公开(公告)号：US20060192120A1

公开(公告)日：2006-08-31

申请号：US11411349

申请日：2006-04-25

Applicant: Hiroshi Nishimura ,  Naoto Kihara ,  Kinya Kato ,  Toru Takagi ,  Akihiro Goto ,  Junji Ikeda ,  Kazuya Okamoto

Inventor： Hiroshi Nishimura ,  Naoto Kihara ,  Kinya Kato ,  Toru Takagi ,  Akihiro Goto ,  Junji Ikeda ,  Kazuya Okamoto

IPC: G21K7/00 ,  G01N23/00

CPC classification number: H01J37/26 ,  G01N23/225 ,  H01J37/1471 ,  H01J37/226 ,  H01J37/265 ,  H01J2237/0492 ,  H01J2237/057 ,  H01J2237/1501 ,  H01J2237/2482 ,  H01J2237/2538 ,  H01J2237/262 ,  H01J2237/2806 ,  H01J2237/2817 ,  H01J2237/282 ,  H01J2237/2823 ,  H01J2237/2826 ,  H01J2237/30438

Abstract: Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation-optical system, and enters a Wien filter (“E×B”). Upon passing through the E×B, the irradiation beam passes through an objective-optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective-optical system and the E×B in a different direction to a detector via an imaging-optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the E×B. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g., in the plane of the object surface) can be used that are optimized for the CPB-optical system and the off-axis optical system. Desirably, the image formed on the detector when electrical voltage and current are not applied to the E×B is in the same position as the image formed on the detector when electrical voltage and current are applied to the E×B. Also provided are “evaluation charts” for use in such alignments that do not require adjustment of the optical axis of the irradiation-optical system, and from which the kinetic-energy distribution of the emitted adjustment beam is stable.

公开(公告)号：US20040086170A1

公开(公告)日：2004-05-06

申请号：US10637488

申请日：2003-08-11

Inventor： Chie Shishido ,  Yuji Takagi ,  Shuji Maeda ,  Takanori Ninomiya ,  Takashi Hiroi ,  Masahiro Watanabe ,  Hideaki Dot

IPC: G06K009/00 ,  G06K009/68

CPC classification number: G06T7/001 ,  G06T5/006 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/226 ,  H01J37/28 ,  H01J2237/2448 ,  H01J2237/24592 ,  H01J2237/2482 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: A pattern inspecting method and apparatus for inspecting a defect or defective candidate of patterns on a sample includes picking up an image of a sample by shifting a sampling position on the sample, measuring geometric distortion in an image of a standard sample, beforehand, and defining a size for which the measured geometric distortion is neglectable, obtaining a first image of the sample and a second image to be compared with the first image, dividing the first image and the second stage into images of a division unit having a size not greater than the defined size, comparing a divided image of the first image with a divided image of the second image, and for calculating a difference in gradation values between both of the divided images. The defect or the defect candidate of the sample is extracted in accordance with the difference in the gradation values.

Abstract translation: 用于检查样本上的图案的缺陷或缺陷候选的图案检查方法和装置包括：通过移动样本上的采样位置，预先测量标准样本的图像中的几何失真，并定义 测量的几何失真可忽略的尺寸，获得样本的第一图像和要与第一图像比较的第二图像，将第一图像和第二阶段划分为尺寸不大于的尺寸的分割单元的图像 定义的尺寸，将第一图像的分割图像与第二图像的分割图像进行比较，并且用于计算两个分割图像之间的灰度值差。 根据灰度值的差异提取样本的缺陷或缺陷候选。

公开(公告)号：US06621282B2

公开(公告)日：2003-09-16

申请号：US09774249

申请日：2001-01-30

Applicant: Kenneth F. Hollman

Inventor： Kenneth F. Hollman

IPC: G01R3102

CPC classification number: H01J37/226 ,  G01R31/2851 ,  G01R31/2887 ,  G01R31/307

Abstract: A method and system for probing with electrical test signals on an integrated circuit specimen using a scanning electron microscope (SEM) positioned for observing a surface of the specimen exposing electrically conductive terminals on the specimen. A carrier is provided for supporting the specimen in relation to the scanning electron microscope while a computer acquires an image identifying conductive path indicia of the surface of the specimen from the scanning electron microscope. A motorized manipulator remotely controlled by the computer manipulates a plurality of probes positionable on the surface of the specimen for conveying electrical test signals inside a vacuum chamber inner enclosure which houses the scanning electron microscope, the carrier, the motorized manipulator and the plurality of probes for analyzing the specimen in a vacuum. A feedthrough on the vacuum chamber couples electrical signals from the computer to the motorized manipulator and the plurality of probes. The computer communicates with the motorized manipulator for positioning the plurality of probes, and for applying electrical test signals to the terminals on the specimen using the image acquired by the computer to identify the electrically conductive terminals from the conductive path indicia of the surface of the specimen observed with the scanning electron microscope.

公开(公告)号：US06480279B2

公开(公告)日：2002-11-12

申请号：US09832217

申请日：2001-04-11

Applicant: Yasuhiko Nara ,  Kazuhisa Machida ,  Mari Nozoe ,  Hiroshi Morioka ,  Yasutsugu Usami ,  Takashi Hiroi

Inventor： Yasuhiko Nara ,  Kazuhisa Machida ,  Mari Nozoe ,  Hiroshi Morioka ,  Yasutsugu Usami ,  Takashi Hiroi

IPC: G01B1100

CPC classification number: G03F7/70616 ,  G03F1/84 ,  G03F7/7065 ,  G06T7/001 ,  G06T2207/30141 ,  H01J37/226 ,  H01J2237/082 ,  H01J2237/2817 ,  H01L22/12

Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents. When a desired item name is clicked, the picture plane is switched and the contents corresponding to the clicked item name are displayed.

Abstract translation: 设置用于电路图案的检查方法，装置和系统，其中当通过使用通过照射白光形成的图像，激光束或带电粒子束来检查精细电路图案的情况下需要各种条件时， 其运行效率可以提高。 显示检查对象基板的检查对象区域，并且指定区域的指定地图画面和光学显微镜或电子束显微镜的图像并行显示，从而能够将缺陷分布和缺陷图像 同时看到。 检查条件的项目名称和显示，输入或指示检查条件内容的画面被整合，这些内容与图像平面重叠，层叠显示，并且所有项目名称均以 选项卡格式在内容的图片平面的上部。 当点击所需的项目名称时，切换画面并显示与点击的项目名称对应的内容。

公开(公告)号：US06303930B1

公开(公告)日：2001-10-16

申请号：US09310766

申请日：1999-05-13

Applicant: Ryoji Hagiwara

Inventor： Ryoji Hagiwara

IPC: G01N2300

CPC classification number: G01N23/04 ,  H01J37/226 ,  H01J37/3045 ,  H01J2237/2482 ,  H01J2237/28 ,  H01J2237/31749 ,  H01L21/67282

Abstract: An optical observing apparatus has a sample stage for moving a sample to a desired location to be operated upon at a target position by a charged particle beam apparatus so that the target position can be visually observed, an optical observation system for magnifying the sample for visual observation of the target position, a marking system for moving the sample based on the visual observation and marking the sample at one or more locations from which the target position can be determined without the need for further visual observation so that the target position may be located by the charged particle beam apparatus even when the target position can not be visually observed by use of the charged particle beam apparatus, and a control system for storing the target position and the location of the one or more markings together with an optical observation image and corresponding stage coordinate. In a preferred embodiment, the marking system is a laser marking system for producing a plurality of laser beams on the same optical axis, each having a different wavelength, so that an appropriate laser beam may be selected based upon the nature of the sample. The sample has an underlying structure covered by a layer of transparent material, so that the underlying structure can be visually observed by means of the optical observation system but cannot be observed by use of the charged particle beam apparatus.

Abstract translation: 光学观察装置具有用于通过带电粒子束装置将样品移动到目标位置以在目标位置操作的期望位置的样品台，使得可以目视观察目标位置，用于放大样品以进行视觉的光学观察系统 观察目标位置，用于基于目视观察移动样本的标记系统，并且可以在可以确定目标位置的一个或多个位置处标记样本，而不需要进一步目视观察，使得目标位置可以位于 即使当使用带电粒子束装置不能目视观察目标位置时，也可以通过带电粒子束装置和用于将目标位置和一个或多个标记的位置与光学观察图像一起存储的控制系统，以及 对应阶段坐标。 在优选实施例中，标记系统是用于在同一光轴上产生多个激光束的激光标记系统，每个激光束具有不同的波长，使得可以基于样品的性质来选择适当的激光束。 样品具有由透明材料层覆盖的下层结构，使得可以通过光学观察系统目视观察下面的结构，但是通过使用带电粒子束装置不能观察到。

公开(公告)号：US20010011706A1

公开(公告)日：2001-08-09

申请号：US09832220

申请日：2001-04-11

Inventor： Yasuhiko Nara ,  Kazuhisa Machida ,  Mari Nozoe ,  Hiroshi Morioka ,  Yasutsugu Usami ,  Takashi Hiroi ,  Kohichi Hayakawa ,  Maki Ito

IPC: G01K001/08

CPC classification number: G03F7/70616 ,  G03F1/84 ,  G03F7/7065 ,  G06T7/001 ,  G06T2207/30141 ,  H01J37/226 ,  H01J2237/082 ,  H01J2237/2817 ,  H01L22/12

Abstract: Inspection method, apparatus, and system for a circuit pattern, in which when various conditions which are necessary in case of inspecting a fine circuit pattern by using an image formed by irradiating white light, a laser beam, or a charged particle beam are set, its operating efficiency can be improved. An inspection target region of an inspection-subject substrate is displayed, and a designated map picture plane and an image of an optical microscope or an electron beam microscope of a designated region are displayed in parallel, thereby enabling a defect distribution and a defect image to be simultaneously seen. Item names of inspecting conditions and a picture plane to display, input, or instruct the contents of the inspecting conditions are integrated, those contents are overlapped to the picture plane and layer-displayed, and all of the item names are displayed in parallel in a tab format in the upper portion of the picture plane of the contents. When a desired item name is clicked, the picture plane is switched and the contents corresponding to the clicked item name are displayed.

公开(公告)号：US5811804A

公开(公告)日：1998-09-22

申请号：US682601

申请日：1996-08-12

Applicant: Clemens Antoni Van Blitterswijk ,  Hendrick Klaas Koerten ,  Jan Greve

Inventor： Clemens Antoni Van Blitterswijk ,  Hendrick Klaas Koerten ,  Jan Greve

IPC: G01N21/65 ,  H01J37/252 ,  H01J37/256 ,  H01J37/244

CPC classification number: H01J37/228 ,  G01N21/65 ,  H01J37/226 ,  H01J37/252 ,  H01J37/256 ,  G01N2021/656 ,  H01J2237/2445

Abstract: Electron microscope provided, in the direction of the longitudinal axis, with at least one electron beam generation system, a condenser and objective lens system, a specimen chamber with a specimen mount, a projection lens system with imaging screen for the purpose of transmission electron microscopy (TEM) and/or an electron detector for the purpose of scanning electron microscopy (SEM) . The microscope is used in combination with an externally positioned Raman spectrometer and an associated light source for injecting and extracting, via a window in the microscope wall, a light beam to be directed at the specimen, and specimen-related Raman radiation, respectively. In the specimen chamber, a light beam and Raman radiation guide system is provided with an optical guide to guide the light beam to--and the Raman radiation from--the specimen. The guide system and the specimen mount are displaceable with respect to one another for mutual alignment of the specimen and the optical axis of the Raman spectrometer.

Abstract translation: PCT No.PCT / NL95 / 00033 Sec。 371日期：1996年8月12日 102（e）日期1996年8月12日PCT提交1995年1月24日PCT公布。 公开号WO95 / 20242 日期1995年7月27日电子显微镜在纵向方向上提供至少一个电子束产生系统，冷凝器和物镜系统，具有样本座的样本室，具有成像屏幕的投影透镜系统 用于扫描电子显微镜（SEM）的透射电子显微镜（TEM）和/或电子检测器的目的。 显微镜与外部定位的拉曼光谱仪和相关联的光源结合使用，用于通过显微镜壁中的窗口分别注射和提取指向样品的光束和与样品相关的拉曼辐射。 在样本室中，光束和拉曼辐射导向系统设置有光引导件，以将光束引导到来自样本的拉曼辐射。 引导系统和样本支架可相对于彼此移位，以使样本与拉曼光谱仪的光轴相互对准。

公开(公告)号：US5747816A

公开(公告)日：1998-05-05

申请号：US670047

申请日：1996-06-25

Applicant: Toshiei Kurosaki

Inventor： Toshiei Kurosaki

IPC: H01J37/20 ,  H01J37/22 ,  H01J37/28 ,  H01L21/027

CPC classification number: H01J37/28 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/226 ,  H01J37/3174 ,  H01J2237/2826 ,  H01J2237/30433

Abstract: In a scanning electron microscope, a couple of fiducial patterns which are so laid out on the X-Y stage as to be separated with a distance equivalent to the distance between the optical axis of the optical microscope and the optical axis of the electronic optical system, the image signals of these patterns are captured by the image processing circuit, the position shift of the optical axis of the optical microscope and the position shift of the optical axis of the electronic optical system with respect to the fiducial patterns are obtained by numerical calculation, and then, this position shift is used as an offset value in the actual measurement by the scanning electron microscope, which leads to an accurate positioning.

Abstract translation: 在扫描电子显微镜中，将在XY台上布置的距离等于光学显微镜的光轴与电子光学系统的光轴之间的距离分开的两对基准图案， 这些图案的图像信号由图像处理电路捕获，通过数值计算获得光学显微镜的光轴的位置偏移和电子光学系统的光轴相对于基准图案的位置偏移，并且 那么该位置偏移被用作通过扫描电子显微镜的实际测量中的偏移值，这导致精确的定位。

公开(公告)号：US4447731A

公开(公告)日：1984-05-08

申请号：US327191

申请日：1981-12-03

Applicant: Asahiro Kuni ,  Yukio Kembo ,  Nobuyuki Akiyama ,  Nobuhiko Aoki

Inventor： Asahiro Kuni ,  Yukio Kembo ,  Nobuyuki Akiyama ,  Nobuhiko Aoki

IPC: G01B11/02 ,  G01B21/00 ,  G01Q20/02 ,  G01Q20/04 ,  G01Q30/02 ,  G01Q30/04 ,  H01J37/20 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/226 ,  H01J37/20

Abstract: An exterior view examination apparatus comprising a movable sample stage provided in a sample chamber of a scanning type electron microscope; a sample mounted on the stage; and an optical microscope which can observe the sample from an exterior of the chamber, mounted on the chamber in parallel with the scanning type electron microscope, the position of a surface part of the sample (mounted on the sample stage) to be observed, measured or analyzed being preliminary defined by the optical microscope, and the sample stage being moved by a certain amount thereby to bring the sample at the center of the visual field of the electron microscope.

Abstract translation: 一种外观检查装置，包括设置在扫描型电子显微镜的样品室中的可移动样品台; 样品安装在舞台上; 和可以与扫描型电子显微镜平行地安装在室上的室外观察样品的光学显微镜，测量样品表面部分（安装在样品台上）的位置，测量 或者通过光学显微镜进行初步定义，并且将样品台移动一定量，从而将样品置于电子显微镜的视野的中心。

公开(公告)号：US20240363306A1

公开(公告)日：2024-10-31

申请号：US18771126

申请日：2024-07-12

Applicant: Hitachi High-Tech Corporation

Inventor： Minami SHOUJI ,  Natsuki TSUNO ,  Hiroya OHTA ,  Daisuke BIZEN ,  Hajime KAWANO

IPC: H01J37/22 ,  H01J37/244

CPC classification number: H01J37/222 ,  H01J37/226 ,  H01J37/244

Abstract: An object of the invention is to provide a charged particle beam apparatus capable of acquiring an observation image having a high contrast in a sample whose light absorption characteristic depends on a light wavelength. The charged particle beam apparatus according to the invention irradiates the sample with light, generates an observation image of the sample, changes an irradiation intensity per unit time of the light, and then generates a plurality of the observation images having different contrasts.