公开(公告)号：US20230207253A1

公开(公告)日：2023-06-29

申请号：US18088497

申请日：2022-12-23

Applicant: ASML Netherlands B.V.

Inventor： Marco Jan-Jaco WIELAND

IPC: H01J37/153 ,  H01J37/28 ,  H01J37/10

CPC classification number: H01J37/153 ,  H01J37/28 ,  H01J37/10

Abstract: Electron-optical devices and associated methods are disclosed. In one arrangement, an electron-optical device projects a multi-beam of sub-beams of charged particles to a sample. A plurality of plates are provided in which are defined respective aperture arrays. The plates comprise an objective lens array configured to project the sub-beams towards the sample. The aperture arrays defined in at least two of the plates each have a geometrical characteristic configured to apply a perturbation to a corresponding target property of the sub-beams. A controller controls potentials applied to the plates having the geometrical characteristics such that the applied perturbations together substantially compensate for a variation in the target property over a range of a parameter of the device.

公开(公告)号：US20230046682A1

公开(公告)日：2023-02-16

申请号：US17886348

申请日：2022-08-11

Applicant: ASML Netherlands B.V.

Inventor： Fuming WANG ,  Marco Jan-Jaco WIELAND ,  Yu CAO ,  Guohong ZHANG

IPC: G03F1/86 ,  G03F7/20

Abstract: An improved methods and systems for detecting defect(s) on a mask are disclosed. An improved method comprises inspecting an exposed wafer after the wafer was exposed, by a lithography system using a mask, with a selected process condition that is determined based on a mask defect printability under the selected process condition; and identifying, based on the inspection, a wafer defect that is caused by a defect on the mask to enable identification of the defect on the mask.

公开(公告)号：US20230023939A1

公开(公告)日：2023-01-26

申请号：US17869550

申请日：2022-07-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Vincent Sylvester KUIPER ,  Marija TRAJANOSKA ,  Marco Jan-Jaco WIELAND

IPC: G03F7/20 ,  G06T7/00

Abstract: A data processing device for detecting defects in sample image data generated by a charged particle assessment system, the device comprising: a first processing module configured to receive a sample image datastream from the charged particle assessment system, the sample image datastream comprising an ordered series of data points representing an image of the sample, and to apply a first defect detection test to select a subset of the sample image datastream as first selected data, wherein the first defect detection test is a localised test which is performed in parallel with receipt of the sample image datastream; and a second processing module configured to receive the first selected data and to apply a second defect detection test to select a subset of the first selected data as second selected data.

公开(公告)号：US20220415611A1

公开(公告)日：2022-12-29

申请号：US17778036

申请日：2020-11-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Stijn Wilem Herman Karel STEENBRINK ,  Marco Jan-Jaco WIELAND ,  Albertus Victor Gerardus MANGNUS

IPC: H01J37/317 ,  H01J37/28 ,  H01J37/141 ,  H01J37/147

Abstract: A multi-source illumination apparatus for illuminating a sample with charged particles, wherein beams, from a plurality of sources, are arranged such that a beam from at least one source intersects, at a plane of a condenser lens, with at least part of one other beam from a different one of the plurality of sources. The condenser lens is configured to separately collimate the received beams from each source. A manipulator array arrangement is configured to manipulate the collimated beams to generate one or more beams, in a single column, that include charged particles from the plurality of sources. The manipulator array arrangement includes a multi-beam generator configured to receive the plurality of substantially parallel substantially collimated beams generated by the deflector array, and generate a multibeam in dependence on the received plurality of substantially parallel substantially collimated beams, wherein the multi-beam includes a plurality of substantially collimated sub-beams.

公开(公告)号：US20220196581A1

公开(公告)日：2022-06-23

申请号：US17559950

申请日：2021-12-22

Applicant: ASML Netherlands B.V.

Inventor： Marco Jan-Jaco WIELAND ,  Albertus Victor Gerardus MANGNUS

IPC: G01N23/2251 ,  H01J37/244 ,  H01J37/10 ,  G01N23/203

Abstract: The embodiments of the present disclosure provide various techniques for detecting backscatter charged particles, including accelerating charged particle sub-beams along sub-beam paths to a sample, repelling secondary charged particles from detector arrays, and providing devices and detectors which can switch between modes for primarily detecting charged particles and modes for primarily detecting secondary particles.