公开(公告)号：US20130313429A1

公开(公告)日：2013-11-28

申请号：US13954425

申请日：2013-07-30

Applicant: Nobuharu Noji ,  Yoshihiko Naito ,  Hirosi Sobukawa ,  Kenji Terao ,  Masahiro Hatakeyama ,  Katsuya Okumura

Inventor： Nobuharu Noji ,  Yoshihiko Naito ,  Hirosi Sobukawa ,  Kenji Terao ,  Masahiro Hatakeyama ,  Katsuya Okumura

IPC: H01J37/26

CPC classification number: H01J37/265 ,  G01R31/307 ,  H01J37/04 ,  H01J2237/2441 ,  H01J2237/2446 ,  H01J2237/2594 ,  H01J2237/2817

Abstract: Provided is a method and an apparatus for inspecting a sample surface with high accuracy. Provided is a method for inspecting a sample surface by using an electron beam method sample surface inspection apparatus, in which an electron beam generated by an electron gun of the electron beam method sample surface inspection apparatus is irradiated onto the sample surface, and secondary electrons emanating from the sample surface are formed into an image toward an electron detection plane of a detector for inspecting the sample surface, the method characterized in that a condition for forming the secondary electrons into an image on a detection plane of the detector is controlled such that a potential in the sample surface varies in dependence on an amount of the electron beam irradiated onto the sample surface.

公开(公告)号：US20130292566A1

公开(公告)日：2013-11-07

申请号：US13864600

申请日：2013-04-17

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Gerd Benner

IPC: H01J37/244

CPC classification number: H01J37/244 ,  H01J37/04 ,  H01J37/26 ,  H01J2237/0492

Abstract: A transmission electron microscopy system comprises: an illumination system (2), an objective lens system (13), a first projection system (21) imaging the diffraction plane (15) objective lens system into a first intermediate diffraction plane (25), a second projection system (41) imaging the first intermediate diffraction plane into a second intermediate diffraction plane (43), a first aperture (27) located in the first intermediate diffraction plane and having a central opening of a first radius (r1), and a bright field detector (45) located in the second intermediate diffraction plane and having a detection surface defined by an inner edge (49) of a second radius (r2), wherein the first radius and the second radius define a maximum angle and a minimum angle, respectively, relative to the optical axis of directions of bright field electrons traversing the sample plane and detectable by the bright field detector.

Abstract translation: 透射电子显微镜系统包括：照明系统（2），物镜系统（13），将衍射平面（15）物镜系统成像为第一中间衍射平面（25）的第一投影系统（21）， 将第一中间衍射平面成像为第二中间衍射平面（43）的第二投影系统（41），位于第一中间衍射平面中并具有第一半径（r1）的中心开口的第一孔（27） 位于第二中间衍射平面中并具有由第二半径（r2）的内边缘（49）限定的检测表面的明场检测器（45），其中第一半径和第二半径限定最大角度和最小角度 分别相对于穿过样品平面并由亮场检测器检测的亮场电子的方向的光轴。

公开(公告)号：US20130206987A1

公开(公告)日：2013-08-15

申请号：US13757939

申请日：2013-02-04

Applicant: JEOL LTD.

Inventor： Kazuya Omoto

IPC: H01J37/10 ,  H01J37/153 ,  H01J37/05

CPC classification number: H01J37/10 ,  H01J37/04 ,  H01J37/05 ,  H01J37/153 ,  H01J37/26 ,  H01J2237/0492 ,  H01J2237/057 ,  H01J2237/1532

Abstract: A transmission electron microscope (100) includes an electron beam source (2), an illumination lens (10), an objective lens (20), an intermediate lens system (30), a pair of transfer lenses (40) located behind the intermediate lens system (30), and an energy filter (60) for separating the electrons of the beam L transmitted through the specimen (S) according to energy. The transfer lenses (40) transfer the first image to the entrance crossover plane (S1) of the energy filter (60) and to transfer the second image to the entrance image plane (A1) of the filter (60). An image plane (A3) is formed between the first transfer lens (40a) and the second transfer lens (40b).

Abstract translation: 透射电子显微镜（100）包括电子束源（2），照明透镜（10），物镜（20），中间透镜系统（30），位于中间的后面的一对转印透镜 透镜系统（30）和能量过滤器（60），用于根据能量分离透过样本（S）的光束L的电子。 传送透镜（40）将第一图像传送到能量过滤器（60）的入口交叉平面（S1），并将第二图像传送到过滤器（60）的入射图像平面（A1）。 在第一转印透镜（40a）和第二转印透镜（40b）之间形成像平面（A3）。

公开(公告)号：US08309935B2

公开(公告)日：2012-11-13

申请号：US12418053

申请日：2009-04-03

Applicant: Frank Sinclair ,  Svetlana B. Radovanov ,  Kenneth H. Purser

Inventor： Frank Sinclair ,  Svetlana B. Radovanov ,  Kenneth H. Purser

IPC: H01J3/14

CPC classification number: H01J37/3171 ,  H01J37/04 ,  H01J2237/036 ,  H01J2237/15

Abstract: An ion implantation system includes an electrostatic lens. The electrostatic lens includes a terminal electrode, a ground electrode and a suppression electrode disposed therebetween. An ion beam enters the electrostatic lens through the terminal electrode and exits through the ground electrode. The electrodes have associated electrostatic equipotentials. An end plate is disposed between a top and bottom portion of the suppression electrode and/or the top and bottom portion of the ground electrode. The respective end plate has a shape which corresponds to the electrostatic equipotential associated with the particular electrode in order to maintain uniformity of the beam as it passes through the electrostatic lens.

Abstract translation: 离子注入系统包括静电透镜。 静电透镜包括端子电极，接地电极和设置在它们之间的抑制电极。 离子束通过端子电极进入静电透镜并通过接地电极离开。 电极具有相关的静电等电位。 端板设置在抑制电极的顶部和底部之间和/或接地电极的顶部和底部之间。 相应的端板具有对应于与特定电极相关联的静电等电位的形状，以便在光束通过静电透镜时保持光束的均匀性。

公开(公告)号：US20120217393A1

公开(公告)日：2012-08-30

申请号：US13505951

申请日：2010-11-01

Applicant: Nobuhiro Okai ,  Yasunari Sohda

Inventor： Nobuhiro Okai ,  Yasunari Sohda

IPC: H01J37/26

CPC classification number: H01J37/04 ,  H01J37/026 ,  H01J37/14 ,  H01J37/145 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/0044 ,  H01J2237/121 ,  H01J2237/153

Abstract: A scanning electron microscope suppresses a beam drift by reducing charging on a sample surface while suppressing resolution degradation upon observation of an insulator sample. An electron microscope includes an electron source and an objective lens that focuses an electron beam emitted from the electron source, which provides an image using a secondary signal generated from the sample irradiated with the electron beam. A magnetic body with a continuous structure and an inside diameter larger than an inside diameter of an upper pole piece that forms the objective lens is provided between the objective lens and the sample.

Abstract translation: 扫描电子显微镜通过减少对样品表面的充电而抑制光束偏移，同时在观察绝缘体样品时抑制分辨率劣化。 电子显微镜包括电子源和物镜，其聚焦从电子源发射的电子束，其使用从照射电子束的样品产生的二次信号来提供图像。 在物镜和样品之间设置具有连续结构且内径大于形成物镜的上极片的内径的磁体。

公开(公告)号：US20120211654A1

公开(公告)日：2012-08-23

申请号：US13505517

申请日：2010-11-12

Applicant: Toru Iwaya ,  Sakae Kobori ,  Tomohisa Ohtaki ,  Haruhiko Hatano

Inventor： Toru Iwaya ,  Sakae Kobori ,  Tomohisa Ohtaki ,  Haruhiko Hatano

IPC: H01J37/26

CPC classification number: H01J37/143 ,  H01J37/04 ,  H01J37/141 ,  H01J37/26 ,  H01J37/28

Abstract: There is provided a scanning electron microscope capable of achieving a size reduction of the device while at the same time suppressing the increase in column temperature as well as maintaining performance, e.g., resolution, etc. With respect to a scanning electron microscope for observing a sample by irradiating the sample with an electron beam emitted from an electron source and focused by condenser lenses, and detecting secondary electrons from the sample, the condenser lenses comprise both an electromagnetic coil-type condenser lens and a permanent magnet-type condenser lens.

Abstract translation: 提供了能够实现装置的尺寸减小同时抑制柱温增加以及维持性能（例如分辨率等）的扫描电子显微镜。关于用于观察样品的扫描电子显微镜 通过从电子源发射并由聚光透镜聚焦的电子束照射样品，并且从样品检测二次电子，聚光透镜包括电磁线圈型聚光透镜和永磁体型聚光透镜。

公开(公告)号：US08187414B2

公开(公告)日：2012-05-29

申请号：US12409984

申请日：2009-03-24

Applicant: Randall Hardin ,  John Keihl ,  Duane Lytle

Inventor： Randall Hardin ,  John Keihl ,  Duane Lytle

IPC: C23C16/00 ,  H01L21/306 ,  C23F1/00

CPC classification number: H01J37/04 ,  C23C16/4401 ,  C23C16/45565 ,  H01J37/3255 ,  H01J37/32605 ,  H01J37/32724 ,  H01J2237/032

Abstract: A silicon-based showerhead electrode is provided where backside inserts are positioned in backside recesses formed along the backside of the electrode. The backside inserts comprise a threaded outside diameter, a threaded inside diameter, and a tool engaging portion formed in the threaded inside diameter. The tool engaging portion is formed such that the backside insert further comprises one or more lateral shielding portions between the tool engaging portion and the threaded outside diameter to prevent a tool engaged with the tool engaging portion of the backside insert from extending beyond the threaded outside diameter of the insert. Further, the tool engaging portion of the backside insert comprises a plurality of torque-receiving slots arranged about the axis of rotation of the backside insert. The torque-receiving slots are arranged to avoid on-axis rotation of the backside insert via opposing pairs of torque receiving slots.

Abstract translation: 提供硅基喷头电极，其中后侧插入件位于沿着电极的背面形成的背面凹部中。 后侧插入件包括螺纹外径，螺纹内径和形成为螺纹内径的工具接合部分。 工具接合部分形成为使得后侧插入件还包括在工具接合部分和螺纹外径之间的一个或多个横向遮蔽部分，以防止与后侧插入件的工具接合部分接合的工具延伸超出螺纹外径 的插入。 此外，后侧插入件的工具接合部分包括围绕后侧插入件的旋转轴线布置的多个扭矩接收槽。 扭矩接收槽布置成避免背面插入件经由相对的扭矩接收槽对的轴向旋转。

公开(公告)号：US20120104252A1

公开(公告)日：2012-05-03

申请号：US13342017

申请日：2011-12-31

Applicant: Rainer KNIPPELMEYER ,  Oliver KIENZLE ,  Thomas KEMEN ,  Heiko MUELLER ,  Stephan UHLEMANN ,  Maximilian HAIDER ,  Antonio CASARES ,  Steven ROGERS

Inventor： Rainer KNIPPELMEYER ,  Oliver KIENZLE ,  Thomas KEMEN ,  Heiko MUELLER ,  Stephan UHLEMANN ,  Maximilian HAIDER ,  Antonio CASARES ,  Steven ROGERS

IPC: H01J37/28 ,  H01J1/50 ,  H01J3/14

CPC classification number: H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/10 ,  H01J37/14 ,  H01J37/153 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/06 ,  H01J2237/14 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.

Abstract translation: 粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成 在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。

公开(公告)号：US08152954B2

公开(公告)日：2012-04-10

申请号：US11871586

申请日：2007-10-12

Applicant: Greg Bettencourt ,  Raj Dhindsa ,  George Diercks ,  Randall A. Hardin ,  Jon Keihl ,  Duane Lytle ,  Alexei Marakhtanov ,  Roger Patrick ,  John Pegg ,  Shannon Spencer

Inventor： Greg Bettencourt ,  Raj Dhindsa ,  George Diercks ,  Randall A. Hardin ,  Jon Keihl ,  Duane Lytle ,  Alexei Marakhtanov ,  Roger Patrick ,  John Pegg ,  Shannon Spencer

IPC: C23F1/00 ,  H01L21/306

CPC classification number: H01J37/04 ,  C23C16/4401 ,  C23C16/45565 ,  H01J37/3255 ,  H01J37/32605 ,  H01J37/32724 ,  H01J2237/032

Abstract: The present invention relates generally to plasma processing and, more particularly, to plasma processing chambers and electrode assemblies used therein. According to one embodiment of the present invention, an electrode assembly is provided comprising a thermal control plate, a silicon-based showerhead electrode, and securing hardware, wherein the silicon-based showerhead electrode comprises a plurality of partial recesses formed in the backside of the silicon-based showerhead electrode and backside inserts positioned in the partial recesses. The thermal control plate comprises securing hardware passages configured to permit securing hardware to access the backside inserts. The securing hardware and the backside inserts are configured to maintain engagement of the thermal control plate and the silicon-based showerhead electrode and to permit disengagement of the thermal control plate and the silicon-based showerhead electrode while isolating the silicon-based electrode material of the silicon-based showerhead electrode from frictional contact with the securing hardware during disengagement.

Abstract translation: 本发明一般涉及等离子体处理，更具体地，涉及其中使用的等离子体处理室和电极组件。 根据本发明的一个实施例，提供一种电极组件，其包括热控制板，硅基喷头电极和固定硬件，其中硅基喷头电极包括多个部分凹部，其形成在 硅基喷头电极和位于部分凹部中的背面插入件。 热控制板包括固定硬件通道，其配置成允许固定硬件以接近背面插入件。 固定硬件和背面插入件被配置为保持热控制板和硅基喷头电极的接合，并且允许热控制板和硅基喷头电极分离，同时隔离硅基电极材料的硅基电极材料 硅基喷头电极在分离时与固定硬件摩擦接触。

公开(公告)号：US20120025741A1

公开(公告)日：2012-02-02

申请号：US13268193

申请日：2011-10-07

Applicant: Hiroshi MORITA ,  Ryozo Takeuchi ,  Toshiyuki Yokosuka

Inventor： Hiroshi MORITA ,  Ryozo Takeuchi ,  Toshiyuki Yokosuka

IPC: H05H7/00

CPC classification number: H05H7/00 ,  H01J37/026 ,  H01J37/04 ,  H01J2237/004 ,  H01J2237/0203 ,  H01J2237/04735

Abstract: In a charged particle accelerator, voltage of several tens of kV is applied between accelerating electrodes. In such a case, electric discharge is sometimes generated between the accelerating electrodes. In the charged particle accelerator, part or entirety of the accelerating electrodes is coated with an electric discharge suppressing layer made of ceramics or alloy having a high melting point as compared with metal. When impurity fine particles are accelerated by an electric field and collide with the electrodes, the electric discharge suppressing layer made of ceramics or alloy prevents metal vapor from being easily generated from the electrodes and an ionized plasma from being easily produced, thus suppressing electric discharge between the electrodes.

Abstract translation: 在带电粒子加速器中，在加速电极之间施加几十kV的电压。 在这种情况下，有时会在加速电极之间产生放电。 在带电粒子加速器中，加速电极的一部分或全部涂覆有与金属相比具有高熔点的陶瓷或合金制成的放电抑制层。 当杂质微粒被电场加速并与电极碰撞时，由陶瓷或合金制成的放电抑制层防止金属蒸气容易地从电极产生，并且电离等离子体容易产生，从而抑制 电极。