公开(公告)号：US20060181692A1

公开(公告)日：2006-08-17

申请号：US11397176

申请日：2006-04-04

Applicant: Ulrich Boettiger ,  Scott Light

Inventor： Ulrich Boettiger ,  Scott Light

IPC: G03B27/72

CPC classification number: G03F7/70083 ,  G03F7/70108 ,  G03F7/70141 ,  G03F7/70191 ,  G03F7/70558 ,  Y10S430/143

Abstract: A method and apparatus for controlling an intensity distribution of a radiation beam directed to a microlithographic substrate. The method can include directing a radiation beam from a radiation source along the radiation path, with the radiation beam having a first distribution of intensity as the function of location in a plane generally transverse to the radiation path. The radiation beam impinges on an adaptive structure positioned in the radiation path and an intensity distribution of the radiation beam is changed from the first distribution to a second distribution by changing a state of the first portion of the adaptive structure relative to a second portion of the adaptive structure. For example, the transmissivity of the first portion, or inclination of the first portion can be changed relative to the second portion. The radiation is then directed away from the adaptive structure to impinge on the microlithographic substrate.

Abstract translation: 一种用于控制指向微光刻基片的辐射束的强度分布的方法和装置。 该方法可以包括沿着辐射路径引导来自辐射源的辐射束，其中辐射束具有作为大致横向于辐射路径的平面中的位置的函数的强度的第一分布。 辐射束照射位于辐射路径中的自适应结构，并且辐射束的强度分布从第一分布改变到第二分布，通过改变自适应结构的第一部分相对于第二部分的第二部分的状态 自适应结构。 例如，第一部分的透射率或第一部分的倾斜度可以相对于第二部分改变。 然后将辐射导向远离自适应结构以照射到微光刻基板上。

公开(公告)号：US20060152813A1

公开(公告)日：2006-07-13

申请号：US11328158

申请日：2006-01-10

Applicant: Ulrich Boettiger ,  Jin Li

Inventor： Ulrich Boettiger ,  Jin Li

IPC: G02B27/10

CPC classification number: G02B27/10 ,  B29D11/00278 ,  B29D11/00365 ,  G02B3/0018 ,  G02B3/0043 ,  G02B3/0056 ,  H01L27/14627 ,  H01L27/14685

Abstract: Asymmetrical structures and methods are used to adjust the orientation of a microlens for a pixel array. The asymmetrical structures affect volume and surface force parameters during microlens formation. Exemplary microlens structures include an asymmetrical microlens frame, base, material or a combination thereof to affect the focal characteristics of the microlens. The asymmetrical frame alters the microlens flow resulting from the heating of the microlens during fabrication such that orientation of the microlens relative to an axis of the imager can be controlled.

公开(公告)号：US20060119950A1

公开(公告)日：2006-06-08

申请号：US11002231

申请日：2004-12-03

Applicant: Ulrich Boettiger ,  Jin Li

Inventor： Ulrich Boettiger ,  Jin Li

IPC: G02B27/10

CPC classification number: G02B3/0018 ,  G02B3/0056 ,  H01L27/14627

Abstract: A microlens array having first and second sets of spherically-shaped microlenses. The second set of spherically-shaped microlenses are located in the areas between individual microlenses of the first set in such a way that there is minimized gapping over the entire microlens array. A semiconductor-based imager includes a pixel array having embedded pixel cells, each with a photosensor, and a microlens array having spherically-shaped microlenses as just described.

Abstract translation: 具有第一组和第二组球形微透镜的微透镜阵列。 第二组球形微透镜位于第一组的单个微透镜之间的区域中，使得在整个微透镜阵列上的间隙最小化。 基于半导体的成像器包括具有嵌入像素单元的像素阵列，每个像素单元具有光电传感器，以及具有如前所述的球形微透镜的微透镜阵列。

公开(公告)号：US20060027734A1

公开(公告)日：2006-02-09

申请号：US11244101

申请日：2005-10-06

Applicant: Jin Li ,  Jiutao Li ,  Ulrich Boettiger ,  Loriston Ford

Inventor： Jin Li ,  Jiutao Li ,  Ulrich Boettiger ,  Loriston Ford

IPC: H01L27/00

CPC classification number: H01L27/14627 ,  G02B3/0018 ,  G02B3/0037 ,  G02B3/0056

Abstract: A microlens structure includes lower lens layers on a substrate. A sputtered layer of glass, such as silicon oxide, is applied over the lower lens layers at an angle away from normal to form upper lens layers that increase the effective focal length of the microlens structure. The upper lens layers can be deposited in an aspherical shape with radii of curvature longer than the lower lens layers. As a result, small microlenses can be provided with longer focal lengths. The microlenses are arranged in arrays for use in imaging devices.

Abstract translation: 微透镜结构包括在基底上的较低透镜层。 将溅射的玻璃层（例如氧化硅）施加在下透镜层上以与法线成一定角度以形成增加微透镜结构的有效焦距的上透镜层。 上透镜层可以沉积成具有比下透镜层更长的曲率半径的非球面形状。 结果，可以提供更小焦距的小微透镜。 微透镜被布置成阵列以用于成像装置。

公开(公告)号：US20050078377A1

公开(公告)日：2005-04-14

申请号：US10681308

申请日：2003-10-09

Applicant: Jin Li ,  Ulrich Boettiger

Inventor： Jin Li ,  Ulrich Boettiger

IPC: B29D11/00 ,  G02B3/00 ,  H01L27/14 ,  H04N5/369 ,  H04N9/07 ,  G02B27/10

CPC classification number: G02B3/005 ,  B29D11/00278 ,  B29D11/00365 ,  G02B3/0018 ,  G02B3/0043 ,  G02B3/0056 ,  H01L27/14621 ,  H01L27/14627

Abstract: A micro-lens array with reduced or no empty space between individual micro-lenses and a method for forming same. The micro-lens array is formed by patterning a first set of micro-lens material in a checkerboard pattern on a substrate. The first set of micro-lens material is reflowed and cured into first micro-lenses impervious to subsequent reflows. Then, a second set of micro-lens material is patterned in spaces among the first micro-lenses, reflowed and cured into second micro-lenses. The reflows and cures can be conducted under different conditions, and the micro-lenses may be differently sized. The conditions of the reflows can be chosen to ensure that the focal lengths of micro-lenses are optimized for maximum sensor signal.

Abstract translation: 具有在单个微透镜之间减少或没有空白空间的微透镜阵列及其形成方法。 微透镜阵列通过在衬底上以棋盘图案形成第一组微透镜材料而形成。 第一组微透镜材料被回流并固化成不可逆转的第一微透镜。 然后，将第二组微透镜材料图案化在第一微透镜之间的空间中，回流并固化成第二微透镜。 可以在不同的条件下进行回流和固化，并且微透镜的尺寸可以不同。 可以选择回流条件以确保微透镜的焦距被优化用于最大传感器信号。

公开(公告)号：US08704935B2

公开(公告)日：2014-04-22

申请号：US13053728

申请日：2011-03-22

Applicant: Ulrich Boettiger

Inventor： Ulrich Boettiger

IPC: H04N5/225 ,  H04N3/14 ,  H04N5/335 ,  H01L27/00 ,  H01L31/062 ,  H01L31/113 ,  H01L31/0232

CPC classification number: H04N5/2254

Abstract: An imaging system may include an array of lenses, each of which is aligned over a respective one of a plurality of imaging pixels. The array of lenses may be formed in two layers. The first layer may include a first set of non-adjacent lenses and centering structures between the first lenses. The centering structures may be aligned with the first set of lenses as part of a mask design with a high level of accuracy. The second layer may include a second set of lenses, each of which is formed on a respective one of the centering structures. Forming the second set of lenses may include a reflow process in which surface tension forces center the second set of lenses on their respective centering structures, thereby aligning the second set of lenses with the first set of lenses with a high level of accuracy.

Abstract translation: 成像系统可以包括透镜阵列，每个透镜阵列在多个成像像素中的相应一个上对准。 透镜阵列可以形成为两层。 第一层可以包括第一组非相邻透镜和第一透镜之间的定心结构。 定心结构可以与第一组透镜对准，作为掩模设计的一部分，具有高精度。 第二层可以包括第二组透镜，每个透镜形成在相应的定心结构之一上。 形成第二组透镜可以包括回流处理，其中表面张力将第二组透镜定位在它们各自的对中结构上，从而以高精度对准第二组透镜与第一组透镜。

公开(公告)号：US20120273906A1

公开(公告)日：2012-11-01

申请号：US13294951

申请日：2011-11-11

Applicant: Jeffrey Mackey ,  Ulrich Boettiger ,  Mattia Cichocki ,  Loriston Ford ,  Rick Holscher ,  Mitchell J. Mooney ,  Brian Vaartstra

Inventor： Jeffrey Mackey ,  Ulrich Boettiger ,  Mattia Cichocki ,  Loriston Ford ,  Rick Holscher ,  Mitchell J. Mooney ,  Brian Vaartstra

IPC: H01L31/0232 ,  H01L31/18

CPC classification number: H01L31/02327 ,  H01L27/1446 ,  H01L27/14605 ,  H01L27/14621 ,  H01L27/14629 ,  H01L27/1464 ,  H01L27/14685 ,  H01L31/02162

Abstract: Pixel arrays are provided for image sensors that have barriers between color filters in an array of color filters. Color filter barriers may be formed from a transparent or semi-transparent material. Color filter barriers may be formed from a low refractive index material. Color filters may be etched and color filter barrier material may be formed in the etched regions of the color filters. If desired, a layer of color filter barrier material may be etched to form open regions and color filter material may be formed in the open regions of the color filter barrier material. An image sensor may be a front-side illuminated image sensor or a back-side illuminated image sensor.

Abstract translation: 像素阵列被提供用于在滤色器阵列中的滤色器之间具有屏障的图像传感器。 滤色器屏障可以由透明或半透明材料形成。 滤色器屏障可以由低折射率材料形成。 可以蚀刻滤色器，并且可以在滤色器的蚀刻区域中形成滤色器阻挡材料。 如果需要，可以蚀刻一层滤色器阻挡材料以形成开放区域，并且滤色器材料可以形成在滤色器阻挡材料的开放区域中。 图像传感器可以是前侧照明图像传感器或背面照明图像传感器。

公开(公告)号：US20120045103A1

公开(公告)日：2012-02-23

申请号：US13114982

申请日：2011-05-24

Applicant: Kenneth Edward Salsman ,  Ulrich Boettiger ,  Dmitry Bakin ,  Curtis W. Stith

Inventor： Kenneth Edward Salsman ,  Ulrich Boettiger ,  Dmitry Bakin ,  Curtis W. Stith

IPC: G06K9/00 ,  H04N7/18

CPC classification number: G01N15/1012 ,  G01N15/1434 ,  G01N15/1459 ,  G01N15/1463 ,  G01N2015/1025 ,  G01N2015/1443

Abstract: An image sensor integrated circuit may contain image sensor pixels. A channel containing a fluid with particles such as cells may be formed on top of the image sensor. Some of the image sensor pixels may form a calibration sensor and some of the image sensor pixels may form an imager. As the fluid and particles flow through the channel at a flow rate, the calibration sensor may measures the flow rate and illumination intensity in the channel. Based on calibration data such as measured flow rate and measured illumination intensity, adjustments may be made to ensure that the imager acquires satisfactory image data. The adjustments may include flow rate adjustments, image acquisition data rate adjustments, and illumination adjustments. A processing unit in the channel may contain a laser or other component to destroy selected cells. A flared region in the channel may be used as a chromatograph.

Abstract translation: 图像传感器集成电路可以包含图像传感器像素。 可以在图像传感器的顶部上形成包含诸如细胞等颗粒的流体的通道。 一些图像传感器像素可以形成校准传感器，并且一些图像传感器像素可以形成成像器。 当流体和颗粒以流速流过通道时，校准传感器可以测量通道中的流量和照射强度。 基于诸如测量流量和测量的照射强度的校准数据，可以进行调整以确保成像器获得令人满意的图像数据。 调整可以包括流量调整，图像采集数据速率调整和照明调整。 通道中的处理单元可以包含用于摧毁所选择的单元的激光器或其他组件。 通道中的扩口区域可用作色谱仪。

公开(公告)号：US20120044341A1

公开(公告)日：2012-02-23

申请号：US13205340

申请日：2011-08-08

Applicant: Curtis W. Stith ,  Kenneth Edward Salsman ,  Dmitry Bakin ,  Ulrich Boettiger

Inventor： Curtis W. Stith ,  Kenneth Edward Salsman ,  Dmitry Bakin ,  Ulrich Boettiger

IPC: H01L27/146 ,  H04N5/228 ,  H04N7/18 ,  H04N5/335

CPC classification number: G01N21/645 ,  B01L3/502715 ,  G01N21/6458 ,  G02B21/0004 ,  G02B21/16 ,  H01L27/14603 ,  H04N2005/2255

Abstract: An integrated circuit may contain image sensor pixels. Channels containing a fluid with samples such as cells may be formed on top of the image sensor. Control circuitry may be formed on the integrated circuit. The image sensor pixels may form light sensors and imagers. Portions of the channel may have multiple chambers such as fluorescence detection chambers. Gating structures and other fluid control structures may control the flow of fluid through the channels and chambers. Portions of the channel may be used to form chambers. The chambers may each be provided with one or more light sensors, light sources, and color filters to alter the color of illumination form a light source, one or more reactants such as dyes, antigens, and antibodies, and heaters. The control circuitry may be configured to control the imagers, the gating structures, the fluid control structures, the light source, the heaters, etc.

Abstract translation: 集成电路可以包含图像传感器像素。 可以在图像传感器的顶部上形成包含诸如细胞样品的流体的通道。 控制电路可以形成在集成电路上。 图像传感器像素可以形成光传感器和成像器。 通道的一部分可以具有多个室，例如荧光检测室。 门控结构和其他流体控制结构可以控制通过通道和腔室的流体流动。 可以使用通道的一部分来形成室。 每个室可以各自设置有一个或多个光传感器，光源和滤色器，以改变来自光源的照明的颜色，一种或多种反应物，例如染料，抗原和抗体，以及加热器。 控制电路可以被配置为控制成像器，门控结构，流体控制结构，光源，加热器等

公开(公告)号：US07920343B2

公开(公告)日：2011-04-05

申请号：US12353807

申请日：2009-01-14

Applicant: Rick Lake ,  Ulrich Boettiger ,  Shashikant Hegde ,  Jacques Duparre

Inventor： Rick Lake ,  Ulrich Boettiger ,  Shashikant Hegde ,  Jacques Duparre

IPC: G02B7/02

CPC classification number: G02B3/0031 ,  G02B3/0075 ,  G02B7/08 ,  G02B26/0875 ,  Y10T156/1039

Abstract: Micro-electrical-mechanical (MEMS) wafers in which a lens is formed on a micro-electrical-mechanical structure. The micro-electrical-mechanical wafers can comprise a substrate, MEMS structures, and a lens array. A method of forming a micro-electrical-mechanical wafer comprises providing a substrate, forming a micro-electrical-mechanical structure on the substrate, forming a carrier, forming a lens array on the carrier, and transferring the lens array from the carrier onto the micro-electrical-mechanical structure. The lens array is placed above the micro-electrical-mechanical structure.

Abstract translation: 其中在微机电结构上形成透镜的微机电（MEMS）晶片。 微机电晶片可以包括衬底，MEMS结构和透镜阵列。 一种形成微机电晶片的方法包括提供衬底，在衬底上形成微机电结构，形成载体，在载体上形成透镜阵列，以及将透镜阵列从载体转移到 微机电结构。 透镜阵列放置在微机电结构的上方。