发明申请
- 专利标题： Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same
- 专利标题（中）： 用于有机抗反射涂层的光吸收剂聚合物，其制备方法和包含其的有机抗反射涂料组合物
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申请号： US10963129申请日： 2004-10-12
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公开(公告)号： US20060004161A1公开(公告)日： 2006-01-05
- 发明人: Jae-chang Jung , Keun Kong , Jin-soo Kim
- 申请人： Jae-chang Jung , Keun Kong , Jin-soo Kim
- 申请人地址： KR Kyungki-Do
- 专利权人： HYNIX SEMICONDUCTOR INC.
- 当前专利权人： HYNIX SEMICONDUCTOR INC.
- 当前专利权人地址： KR Kyungki-Do
- 优先权： KR2003-71916 20031015
- 主分类号： B05D5/06
- IPC分类号： B05D5/06
摘要：
Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused light reflection of bottom film layer or substrate and reduce standing waves caused by a variation of thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF among processes for manufacturing semiconductor devices, and its preparation method. Also, the present invention discloses an organic anti-reflective coating composition comprising a light absorbent agent polymer for the organic anti-reflective coating and a pattern formation process using the coating composition.
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