METHOD AND SYSTEM FOR MODIFYING THE WETTABILITY CHARACTERISTICS OF A SURFACE OF A MEDICAL DEVICE BY THE APPLICATION OF GAS CLUSTER ION BEAM TECHNOLOGY AND MEDICAL DEVICES MADE THEREBY
    24.
    发明申请
    METHOD AND SYSTEM FOR MODIFYING THE WETTABILITY CHARACTERISTICS OF A SURFACE OF A MEDICAL DEVICE BY THE APPLICATION OF GAS CLUSTER ION BEAM TECHNOLOGY AND MEDICAL DEVICES MADE THEREBY 审中-公开
    通过应用气体离子束技术和医疗器械改造医疗器械表面的湿度特性的方法和系统

    公开(公告)号:US20090074834A1

    公开(公告)日:2009-03-19

    申请号:US12210018

    申请日:2008-09-12

    CPC classification number: B05D3/068 B05D3/104 B05D5/00 H01J2237/0812

    Abstract: Irradiation of a surface of a material with a gas cluster ion beam modifies the wettability of the surface. The wettability may be increased or decreased dependent on the characteristics of the gas cluster ion beam. Improvements in wettability of a surface by the invention exceed those obtained by conventional plasma cleaning or etching. The improvements may be applied to surfaces of medical devices, such as vascular stents for example, and may be used to enable better wetting of medical device surfaces with liquid drugs in preparation for adhesion of the drug to the device surfaces. A mask may be used to limit processing to a portion of the surface. Medical devices formed by using the methods of the invention are disclosed.

    Abstract translation: 用气体簇离子束照射材料的表面改变了表面的润湿性。 根据气体簇离子束的特性,润湿性可以增加或减少。 通过本发明的表面润湿性的改善超过了通过常规等离子体清洗或蚀刻获得的那些。 这些改进可以应用于诸如血管支架的医疗装置的表面,并且可以用于使液体药物更好地润湿医疗装置表面,以准备将药物粘附到装置表面。 可以使用掩模来将处理限制到表面的一部分。 公开了通过使用本发明的方法形成的医疗装置。

    FILM AND METHODS OF FORMING SAME
    29.
    发明申请
    FILM AND METHODS OF FORMING SAME 审中-公开
    胶片及其形成方法

    公开(公告)号:US20160091787A1

    公开(公告)日:2016-03-31

    申请号:US14892284

    申请日:2014-05-21

    Abstract: A film and method of forming a film provides an unmodified starting layer of a starting material, the starting layer having opposed first and second surfaces and an initial thickness, T1, and a modified surface layer of thickness T2 which is less than T1, formed in at least a portion of the second surface, wherein a portion of the modified surface layer is not supported by unmodified starting material removed from the first surface opposite the modified surface layer.

    Abstract translation: 薄膜和薄膜的形成方法提供了未改性的原料起始层,起始层具有相对的第一和第二表面,初始厚度T1和厚度T2小于T1的改性表面层形成于 所述第二表面的至少一部分,其中所述改性表面层的一部分不被从所述改性表面层相对的所述第一表面除去的未改性起始材料支撑。

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