公开(公告)号：US08890094B2

公开(公告)日：2014-11-18

申请号：US14027697

申请日：2013-09-16

Applicant: Mapper Lithography IP B.V.

Inventor： Marco Jan Jaco Wieland ,  Bert Jan Kampherbeek ,  Alexander Hendrik Vincent Van Veen ,  Pieter Kruit ,  Stijn Willem Herman Karel Steenbrink

IPC: H01J37/317 ,  H01J37/12 ,  H01J37/30 ,  B82Y40/00 ,  B82Y10/00

CPC classification number: H01J37/3175 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/151 ,  H01J2237/31774

Abstract: A projection lens arrangement for a charged particle multi-beamlet system, the projection lens arrangement including one or more plates and one or more arrays of projection lenses. Each plate has an array of apertures formed in it, with projection lenses formed at the locations of the apertures. The arrays of projection lenses form an array of projection lens systems, each projection lens system comprising one or more of the projection lenses formed at corresponding points of the one or more arrays of projection lenses.

Abstract translation: 一种用于带电粒子多子束系统的投影透镜装置，所述投影透镜装置包括一个或多个板和一个或多个投影透镜阵列。 每个板具有形成在其中的孔阵列，其中投影透镜形成在孔的位置处。 投影透镜的阵列形成投影透镜系统的阵列，每个投影透镜系统包括一个或多个投影透镜，其形成在一个或多个投影透镜阵列的对应点处。