Invention Grant
US08187414B2 Anchoring inserts, electrode assemblies, and plasma processing chambers
有权
锚固插件,电极组件和等离子体处理室
- Patent Title: Anchoring inserts, electrode assemblies, and plasma processing chambers
- Patent Title (中): 锚固插件,电极组件和等离子体处理室
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Application No.: US12409984Application Date: 2009-03-24
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Publication No.: US08187414B2Publication Date: 2012-05-29
- Inventor: Randall Hardin , John Keihl , Duane Lytle
- Applicant: Randall Hardin , John Keihl , Duane Lytle
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Dinsmore & Shohl LLP
- Main IPC: C23C16/00
- IPC: C23C16/00 ; H01L21/306 ; C23F1/00

Abstract:
A silicon-based showerhead electrode is provided where backside inserts are positioned in backside recesses formed along the backside of the electrode. The backside inserts comprise a threaded outside diameter, a threaded inside diameter, and a tool engaging portion formed in the threaded inside diameter. The tool engaging portion is formed such that the backside insert further comprises one or more lateral shielding portions between the tool engaging portion and the threaded outside diameter to prevent a tool engaged with the tool engaging portion of the backside insert from extending beyond the threaded outside diameter of the insert. Further, the tool engaging portion of the backside insert comprises a plurality of torque-receiving slots arranged about the axis of rotation of the backside insert. The torque-receiving slots are arranged to avoid on-axis rotation of the backside insert via opposing pairs of torque receiving slots.
Public/Granted literature
- US20100038033A1 ANCHORING INSERTS, ELECTRODE ASSEMBLIES, AND PLASMA PROCESSING CHAMBERS Public/Granted day:2010-02-18
Information query
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