Method for forming a pattern on a semiconductor device and semiconductor device resulting from the same
    24.
    发明授权
    Method for forming a pattern on a semiconductor device and semiconductor device resulting from the same 失效
    在半导体器件上形成图案的方法和由其制成的半导体器件

    公开(公告)号:US07510979B2

    公开(公告)日:2009-03-31

    申请号:US11770503

    申请日:2007-06-28

    摘要: Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused light reflection of bottom film layer or substrate and reduce standing waves caused by a variation of thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF among processes for manufacturing semiconductor devices, and its preparation method. Also, the present invention discloses an organic anti-reflective coating composition comprising a light absorbent agent polymer for the organic anti-reflective coating and a pattern formation process using the coating composition.

    摘要翻译: 公开了一种用于有机抗反射涂层的光吸收剂聚合物,其可以防止底部薄膜层或基底的扩散光反射,并减少由光致抗蚀剂本身的厚度变化引起的驻波,从而提高光致抗蚀剂图案的均匀性, 其制造半导体装置的制造方法中使用193nm的ArF,形成用于光刻的光刻胶的超微细图案的方法及其制备方法。 此外,本发明公开了一种有机抗反射涂层组合物,其包含用于有机抗反射涂层的光吸收剂聚合物和使用该涂料组合物的图案形成方法。

    Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same
    25.
    发明授权
    Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same 失效
    用于有机抗反射涂层的光吸收剂聚合物,其制备方法和包含其的有机抗反射涂料组合物

    公开(公告)号:US07285370B2

    公开(公告)日:2007-10-23

    申请号:US10963129

    申请日:2004-10-12

    IPC分类号: C03C1/825 C08F122/04

    摘要: Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused light reflection of bottom film layer or substrate and reduce standing waves caused by a variation of thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF among processes for manufacturing semiconductor devices, and its preparation method. Also, the present invention discloses an organic anti-reflective coating composition comprising a light absorbent agent polymer for the organic anti-reflective coating and a pattern formation process using the coating composition.

    摘要翻译: 公开了一种用于有机抗反射涂层的光吸收剂聚合物,其可以防止底部薄膜层或基底的扩散光反射,并减少由光致抗蚀剂本身的厚度变化引起的驻波,从而提高光致抗蚀剂图案的均匀性, 其制造半导体装置的制造方法中使用193nm的ArF,形成用于光刻的光刻胶的超微细图案的方法及其制备方法。 此外,本发明公开了一种有机抗反射涂层组合物,其包含用于有机抗反射涂层的光吸收剂聚合物和使用该涂料组合物的图案形成方法。

    Process for forming latex polymers
    26.
    发明申请
    Process for forming latex polymers 失效
    形成胶乳聚合物的方法

    公开(公告)号:US20030045609A1

    公开(公告)日:2003-03-06

    申请号:US10118586

    申请日:2002-04-08

    IPC分类号: C08K003/00 C09D005/00

    摘要: A process for synthesizing copolymers of ethylenically unsaturated monomers with ethylenically unsaturated derivatives of fatty acids and/or oils via emulsion polymerization techniques is performed in two stages. One or more suitable ethylenically unsaturated monomers are polymerized in the first stage of an emulsion polymerization. The ethylenically unsaturated derivatives of fatty acids and/or oils are blended with other monomers and polymerized in a second stage of the polymerization reaction. A suitable surfactant is added to the polymerization mixture to facilitate formation of the emulsion. In a preferred embodiment, the surfactant is a hybrid surfactant, i.e., one having both anionic and non-ionic characteristics.

    摘要翻译: 通过乳液聚合技术合成烯属不饱和单体与脂肪酸和/或油的烯属不饱和衍生物的共聚物的方法分两个阶段进行。 在乳液聚合的第一阶段聚合一种或多种合适的烯属不饱和单体。 将脂肪酸和/或油的烯键式不饱和衍生物与其它单体混合并在聚合反应的第二阶段进行聚合。 将合适的表面活性剂加入到聚合混合物中以促进乳液的形成。 在优选的实施方案中,表面活性剂是杂化表面活性剂,即具有阴离子和非离子特性的表面活性剂。

    Coating compositions
    27.
    发明授权
    Coating compositions 失效
    涂料组合物

    公开(公告)号:US5304607A

    公开(公告)日:1994-04-19

    申请号:US781230

    申请日:1991-12-31

    CPC分类号: C09D135/00

    摘要: A coating composition which is capable of curing at ambient temperature to form a coating comprises (A) an anhydride-functional polymer containing at least two cyclic carboxylic acid anhydride groups per molecule and (B) an amine-functional polymer and is characterized in that the amine-functional polymer (B) contains at least two secondary amine groups per molecule, the polymer (B) being substantially free from hydroxy and ether oxygen atoms and amine nitrogen atoms in the alpha and beta positions with respect to the amine nitrogen atoms, and the carbon atoms directly bonded to the amine nitrogen atoms not being tertiary carbon atoms.

    摘要翻译: PCT No.PCT / GB90 / 01027 Sec。 371日期1991年12月31日 102(e)1991年12月31日PCT PCT 1990年7月3日PCT公布。 公开号WO91 / 00321 日本1991年1月10日。一种能够在环境温度下固化以形成涂层的涂料组合物包含(A)每分子含有至少两个环状羧酸酐基团的酸酐官能聚合物和(B)胺官能团 聚合物,其特征在于胺官能聚合物(B)每分子含有至少两个仲胺基团,聚合物(B)在α和β位置基本上不含羟基和醚氧原子和胺氮原子,相对于 直接键合到胺氮原子上的碳原子不是叔碳原子。

    Curable copolymers, a process for their preparation and their use
    28.
    发明授权
    Curable copolymers, a process for their preparation and their use 失效
    可固化共聚物,其制备方法及其用途

    公开(公告)号:US4704442A

    公开(公告)日:1987-11-03

    申请号:US826789

    申请日:1986-02-06

    CPC分类号: C08F222/22 C09D135/00

    摘要: Copolymers based on (A) 5-95% by weight of at least one polymerizable carbamoyloxyalkyldicarboxylic acid ester, carrying hydroxyl groups, of the general formula I ##STR1## in which R.sup.1 represents hydrogen or alkyl or hydroxyalkyl having in each case 1 to 30 carbon atoms in the alkyl radical, R.sup.2 represents alkyl or hydroxyalkyl having in each case 1 to 30 carbon atoms in the alkyl radical, or the radical ##STR2## subject to the proviso that R.sup.1 is hydrogen and x is an integer from 2 to 10, R.sup.3 represents linear or branched alkylene having 2 to 5 carbon atoms, R.sup.4 represents hydrogen or methyl and R.sup.5 represents hydroxyalkyl or hydroxyaminoalkyl having in each case 2 to 20 carbon atoms in the alkyl radical, or an alkyl radical of this type which also contains ester groups and/or ether groups, and (B) 5-95% by weight of at least one copolymerizable monomer belonging to the group comprising (a) .alpha.,.beta.-olefinically unsaturated monocarboxylic acid and alkyl and hydroxyalkyl esters thereof having in each case 1 to 18 carbon atoms in the alkyl radical, and amides and nitriles thereof, and also monoalkyl and dialkyl esters of .alpha.,.beta.-olefinically unsaturated dicarboxylic acids having 1 to 18 carbon atoms in the alkyl radical, (b) vinyl-aromatic monomers, (c) vinyl esters of organic monocarboxylic acids having 1 to 18 carbon atoms in the carboxylic acid radical, and (d) glycidyl esters of unsaturated monocarboxylic and/or dicarboxylic acids, the sum of the components (A) and (B) being in all cases 100% by weight, and a process for their preparation.The copolymers are used for the preparation of shaped articles and/or coatings which have excellent properties.

    摘要翻译: 基于(A)5-95重量%的至少一种带有羟基的可聚合的氨基甲酰氧基烷基二羧酸酯,其通式为Ⅰ,其中R1代表氢或烷基或羟基烷基,其中在每种情况下为1-30碳 烷基中的原子,R 2表示在每个情况下在烷基中具有1至30个碳原子的烷基或羟烷基,或者基团,条件是R 1是氢且x是2至10的整数,R 3 表示具有2至5个碳原子的直链或支链亚烷基,R4表示氢或甲基,R5表示在烷基中各自为2至20个碳原子的羟基烷基或羟基氨基烷基,或还含有酯基的这种类型的烷基, /或醚基,和(B)5-95重量%的至少一种可共聚单体,其属于包含(a)α,β-烯属不饱和一元羧酸及其烷基和羟烷基酯的组 在每种情况下,烷基中的1至18个碳原子,以及其酰胺和腈,以及在烷基中具有1至18个碳原子的α,β-烯属不饱和二羧酸的单烷基和二烷基酯,(b)乙烯基 - 芳族单体,(c)在羧酸基团中具有1至18个碳原子的有机单羧酸的乙烯基酯,和(d)不饱和一元羧酸和/或二羧酸的缩水甘油酯,组分(A)和( B)在所有情况下为100重量%,以及其制备方法。 共聚物用于制备具有优异性能的成型制品和/或涂层。