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公开(公告)号：US11952512B2
公开(公告)日：2024-04-09
申请号：US16870698
申请日：2020-05-08
Applicant: The Boeing Company
Inventor： Michael C. Beatty
IPC: B64F5/40 , B05D3/10 , C09D5/34 , C09D9/00 , C09D181/04
Abstract: A method of chemically stripping a surface is described. The method comprises applying a sealant to at least a portion of a surface of an object, the surface comprising a coating and one or more ingression points, the sealant filling the one or more ingression points to form a sealed surface. The method further comprises applying a stripping agent to the sealed surface to remove at least a portion of the coating to form a stripped surface.
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公开(公告)号：US10011800B2
公开(公告)日：2018-07-03
申请号：US14414207
申请日：2013-07-12
Applicant: Presidents and Fellows of Harvard College
Inventor： Joanna Aizenberg , Michael Aizenberg , Philseok Kim
IPC: C09D5/16 , C10M105/76 , B08B17/06 , C23C18/04 , C23C18/12 , C10M177/00 , B05D3/10 , B05D5/08 , B65D25/14 , C03C17/00 , C09D7/61
CPC classification number: C10M105/76 , B05D3/104 , B05D5/08 , B05D5/086 , B08B17/06 , B65D25/14 , C03C17/001 , C03C2217/76 , C03C2218/31 , C09D5/1693 , C09D7/61 , C10M177/00 , C10M2213/0606 , C10N2280/00 , C23C18/04 , C23C18/1216 , C23C18/1254 , C23C18/1295 , Y10T428/24997
Abstract: A method of preparing an article having a slippery surface includes providing a metal-containing surface, chemically modifying the metal-containing surface to roughen the metal-containing surface, and disposing a lubricating layer on the roughened metal-containing surface, wherein the lubricating layer is substantially stabilized on the roughened metal-containing surface.
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公开(公告)号：US20170283646A1
公开(公告)日：2017-10-05
申请号：US15392293
申请日：2016-12-28
Applicant: AI SILK CORPORATION
Inventor： Hideo Okano , Satoshi Watanabe
CPC classification number: C09D165/00 , A61B5/00 , B05B9/01 , B05C9/10 , B05C9/12 , B05D1/26 , B05D1/36 , B05D3/0218 , B05D3/104 , B05D3/107 , B05D5/12 , B05D2401/10 , B05D2401/31 , B41J11/0015 , C09D5/24 , D06M15/15 , H01B1/12
Abstract: A problem is to provide a method and a device for producing a conductive polymer conductor according to which a conductive polymer cm be easily adhered to a base material with high accuracy. A solution is a production device 10 equipped with a heating means 11 for heating a base material 22, a raw material application means 12 for applying, to the base material 22, a raw material solution containing a monomer of the conductive polymer, and a producing solution application means 13 for applying, to the base material 22, a producing solution containing an oxidizing agent for promoting polymerization of the monomer, a dopant for developing electrical conductivity in the conductive polymer, and a viscosity improver for improving viscosity. The raw material solution is applied thereto after heating the base material 22 or while heating the base material 22, and then the producing solution is applied thereto.
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公开(公告)号：US09763453B2
公开(公告)日：2017-09-19
申请号：US14268473
申请日：2014-05-02
Applicant: Bacterin International, Inc.
Inventor： Guy S. Cook , Matt R. Trebella
IPC: A01N25/10 , A01N59/16 , B05D3/10 , A61L27/34 , A61L27/54 , A61L29/08 , A61L29/16 , A61L31/10 , A61L31/16 , B05D3/14 , C09D5/14
CPC classification number: A01N59/16 , A01N25/10 , A61L27/34 , A61L27/54 , A61L29/085 , A61L29/16 , A61L31/10 , A61L31/16 , A61L2300/104 , A61L2300/406 , A61L2300/606 , B05D3/104 , B05D3/142 , C09D5/14
Abstract: The present invention provides antimicrobial coatings for coating substrate surfaces, particularly medical devices, for preventing bacterial adhesion and biofilm formation by inhibiting microbial growth and proliferation on the coating surface. The antimicrobial coatings are composed of a hydrogel and a bioactive agent including a substantially water-insoluble antimicrobial metallic material that is solubilized within the coating. Antimicrobial coating formulations for obtaining such coatings, and coating methods are also described.
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公开(公告)号：US20170225365A1
公开(公告)日：2017-08-10
申请号：US15016118
申请日：2016-02-04
Applicant: The Aerospace Corporation
Inventor： Hyun I. Kim , Rafael J. Zaldivar , James M. Helt
CPC classification number: B29C33/58 , B05D1/185 , B05D3/104 , B05D5/083 , B05D2203/35 , B29C33/62 , B29K2909/08
Abstract: A deposition assembly generally comprises a first deposition apparatus that is configured to receive a substrate, such as a glass mandrel. The first deposition apparatus is further configured to deposit a plurality of first monolayer molecules onto at least a surface of the substrate to generate a first coating structure on the substrate. A second deposition apparatus is coupled to the first deposition apparatus, and wherein the second deposition apparatus is configured to deposit a plurality of second monolayer molecules onto at least the surface of the substrate such that the second monolayer molecules are diffused through the first coating structure and at least one aperture is filled by at least one of the second monolayer molecules to generate at least one mold release layer on at least the surface of the substrate.
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Patent Agency Ranking
6.发明授权Glass-electrode responsive-glass cleaning liquid and method for cleaning glass-electrode responsive-glass 有权玻璃电极响应玻璃清洗液和玻璃电极响应玻璃的清洗方法公开(公告)号：US09506021B2
公开(公告)日：2016-11-29
申请号：US14474886
申请日：2014-09-02
Applicant: HORIBA, Ltd.
Inventor： Manabu Shibata , Nahoko Nishimura , Takeshi Mori , Hisashi Yamanouchi , Katsuaki Ogura
CPC classification number: C11D7/10 , B05D3/104 , C03C4/18 , C03C15/00 , C03C23/0075 , C11D11/0035 , C11D11/0047
Abstract: To maintain a uniform etching rate during cleaning of a responsive glass in a glass electrode, a responsive-glass cleaning liquid for a glass electrode 1 serves to clean a responsive glass 2 used in the glass electrode 1, is used with a hydrated-layer forming solution for forming a hydrated layer on the surface of the responsive glass 2, and contains ammonium hydrogen fluoride having a predetermined concentration, or a salt of a strong base containing hydrofluoric acid and a fluoride ion.
Abstract translation: 为了在玻璃电极中的响应性玻璃的清洁期间保持均匀的蚀刻速率，用于玻璃电极1的响应玻璃清洁液用于清洁玻璃电极1中使用的响应玻璃2，与水合层形成 在响应性玻璃2的表面上形成水合层的溶液，并且含有预定浓度的氟化氢铵，或含有氢氟酸和氟离子的强碱的盐。
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7.发明授权Solvent for reducing resist consumption and method using solvent for reducing resist consumption 有权降低抗蚀剂消耗的溶剂和使用溶剂降低抗蚀剂消耗的方法公开(公告)号：US09482957B1
公开(公告)日：2016-11-01
申请号：US14738946
申请日：2015-06-15
Applicant: I-Shan Ke
Inventor： Yu-Hsun Lin
CPC classification number: G03F7/422 , B05D1/005 , B05D3/104 , C11D3/2068 , C11D3/226 , C11D7/5022 , C11D11/0047 , G03F7/0048 , G03F7/16 , G03F7/168 , H01L21/02282
Abstract: The present disclosure provides a solvent for reducing resist consumption, which includes a first solvent selected from the group consisting of alkylene glycol alkyl ether acetate, alkylene glycol alkyl ether and a combination thereof, and a second solvent having a hydrogen bonding Hansen parameter lower than 5.34 and an evaporation rate (n-BuAc=1) lower than 0.6. A volume ratio of the first solvent to the second solvent is in a range of 0/100 to 90/10. A resist dispense volume for a 300 mm wafer is less than 0.6 cc, or a resist dispense volume for a 450 mm wafer is less than 1.1 cc.
Abstract translation: 本公开内容提供了用于降低抗蚀剂消耗的溶剂，其包括选自亚烷基二醇烷基醚乙酸酯，亚烷基二醇烷基醚及其组合的第一溶剂和具有低于5.34的氢键Hansen参数的第二溶剂 和蒸发速率（n-BuAc = 1）低于0.6。 第一溶剂与第二溶剂的体积比在0/100〜90/10的范围内。 用于300mm晶片的抗蚀剂分配体积小于0.6cc，或者450mm晶片的抗蚀剂分配体积小于1.1cc。
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公开(公告)号：US20150210951A1
公开(公告)日：2015-07-30
申请号：US14414668
申请日：2013-07-12
Applicant: President and Fellows of Harvard College
Inventor： Joanna Aizenberg , Michael Aizenberg , Tak Sing Wong , Nicolas Vogel , Cicely Shillingford , Philseok Kim , Benjamin Hatton , Stefanie Utech , Oktay Uzun , Steffi Sunny
IPC: C10M105/76 , B05D5/08 , B65D25/14 , C03C17/00 , B08B17/06
CPC classification number: C10M105/76 , B05D3/104 , B05D5/08 , B05D5/086 , B08B17/06 , B65D25/14 , C03C17/001 , C03C2217/76 , C03C2218/31 , C09D5/1693 , C09D7/61 , C10M177/00 , C10M2213/0606 , C10N2280/00 , C23C18/04 , C23C18/1216 , C23C18/1254 , C23C18/1295 , Y10T428/24997
Abstract: Methods and compositions disclosed herein relate to liquid repellant surfaces having selective wetting and transport properties. An article having a repellant surface includes a substrate comprising fabric material and a lubricant wetting and adhering to the fabric material to form a stabilized liquid overlayer, wherein the stabilized liquid overlayer covers the fabric material at a thickness sufficient to form a liquid upper surface above the fabric material, wherein the fabric material is chemically functionalized to enhance chemical affinity with the lubricant such that the lubricant is substantially immobilized on the fabric material to form a repellant surface.
Abstract translation: 本文公开的方法和组合物涉及具有选择性润湿和输送性质的液体排斥性表面。 具有驱避表面的制品包括包含织物材料的基材和润湿并粘附到织物材料上以形成稳定的液体覆盖层的润滑剂，其中稳定的液体覆盖层以足以在上面形成液体上表面的厚度覆盖织物材料 织物材料，其中织物材料被化学官能化以增强与润滑剂的化学亲和力，使得润滑剂基本上固定在织物材料上以形成排斥表面。
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公开(公告)号：US08496995B2
公开(公告)日：2013-07-30
申请号：US13180409
申请日：2011-07-11
Applicant: Marcos Hernandez , Carl Rosenblatt
Inventor： Marcos Hernandez , Carl Rosenblatt
CPC classification number: B05D3/002 , B05D3/104 , B05D5/00 , B05D7/22 , B05D2203/35 , B05D2254/04 , H01H29/06 , H01H29/22 , Y10T29/49105 , Y10T156/10
Abstract: Encapsulated switches are disclosed which substitute non-toxic gallium alloy for mercury. In one embodiment, wetting of the interior surfaces of the housing is prevented by coating the surfaces with an electrically insulative inorganic non-metallic material, such as alumina or boron nitrate. According to another embodiment, a perfluorocarbon liquid is employed as the anti-wetting agent.
Abstract translation: 公开了用无毒镓合金代替汞的封装开关。 在一个实施例中，通过用电绝缘的无机非金属材料（例如氧化铝或硝酸硼）涂覆表面来防止外壳的内表面的润湿。 根据另一个实施方案，使用全氟化碳液体作为抗湿润剂。
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公开(公告)号：US20130101885A1
公开(公告)日：2013-04-25
申请号：US13328607
申请日：2011-12-16
Applicant: Joo Sung LEE , Jang-Hyuk Hong , Jong-Hun Kim
Inventor： Joo Sung LEE , Jang-Hyuk Hong , Jong-Hun Kim
CPC classification number: H01M2/145 , B05D1/26 , B05D3/0254 , B05D3/104 , B05D2252/02 , H01M2/1646 , H01M2/1653 , H01M2/166 , H01M2/1686 , H01M10/0525
Abstract: A method for manufacturing a separator includes (S1) preparing a porous substrate having pores, (S2) coating at least one surface of the porous substrate with a first solvent, (S3) coating the first solvent with a slurry containing inorganic particles dispersed therein and formed by dissolving a binder polymer in a second solvent, (S4) drying the first and second solvents simultaneously to form a porous organic-inorganic composite layer on the porous substrate. Since the phenomenon that the pores of the porous substrate are closing by the binder polymer is minimized, it is possible to prevent the resistance of the separator from increasing due to the formation of the porous organic-inorganic composite layer.
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