公开(公告)号：US09449794B2

公开(公告)日：2016-09-20

申请号：US14270578

申请日：2014-05-06

Applicant: APPLIED MATERIALS, INC.

Inventor： Andrew Nguyen ,  Kartik Ramaswamy ,  Jason A. Kenney ,  Shahid Rauf ,  Kenneth S. Collins ,  Yang Yang ,  Steven Lane ,  Yogananda Sarode Vishwanath

IPC: H01J7/24 ,  H01J37/32 ,  C23C16/455 ,  C23C16/509 ,  H05H1/46

CPC classification number: H01J37/3211 ,  C23C16/45563 ,  C23C16/509 ,  H01J37/32174 ,  H05H1/46 ,  H05H2001/4667

Abstract: A plasma reactor has an overhead multiple coil antennas including a parallel spiral coil antenna and symmetric and radial RF feeds and cylindrical RF shielding around the symmetric and radial RF feeds. The radial RF feeds are symmetrically fed to the plasma source.

Abstract translation: 等离子体反应器具有架空多重线圈天线，包括平行的螺旋线圈天线以及围绕对称和径向射频馈送的对称和径向射频馈送以及圆柱形RF屏蔽。 径向RF馈送对称地馈送到等离子体源。

公开(公告)号：US09161428B2

公开(公告)日：2015-10-13

申请号：US13804616

申请日：2013-03-14

Applicant: APPLIED MATERIALS, INC.

Inventor： Kenneth S. Collins ,  Satoru Kobayashi ,  Lawrence Wong ,  Jonathan Liu ,  Yang Yang ,  Kartik Ramaswamy ,  Shahid Rauf

IPC: H05H1/46 ,  H01J37/32

CPC classification number: H05H1/46 ,  H01J37/321 ,  H01J37/32174 ,  H05H2001/4682

Abstract: Plasma distribution is controlled in a plasma reactor by controlling the phase differences between different RF coil antennas, in accordance with a desired or user-selected phase difference, by a phase-lock feedback control loop.

Abstract translation: 通过相位锁定反馈控制回路根据期望或用户选择的相位差控制不同RF线圈天线之间的相位差，等离子体反应器中的等离子体分布被控制。

公开(公告)号：US08734664B2

公开(公告)日：2014-05-27

申请号：US13958898

申请日：2013-08-05

Applicant: Applied Materials, Inc.

Inventor： Yang Yang ,  Kartik Ramaswamy ,  Kenneth S. Collins ,  Steven Lane ,  Douglas A. Buchberger, Jr. ,  Lawrence Wong ,  Nipun Misra

IPC: B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00

CPC classification number: H01J37/32064 ,  H01J37/32082 ,  H01J37/32174 ,  H01J37/32623 ,  H01J37/32642 ,  H01J2237/2001 ,  H01L21/67109 ,  H01L21/6833

Abstract: A method of controlling distribution of a plasma parameter in a plasma reactor having an RF-driven electrode and two (or more) counter electrodes opposite the RF driven electrode and facing different portions of the process zones. The method includes providing two (or more) variable reactances connected between respective ones of the counter electrodes and ground, and governing the variable reactances to change distribution of a plasma parameter such as plasma ion density or ion energy.

Abstract translation: 一种控制等离子体反应器中等离子体参数分布的方法，其具有RF驱动电极和与RF驱动电极相对的两个（或更多个）对置电极并且面对处理区的不同部分。 该方法包括提供连接在相应的对置电极和接地之间的两个（或多个）可变电抗，并且控制可变电抗以改变诸如等离子体离子密度或离子能量之类的等离子体参数的分布。

公开(公告)号：US20140034612A1

公开(公告)日：2014-02-06

申请号：US13958898

申请日：2013-08-05

Applicant: APPLIED MATERIALS, INC.

Inventor： Yang Yang ,  Kartik Ramaswamy ,  Kenneth S. Collins ,  Steven Lane ,  Douglas A. Buchberger, JR. ,  Lawrence Wong ,  Nipun Misra

IPC: H01J37/32

CPC classification number: H01J37/32064 ,  H01J37/32082 ,  H01J37/32174 ,  H01J37/32623 ,  H01J37/32642 ,  H01J2237/2001 ,  H01L21/67109 ,  H01L21/6833

Abstract: A method of controlling distribution of a plasma parameter in a plasma reactor having an RF-driven electrode and two (or more) counter electrodes opposite the RF driven electrode and facing different portions of the process zones. The method includes providing two (or more) variable reactances connected between respective ones of the counter electrodes and ground, and governing the variable reactances to change distribution of a plasma parameter such as plasma ion density or ion energy.

Abstract translation: 一种控制等离子体反应器中等离子体参数分布的方法，其具有RF驱动电极和与RF驱动电极相对的两个（或更多个）对置电极并且面对处理区的不同部分。 该方法包括提供连接在相应的对置电极和接地之间的两个（或多个）可变电抗，并且控制可变电抗以改变诸如等离子体离子密度或离子能量之类的等离子体参数的分布。

公开(公告)号：US20130284370A1

公开(公告)日：2013-10-31

申请号：US13804616

申请日：2013-03-14

Applicant: APPLIED MATERIALS, INC.

Inventor： Kenneth S. Collins ,  Satoru Kobayashi ,  Lawrence Wong ,  Jonathan Liu ,  Yang Yang ,  Kartik Ramaswamy ,  Shahid Rauf

IPC: H05H1/46

CPC classification number: H05H1/46 ,  H01J37/321 ,  H01J37/32174 ,  H05H2001/4682

Abstract: Plasma distribution is controlled in a plasma reactor by controlling the phase differences between different RF coil antennas, in accordance with a desired or user-selected phase difference, by a phase-lock feedback control loop.

Abstract translation: 通过相位锁定反馈控制回路根据期望或用户选择的相位差控制不同RF线圈天线之间的相位差，等离子体反应器中的等离子体分布被控制。

公开(公告)号：US20130284369A1

公开(公告)日：2013-10-31

申请号：US13632302

申请日：2012-10-01

Applicant: APPLIED MATERIALS, INC.

Inventor： Satoru Kobayashi ,  Lawrence Wong ,  Jonathan Liu ,  Yang Yang ,  Kartik Ramaswamy ,  Shahid Rauf ,  Shane C. Nevil ,  Kallol Bera ,  Kenneth S. Collins

IPC: C23C16/505 ,  B05C9/00

CPC classification number: C23C16/505 ,  B05C9/00 ,  H01J37/32091 ,  H01J37/32174 ,  H01J37/3299

Abstract: Plasma distribution is controlled in a plasma reactor by controlling the phase difference between opposing RF electrodes, in accordance with a desired or user-selected phase difference, by a phase-lock feedback control loop.

Abstract translation: 通过相位锁定反馈控制回路根据期望或用户选择的相位差控制相对RF电极之间的相位差，在等离子体反应器中控制等离子体分布。