公开(公告)号：US10955757B2

公开(公告)日：2021-03-23

申请号：US16531220

申请日：2019-08-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Ten Kate ,  Raymond Wilhelmus Louis Lafarre

IPC: G03F7/20

Abstract: A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.

公开(公告)号：US10898955B2

公开(公告)日：2021-01-26

申请号：US16369368

申请日：2019-03-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade ,  Elisabeth Corinne Rodenburg

IPC: G03F7/20 ,  B22F7/06 ,  B23K26/354 ,  B23K26/342 ,  B23Q3/18 ,  B05D3/06 ,  B05D5/00 ,  B33Y10/00 ,  B33Y80/00 ,  B22F3/105

Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burs to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.

公开(公告)号：US10747127B2

公开(公告)日：2020-08-18

申请号：US16326948

申请日：2017-08-11

Applicant: ASML Netherlands B.V.

Inventor： Frits Van Der Meulen ,  Erik Johan Arlemark ,  Hendrikus Herman Marie Cox ,  Martinus Agnes Willem Cuijpers ,  Joost De Hoogh ,  Gosse Charles De Vries ,  Paul Comé Henri De Wit ,  Sander Catharina Reinier Derks ,  Ronald Cornelis Gerardus Gijzen ,  Dries Vaast Paul Hemschoote ,  Christiaan Alexander Hoogendam ,  Adrianus Hendrik Koevoets ,  Raymond Wilhelmus Louis Lafarre ,  Alain Louis Claude Leroux ,  Patrick Willem Paul Limpens ,  Jim Vincent Overkamp ,  Christiaan Louis Valentin ,  Koos Van Berkel ,  Stan Henricus Van Der Meulen ,  Jacobus Cornelis Gerardus Van Der Sanden ,  Harmen Klaas Van Der Schoot ,  David Ferdinand Vles ,  Evert Auke Rinze Westerhuis

IPC: G03F7/20

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

公开(公告)号：US10481502B2

公开(公告)日：2019-11-19

申请号：US15918478

申请日：2018-03-12

Applicant: ASML Netherlands B.V.

Inventor： Thibault Simon Mathieu Laurent ,  Johannes Henricus Wilhelmus Jacobs ,  Wilhelmus Franciscus Johannes Simons ,  Martijn Houben ,  Raymond Wilhelmus Louis Lafarre ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Rogier Hendrikus Magdalena Cortie ,  Ruud Hendrikus Martinus Johannes Bloks ,  Gerben Pieterse ,  Siegfried Alexander Tromp ,  Theodorus Wilhelmus Polet ,  Jim Vincent Overkamp ,  Van Vuong Vy

IPC: G03F7/20 ,  H01L21/68

Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

公开(公告)号：US10324383B2

公开(公告)日：2019-06-18

申请号：US15764594

申请日：2016-10-05

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Adrianus Hendrik Koevoets ,  Michael Leo Nelson ,  Jacobus Cornelius Gerardus Van Der Sanden ,  Geoffrey O'Connor ,  Michael Andrew Chieda ,  Tammo Uitterdijk

IPC: G03F7/20 ,  H01L21/683 ,  H01L21/67

Abstract: A lithographic apparatus includes a clamp (406) configured to receive an object (402). The clamp defines at least one channel (408) configured to pass a fluid at a first fluid temperature. The lithographic apparatus also includes a chuck (404) coupled to the clamp. The chuck (404) defines at least one void (464) configured to thermally insulate the chuck from the clamp.

公开(公告)号：US10245641B2

公开(公告)日：2019-04-02

申请号：US15261553

申请日：2016-09-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade ,  Elisabeth Corinne Rodenburg

IPC: B22F7/06 ,  B23K26/354 ,  G03F7/20 ,  B23Q3/18 ,  B05D3/06 ,  B05D5/00 ,  B23K26/342 ,  B33Y10/00 ,  B33Y80/00 ,  B22F3/105

Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.

公开(公告)号：US10203612B2

公开(公告)日：2019-02-12

申请号：US15344994

申请日：2016-11-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Takeshi Kaneko ,  Joost Jeroen Ottens ,  Raymond Wilhelmus Louis Lafarre

IPC: G03B27/58 ,  G03F7/20

Abstract: A table for a lithographic apparatus, the table having an encoder plate located on the table, a gap between the encoder plate and a top surface of the table, the gap located radially inward of the encoder plate relative to the periphery of the table, and a fluid extraction system with an opening in the surface of the gap to extract liquid from the gap.

公开(公告)号：US10018924B2

公开(公告)日：2018-07-10

申请号：US15014829

申请日：2016-02-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade ,  Siegfried Alexander Tromp ,  Jacobus Josephus Leijssen ,  Elisabeth Corinne Rodenburg ,  Maurice Wilhelmus Leonardus Hendricus Feijts ,  Hendrik Huisman

IPC: G03B27/58 ,  G03F7/20 ,  G01J5/20 ,  G01J5/02 ,  B05D3/02

CPC classification number: G03F7/70716 ,  B05D3/02 ,  G01J5/0285 ,  G01J5/20 ,  G03F7/70341 ,  G03F7/70708

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The thin film stack comprises an (optional) isolation layer, a metal layer forming an electrode, a sensor, a heater, a transistor or a logic device, and a top isolation layer.

公开(公告)号：US20180074411A1

公开(公告)日：2018-03-15

申请号：US15818232

申请日：2017-11-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Thibault Simon Mathieu Laurent ,  Gerardus Adrianus Antonius Maria Kusters ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Raymond Wilhelmus Louis Lafarre ,  Koen Steffens ,  Takeshi Kaneko ,  Robbert Jan Voogd ,  Gregory Martin Mason Corcoran ,  Ruud Henrikus Martinus Johannes Bloks ,  Johan Gertrudis Cornelis Kunnen ,  Ramin Badie

IPC: G03F7/20

CPC classification number: G03F7/70483 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70875

Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

公开(公告)号：US09829803B2

公开(公告)日：2017-11-28

申请号：US15131986

申请日：2016-04-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade ,  Elisabeth Corinne Rodenburg ,  Peter Van Delft

IPC: G03F7/20 ,  B05D1/00

CPC classification number: G03F7/70716 ,  B05D1/005 ,  G03F7/70341 ,  G03F7/70691 ,  G03F7/707

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The planarization layer is of substantially uniform thickness and/or its outer surface has a peak to valley distance of less than 10 μm. The planarization layer may be formed by applying two solutions of different concentration. A surface treatment may be applied to the burls to repel a solution of the planarization layer material.