公开(公告)号：US20170025241A1

公开(公告)日：2017-01-26

申请号：US15213781

申请日：2016-07-19

Applicant: Hermes Microvision, Inc.

Inventor： Shuai Li ,  Weiming Ren ,  Xuedong Liu ,  Juying Dou ,  Xuerang Hu ,  Zhongwei Chen

IPC: H01J37/14 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J37/10 ,  H01J37/20 ,  H01J37/244 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/04924 ,  H01J2237/04926 ,  H01J2237/04928 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.

Abstract translation: 提出了一种用于以高分辨率和高吞吐量和灵活变化的观察条件观察样品的多光束装置。 该装置使用可移动准直透镜来灵活地改变多个探针点的电流而不影响其间隔，新的源转换单元形成单个电子源的多个图像并补偿多个探针点的离轴像差 以及用于减小由于一次电子束引起的强烈的库仑效应的前束形成装置。

公开(公告)号：US09202658B2

公开(公告)日：2015-12-01

申请号：US14572052

申请日：2014-12-16

Applicant: Hermes-Microvision, Inc.

Inventor： Zhongwei Chen ,  Weiming Ren ,  Xuerang Hu ,  Xuedong Liu

IPC: H01J1/50 ,  H01J3/20

CPC classification number: H01J3/20 ,  H01J37/141 ,  H01J37/143 ,  H01J2237/1405 ,  Y10T29/49075

Abstract: A multi-axis magnetic lens with stable performance in focusing a plurality of charged particle beams is provided. The multi-axis magnetic lens comprises a plurality of magnetic dub-lens modules. On the one hand, the multi-axis magnetic lens employs an annular permanent-magnet unit to provide a basic and stable magnetic flux to the plurality of magnetic sub-lens modules. One the other hand, the multi-axis magnetic lens uses a plurality of subsidiary coils to provide additional and adjustable magnetic flux to the plurality of magnetic sub-lens modules respectively. The invention also proposes a method to turn off or adjust the basic and stable magnetic flux for some applications. Hence, this invention will benefit the applications which need to execute in a long time period while keeping a high stabilization in performance.

Abstract translation: 提供了一种在聚焦多个带电粒子束时具有稳定性能的多轴磁性透镜。 多轴磁性透镜包括多个磁性复数透镜模块。 一方面，多轴磁性透镜采用环形永磁体单元，以向多个磁性子透镜模块提供基本稳定的磁通量。 另一方面，多轴磁性透镜使用多个辅助线圈来分别向多个磁性子透镜模块提供附加和可调节的磁通量。 本发明还提出了在一些应用中关闭或调节基本和稳定磁通的方法。 因此，本发明将有益于需要在长时间内执行的应用，同时保持高性能稳定性。

公开(公告)号：US20150155133A1

公开(公告)日：2015-06-04

申请号：US14560845

申请日：2014-12-04

Applicant: Hermes Microvision Inc.

Inventor： Zhongwei Chen ,  Jack Jau ,  Weiming Ren

IPC: H01J37/26 ,  H01J37/22 ,  H01J37/20 ,  H01J37/10 ,  H01J37/14

CPC classification number: H01J37/28 ,  H01J37/026 ,  H01J37/10 ,  H01J37/14 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/261 ,  H01J37/285 ,  H01J37/292 ,  H01J2237/04926 ,  H01J2237/1405 ,  H01J2237/24475 ,  H01J2237/24495 ,  H01J2237/24528 ,  H01J2237/2801 ,  H01J2237/2804 ,  H01J2237/2806 ,  H01J2237/2814

Abstract: The present invention provides apparatuses to inspect small particles on the surface of a sample such as wafer and mask. The apparatuses provide both high detection efficiency and high throughput by forming Dark-field BSE images. The apparatuses can additionally inspect physical and electrical defects on the sample surface by form SE images and Bright-field BSE images simultaneously. The apparatuses can be designed to do single-beam or even multiple single-beam inspection for achieving a high throughput.

公开(公告)号：US20150144788A1

公开(公告)日：2015-05-28

申请号：US14564921

申请日：2014-12-09

Applicant: Hermes Microvision Inc.

Inventor： Zhongwei Chen ,  Jack Jau ,  Weiming Ren ,  Chiyan Kuan ,  Yixiang Wang ,  Xiaoli Guo ,  Feng Cao

IPC: H01J37/26 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/261 ,  H01J37/226 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/10 ,  H01J2237/24475 ,  H01J2237/24495 ,  H01J2237/24528 ,  H01J2237/2801 ,  H01J2237/2804 ,  H01J2237/2806 ,  H01J2237/2814

Abstract: The present invention provides a dual-beam apparatus which employs the dark-field e-beam inspection method to inspect small particles on a surface of a sample such as wafer and mask with high throughput. The dual beam apparatus comprises two single-beam dark-field units placed in a same vacuum chamber and in two different orientations. The two single-beam dark-field units can perform the particle inspection separately or almost simultaneously by means of the alternately-scanning way. The invention also proposes a triple-beam apparatus for both inspecting and reviewing particles on a sample surface within the same vacuum chamber. The triple-beam apparatus comprises one foregoing dual-beam apparatus performing the particle inspection and one high-resolution SEM performing the particle review.

Abstract translation: 本发明提供一种双光束装置，其采用暗场电子束检查方法以高生产量检查诸如晶片和掩模的样品表面上的小颗粒。 双光束装置包括放置在相同真空室中并具有两个不同取向的两个单光束暗场单元。 两个单光束暗场单元可以通过交替扫描方式分别或几乎同时进行粒子检测。 本发明还提出了一种用于检查和检查在相同真空室内的样品表面上的颗粒的三光束装置。 三光束装置包括执行颗粒检查的一个前述双光束装置和执行颗粒检查的一个高分辨率SEM。

公开(公告)号：US20150083912A1

公开(公告)日：2015-03-26

申请号：US14560784

申请日：2014-12-04

Applicant: Hermes Microvision Inc.

Inventor： Zhongwei Chen ,  Jack Jau ,  Weiming Ren

IPC: H01J37/26 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J37/026 ,  H01J37/10 ,  H01J37/14 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/261 ,  H01J37/285 ,  H01J37/292 ,  H01J2237/04926 ,  H01J2237/1405 ,  H01J2237/24475 ,  H01J2237/24495 ,  H01J2237/24528 ,  H01J2237/2801 ,  H01J2237/2804 ,  H01J2237/2806 ,  H01J2237/2814

Abstract: The present invention provides apparatuses to inspect small particles on the surface of a sample such as wafer and mask. The apparatuses provide both high detection efficiency and high throughput by forming Dark-field BSE images. The apparatuses can additionally inspect physical and electrical defects on the sample surface by form SE images and Bright-field BSE images simultaneously. The apparatuses can be designed to do single-beam or even multiple single-beam inspection for achieving a high throughput.

Abstract translation: 本发明提供了检查诸如晶片和掩模之类的样品表面上的小颗粒的装置。 这些装置通过形成暗场BSE图像提供高检测效率和高吞吐量。 这些装置可以通过同时形成SE图像和亮场BSE图像另外检查样品表面上的物理和电气缺陷。 这些装置可被设计成进行单光束或甚至多个单光束检查以实现高吞吐量。