast-to-noise ratio measured by the measurement unit and a threshold value set in advance.

Abstract translation: 提出了一种带电粒子束装置，包括：多个噪声去除滤波器，其去除电信号的噪声; 测量单元，其在应用所述噪声去除滤波器之一之后测量所述对比噪声比; 以及确定单元，其确定由测量单元测量的对比度噪声比与预先设置的阈值之间的大小关系。

公开(公告)号：US20130248706A1

公开(公告)日：2013-09-26

申请号：US13605580

申请日：2012-09-06

Applicant: Haruko AKUTSU

Inventor： Haruko AKUTSU

IPC: G01N23/00

CPC classification number: H01J37/263 ,  G01N23/22 ,  G01N23/2251 ,  G01N2223/6116 ,  H01J37/24 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24485 ,  H01J2237/24528 ,  H01J2237/24585 ,  H01J2237/2804 ,  H01J2237/2805 ,  H01J2237/2806 ,  H01J2237/2814

Abstract: In accordance with an embodiment, a sample analyzing apparatus includes a charged beam generating unit, a detecting unit, and an analyzing unit. The charged beam generating unit is configured to generate a charged beam and apply the charged beam to a sample. The detecting unit is configured to detect charged particles and then output a signal, the charged particles being generated from the sample by the application of the charged beam in a manner depending on a three-dimensional structure and material characteristics of the sample. The analyzing unit is configured to process the signal to analyze the sample.

Abstract translation: 根据实施例，样本分析装置包括充电光束产生单元，检测单元和分析单元。 带电波束产生单元被配置为产生带电波束并将带电波束施加到样品。 检测单元被配置为检测带电粒子，然后输出信号，所述带电粒子是通过以取决于样本的三维结构和材料特性的方式施加带电束而从样品产生的。 分析单元被配置为处理信号以分析样本。

公开(公告)号：US08471203B2

公开(公告)日：2013-06-25

申请号：US12756455

申请日：2010-04-08

Applicant: Gerd Benner ,  Matthias Langer

Inventor： Gerd Benner ,  Matthias Langer

IPC: G01N23/00

CPC classification number: H01J37/244 ,  H01J37/09 ,  H01J37/153 ,  H01J37/263 ,  H01J2237/1534 ,  H01J2237/24455 ,  H01J2237/24475 ,  H01J2237/262 ,  H01J2237/28

Abstract: A particle beam microscope includes an illumination system generating a particle beam having a ring-shaped conical configuration. A selective detection system is configured to selectively detect one of two groups of particles having traversed the object region. The first group of particles includes the particles that traversed the object region un-scattered or scattered by a small scattering amount. The second group of particles includes particles scattered in the object region by a greater scattering amount.

Abstract translation: 粒子束显微镜包括产生具有环形锥形构造的粒子束的照明系统。 选择性检测系统被配置为选择性地检测穿过对象区域的两组颗粒中的一个。 第一组粒子包括通过小散射量穿过物体区域而不散射或散射的粒子。 第二组颗粒包括在物体区域散射较大散射量的颗粒。

公开(公告)号：US20130112875A1

公开(公告)日：2013-05-09

申请号：US13808134

申请日：2011-07-11

Applicant: Kuniyasu Nakamura ,  Hiromi Inada

Inventor： Kuniyasu Nakamura ,  Hiromi Inada

IPC: H01J37/26 ,  H01J37/28

CPC classification number: H01J37/263 ,  H01J37/28 ,  H01J2237/0451 ,  H01J2237/1501 ,  H01J2237/2802

Abstract: A scanning transmission electron microscope equipped with an aberration corrector is capable of automatically aligning the position of a convergence aperture with the center of an optical axis irrespective of skill and experience of an operator. The scanning transmission electron microscope system includes an electron source; a condenser lens configured to converge an electron beam emitted from the electron source; a deflector configured to cause the electron beam to perform scanning on a sample; an aberration correction device configured to correct an aberration of the electron beam; a convergence aperture configured to determine a convergent angle of the electron beam; and a detector configured to detect electrons passing through or diffracted by the sample. The system acquires information on contrast of a Ronchigram formed by the electron beam passing through the sample, and determines a position of the convergence aperture on the basis of the information.

Abstract translation: 配备有像差校正器的扫描透射电子显微镜能够自动地将会聚孔的位置与光轴的中心对齐，而与操作者的技术和经验无关。 扫描透射电子显微镜系统包括电子源; 聚光透镜，被配置为会聚从电子源发射的电子束; 配置成使电子束对样品进行扫描的偏转器; 被配置为校正电子束的像差的像差校正装置; 收敛孔，被配置为确定电子束的收敛角; 以及检测器，其被配置为检测通过所述样品的衍射的电子。 该系统获取通过通过样本的电子束形成的罗尼克拉姆的对比度的信息，并且基于该信息确定会聚孔径的位置。

公开(公告)号：US08389937B2

公开(公告)日：2013-03-05

申请号：US13155303

申请日：2011-06-07

Applicant: Christopher Su-Yan Own ,  Andrew Bleloch ,  William Andregg

Inventor： Christopher Su-Yan Own ,  Andrew Bleloch ,  William Andregg

IPC: G01N23/00 ,  G01N23/02

CPC classification number: H01J37/263 ,  H01J37/153 ,  H01J37/26 ,  H01J37/261 ,  H01J2237/2614 ,  H01J2237/262

Abstract: A transmission electron microscope includes an electron beam source to generate an electron beam. Beam optics are provided to converge the electron beam. An aberration corrector corrects the electron beam for at least a spherical aberration. A specimen holder is provided to hold a specimen in the path of the electron beam. A detector is used to detect the electron beam transmitted through the specimen. The transmission electron microscope may operate in an incoherent mode and may be used to locate a sequence of objects on a molecule.

Abstract translation: 透射电子显微镜包括用于产生电子束的电子束源。 光束被提供以会聚电子束。 像差校正器校正至少球面像差的电子束。 提供试样保持器以将样品保持在电子束的路径中。 检测器用于检测透过样品的电子束。 透射电子显微镜可以以非相干模式操作，并且可以用于在分子上定位物体的序列。

公开(公告)号：US20120312986A1

公开(公告)日：2012-12-13

申请号：US13565678

申请日：2012-08-02

Applicant: Ahmed H. Zewail

Inventor： Ahmed H. Zewail

IPC: H01J37/26

CPC classification number: H01J37/26 ,  H01J37/22 ,  H01J37/263 ,  H01J37/28 ,  H01J2237/2482 ,  H01J2237/2809 ,  H01J2237/2813

Abstract: The present invention relates to methods and systems for 4D ultrafast electron microscopy (UEM)—in situ imaging with ultrafast time resolution in TEM. Single electron imaging is used as a component of the 4D UEM technique to provide high spatial and temporal resolution unavailable using conventional techniques. Other embodiments of the present invention relate to methods and systems for convergent beam UEM, focusing the electron beams onto the specimen to measure structural characteristics in three dimensions as a function of time. Additionally, embodiments provide not only 4D imaging of specimens, but characterization of electron energy, performing time resolved electron energy loss spectroscopy (EELS).

Abstract translation: 本发明涉及4D超快速电子显微镜（UEM）在TEM中超快时间分辨率的原位成像方法和系统。 单电子成像被用作4D UEM技术的组成部分，以提供使用常规技术不可用的高空间和时间分辨率。 本发明的其他实施例涉及用于会聚波束UEM的方法和系统，其将电子束聚焦到样本上以测量作为时间的函数的三维结构特征。 此外，实施例不仅提供了样本的4D成像，而且提供电子能量的表征，执行时间分辨的电子能量损耗光谱（EELS）。

公开(公告)号：US08207512B2

公开(公告)日：2012-06-26

申请号：US12898455

申请日：2010-10-05

Applicant: Chie Shishido ,  Mayuka Oosaki ,  Mitsugu Sato ,  Hiroki Kawada ,  Tatsuya Maeda

Inventor： Chie Shishido ,  Mayuka Oosaki ,  Mitsugu Sato ,  Hiroki Kawada ,  Tatsuya Maeda

IPC: G21K7/00 ,  A61N5/00 ,  G21G5/00

CPC classification number: H01J37/263 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/2826

Abstract: The present invention provides a charged particle beam apparatus used to measure micro-dimensions (CD value) of a semiconductor apparatus or the like which captures images for measurement. For the present invention, a sample for calibration, on which a plurality of polyhedral structural objects with known angles on surfaces produced by the crystal anisotropic etching technology are arranged in a viewing field, is used. A beam landing angle at each position within a viewing field is calculated based on geometric deformation on an image of each polyhedral structural object. Beam control parameters for equalizing the beam landing angle at each position within the viewing field are pre-registered. The registered beam control parameters are applied according to the position of the pattern to be measured within the viewing field when performing dimensional measurement. Accordingly, the present invention provides methods for reducing the variation in the CD value caused by the variation in the electron beam landing angle with respect to the sample with an equal beam landing angle and methods for reducing the instrumental error caused by the difference in the electron beam landing angle between apparatuses.

Abstract translation: 本发明提供一种用于测量捕获用于测量的图像的半导体装置等的微尺寸（CD值）的带电粒子束装置。 对于本发明，使用用于校准的样品，其上在视场中排列有通过晶体各向异性蚀刻技术产生的表面上具有已知角度的多个多面体结构物体。 基于每个多面体结构物体的图像上的几何变形来计算视野内的每个位置处的束着陆角。 用于均衡视场内每个位置的束着陆角的光束控制参数被预先注册。 当进行尺寸测量时，根据待测图案的位置在观察区域中应用登记的光束控制参数。 因此，本发明提供了减少相对于具有相同束着陆角的样品的电子束着角的变化引起的CD值的变化的方法，以及用于减少由电子差异引起的仪器误差的方法 设备之间的束着陆角度。

公开(公告)号：US08203120B2

公开(公告)日：2012-06-19

申请号：US12575285

申请日：2009-10-07

Applicant: Ahmed H. Zewail

Inventor： Ahmed H. Zewail

IPC: G01N23/00 ,  G21K7/00

CPC classification number: H01J37/26 ,  H01J37/22 ,  H01J37/263 ,  H01J37/28 ,  H01J2237/2482 ,  H01J2237/2809 ,  H01J2237/2813

Abstract: The present invention relates to methods and systems for 4D ultrafast electron microscopy (UEM)—in situ imaging with ultrafast time resolution in TEM. Single electron imaging is used as a component of the 4D UEM technique to provide high spatial and temporal resolution unavailable using conventional techniques. Other embodiments of the present invention relate to methods and systems for convergent beam UEM, focusing the electron beams onto the specimen to measure structural characteristics in three dimensions as a function of time. Additionally, embodiments provide not only 4D imaging of specimens, but characterization of electron energy, performing time resolved electron energy loss spectroscopy (EELS).

Abstract translation: 本发明涉及4D超快速电子显微镜（UEM）在TEM中超快时间分辨率的原位成像方法和系统。 单电子成像被用作4D UEM技术的组成部分，以提供使用常规技术不可用的高空间和时间分辨率。 本发明的其他实施例涉及用于会聚波束UEM的方法和系统，其将电子束聚焦到样本上以测量作为时间的函数的三维结构特征。 此外，实施例不仅提供了样本的4D成像，而且提供电子能量的表征，执行时间分辨的电子能量损耗光谱（EELS）。