Invention Grant
US08362425B2 Multiple-beam system for high-speed electron-beam inspection 有权
用于高速电子束检测的多光束系统

Multiple-beam system for high-speed electron-beam inspection
Abstract:
One embodiment disclosed relates to a multiple-beamlet electron beam imaging apparatus for imaging a surface of a target substrate. A beam splitter lens array is configured to split the illumination beam to form a primary beamlet array, and a scanning system is configured to scan the primary beamlet array over an area of the surface of the target substrate. In addition, a detection system configured to detect individual secondary electron beamlets. Another embodiment disclosed relates to a method of imaging a surface of a target substrate using a multiple-beamlet electron beam column. Other features and embodiments are also disclosed.
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