公开(公告)号：US20140167614A1

公开(公告)日：2014-06-19

申请号：US13719309

申请日：2012-12-19

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Chin-Tsung LIN ,  Hsiao-Yin HSIEH ,  Chi-Hao HUANG ,  Hong-Hsing CHOU ,  Yeh-Chieh WANG

IPC: H01J37/08 ,  H01J37/317

CPC classification number: H01J37/08 ,  H01J37/244 ,  H01J37/3171 ,  H01J2237/0203 ,  H01J2237/024 ,  H01J2237/026 ,  H01J2237/08 ,  H01J2237/303 ,  H01J2237/30405

Abstract: An apparatus for extending the useful life of an ion source, comprising an arc chamber containing a plurality of cathodes to be used sequentially and a plurality of repellers to protect cathodes when not in use. The arc chamber includes an arc chamber housing defining a reaction cavity, gas injection openings, a plurality of cathodes, and at least one repeller element. A method for extending the useful life of an ion source includes providing power to a first cathode of an arc chamber in an ion source, operating the first cathode, detecting a failure or degradation in performance of the first cathode, energizing a second cathode, and continuing operation of the arc chamber with the second cathode.

Abstract translation: 一种用于延长离子源的使用寿命的装置，包括电弧室，其包含要顺序使用的多个阴极，以及多个防水剂，以在不使用时保护阴极。 电弧室包括限定反应腔的电弧室壳体，气体注入开口，多个阴极和至少一个排斥元件。 用于延长离子源的使用寿命的方法包括向离子源中的电弧室的第一阴极提供电力，操作第一阴极，检测第一阴极的故障或性能下降，激励第二阴极，以及 与第二阴极连续操作电弧室。

公开(公告)号：US20140151555A1

公开(公告)日：2014-06-05

申请号：US14130919

申请日：2012-05-16

Applicant: Takeshi Ogashiwa ,  Masahiro Akatsu

Inventor： Takeshi Ogashiwa ,  Masahiro Akatsu

IPC: H01J37/28

CPC classification number: H01J37/28 ,  H01J37/20 ,  H01J2237/0203

Abstract: Provided is an electron microscope on which a specimen holder with high voltage applied is mountable. The specimen holder has safety (electric shock prevention means), and attention is paid to the specimen holder in terms of operability.The present invention includes a specimen holder having a function of applying a voltage to a specimen mount, disposed to load a specimen, a voltage source that supplies the voltage to be applied to the specimen mount, a voltage cable connected at one end thereof to the specimen holder, and a relay unit to which the other end of the voltage cable is connected, the relay unit being placed on a supporting base that supports a lens barrel of the electron microscope.

Abstract translation: 提供一种电子显微镜，其上安装有高电压的检体保持器。 试样架具有安全（防电击装置），并且在可操作性方面注意试样架。 本发明包括一个试样保持器，其具有向样本载体施加电压的功能，该载体被设置成装载试样，提供施加到样品载体上的电压的电压源，一端连接到该试样载体上的电压电缆 试样架和电压电缆的另一端连接的继电器单元，将继电器单元放置在支撑电子显微镜的镜筒的支撑座上。

公开(公告)号：US08659243B2

公开(公告)日：2014-02-25

申请号：US13268193

申请日：2011-10-07

Applicant: Hiroshi Morita ,  Ryozo Takeuchi ,  Toshiyuki Yokosuka

Inventor： Hiroshi Morita ,  Ryozo Takeuchi ,  Toshiyuki Yokosuka

IPC: H05H9/00

CPC classification number: H05H7/00 ,  H01J37/026 ,  H01J37/04 ,  H01J2237/004 ,  H01J2237/0203 ,  H01J2237/04735

Abstract: In a charged particle accelerator, voltage of several tens of kV is applied between accelerating electrodes. In such a case, electric discharge is sometimes generated between the accelerating electrodes. In the charged particle accelerator, part or entirety of the accelerating electrodes is coated with an electric discharge suppressing layer made of ceramics or alloy having a high melting point as compared with metal. When impurity fine particles are accelerated by an electric field and collide with the electrodes, the electric discharge suppressing layer made of ceramics or alloy prevents metal vapor from being easily generated from the electrodes and an ionized plasma from being easily produced, thus suppressing electric discharge between the electrodes.

Abstract translation: 在带电粒子加速器中，在加速电极之间施加几十kV的电压。 在这种情况下，有时会在加速电极之间产生放电。 在带电粒子加速器中，加速电极的一部分或全部涂覆有与金属相比具有高熔点的陶瓷或合金制成的放电抑制层。 当杂质微粒被电场加速并与电极碰撞时，由陶瓷或合金制成的放电抑制层防止金属蒸气容易地从电极产生，并且电离等离子体容易产生，从而抑制 电极。

公开(公告)号：US08492715B2

公开(公告)日：2013-07-23

申请号：US13441344

申请日：2012-04-06

Applicant: Maximus Theodorus Otten ,  Gerrit Cornelis Van Hoften ,  Joeri Lof

Inventor： Maximus Theodorus Otten ,  Gerrit Cornelis Van Hoften ,  Joeri Lof

IPC: G01N23/00 ,  G21K7/00

CPC classification number: H01J37/26 ,  H01J37/244 ,  H01J37/302 ,  H01J2237/0203 ,  H01J2237/043 ,  H01J2237/065 ,  H01J2237/22 ,  H01J2237/2441 ,  H01J2237/24455 ,  H01J2237/24507 ,  H01J2237/26 ,  H01J2237/262 ,  H01J2237/2802

Abstract: The invention relates to a Method of protecting a direct electron detector (151) in a TEM. The invention involves predicting the current density on the detector before setting new beam parameters, such as changes to the excitation of condenser lenses (104), projector lenses (106) and/or beam energy. The prediction is made using an optical model or a Look-Up-Table. When the predicted exposure of the detector is less than a predetermined value, the desired changes are made, otherwise a warning message is generated and changes to the settings are postponed.

Abstract translation: 本发明涉及一种在TEM中保护直接电子检测器（151）的方法。 本发明涉及在设置新的光束参数之前预测检测器上的电流密度，例如对聚光透镜（104），投影透镜（106）和/或光束能量的激发的改变。 使用光学模型或查找表进行预测。 当检测器的预测曝光小于预定值时，进行所需的改变，否则产生警告消息并延迟对设置的改变。

公开(公告)号：US20120256085A1

公开(公告)日：2012-10-11

申请号：US13441344

申请日：2012-04-06

Applicant: Maximus Theodorus Otten ,  Gerrit Cornelis van Hoften ,  Joeri Lof

Inventor： Maximus Theodorus Otten ,  Gerrit Cornelis van Hoften ,  Joeri Lof

IPC: H01J37/26

CPC classification number: H01J37/26 ,  H01J37/244 ,  H01J37/302 ,  H01J2237/0203 ,  H01J2237/043 ,  H01J2237/065 ,  H01J2237/22 ,  H01J2237/2441 ,  H01J2237/24455 ,  H01J2237/24507 ,  H01J2237/26 ,  H01J2237/262 ,  H01J2237/2802

Abstract: The invention relates to a Method of protecting a direct electron detector (151) in a TEM. The invention involves predicting the current density on the detector before setting new beam parameters, such as changes to the excitation of condenser lenses (104), projector lenses (106) and/or beam energy. The prediction is made using an optical model or a Look-Up-Table. When the predicted exposure of the detector is less than a predetermined value, the desired changes are made, otherwise a warning message is generated and changes to the settings are postponed.

Abstract translation: 本发明涉及一种在TEM中保护直接电子检测器（151）的方法。 本发明涉及在设置新的光束参数之前预测检测器上的电流密度，例如对聚光透镜（104），投影透镜（106）和/或光束能量的激发的改变。 使用光学模型或查找表进行预测。 当检测器的预测曝光小于预定值时，进行所需的改变，否则产生警告消息并延迟对设置的改变。

公开(公告)号：US08198602B2

公开(公告)日：2012-06-12

申请号：US13076540

申请日：2011-03-31

Applicant: Stijn Willem Herman Karel Steenbrink ,  Johan Joost Koning ,  Peter Veltman

Inventor： Stijn Willem Herman Karel Steenbrink ,  Johan Joost Koning ,  Peter Veltman

IPC: G03B27/54 ,  H01J3/14 ,  B23P17/04

CPC classification number: H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/004 ,  H01J2237/0203 ,  H01J2237/03 ,  H01J2237/04924 ,  Y10T29/49

Abstract: An electrostatic lens comprising a first conductive plate with a first aperture, a second conductive plate with a second aperture, the second aperture being substantially aligned with the first aperture, a voltage supply for supplying a first voltage to the first conductive plate and a second voltage to the second conductive plate, the first voltage being lower than the second voltage, and an insulating structure for separating the first conductive plate from the second conductive plate. The insulating structure comprises a first portion in contact with the first conductive plate and a second portion in contact with the second conductive plate, the first portion having an overhanging portion and the second portion having an indented portion at an edge of the insulating structure, so that a gap is formed between the overhanging portion and the second conductive plate.

Abstract translation: 一种静电透镜，包括具有第一孔的第一导电板，具有第二孔的第二导电板，所述第二孔基本上与所述第一孔对准，用于向所述第一导电板提供第一电压的电压源和第二电压 到第二导电板，第一电压低于第二电压，以及用于将第一导电板与第二导电板分离的绝缘结构。 绝缘结构包括与第一导电板接触的第一部分和与第二导电板接触的第二部分，第一部分具有突出部分，第二部分在绝缘结构的边缘处具有凹入部分，因此 在悬伸部分和第二导电板之间形成间隙。

公开(公告)号：US20120025741A1

公开(公告)日：2012-02-02

申请号：US13268193

申请日：2011-10-07

Applicant: Hiroshi MORITA ,  Ryozo Takeuchi ,  Toshiyuki Yokosuka

Inventor： Hiroshi MORITA ,  Ryozo Takeuchi ,  Toshiyuki Yokosuka

IPC: H05H7/00

CPC classification number: H05H7/00 ,  H01J37/026 ,  H01J37/04 ,  H01J2237/004 ,  H01J2237/0203 ,  H01J2237/04735

Abstract: In a charged particle accelerator, voltage of several tens of kV is applied between accelerating electrodes. In such a case, electric discharge is sometimes generated between the accelerating electrodes. In the charged particle accelerator, part or entirety of the accelerating electrodes is coated with an electric discharge suppressing layer made of ceramics or alloy having a high melting point as compared with metal. When impurity fine particles are accelerated by an electric field and collide with the electrodes, the electric discharge suppressing layer made of ceramics or alloy prevents metal vapor from being easily generated from the electrodes and an ionized plasma from being easily produced, thus suppressing electric discharge between the electrodes.

Abstract translation: 在带电粒子加速器中，在加速电极之间施加几十kV的电压。 在这种情况下，有时会在加速电极之间产生放电。 在带电粒子加速器中，加速电极的一部分或全部涂覆有与金属相比具有高熔点的陶瓷或合金制成的放电抑制层。 当杂质微粒被电场加速并与电极碰撞时，由陶瓷或合金制成的放电抑制层防止金属蒸气容易地从电极产生，并且电离等离子体容易产生，从而抑制 电极。

公开(公告)号：US20110226422A1

公开(公告)日：2011-09-22

申请号：US13014956

申请日：2011-01-27

Applicant: Joe Kwan ,  Qing Ji

Inventor： Joe Kwan ,  Qing Ji

IPC: H05H1/46 ,  C23F1/08

CPC classification number: H05H7/00 ,  H01J27/16 ,  H01J37/08 ,  H01J2237/0203 ,  H01J2237/0817 ,  H01J2237/31701

Abstract: A novel ion source is described having an improved lifetime. The ion source, in one embodiment, is a proton source, including an external RF antenna mounted to an RF window. To prevent backstreaming electrons formed in the beam column from striking the RF window, a back streaming electron dump is provided, which in one embodiment is formed of a cylindrical tube, open at one end to the ion source chamber and capped at its other end by a metal plug. The plug, maintained at the same electrical potential as the source, captures these backstreaming electrons, and thus prevents localized heating of the window, which due to said heating, might otherwise cause window damage.

Abstract translation: 描述了具有改善的寿命的新型离子源。 在一个实施例中，离子源是质子源，包括安装到RF窗口的外部RF天线。 为了防止在束柱中形成的电子的反向流向RF射流窗口，将提供一个反向流动的电子转储，其在一个实施例中由圆柱形管形成，其一端在离子源室处敞开，并在其另一端由 金属插头 保持在与源相同的电位的插头捕获这些回流电子，从而防止由于所述加热而导致的窗口的局部加热可能导致窗口损坏。

公开(公告)号：US20110216299A1

公开(公告)日：2011-09-08

申请号：US13076540

申请日：2011-03-31

Applicant: Stijn Willem STEENBRINK ,  Johan Joost Koning ,  Peter Veltman

Inventor： Stijn Willem STEENBRINK ,  Johan Joost Koning ,  Peter Veltman

IPC: G03B27/54 ,  H01J3/14 ,  B23P17/04

CPC classification number: H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/004 ,  H01J2237/0203 ,  H01J2237/03 ,  H01J2237/04924 ,  Y10T29/49

Abstract: An electrostatic lens comprising a first conductive plate with a first aperture, a second conductive plate with a second aperture, the second aperture being substantially aligned with the first aperture, a voltage supply for supplying a first voltage to the first conductive plate and a second voltage to the second conductive plate, the first voltage being lower than the second voltage, and an insulating structure for separating the first conductive plate from the second conductive plate. The insulating structure comprises a first portion in contact with the first conductive plate and a second portion in contact with the second conductive plate, the first portion having an overhanging portion and the second portion having an indented portion at an edge of the insulating structure, so that a gap is formed between the overhanging portion and the second conductive plate.

Abstract translation: 一种静电透镜，包括具有第一孔的第一导电板，具有第二孔的第二导电板，所述第二孔基本上与所述第一孔对准，用于向所述第一导电板提供第一电压的电压源和第二电压 到第二导电板，第一电压低于第二电压，以及用于将第一导电板与第二导电板分离的绝缘结构。 绝缘结构包括与第一导电板接触的第一部分和与第二导电板接触的第二部分，第一部分具有突出部分，第二部分在绝缘结构的边缘处具有凹入部分，因此 在悬伸部分和第二导电板之间形成间隙。

公开(公告)号：US20080265158A1

公开(公告)日：2008-10-30

申请号：US12104160

申请日：2008-04-16

Applicant: Kouji Iwasaki

Inventor： Kouji Iwasaki

IPC: G01N23/00

CPC classification number: G01N23/2251 ,  H01J37/302 ,  H01J37/3056 ,  H01J2237/0203 ,  H01J2237/20 ,  H01J2237/304 ,  H01J2237/3174

Abstract: A charged particle beam instrument is offered which comprises an irradiation mechanism for irradiating a sample with a charged particle beam (FIB/EB), a detection mechanism for detecting secondary charged particles produced by the irradiation by the charged particle beam, a storage portion for previously storing three-dimensional data about the irradiation mechanism and detection mechanism in an interrelated manner to the stage coordinate system W, a conversion portion for converting three-dimensional data about the sample into the stage coordinate system, and a decision portion for simulating the positional relationships among the sample, irradiation mechanism, and detection mechanism based on data converted by the conversion portion and on data stored in the storage portion when a certain position on the sample is placed into a measurement point and for previously making a decision as to whether the sample will interfere and making a report of the result of the decision.

Abstract translation: 提供一种带电粒子束仪器，其包括用于用带电粒子束（FIB / EB）照射样品的照射机构，用于检测由带电粒子束照射产生的二次带电粒子的检测机构，用于预先 以相关方式存储关于照射机构和检测机构的三维数据到舞台坐标系W，将关于样本的三维数据转换成舞台坐标系的转换部分，以及用于模拟位置关系的判定部分 当样本中的某个位置被放入测量点时，基于由转换部分转换的数据和存储在存储部分中的数据的样本，照射机制和检测机制，并且用于先前作出关于样本 将干预并作出决定结果的报告。