公开(公告)号：US08963099B2

公开(公告)日：2015-02-24

申请号：US13862728

申请日：2013-04-15

Applicant: Canon Kabushiki Kaisha

Inventor： Shuji Yamada

IPC: H01J1/02 ,  H01J3/18 ,  H01J37/317 ,  H01J9/02 ,  H01J37/12 ,  H01J1/46 ,  H01J3/02 ,  H01J9/14

CPC classification number: H01J1/02 ,  B82Y10/00 ,  B82Y40/00 ,  H01J1/46 ,  H01J3/027 ,  H01J3/18 ,  H01J9/02 ,  H01J9/14 ,  H01J37/12 ,  H01J37/317 ,  H01J37/3177 ,  H01J2237/032 ,  H01J2237/1205

Abstract: An electrode to be used for an electrostatic lens, wherein the electrode at least includes: a first substrate having a first through-hole and a second substrate having a second through-hole; the first substrate having a thickness smaller than the second substrate; the first through-hole having a diameter smaller than the second through-hole; the second substrate having a specific resistance smaller than the first substrate, wherein the first substrate and the second substrate are superimposed so that the first through-hole and the second through-hole are aligned relative to each other. Notching taking place near any of the through-holes in a dry etching process can be reduced, and thus, the through-holes can be formed accurately.

Abstract translation: 一种用于静电透镜的电极，其中所述电极至少包括：具有第一通孔的第一基板和具有第二通孔的第二基板; 所述第一基板的厚度小于所述第二基板; 所述第一通孔的直径小于所述第二通孔; 所述第二基板具有小于所述第一基板的电阻率，其中所述第一基板和所述第二基板重叠，使得所述第一通孔和所述第二通孔相对于彼此对准。 可以减少在干蚀刻工艺中的任何通孔附近发生的凹陷，因此可以精确地形成通孔。

公开(公告)号：US08890094B2

公开(公告)日：2014-11-18

申请号：US14027697

申请日：2013-09-16

Applicant: Mapper Lithography IP B.V.

Inventor： Marco Jan Jaco Wieland ,  Bert Jan Kampherbeek ,  Alexander Hendrik Vincent Van Veen ,  Pieter Kruit ,  Stijn Willem Herman Karel Steenbrink

IPC: H01J37/317 ,  H01J37/12 ,  H01J37/30 ,  B82Y40/00 ,  B82Y10/00

CPC classification number: H01J37/3175 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/151 ,  H01J2237/31774

Abstract: A projection lens arrangement for a charged particle multi-beamlet system, the projection lens arrangement including one or more plates and one or more arrays of projection lenses. Each plate has an array of apertures formed in it, with projection lenses formed at the locations of the apertures. The arrays of projection lenses form an array of projection lens systems, each projection lens system comprising one or more of the projection lenses formed at corresponding points of the one or more arrays of projection lenses.

Abstract translation: 一种用于带电粒子多子束系统的投影透镜装置，所述投影透镜装置包括一个或多个板和一个或多个投影透镜阵列。 每个板具有形成在其中的孔阵列，其中投影透镜形成在孔的位置处。 投影透镜的阵列形成投影透镜系统的阵列，每个投影透镜系统包括一个或多个投影透镜，其形成在一个或多个投影透镜阵列的对应点处。

公开(公告)号：US08748842B2

公开(公告)日：2014-06-10

申请号：US13915834

申请日：2013-06-12

Applicant: Canon Kabushiki Kaisha

Inventor： Yasuo Ohashi

IPC: G21K1/08

CPC classification number: H01J3/18 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/027 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/032 ,  H01J2237/1205 ,  H01J2237/28

Abstract: Provided is an electrostatic lens array, including multiple substrates arranged with intervals, each of the multiple substrates having an aperture for passing a charged particle beam, in which: in a travelling direction of the charged particle beam, a peripheral contour line formed by any one of surfaces of the multiple substrates other than an upper surface of a most upstream substrate and a lower surface of a most downstream substrate has a protruding portion protruding from a peripheral contour line of one of the upper surface of the most upstream substrate and the lower surface of the most downstream substrate; and a position of the protruding portion is defined by a position regulating member, whereby parallelism is adjustable so that a surface including the protruding portion is parallel to a surface to be irradiated with the charged particle beam after passing through the aperture.

Abstract translation: 本发明提供一种静电透镜阵列，其包括间隔布置的多个基板，所述多个基板中的每一个具有用于使带电粒子束通过的孔，其中：在带电粒子束的行进方向上，由任何一个形成的周边轮廓线 多个基板的除了最上游基板的上表面和最下游基板的下表面以外的多个基板的表面具有从最上游基板的上表面和下游表面的上表面的周边轮廓线突出的突出部 的最下游底物; 并且突出部的位置由位置限制构件限定，由此平行度是可调节的，使得包括突出部分的表面平行于穿过孔之后被带电粒子束照射的表面。

公开(公告)号：US08686378B2

公开(公告)日：2014-04-01

申请号：US13550702

申请日：2012-07-17

Applicant: Shigeru Terashima

Inventor： Shigeru Terashima

IPC: H01J37/12 ,  H01J7/22

CPC classification number: G03F7/20 ,  B82Y10/00 ,  B82Y40/00 ,  G21K5/04 ,  G21K5/10 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/188

Abstract: A charged particle beam drawing apparatus includes an electrostatic lens including an electrode member and configured to project the plurality of charged particle beams onto the substrate via the electrode member. In the electrode member are formed a plurality of first openings via which the plurality of charged particle beams pass, and a plurality of second openings different from the plurality of first openings, a total area of the plurality of second openings being not smaller than a total area of the plurality of first openings.

Abstract translation: 带电粒子束描绘装置包括具有电极部件的静电透镜，并配置成经由电极部件将多根带电粒子束投射到基板上。 在电极部件中形成有多个带电粒子束通过的多个第一开口以及与多个第一开口不同的多个第二开口，多个第二开口的总面积不小于总数 多个第一开口的区域。

公开(公告)号：US20130306878A1

公开(公告)日：2013-11-21

申请号：US13862728

申请日：2013-04-15

Applicant: CANON KABUSHIKI KAISHA

Inventor： Shuji Yamada

IPC: H01J1/02 ,  H01J37/317 ,  H01J9/02 ,  H01J3/18

CPC classification number: H01J1/02 ,  B82Y10/00 ,  B82Y40/00 ,  H01J1/46 ,  H01J3/027 ,  H01J3/18 ,  H01J9/02 ,  H01J9/14 ,  H01J37/12 ,  H01J37/317 ,  H01J37/3177 ,  H01J2237/032 ,  H01J2237/1205

Abstract: An electrode to be used for an electrostatic lens, wherein the electrode at least includes: a first substrate having a first through-hole and a second substrate having a second through-hole; the first substrate having a thickness smaller than the second substrate; the first through-hole having a diameter smaller than the second through-hole; the second substrate having a specific resistance smaller than the first substrate, wherein the first substrate and the second substrate are superimposed so that the first through-hole and the second through-hole are aligned relative to each other. Notching taking place near any of the through-holes in a dry etching process can be reduced, and thus, the through-holes can be formed accurately.

Abstract translation: 一种用于静电透镜的电极，其中所述电极至少包括：具有第一通孔的第一基板和具有第二通孔的第二基板; 所述第一基板的厚度小于所述第二基板; 所述第一通孔的直径小于所述第二通孔; 所述第二基板具有小于所述第一基板的电阻率，其中所述第一基板和所述第二基板重叠，使得所述第一通孔和所述第二通孔相对于彼此对准。 可以减少在干蚀刻工艺中的任何通孔附近发生的凹陷，因此可以精确地形成通孔。

公开(公告)号：US08362425B2

公开(公告)日：2013-01-29

申请号：US13095585

申请日：2011-04-27

Applicant: Liqun Han ,  Xinrong Jiang ,  John D. Greene

Inventor： Liqun Han ,  Xinrong Jiang ,  John D. Greene

IPC: G01N23/04 ,  G01N23/00

CPC classification number: G01N23/2251 ,  G01N2223/102 ,  G01N2223/611 ,  H01J37/04 ,  H01J37/28 ,  H01J2237/0435 ,  H01J2237/04926 ,  H01J2237/1205 ,  H01J2237/15 ,  H01J2237/2446

Abstract: One embodiment disclosed relates to a multiple-beamlet electron beam imaging apparatus for imaging a surface of a target substrate. A beam splitter lens array is configured to split the illumination beam to form a primary beamlet array, and a scanning system is configured to scan the primary beamlet array over an area of the surface of the target substrate. In addition, a detection system configured to detect individual secondary electron beamlets. Another embodiment disclosed relates to a method of imaging a surface of a target substrate using a multiple-beamlet electron beam column. Other features and embodiments are also disclosed.

Abstract translation: 公开的一个实施例涉及用于对目标基板的表面进行成像的多子束电子束成像装置。 分束器透镜阵列被配置为分离照明光束以形成主子束阵列，并且扫描系统被配置为在目标基板的表面的区域上扫描主子束阵列。 另外，被配置为检测单个二次电子束的检测系统。 所公开的另一实施例涉及使用多子束电子束柱对目标衬底的表面进行成像的方法。 还公开了其它特征和实施例。

公开(公告)号：US20120319001A1

公开(公告)日：2012-12-20

申请号：US13493833

申请日：2012-06-11

Applicant: Koichi Tsunoda

Inventor： Koichi Tsunoda

IPC: H01J3/18

CPC classification number: H01J37/12 ,  H01J2237/1205

Abstract: An electrostatic charged particle beam lens in a charged particle beam exposure apparatus includes a first electrode having at least one aperture; a second electrode having at least one aperture; and a supporting body disposed between the first electrode and the second electrode, the supporting body being configured to support the first electrode and the second electrode such that the first electrode and the second electrode are electrically separated from each other. The supporting body is made of alkali-free glass or low-alkali glass.

Abstract translation: 带电粒子束曝光装置中的静电带电粒子束透镜包括具有至少一个孔径的第一电极; 具有至少一个孔的第二电极; 以及设置在所述第一电极和所述第二电极之间的支撑体，所述支撑体被配置为支撑所述第一电极和所述第二电极，使得所述第一电极和所述第二电极彼此电分离。 支撑体由无碱玻璃或低碱玻璃制成。

公开(公告)号：US20120211677A1

公开(公告)日：2012-08-23

申请号：US13461594

申请日：2012-05-01

Applicant: Pieter Kruit ,  Yanxia Zhang ,  Matijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

Inventor： Pieter Kruit ,  Yanxia Zhang ,  Matijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

IPC: G21K5/10

CPC classification number: H01J37/12 ,  H01J37/153 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/317

Abstract: The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.

Abstract translation: 本发明涉及一种多束带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。 该系统可以包括发散的带电粒子束部分，其中包括透镜结构。 透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。 在进一步的阐述中，透镜与限流孔结合，相对于所述结构的透镜对准，所述透镜中由所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

公开(公告)号：US08158954B2

公开(公告)日：2012-04-17

申请号：US12492610

申请日：2009-06-26

Applicant: Stefan Lanio

Inventor： Stefan Lanio

IPC: H01J37/141

CPC classification number: H01J37/141 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/145 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/1405

Abstract: The invention provides a lens system for a plurality of charged particle beams. The lens system comprises an excitation coil providing a magnetic flux to a pole piece unit having a first pole piece, a second pole piece and at least two openings for charged particle beams, wherein the two openings are arranged in one row, thereby forming a lens row, and wherein the pole piece unit has an elongated shape.

Abstract translation: 本发明提供一种用于多个带电粒子束的透镜系统。 所述透镜系统包括向具有第一极片，第二极片和用于带电粒子束的至少两个开口的极片单元提供磁通的激励线圈，其中两个开口布置成一排，从而形成透镜 并且其中所述极靴单元具有细长形状。

公开(公告)号：US08071955B2

公开(公告)日：2011-12-06

申请号：US12600266

申请日：2008-05-15

Applicant: Ho Seob Kim ,  Young Chul Kim

Inventor： Ho Seob Kim ,  Young Chul Kim

IPC: H01J3/26 ,  H01J37/14 ,  H01J37/147

CPC classification number: H01J37/147 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1205 ,  H01J2237/152 ,  H01J2237/1532

Abstract: The present invention relates, in general, to a deflector for microcolumns for generating electron beams, and, more particularly, to a deflector capable of scanning or shifting electron beams or functioning as a stigmator using a magnetic field. The deflector (100) according to the present invention includes one or more deflector electrodes. Each of the deflector electrodes includes a core (12) made of a conductor or a semiconductor, and a coil (11) wound around the core (12).

Abstract translation: 本发明一般涉及用于产生电子束的微柱偏转器，更具体地，涉及一种能够扫描或移动电子束或用作使用磁场的标称器的偏转器。 根据本发明的偏转器（100）包括一个或多个偏转器电极。 每个偏转器电极包括由导体或半导体制成的芯体（12）和缠绕在芯部（12）上的线圈（11）。