摘要:
Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused light reflection of bottom film layer or substrate and reduce standing waves caused by a variation of thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF among processes for manufacturing semiconductor devices, and its preparation method. Also, the present invention discloses an organic anti-reflective coating composition comprising a light absorbent agent polymer for the organic anti-reflective coating and a pattern formation process using the coating composition.
摘要:
Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused light reflection of bottom film layer or substrate and reduce standing waves caused by a variation of thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF among processes for manufacturing semiconductor devices, and its preparation method. Also, the present invention discloses an organic anti-reflective coating composition comprising a light absorbent agent polymer for the organic anti-reflective coating and a pattern formation process using the coating composition.
摘要:
A method for forming a micro-pattern of a semiconductor substrate, and more particularly, to a method for preventing defects in a photoresist pattern, such as undercut or footing, due to inter-mixing between an organic anti-reflective coating and a photoresist by forming a carbonized layer on the surface of the organic anti-reflective coating by a curing process like ion implantation or E-beam curing.
摘要:
Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused light reflection of bottom film layer or substrate and reduce standing waves caused by a variation of thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF among processes for manufacturing semiconductor devices, and its preparation method. Also, the present invention discloses an organic anti-reflective coating composition comprising a light absorbent agent polymer for the organic anti-reflective coating and a pattern formation process using the coating composition.
摘要:
An optical plate includes a main body plate, and a plurality of lens patterns formed on a first surface of the main body plate, wherein the lens patterns are elongated in a first direction and arranged in parallel with each other in a second direction crossing the first direction, wherein a cross section of the lens patterns form a part of an ellipse shape, the ratio of a semi-major axis to a semi-minor axis of the ellipse shape ranging from about 1.65 to about 1.75.
摘要:
A bus system and execution scheduling method used for the bus system are provided. The execution scheduling method used for the bus system includes the steps of (a) transmitting one or more access commands issuing from one or more master devices to corresponding slave devices; (b) storing the transmitted access commands; and (c) the slave devices executing the stored access commands in the order in which execution preparation of access commands is completed. According to the method, the order of execution of the access commands is adjusted, thereby providing a bus system having improved data processing speed and the execution scheduling method thereof.
摘要:
A bus system is provided. The bus system includes: an arbiter that receives access commands output from the plurality of master devices and outputs the access commands in an order according to a predetermined arbitration algorithm; an execution scheduler that receives the access commands from the arbiter and outputs the access commands in the order in which execution preparation by corresponding slave devices are complete; a plurality of command execution controllers corresponding to at least one of the slave devices, respectively, each command execution controller stores two or more access commands input from the execution scheduler, extracts access information necessary for execution from the stored access commands, controls the output order of the access commands based on the result of comparing the extracted access information with access information about the command currently being executed so that the total execution time of the stored commands is shorter than the total execution time according to the order in which the commands are input; and a plurality of pseudo-delayers corresponding to at least one of slave devices, respectively, each pseudo-delayer delays and outputs the access command received from the command execution controller to a corresponding slave device so that the latency period of the corresponding slave device may equal the longest of latency periods of the plurality of slave devices. Accordingly, the number of idle clock cycles of a data bus is reduced and the overall system efficiency is improved.
摘要:
A prediction image generating apparatus using a plurality of masks and an apparatus for coding, transmitting and decoding a binary image using the same. The prediction image generating apparatus includes a maximum value searching unit, a minimum value searching unit, a mean calculation unit, a binarization unit and a comparing unit. The maximum value searching unit searches a maximum value of element values of one of the masks corresponding to a pixel having one binary level among a plurality of pixels located in front of the pixel having the current binary level to be predicted in a window of a predetermined size. The minimum value searching unit searches a minimum value of element values of the one mask corresponding to a pixel having the other binary level among a plurality of pixels located in front of the pixel having the current binary level to be predicted in the window of the predetermined size. The mean calculation unit takes an average of the maximum value and the minimum value searched from the maximum value searching unit and the minimum value searching unit. The binarization unit binarizes the average determined in the mean calculation unit. The comparing unit compares the binarized average with the binary level of the current pixel and outputs prediction image data indicating a successful or a failed prediction. Accordingly, when an image obtained by binarizing a document of pictures as well as text documents is transmitted, good picture quality and high coding efficiency are realized.
摘要:
A Schottky diode and a memory device including the same are provided. The Schottky diode includes a first metal layer and an Nb-oxide layer formed on the first metal layer.
摘要:
A page replacement method is provided. The page replacement method includes (a) establishing a first page list in which a plurality of pages in a main memory are listed in an order that they have been used, (b) establishing a second page list in which some of the pages in the main memory whose images are stored in a storage medium are listed in an order that they have been used, and (c) storing data downloaded from the storage medium in the pages included in the second page list in an order opposite to the order that the corresponding pages are listed in the second page list.