公开(公告)号：US20240363306A1

公开(公告)日：2024-10-31

申请号：US18771126

申请日：2024-07-12

Applicant: Hitachi High-Tech Corporation

Inventor： Minami SHOUJI ,  Natsuki TSUNO ,  Hiroya OHTA ,  Daisuke BIZEN ,  Hajime KAWANO

IPC: H01J37/22 ,  H01J37/244

CPC classification number: H01J37/222 ,  H01J37/226 ,  H01J37/244

Abstract: An object of the invention is to provide a charged particle beam apparatus capable of acquiring an observation image having a high contrast in a sample whose light absorption characteristic depends on a light wavelength. The charged particle beam apparatus according to the invention irradiates the sample with light, generates an observation image of the sample, changes an irradiation intensity per unit time of the light, and then generates a plurality of the observation images having different contrasts.

公开(公告)号：US20240029994A1

公开(公告)日：2024-01-25

申请号：US18024797

申请日：2020-09-18

Applicant: Hitachi High-Tech Corporation

Inventor： Natsuki TSUNO ,  Yasuhiro SHIRASAKI ,  Minami SHOUJI ,  Daisuke BIZEN ,  Makoto SUZUKI ,  Satoshi TAKADA ,  Yohei NAKAMURA

IPC: H01J37/22 ,  H01J37/244

CPC classification number: H01J37/222 ,  H01J37/244 ,  H01J37/226 ,  H01J2237/2448

Abstract: This inspection system 100 comprises: an electron source 102 which irradiates a sample 200 with an inspection beam; a detector 105 which detects secondary electrons obtained by irradiating the sample 200 with the inspection beam and outputs a detection signal; a laser device 107 which emits an action laser that changes the amount of secondary electrons; an electron gun 106 which emits an action electron beam that changes the amount of secondary electrons; and a computer system 140 which generates an image of the sample 200 on the basis of the detection signal. The computer system 140 generates an inspection image I1 related to the emission of the inspection beam, acquires the dimensions and the like related to a pattern on the sample 200 on the basis of the inspection image I1, generates an inspection image I2 related to the emission of the action laser and the inspection beam, acquires the material characteristics related to the pattern on the basis of the inspection image I2, generates an inspection image I3 related to the emission of the action electron beam and the inspection beam, and acquires the electrical characteristics related to the pattern on the basis of the inspection image I3.

公开(公告)号：US20220059317A1

公开(公告)日：2022-02-24

申请号：US17274872

申请日：2018-09-11

Applicant: Hitachi High-Tech Corporation

Inventor： Minami SHOUJI ,  Natsuki TSUNO ,  Toshihide AGEMURA

IPC: H01J37/28 ,  H01J37/22 ,  H01J37/26 ,  H01J37/244

Abstract: An electron beam device obtains contrast reflecting an electronic state of a sample with high sensitivity. The device includes an electron optical system which emits an electron beam to a sample and detects electrons emitted from the sample; a light pulse emission system that emits a light pulse to the sample; a synchronization processing unit that samples the emitted electrons; an image signal processing unit which forms an image by a detection signal output based upon the emitted electrons detected by the electron optical system; and a device control unit for setting a control condition of the electron optical system. The device control unit sets a sampling frequency for detection sampling of the emitted electrons to be greater than a value obtained by dividing the number of emissions of the light pulse per unit pixel time by the unit pixel time.

公开(公告)号：US20210042900A1

公开(公告)日：2021-02-11

申请号：US16904309

申请日：2020-06-17

Applicant: Hitachi High-Tech Corporation

Inventor： Heita KIMIZUKA ,  Yohei NAKAMURA ,  Natsuki TSUNO ,  Muneyuki FUKUDA

IPC: G06T7/00

Abstract: An object of the present disclosure is to provide a system for deriving a type of a defect of a semiconductor element and a non-transitory computer-readable medium. The system receives, from the image acquisition tool, image data obtained by sequentially irradiating a plurality of patterns provided on the semiconductor wafer with a beam and extracts characteristics of the plurality of patterns sequentially irradiated with abeam from the received image data, the characteristics being included in the image data, or receives characteristics of the plurality of patterns sequentially irradiated with a beam from the image acquisition tool, the characteristics being extracted from the image data (Step 603), and derives (Step 605) a type of a defect by referring to (Step 604) related information for the characteristics of the plurality of patterns, the related information storing the characteristics of the plurality of patterns and types of defects in association with each other.

公开(公告)号：US20230274909A1

公开(公告)日：2023-08-31

申请号：US18019347

申请日：2020-09-28

Applicant: Hitachi High-Tech Corporation

Inventor： Minami SHOUJI ,  Yasuhiro SHIRASAKI ,  Natsuki TSUNO ,  Hirohiko KITSUKI ,  Hiroya OHTA

IPC: H01J37/28 ,  H01J37/22

CPC classification number: H01J37/28 ,  H01J37/222 ,  H01J37/226

Abstract: An object of the invention is to obtain an observation image in which a plurality of pieces of feature data of a sample are emphasized in a charged particle beam device that acquires an observation image of the sample by irradiating the sample with a charged particle beam and light. The charged particle beam device according to the invention calculates a sequence for modulating a light irradiation condition according to an irradiation condition of a charged particle beam, and controls the light irradiation condition according to the sequence (see FIG. 2).

公开(公告)号：US20230253180A1

公开(公告)日：2023-08-10

申请号：US18015605

申请日：2020-09-18

Applicant: Hitachi High-Tech Corporation

Inventor： Daisuke BIZEN ,  Natsuki TSUNO ,  Yasuhiro SHIRASAKI ,  Yohei NAKAMURA ,  Satoshi TAKADA

IPC: H01J37/28 ,  H01J37/20 ,  H01J37/244

CPC classification number: H01J37/28 ,  H01J37/20 ,  H01J37/244

Abstract: A charged particle optical system scans a sample with a pulsed charged particle beam and detects secondary charged particles; and a scan image is formed. Control is carried out so that a deflection signal for deflecting the charged particle beam in a first direction, a first timing for pulsed irradiation, a second timing for pulsed irradiation, and a third timing for detection of the secondary charged particles are synchronized. When the deflection amount of the charged particle beam in the time period of the first timing corresponds to the coordinates of n pixels in the scan image, the same line is scanned m times (m

公开(公告)号：US20210327048A1

公开(公告)日：2021-10-21

申请号：US17285368

申请日：2019-09-09

Applicant: Hitachi High-Tech Corporation

Inventor： Heita KIMIZUKA ,  Natsuki TSUNO ,  Muneyuki FUKUDA

IPC: G06T7/00 ,  G06K9/00 ,  G06T5/00 ,  G06T5/50 ,  G06K9/62 ,  H01J37/28 ,  H01J37/22

Abstract: The present disclosure hereinafter proposes a charged particle beam device and a method for adjusting a charged particle beam device which aim to appropriately set device conditions independently of a state of a sample. The present disclosure proposes a method and a system for adjusting contrast and brightness of an image, comprising: adjusting offset (step 112) of a signal processing device of the charged particle beam device so that the brightness of a pattern in an image obtained by scanning with a first charged particle beam (first intermittent condition beam) becomes a predetermined value; and adjusting a gain (step 114) of the signal processing device so that the brightness of a pattern in an image obtained by scanning with a second charged particle beam, which is a pulse beam (second intermittent condition beam) different from the first charged particle beam in at least one of irradiation time, irradiation distance, interval time between irradiation points, and distance between irradiation points, becomes a predetermined value.

公开(公告)号：US20240020816A1

公开(公告)日：2024-01-18

申请号：US18453405

申请日：2023-08-22

Applicant: Hitachi High-Tech Corporation

Inventor： Heita KIMIZUKA ,  Natsuki TSUNO

IPC: G06T7/00 ,  H01J37/28 ,  H01J37/22

CPC classification number: G06T7/0004 ,  H01J37/28 ,  H01J37/222 ,  H01J2237/24578 ,  G06T2207/20081 ,  G06T2207/30148 ,  G06T2207/10061

Abstract: A system is provided in which electrical characteristics of an element formed on a sample can be evaluated. In order to achieve the above-described object, disclosed is a system including: an image acquisition tool; and a computer system that includes one or more processors and is configured to be communicable with the image acquisition tool, in which electrical characteristic are derived by receiving information regarding two or more characteristics of a specific pattern that is included in a plurality of images acquired from the image acquisition tool under at least two different image acquisition conditions and by referring to, for the information, relation information between information regarding two or more characteristics and electrical characteristics of an element formed on a sample, the characteristics being extracted from at least two pieces of image data acquired from the image acquisition tool under at least two image acquisition conditions.

公开(公告)号：US20210027981A1

公开(公告)日：2021-01-28

申请号：US17040141

申请日：2018-04-25

Applicant: Hitachi High-Tech Corporation

Inventor： Heita KIMIZUKA ,  Natsuki TSUNO ,  Muneyuki FUKUDA ,  Katsura TAKAGUCHI

IPC: H01J37/22 ,  H01J37/28 ,  H01J37/147 ,  H01J37/244

Abstract: The purpose of the present disclosure is to propose a charged particle beam device capable of allowing specifying of a distance between irradiation points for a pulsed beam and a time between irradiation points. Proposed is a charged particle beam device equipped with a beam column which has a scanning deflector for sweeping a beam and directs the beam swept by the scanning deflector onto a sample in pulses, wherein: the distance between irradiation points of the pulsed beam is set such that feature quantities of one or more specific regions of an image obtained on the basis of an output of a detector satisfy a predetermined state; the duration of time between irradiation points for the pulsed beam is changed when in a state in which the set distance between irradiation points is set or in a state in which multiple distances between irradiation points determined on the basis of the specified distance between irradiation points are set; and the beam emission is carried out according to the duration of time between irradiation points whereby the feature quantities of the multiple specific regions of the image obtained on the basis of the output of the detector satisfy the predetermined state.

公开(公告)号：US20240177964A1

公开(公告)日：2024-05-30

申请号：US18283499

申请日：2021-03-26

Applicant: Hitachi High-Tech Corporation

Inventor： Heita KIMIZUKA ,  Natsuki TSUNO ,  Yasuhiro SHIRASAKI ,  Minami UCHIHO

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/228 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2448 ,  H01J2237/2809

Abstract: An object of the present disclosure is to provide a charged particle beam system capable of obtaining information about a sample by using a feature amount on an observed image caused by light interference, light diffraction, light standing waves, and the like caused by irradiating a sample with light, and the like. In the charged particle beam system according to the present disclosure, a first feature amount resulting from the light interference, the light diffraction, or the light standing wave generated by irradiating the sample with light is extracted from the observed image of the sample, and a second feature amount of the sample is obtained by using the first feature amount (see FIG. 6).