Semiconductor device with cell region, method of generating layout diagram and system for same

    公开(公告)号:US11568125B2

    公开(公告)日:2023-01-31

    申请号:US17212775

    申请日:2021-03-25

    Abstract: A semiconductor device including: first, second and third active regions a first gate structure over the first active region and a first part of the second active region; a second gate structure over the third active region and a second part of the second active region; a first cell region including the first gate structure, the first active region and the first part of the second active region; a second cell region including the second gate structure, the third active region and the second part of the second active region; a first border region representing an overlap of the first and second cell regions which is substantially aligned with an approximate midline of the second active region; the second gate structure overlapping the first border region; and there being a first gap which is between the first gate structure and the first border region.

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