公开(公告)号：US20160189923A1

公开(公告)日：2016-06-30

申请号：US14911570

申请日：2014-08-08

Applicant: SWINBURNE UNIVERSITY OF TECHNOLOGY

Inventor： Saulius JUODKAZIS ,  Gediminas GERVINSKAS ,  Gediminas SENIUTINAS

IPC: H01J37/26 ,  H01J37/30 ,  H01J37/28

CPC classification number: H01J37/265 ,  B82Y40/00 ,  G01N23/225 ,  G01N2223/073 ,  G01N2223/351 ,  G01N2223/611 ,  H01J37/026 ,  H01J37/263 ,  H01J37/28 ,  H01J37/3002 ,  H01J2237/004 ,  H01J2237/0047 ,  H01J2237/28

Abstract: An apparatus for imaging or fabrication using charged particles, the apparatus including: a charged particle source configured to generate a charged particle beam of ions or electrons; a sample holder mounted relative to the charged particle source to hold a sample in the charged particle beam for the imaging or fabrication; and an optical source system configured to generate an optical beam, wherein the optical source system is mounted relative to the sample holder to direct the optical beam onto the sample to modify an electric charge of the sample during the imaging or fabrication to improve spatial resolution of the imaging or fabrication.

Abstract translation: 一种用于使用带电粒子进行成像或制造的装置，所述装置包括：被配置为产生离子或电子的带电粒子束的带电粒子源; 相对于带电粒子源安装的样品保持器，以将样品保持在带电粒子束中用于成像或制造; 以及被配置为产生光束的光源系统，其中所述光源系统相对于所述样品保持器安装以将所述光束引导到所述样品上，以在成像或制造期间修改所述样品的电荷，以改善所述样品的空间分辨率 成像或制作。

公开(公告)号：US20160133437A1

公开(公告)日：2016-05-12

申请号：US14938689

申请日：2015-11-11

Applicant: FEI Company

Inventor： Marco Hugo Petrus Moers ,  Albert Visscher

IPC: H01J37/26

CPC classification number: H01J37/265 ,  H01J37/02 ,  H01J2237/0216 ,  H01J2237/16

Abstract: A method of mitigating the effects of environmental pressure variation while using a charged particle microscope is described. The charged particle microscope equipped with a barometric pressure sensor and an automatic controller configured to use the signal from the barometric sensor as an input to a control procedure to compensate for a relative positional error between the charged particle beam and the specimen holder.

Abstract translation: 描述了在使用带电粒子显微镜时减轻环境压力变化的影响的方法。 装有大气压力传感器和自动控制器的带电粒子显微镜被配置为使用来自气压传感器的信号作为控制过程的输入，以补偿带电粒子束和样品架之间的相对位置误差。

公开(公告)号：US09324178B2

公开(公告)日：2016-04-26

申请号：US14536313

申请日：2014-11-07

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Wen-Hao Cheng ,  Chih-Chiang Tu ,  Chung-Min Fu ,  Ajay Nandoriya

IPC: H01J37/28 ,  G06T15/10 ,  G01N23/203 ,  H01J37/26

CPC classification number: G06T15/10 ,  G01N23/203 ,  G06T2215/16 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/24578 ,  H01J2237/2611 ,  H01J2237/2815 ,  H01J2237/2818

Abstract: A system comprises an electron beam directed toward a three-dimensional object with one tilting angle and at least two azimuth angles, a detector configured to receive a plurality of scanning electron microscope (SEM) images from the three-dimensional object and a processor configured to calculate a height and a sidewall edge of the three-dimensional object.

Abstract translation: 一种系统包括一个朝向一个倾斜角度和至少两个方位角的三维物体的电子束，被配置为从三维物体接收多个扫描电子显微镜（SEM）图像的检测器，以及被配置为 计算三维物体的高度和侧壁边缘。

公开(公告)号：US09312098B2

公开(公告)日：2016-04-12

申请号：US14629387

申请日：2015-02-23

Applicant: FEI Company

Inventor： Ivan Lazic ,  Eric Gerardus Theodoor Bosch ,  Faysal Boughorbel ,  Bart Buijsse ,  Kasim Sader ,  Sorin Lazar

IPC: H01J37/26 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/26 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/2446 ,  H01J2237/24465 ,  H01J2237/2802

Abstract: Examining a sample in a charged-particle microscope of a scanning transmission type includes: Providing a beam of charged particles that is directed from a source through an illuminator so as to irradiate the sample; Providing a detector for detecting a flux of charged particles traversing the sample; Causing said beam to scan across a surface of the sample, and recording an output of the detector as a function of scan position, resulting in accumulation of a charged-particle image of the sample, Embodying the detector to comprise a plurality of detection segments; Combining signals from different segments of the detector so as to produce a vector output from the detector at each scan position, and compiling this data to yield a vector field; and Mathematically processing said vector field by subjecting it to a two-dimensional integration operation, thereby producing an integrated vector field image.

Abstract translation: 在扫描透射型的带电粒子显微镜中检查样品包括：提供从源通过照射器引导以便照射样品的带电粒子束; 提供检测器，用于检测穿过样品的带电粒子的通量; 使所述光束扫描穿过样品的表面，并记录检测器的输出作为扫描位置的函数，导致样品的带电粒子图像的累积，使检测器包含多个检测段; 组合来自检测器的不同段的信号，以便在每个扫描位置产生从检测器输出的矢量，并且编译该数据以产生矢量场; 并通过使其进行二维积分操作来数字处理所述矢量场，由此产生积分矢量场图像。

公开(公告)号：US09287082B2

公开(公告)日：2016-03-15

申请号：US14616658

申请日：2015-02-07

Applicant: Hitachi High-Technologies Corporation

Inventor： Kenichi Morita ,  Sayaka Tanimoto ,  Makoto Sakakibara ,  Muneyuki Fukuda ,  Naomasa Suzuki ,  Kenji Obara

IPC: H01J37/141 ,  H01J37/28 ,  H01J37/26 ,  H01J37/22

CPC classification number: H01J37/141 ,  H01J37/222 ,  H01J37/243 ,  H01J37/261 ,  H01J37/265 ,  H01J2237/04922 ,  H01J2237/221 ,  H01J2237/2801 ,  H01J2237/2806 ,  H01J2237/2809 ,  H01J2237/2817

Abstract: A charged particle beam apparatus includes a charged particle beam source which irradiates a sample with a charged particle beam, an electromagnetic lens, a lens control electric source for controlling strength of a convergence effect of the electromagnetic lens; and a phase compensation circuit which is connected to the lens control electric source in parallel with the electromagnetic lens, and controls a lens current at the time of switching the strength of the convergence effect of the electromagnetic lens such that the lens current monotonically increases or monotonically decreases.

Abstract translation: 带电粒子束装置包括用带电粒子束照射样本的带电粒子束源，电磁透镜，用于控制电磁透镜的会聚效应的强度的透镜控制电源; 以及相位补偿电路，其与电磁透镜并联连接到透镜控制电源，并且在切换电磁透镜的会聚效果的强度时控制透镜电流，使得透镜电流单调增加或单调 减少

公开(公告)号：US20160005567A1

公开(公告)日：2016-01-07

申请号：US14851692

申请日：2015-09-11

Applicant: Lawrence Livermore National Security, LLC

Inventor： Bryan W. REED ,  William J. DEHOPE ,  Glenn HUETE ,  Thomas B. LAGRANGE ,  Richard M. SHUTTLESWORTH

IPC: H01J37/075 ,  H01J37/26 ,  H01J37/147

CPC classification number: H01J37/075 ,  H01J37/1472 ,  H01J37/22 ,  H01J37/244 ,  H01J37/26 ,  H01J37/265 ,  H01J2237/0432 ,  H01J2237/06333 ,  H01J2237/15 ,  H01J2237/151 ,  H01J2237/24455 ,  H01J2237/2447 ,  H01J2237/2449 ,  H01J2237/24495

Abstract: An electron microscope is disclosed which has a laser-driven photocathode and an arbitrary waveform generator (AWG) laser system (“laser”). The laser produces a train of temporally-shaped laser pulses of a predefined pulse duration and waveform, and directs the laser pulses to the laser-driven photocathode to produce a train of electron pulses. An image sensor is used along with a deflector subsystem. The deflector subsystem is arranged downstream of the target but upstream of the image sensor, and has two pairs of plates arranged perpendicular to one another. A control system controls the laser and a plurality of switching components synchronized with the laser, to independently control excitation of each one of the deflector plates. This allows each electron pulse to be directed to a different portion of the image sensor, as well as to be provided with an independently set duration and independently set inter-pulse spacings.

Abstract translation: 公开了一种具有激光驱动光电阴极和任意波形发生器（AWG）激光系统（“激光”）的电子显微镜。 激光器产生预定脉冲持续时间和波形的时间上形状的激光脉冲串，并将激光脉冲引导到激光驱动的光电阴极以产生一系列电子脉冲。 图像传感器与偏转器子系统一起使用。 偏转器子系统布置在目标的下游，但是在图像传感器的上游，并且具有彼此垂直布置的两对板。 控制系统控制激光器和与激光器同步的多个切换部件，以独立地控制每个偏转板的激励。 这允许每个电子脉冲被引导到图像传感器的不同部分，并且被提供有独立设置的持续时间并且独立设置脉冲间隔。

公开(公告)号：US09218940B1

公开(公告)日：2015-12-22

申请号：US14292606

申请日：2014-05-30

Applicant: FEI Company

Inventor： Valerie Brogden

IPC: H01J37/305 ,  H01J37/26

CPC classification number: H01J37/3056 ,  G01N23/2208 ,  G01N23/2251 ,  G01N23/2255 ,  H01J37/26 ,  H01J37/265 ,  H01J37/3023 ,  H01J2237/2611 ,  H01J2237/2814 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: Methods, apparatuses, and systems for slice and view processing of samples with dual beam systems. The slice and view processing includes exposing a vertical wall of a trench formed in a sample surface; capturing a first image of the wall by interrogating the wall with an interrogating beam while the wall is at a first orientation relative to the beam; capturing a second image of the wall by interrogating the wall with the beam while the wall is at a second orientation relative to the beam, wherein first distances in the first image between a reference point and surface points on the wall are different than second distances in the second image between the reference point and the surface points; determining elevations of the surface points using the first distances and the second distances; and fitting a curve to topography of the wall using the elevations.

Abstract translation: 用于双光束系统的样品的切片和视图处理的方法，设备和系统。 切片和视图处理包括暴露在样品表面中形成的沟槽的垂直壁; 当所述壁相对于所述梁处于第一取向时，用询问梁询问所述壁，捕获所述壁的第一图像; 通过在所述壁相对于所述光束处于第二取向的情况下通过用所述光束询问所述壁来捕获所述壁的第二图像，其中所述第一图像中的参考点和所述壁上的表面点之间的第一距离不同于所述壁上的第二距离 参考点和表面点之间的第二个图像; 使用所述第一距离和所述第二距离确定所述表面点的高度; 并使用高程将曲线拟合到墙的地形。

公开(公告)号：US20150348751A1

公开(公告)日：2015-12-03

申请号：US14292606

申请日：2014-05-30

Applicant: FEI Company

Inventor： Valerie Brogden

IPC: H01J37/305 ,  H01J37/26

CPC classification number: H01J37/3056 ,  G01N23/2208 ,  G01N23/2251 ,  G01N23/2255 ,  H01J37/26 ,  H01J37/265 ,  H01J37/3023 ,  H01J2237/2611 ,  H01J2237/2814 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: Methods, apparatuses, and systems for slice and view processing of samples with dual beam systems. The slice and view processing includes exposing a vertical wall of a trench formed in a sample surface; capturing a first image of the wall by interrogating the wall with an interrogating beam while the wall is at a first orientation relative to the beam; capturing a second image of the wall by interrogating the wall with the beam while the wall is at a second orientation relative to the beam, wherein first distances in the first image between a reference point and surface points on the wall are different than second distances in the second image between the reference point and the surface points; determining elevations of the surface points using the first distances and the second distances; and fitting a curve to topography of the wall using the elevations.

Abstract translation: 用于双光束系统的样品的切片和视图处理的方法，设备和系统。 切片和视图处理包括暴露在样品表面中形成的沟槽的垂直壁; 当所述壁相对于所述梁处于第一取向时，用询问梁询问所述壁，捕获所述壁的第一图像; 通过在所述壁相对于所述光束处于第二取向的情况下通过用所述光束询问所述壁来捕获所述壁的第二图像，其中所述第一图像中的参考点和所述壁上的表面点之间的第一距离与所述壁上的第二距离不同 参考点和表面点之间的第二个图像; 使用所述第一距离和所述第二距离确定所述表面点的高度; 并使用高程将曲线拟合到墙的地形。

公开(公告)号：US20150348748A1

公开(公告)日：2015-12-03

申请号：US14760259

申请日：2014-01-22

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yuzuru MIZUHARA ,  Miki ISAWA ,  Minoru YAMAZAKI ,  Hitoshi TAMURA ,  Hideyuki KAZUMI

IPC: H01J37/244 ,  H01J37/26 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/268 ,  H01J37/1472 ,  H01J37/244 ,  H01J37/265 ,  H01J37/266 ,  H01J37/28 ,  H01J37/3178 ,  H01J2237/24564 ,  H01J2237/28 ,  H01J2237/2809

Abstract: An object of the present invention is to provide a method and an apparatus capable of measuring a potential of a sample surface by using a charged particle beam, or of detecting a compensation value of a variation in an apparatus condition which changes due to sample charging, by measuring a sample potential caused by irradiation with the charged particle beam. In order to achieve the object, a method and an apparatus are provided in which charged particle beams (2(a), 2(b)) emitted from a sample (23) are deflected by a charged particle deflector (33) in a state in which the sample (23) is irradiated with a charged particle beam (1), and information regarding a sample potential is detected by using a signal obtained at that time.

Abstract translation: 本发明的目的是提供一种能够通过使用带电粒子束来测量样品表面的电位或检测由于样品充电而发生变化的装置状态的变化的补偿值的方法和装置， 通过测量由带电粒子束的照射引起的样品电位。 为了实现该目的，提供了一种方法和装置，其中从样品（23）发射的带电粒子束（2（a），2（b））由带电粒子偏转器（33）在某种状态下偏转 其中样品（23）被带电粒子束（1）照射，并且通过使用当时获得的信号来检测关于样品电位的信息。

公开(公告)号：US09153418B2

公开(公告)日：2015-10-06

申请号：US14461051

申请日：2014-08-15

Applicant: Hitachi High-Technologies Corporation

Inventor： Fumihiro Sasajima ,  Yoshihiro Kimura ,  Akihiro Miura

IPC: H01J37/26 ,  G21K5/04 ,  G01N23/225 ,  H01J37/244 ,  H01J37/29

CPC classification number: H01J37/265 ,  G01N23/2251 ,  G01N2223/6116 ,  H01J37/244 ,  H01J37/292 ,  H01J37/3178

Abstract: A charged particle radiation apparatus includes a control device that switches between a first charged particle beam and a second charged particle beam, the first charged particle beam being scanned to acquire an image and a waveform signal, the second charged particle beam being scanned over a sample before the scan of the first charged particle beam and used to charge the sample more than the first charged particle beam; wherein the control device is configured to acquire at least one of signal waveform data and image data about a pattern formed on the sample in accordance with a scan performed on the sample by the second charged particle beam, and to stop, when the acquired data has proved to be indicative of a predetermined state, the scan of the second charged particle beam.

Abstract translation: 带电粒子辐射装置包括：控制装置，其在第一带电粒子束和第二带电粒子束之间切换，第一带电粒子束被扫描以获取图像和波形信号，第二带电粒子束在样本上扫描 在扫描第一带电粒子束之前并且用于对样品充电多于第一带电粒子束; 其中，所述控制装置被配置为根据对由所述第二带电粒子束对所述样本执行的扫描，获取关于在所述样本上形成的图案的信号波形数据和图像数据中的至少一个，并且当所获取的数据具有 被证明是预定状态的指示，第二带电粒子束的扫描。