知搜-全球专利检索

  1. 登录
  2. 注册

搜索结果

33 条记录 (耗时 0.025 秒)

    Substrate separating machine and method
    22.
    发明授权
    Substrate separating machine and method 失效
    基板分离机及方法

    公开(公告)号：US4235357A

    公开(公告)日：1980-11-25

    申请号：US941181

    申请日：1978-09-11

    申请人： David H. Young

    发明人： David H. Young

    IPC分类号： B26F3/00 ,  B28D5/00 ,  H01L21/302

    CPC分类号： H01L21/302 ,  B26F3/002 ,  B28D5/0023 ,  Y10T225/10 ,  Y10T225/12 ,  Y10T225/325 ,  Y10T225/329 ,  Y10T225/371

    摘要： A machine and method for subdividing into individual substrates a wafer which is prescored with a pattern of intersecting score lines defining the substrates. The wafer is progressively directed over a first wafer-engaging surface substantially paralleling one set of score lines, and this surface cooperates during a breaking operation to impart a localized force at a score line in the set. The wafer is halted during the breaking operation, after which the broken-off portion is directed over a second wafer-engaging surface substantially paralleling the other set of score lines. This second surface cooperates, during a substrate breaking operation, to apply a localized force adjacent a score line of the other set. The broken-off portion is halted during this latter breaking operation at which a substrate is separated from the broken-off portion of the wafer.

    摘要翻译： 一种用于将每个衬底细分成晶片的机器和方法，该晶片用限定衬底的相交刻痕线的图案预处理。 晶片逐渐地定向在基本上平行于一组刻痕线的第一晶片接合表面上，并且该表面在断裂操作期间协作以在组中的刻痕线处施加局部力。 在断开操作期间，晶片停止，之后，断开部分被引导到基本上平行于另一组刻痕线的第二晶片接合表面。 该第二表面在衬底断裂操作期间协作以在另一组的刻痕线附近施加局部力。 在后一个断开操作期间，断开部分被停止，在该断开操作期间，基板与晶片的断开部分分离。

    Microbicidal and plant growth regulating compounds
    23.
    发明授权
    Microbicidal and plant growth regulating compounds 失效
    杀菌剂和植物生长调节化合物

    公开(公告)号：US4975459A

    公开(公告)日：1990-12-04

    申请号：US450127

    申请日：1989-12-13

    申请人： Raj J. Mehta ,  Colin Swithenbank ,  Zev Lidert ,  Margaret M. Bowers-Daines ,  David H. Young ,  Barry C. Lange

    发明人： Raj J. Mehta ,  Colin Swithenbank ,  Zev Lidert ,  Margaret M. Bowers-Daines ,  David H. Young ,  Barry C. Lange

    IPC分类号： C07D331/02 ,  A01N35/06 ,  A01N43/20 ,  A01N43/44 ,  C07C50/24 ,  C07C50/34 ,  C07C50/38 ,  C07C225/30 ,  C07C225/34 ,  C07C233/61 ,  C07D203/08 ,  C07D303/04 ,  C07D303/08 ,  C07D303/12 ,  C07D303/34 ,  C07D303/36 ,  C07D303/48

    CPC分类号： C07C50/34 ,  A01N35/06 ,  A01N43/20 ,  C07C225/30 ,  C07C225/34 ,  C07C233/61 ,  C07C50/24 ,  C07C50/38 ,  C07D303/36 ,  C07C2101/02 ,  C07C2103/24

    摘要： Process comprising the use as a microbicide or plant growth regulator of a compound of the formula ##STR1## wherein A, B, C and D is each independently selected from the group consisting of O,NR.sup.1, CR.sup.1 R.sup.1, CO, S,SO, and SO.sub.2, except for the A-C, C-A, B-D,D-B combinations: O--O, SO--SO, SO.sub.2 --SO.sub.2, S--O, S--NR.sup.2, SONR.sup.2, SO--CO, SO.sub.2 --CO, SO.sub.2 --SO;each group of the groups R.sup.1 is independently selected from the group consisting of H and (C.sub.1 -C.sub.4)alkyl;Y.sup.1 and Y.sup.2 may each be independently selected from the group consisting of H, (C.sub.1 -C.sub.4)alkyl, halogen, OR,SOR,SO.sub.2 R, SO.sub.3 R, CN, CO.sub.2 R, COR, CF.sub.3, NO.sub.2, NHCOR, and OCOR; or alternatively Y.sup.1 and Y.sup.2 and the carbons to which they are attached may comprise a cyclic structure selected from the group consisting of ##STR2## where R.sup.11 is aryl or (C.sub.1 -C.sub.4)alkylX.sup.1 to X.sup.8 is each independently selected from the group consisting of H, (C.sub.1 -C.sub.4)alkyl, halogen, OR, SOR, SO.sub.2 R, SO.sub.3 R, CN,CO.sub.2 R, COR, CF.sub.3, NO.sub.2, NHCOR, and OCOR: and furthermore optionally any pair or pairs of adjacent X's may be in the form of a divalent group attached across the adjacent X position;Z.sup.1 and Z.sup.2 is each independently selected from the group consisting of NR.sup.2, O, S, CR.sup.2 R.sup.2 where each of the groups R.sup.2 is independently selected from the group consisting of H and (C.sub.1 -C.sub.4)alkyl;each of the groups R.sup.3 is independently selected from the group consisting of CO.sub.2 R, COR, CN CF.sub.3, SOR, SO.sub.2 R, (C.sub.1 -C.sub.4)alkyl and H.

    摘要翻译： 其中A，B，C和D分别独立地选自O，NR 1，CR 1 R 1，CO，S，SO，以及其中A，B，C和D的化合物的杀微生物剂或植物生长调节剂 SO2，除了AC，CA，BD，DB组合：OO，SO-SO，SO2-SO2，SO，S-NR2，SONR2，SO-CO，SO2-CO，SO2-SO; 每个基团R 1独立地选自H和（C 1 -C 4）烷基; Y 1和Y 2可各自独立地选自H，（C 1 -C 4）烷基，卤素，OR，SOR，SO 2 R，SO 3 R，CN，CO 2 R，COR，CF 3，NO 2，NHCOR和OCOR; 或者Y1和Y2以及它们所连接的碳可以包含选自下列的环状结构：其中R11为芳基或（C1-C4）烷基X1至X8各自独立地选自 由H，（C 1 -C 4）烷基，卤素，OR，SOR，SO 2 R，SO 3 R，CN，CO 2 R，COR，CF 3，NO 2，NHCOR和OCOR组成的组： 为相邻X位置附近的二价基团的形式; Z 1和Z 2各自独立地选自NR 2，O，S，CR 2 R 2，其中每个基团R 2独立地选自H和（C 1 -C 4）烷基; 基团R3各自独立地选自CO 2 R，COR，CN CF 3，SOR，SO 2 R，（C 1 -C 4）烷基和H.

    Porous non-friable polymer film
    26.
    发明授权
    Porous non-friable polymer film 失效
    多孔非易碎聚合物膜

    公开(公告)号：US06750050B2

    公开(公告)日：2004-06-15

    申请号：US09965377

    申请日：2001-09-27

    申请人： Matthew S. Gebhard ,  Patricia M. Lesko ,  Albert B. Brown ,  David H. Young

    发明人： Matthew S. Gebhard ,  Patricia M. Lesko ,  Albert B. Brown ,  David H. Young

    IPC分类号： C12N1108

    CPC分类号： C08J5/18 ,  Y10S525/902 ,  Y10T428/31504

    摘要： Porous films are provided which include a blend of a film forming polymer and a non-film forming material, the film having a network of pores or channels throughout the film. The porous polymer films are formed between 0° and 80° C. retain porosity at elevated temperatures and are non-friable. A process for preparing porous polymer films and their applications are disclosed.

    摘要翻译： 提供多孔膜，其包括成膜聚合物和非成膜材料的共混物，该膜具有整个膜中的孔或通道网络。 多孔聚合物膜在0°和80°C之间形成，在升高的温度下保持孔隙度并且是不易碎的。 公开了一种制备多孔聚合物膜的方法及其应用。