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33 条记录 (耗时 0.042 秒)

    Compounds and methods for controlling fungi
    1.
    发明授权
    Compounds and methods for controlling fungi 失效
    用于控制真菌的化合物和方法

    公开(公告)号：US08759356B2

    公开(公告)日：2014-06-24

    申请号：US12772248

    申请日：2010-05-03

    申请人： Francis E. Tisdell ,  James M. Renga ,  William C. Lo ,  Maurice C. H. Yap ,  David H. Young ,  George E. Davis

    发明人： Francis E. Tisdell ,  James M. Renga ,  William C. Lo ,  Maurice C. H. Yap ,  David H. Young ,  George E. Davis

    IPC分类号： A01N43/54 ,  C07D239/42 ,  C07D401/04 ,  A61K31/505 ,  C07D239/30

    CPC分类号： A61K31/505 ,  A01N43/54 ,  C07D239/30

    摘要： Various aspects disclosed herein relate to aryl substituted aminopyrimidines according to Formula 1: wherein, X1 is N or C—R3; X2 is N or C—R4 provided that X1 and X2 are not both N; R1-R7 are H, CN, CHO, —SCN, NO2, F, Cl, Br, I, substituted or unsubstituted C1-C4-alkyl, substituted or unsubstituted halo-C1-C4-alkyl, substituted or unsubstituted C1-C4-alkoxy, substituted or unsubstituted halo-C1-C4-alkoxy, substituted or unsubstituted C1-C4-thioalkyl, substituted or unsubstituted halo-C1-C4-thioalkyl, substituted or unsubstituted C3-C-7-cycloalkyl, substituted or unsubstituted C2-C4-alkenyl, C2-C4-alkynyl, substituted or unsubstituted C1-C4-acylalkyl, C1-C4-acyloxy, C1-C4 alkoxycarbonyl, C1-C4-alkoxy-amino, C1-C4-alkyl-S(O)═NH, substituted or unsubstituted aryl, substituted or unsubstituted heterocycle, wherein the substituents are one or more of the following F, Cl, Br, OH, CN, NO2, CHO, —SCN, S(O)n-C1-C4-alkyl (where n=0-2), C1-C4-alkyl, halo-C1-C4-alkyl, C1-C4-alkylamine, C1-C4-alkoxy, halo-C1-C4-alkoxy, C1-C4-thioalkyl, halo-C1-C4-thioalkyl, C1-C4-alkylacyl, C1-C4-acyloxy, C1-C4 alkoxycarbonyl, C1-C4-alkoxy-imino, hydroxy-imino; C1-C4-alkyl-S(O)═NH; and Q is a substituted or unsubstituted aryl, substituted or unsubstituted heterocycle wherein the substituents of Q are taken from R1-R7.

    摘要翻译： 本文公开的各个方面涉及式1的芳基取代的氨基嘧啶：其中，X 1是N或C-R 3; X2是N或C-R4，条件是X1和X2不同时为N; R 1 -R 7是H，CN，CHO，-SCN，NO 2，F，Cl，Br，I，取代或未取代的C 1 -C 4 - 烷基，取代或未取代的卤代-C 1 -C 4烷基，取代或未取代的C 1 -C 4 - 烷氧基，取代或未取代的卤代-C 1 -C 4 - 烷氧基，取代或未取代的C 1 -C 4 - 硫代烷基，取代或未取代的卤代-C 1 -C 4 - 硫代烷基，取代或未取代的C 3 -C 7 - 环烷基，取代或未取代的C 2 -C 4 烯基，C 2 -C 4 - 炔基，取代或未取代的C 1 -C 4酰基烷基，C 1 -C 4酰氧基，C 1 -C 4烷氧基羰基，C 1 -C 4烷氧基 - 氨基，C 1 -C 4烷基-S（O） 取代或未取代的芳基，取代或未取代的杂环，其中取代基是以下F，Cl，Br，OH，CN，NO 2，CHO，-SCN，S（O）n-C 1 -C 4烷基中的一种或多种 n = 0-2），C 1 -C 4 - 烷基，卤代-C 1 -C 4 - 烷基，C 1 -C 4烷基胺，C 1 -C 4 - 烷氧基，卤代-C 1 -C 4 - 烷氧基，C 1 -C 4 - C 1 -C 4烷氧基，C 1 -C 4烷氧基羰基，C 1 -C 4烷氧基亚氨基，羟基亚氨基， C 1 -C 4烷基-S（O）= NH; 并且Q是取代或未取代的芳基，取代或未取代的杂环，其中Q的取代基取自R 1 -R 7。

    COMPOUNDS AND METHODS FOR CONTROLLING FUNGI
    6.
    发明申请
    COMPOUNDS AND METHODS FOR CONTROLLING FUNGI 失效
    用于控制真菌的化合物和方法

    公开(公告)号：US20100298143A1

    公开(公告)日：2010-11-25

    申请号：US12772248

    申请日：2010-05-03

    申请人： Francis E. Tisdell ,  James M. Renga ,  William C. Lo ,  Maurice C. H. Yap ,  David H. Young ,  George E. Davis

    发明人： Francis E. Tisdell ,  James M. Renga ,  William C. Lo ,  Maurice C. H. Yap ,  David H. Young ,  George E. Davis

    IPC分类号： A01N43/54 ,  C07D239/42 ,  A01P3/00 ,  A01P7/04 ,  A01P13/00

    CPC分类号： A61K31/505 ,  A01N43/54 ,  C07D239/30

    摘要： Various aspects disclosed herein relate to aryl substituted aminopyrimidines according to Formula 1: wherein, X1 is N or C—R3; X2 is N or C—R4 provided that X1 and X2 are not both N; R1-R7 are H, CN, CHO, —SCN, NO2, F, Cl, Br, I, substituted or unsubstituted C1-C4-alkyl, substituted or unsubstituted halo-C1-C4-alkyl, substituted or unsubstituted C1-C4-alkoxy, substituted or unsubstituted halo-C1-C4-alkoxy, substituted or unsubstituted C1-C4-thioalkyl, substituted or unsubstituted halo-C1-C4-thioalkyl, substituted or unsubstituted C3-C-7-cycloalkyl, substituted or unsubstituted C2-C4-alkenyl, C2-C4-alkynyl, substituted or unsubstituted C1-C4-acylalkyl, C1-C4-acyloxy, C1-C4 alkoxycarbonyl, C1-C4-alkoxy-amino, C1-C4-alkyl-S(O)═NH, substituted or unsubstituted aryl, substituted or unsubstituted heterocycle, wherein the substituents are one or more of the following F, Cl, Br, OH, CN, NO2, CHO, —SCN, S(O)n-C1-C4-alkyl (where n=0-2), C1-C4-alkyl, halo-C1-C4-alkyl, C1-C4-alkylamine, C1-C4-alkoxy, halo-C1-C4-alkoxy, C1-C4-thioalkyl, halo-C1-C4-thioalkyl, C1-C4-alkylacyl, C1-C4-acyloxy, C1-C4 alkoxycarbonyl, C1-C4-alkoxy-imino, hydroxy-imino; C1-C4-alkyl-S(O)═NH; and Q is a substituted or unsubstituted aryl, substituted or unsubstituted heterocycle wherein the substituents of Q are taken from R1-R7

    摘要翻译： 本文公开的各个方面涉及式1的芳基取代的氨基嘧啶：其中，X 1是N或C-R 3; X2是N或C-R4，条件是X1和X2不同时为N; R 1 -R 7是H，CN，CHO，-SCN，NO 2，F，Cl，Br，I，取代或未取代的C 1 -C 4 - 烷基，取代或未取代的卤代-C 1 -C 4烷基，取代或未取代的C 1 -C 4 - 烷氧基，取代或未取代的卤代-C 1 -C 4 - 烷氧基，取代或未取代的C 1 -C 4 - 硫代烷基，取代或未取代的卤代-C 1 -C 4 - 硫代烷基，取代或未取代的C 3 -C 7 - 环烷基，取代或未取代的C 2 -C 4 烯基，C 2 -C 4 - 炔基，取代或未取代的C 1 -C 4酰基烷基，C 1 -C 4酰氧基，C 1 -C 4烷氧基羰基，C 1 -C 4烷氧基 - 氨基，C 1 -C 4烷基-S（O） 取代或未取代的芳基，取代或未取代的杂环，其中取代基是以下F，Cl，Br，OH，CN，NO 2，CHO，-SCN，S（O）n-C 1 -C 4烷基中的一种或多种 n = 0-2），C 1 -C 4 - 烷基，卤代-C 1 -C 4 - 烷基，C 1 -C 4烷基胺，C 1 -C 4 - 烷氧基，卤代-C 1 -C 4 - 烷氧基，C 1 -C 4 - C 1 -C 4烷氧基，C 1 -C 4烷氧基羰基，C 1 -C 4烷氧基亚氨基，羟基亚氨基， C 1 -C 4烷基-S（O）= NH; 并且Q是取代或未取代的芳基，取代或未取代的杂环，其中Q的取代基取自R 1 -R 7

    Substrate separating machine and method
    8.
    发明授权
    Substrate separating machine and method 失效
    基板分离机及方法

    公开(公告)号：US4235357A

    公开(公告)日：1980-11-25

    申请号：US941181

    申请日：1978-09-11

    申请人： David H. Young

    发明人： David H. Young

    IPC分类号： B26F3/00 ,  B28D5/00 ,  H01L21/302

    CPC分类号： H01L21/302 ,  B26F3/002 ,  B28D5/0023 ,  Y10T225/10 ,  Y10T225/12 ,  Y10T225/325 ,  Y10T225/329 ,  Y10T225/371

    摘要： A machine and method for subdividing into individual substrates a wafer which is prescored with a pattern of intersecting score lines defining the substrates. The wafer is progressively directed over a first wafer-engaging surface substantially paralleling one set of score lines, and this surface cooperates during a breaking operation to impart a localized force at a score line in the set. The wafer is halted during the breaking operation, after which the broken-off portion is directed over a second wafer-engaging surface substantially paralleling the other set of score lines. This second surface cooperates, during a substrate breaking operation, to apply a localized force adjacent a score line of the other set. The broken-off portion is halted during this latter breaking operation at which a substrate is separated from the broken-off portion of the wafer.

    摘要翻译： 一种用于将每个衬底细分成晶片的机器和方法，该晶片用限定衬底的相交刻痕线的图案预处理。 晶片逐渐地定向在基本上平行于一组刻痕线的第一晶片接合表面上，并且该表面在断裂操作期间协作以在组中的刻痕线处施加局部力。 在断开操作期间，晶片停止，之后，断开部分被引导到基本上平行于另一组刻痕线的第二晶片接合表面。 该第二表面在衬底断裂操作期间协作以在另一组的刻痕线附近施加局部力。 在后一个断开操作期间，断开部分被停止，在该断开操作期间，基板与晶片的断开部分分离。