公开(公告)号：USRE49066E1

公开(公告)日：2022-05-10

申请号：US16804549

申请日：2020-02-28

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Adrianus Hendrik Koevoets ,  Michael Leo Nelson ,  Jacobus Cornelis Gerardus Van Der Sanden ,  Geoffrey O'Connor ,  Michael Andrew Chieda ,  Tammo Uitterdijk

IPC: G03F7/20 ,  H01L21/683 ,  H01L21/67

Abstract: A lithographic apparatus includes a clamp (406) configured to receive an object (402). The clamp defines at least one channel (408) configured to pass a fluid at a first fluid temperature. The lithographic apparatus also includes a chuck (404) coupled to the clamp. The chuck (404) defines at least one void (464) configured to thermally insulate the chuck from the clamp.

公开(公告)号：US10324383B2

公开(公告)日：2019-06-18

申请号：US15764594

申请日：2016-10-05

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Adrianus Hendrik Koevoets ,  Michael Leo Nelson ,  Jacobus Cornelius Gerardus Van Der Sanden ,  Geoffrey O'Connor ,  Michael Andrew Chieda ,  Tammo Uitterdijk

IPC: G03F7/20 ,  H01L21/683 ,  H01L21/67

Abstract: A lithographic apparatus includes a clamp (406) configured to receive an object (402). The clamp defines at least one channel (408) configured to pass a fluid at a first fluid temperature. The lithographic apparatus also includes a chuck (404) coupled to the clamp. The chuck (404) defines at least one void (464) configured to thermally insulate the chuck from the clamp.