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公开(公告)号：US09177758B2
公开(公告)日：2015-11-03
申请号：US14564921
申请日：2014-12-09
Applicant: Hermes Microvision Inc.
Inventor： Zhongwei Chen , Jack Jau , Weiming Ren , Chiyan Kuan , Yixiang Wang , Xiaoli Guo , Feng Cao
CPC classification number: H01J37/261 , H01J37/226 , H01J37/244 , H01J37/28 , H01J2237/063 , H01J2237/10 , H01J2237/24475 , H01J2237/24495 , H01J2237/24528 , H01J2237/2801 , H01J2237/2804 , H01J2237/2806 , H01J2237/2814
Abstract: The present invention provides a dual-beam apparatus which employs the dark-field e-beam inspection method to inspect small particles on a surface of a sample such as wafer and mask with high throughput. The dual beam apparatus comprises two single-beam dark-field units placed in a same vacuum chamber and in two different orientations. The two single-beam dark-field units can perform the particle inspection separately or almost simultaneously by means of the alternately-scanning way. The invention also proposes a triple-beam apparatus for both inspecting and reviewing particles on a sample surface within the same vacuum chamber. The triple-beam apparatus comprises one foregoing dual-beam apparatus performing the particle inspection and one high-resolution SEM performing the particle review.
Abstract translation: 本发明提供一种双光束装置，其采用暗场电子束检查方法以高生产量检查诸如晶片和掩模的样品表面上的小颗粒。 双光束装置包括放置在相同真空室中并具有两个不同取向的两个单光束暗场单元。 两个单光束暗场单元可以通过交替扫描方式分别或几乎同时进行粒子检测。 本发明还提出了一种用于检查和检查在相同真空室内的样品表面上的颗粒的三光束装置。 三光束装置包括执行颗粒检查的一个前述双光束装置和执行颗粒检查的一个高分辨率SEM。
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公开(公告)号：US20150091258A1
公开(公告)日：2015-04-02
申请号：US14567075
申请日：2014-12-11
Applicant: Hermes Microvision, Inc.
Inventor： Qingpo Xi , Tao Li , Feng Cao , Fumin He , Zhongwei Chen
IPC: F16J15/08
CPC classification number: F16J15/0881 , F16L23/20
Abstract: The present invention introduces a metal seal flange assembly for a vacuum system. A new designed metal gasket has a crosses-section shape of irregular quadrangle with two sharp angle forms by the longer base and legs. The long base of the irregular quadrangle is the vertical inner wall of the metal gasket. A preferred cross section shape of the metal gasket is trapezoid or isosceles trapezoid. This design can reduce the normal force applied to the metal seal flange assembly and reduce the number of bolts used in a limit working space.
Abstract translation: 本发明引入了用于真空系统的金属密封凸缘组件。 新设计的金属垫片具有不规则四边形的横截面形状，具有较长的底座和腿部的两个尖角形状。 不规则四边形的长基座是金属垫片的垂直内壁。 金属垫片的优选截面形状是梯形或等腰梯形。 该设计可以减少施加到金属密封凸缘组件的法向力，并减少在极限工作空间中使用的螺栓数量。
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公开(公告)号：US09605759B2
公开(公告)日：2017-03-28
申请号：US14567075
申请日：2014-12-11
Applicant: Hermes Microvision, Inc.
Inventor： Qingpo Xi , Tao Li , Feng Cao , Fumin He , Zhongwei Chen
CPC classification number: F16J15/0881 , F16L23/20
Abstract: A metal gasket has a cross-sectional shape that is a six sided shape that resembles an irregular quadrangle that is substantially isosceles trapezoidal in shape with two sharp angles between the longest side and the second- and third-longest sides, respectively. The longest side of the cross section is the inner wall of the metal gasket.
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公开(公告)号：US20150144788A1
公开(公告)日：2015-05-28
申请号：US14564921
申请日：2014-12-09
Applicant: Hermes Microvision Inc.
Inventor： Zhongwei Chen , Jack Jau , Weiming Ren , Chiyan Kuan , Yixiang Wang , Xiaoli Guo , Feng Cao
CPC classification number: H01J37/261 , H01J37/226 , H01J37/244 , H01J37/28 , H01J2237/063 , H01J2237/10 , H01J2237/24475 , H01J2237/24495 , H01J2237/24528 , H01J2237/2801 , H01J2237/2804 , H01J2237/2806 , H01J2237/2814
Abstract: The present invention provides a dual-beam apparatus which employs the dark-field e-beam inspection method to inspect small particles on a surface of a sample such as wafer and mask with high throughput. The dual beam apparatus comprises two single-beam dark-field units placed in a same vacuum chamber and in two different orientations. The two single-beam dark-field units can perform the particle inspection separately or almost simultaneously by means of the alternately-scanning way. The invention also proposes a triple-beam apparatus for both inspecting and reviewing particles on a sample surface within the same vacuum chamber. The triple-beam apparatus comprises one foregoing dual-beam apparatus performing the particle inspection and one high-resolution SEM performing the particle review.
Abstract translation: 本发明提供一种双光束装置，其采用暗场电子束检查方法以高生产量检查诸如晶片和掩模的样品表面上的小颗粒。 双光束装置包括放置在相同真空室中并具有两个不同取向的两个单光束暗场单元。 两个单光束暗场单元可以通过交替扫描方式分别或几乎同时进行粒子检测。 本发明还提出了一种用于检查和检查在相同真空室内的样品表面上的颗粒的三光束装置。 三光束装置包括执行颗粒检查的一个前述双光束装置和执行颗粒检查的一个高分辨率SEM。
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