公开(公告)号：US20150072453A1

公开(公告)日：2015-03-12

申请号：US14177180

申请日：2014-02-10

Applicant: Samsung Display Co., Ltd.

Inventor： Choel-Min Jang ,  Sung-Hun Key ,  In-Kyo Kim ,  Suk-Won Jung ,  Myung-Soo Huh

IPC: H01L51/00 ,  H01L51/56

CPC classification number: C23C16/45551

Abstract: A vapor deposition apparatus for depositing thin films on a substrate includes a supply unit including a plurality of linear supply members configured to supply at least one gas; and a nozzle unit including a plurality of nozzle members connected to the plurality of supply members and configured to supply the at least one gas toward the substrate, wherein two adjacent nozzle members of the plurality of nozzle members are connected to at least one common supply member of the plurality of supply members.

Abstract translation: 一种用于在衬底上沉积薄膜的气相沉积设备包括：供给单元，包括多个线性供应构件，其被构造成供应至少一种气体; 以及喷嘴单元，其包括连接到所述多个供应构件并被配置为朝向所述基板供应所述至少一种气体的多个喷嘴构件，其中所述多个喷嘴构件中的两个相邻的喷嘴构件连接到至少一个共同的供应构件 的多个供应构件。

公开(公告)号：US20150027374A1

公开(公告)日：2015-01-29

申请号：US14302646

申请日：2014-06-12

Applicant: Samsung Display Co., Ltd.

Inventor： Jin-Kwang Kim ,  Seung-Yong Song ,  Myung-Soo Huh ,  Suk-Won Jung ,  Choel-Min Jang ,  Jae-Hyun Kim ,  Sung-Chul Kim

IPC: C23C16/44 ,  C23C16/455 ,  C23C16/50

CPC classification number: C23C16/4412 ,  C23C16/4402 ,  C23C16/45536 ,  C23C16/45551 ,  Y10T137/794

Abstract: A vapor deposition apparatus includes a first injection unit through which a first raw gas is injected in a first direction, and a first filter unit which is mounted in the first injection unit and includes a plurality of plates separated from one another in the first direction and disposed in parallel to one another, where holes are defined in each of the plurality of plates which is detachably coupled in the first filter unit.

Abstract translation: 一种气相沉积装置包括：第一注入单元，通过该第一注入单元沿第一方向注入第一原料气体;第一过滤器单元，其安装在第一注射单元中并且包括沿第一方向彼此分离的多个板; 彼此平行设置，其中，在可拆卸地联接在第一过滤器单元中的多个板中的每一个中限定有孔。

公开(公告)号：US20150021631A1

公开(公告)日：2015-01-22

申请号：US14162465

申请日：2014-01-23

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Myung-Soo Huh ,  Sung-Chul Kim ,  Suk-Won Jung

IPC: H01L27/12

CPC classification number: H01L27/1218 ,  H01L27/1266 ,  H01L29/78603 ,  H01L29/78684

Abstract: A method of manufacturing a flexible display apparatus includes: preparing a support substrate; forming a first graphene oxide layer having a first electrical charge on the support substrate; forming a second graphene oxide layer having a second electrical charge on the first graphene oxide layer; forming a flexible substrate on the second graphene oxide layer; forming a display unit on the flexible substrate; and separating the support substrate and the flexible substrate from each other.

Abstract translation: 柔性显示装置的制造方法包括：准备支撑基板; 在所述支撑基板上形成具有第一电荷的第一石墨烯氧化物层; 在所述第一石墨烯氧化物层上形成具有第二电荷的第二石墨烯氧化物层; 在第二石墨烯氧化物层上形成柔性基板; 在柔性基板上形成显示单元; 以及将所述支撑基板和所述柔性基板彼此分离。

公开(公告)号：US20140227442A1

公开(公告)日：2014-08-14

申请号：US13924456

申请日：2013-06-21

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Myung-Soo Huh ,  Sun-Ho Kim ,  Cheol-Rae Jo ,  Hyun-Woo Joo

IPC: C23C16/44

CPC classification number: C23C16/4407 ,  C23C14/564 ,  C23C16/4401

Abstract: Provided is a thin film deposition device including a deposition-preventing unit and a method of removing deposits thereof. The method includes: separating a deposition-preventing unit including at least one deposition-preventing plate and a deformation unit coupled to an outer surface of the at feast one deposition-preventing plate from a chamber of the thin film deposition device; and removing a film formation layer from the deposition-preventing plate.

Abstract translation: 本发明提供一种薄膜沉积装置，其包括防沉积单元及其沉积物的去除方法。 该方法包括：将包括至少一个防沉积板和变形单元的沉积防止单元与薄膜沉积装置的室耦合到一个防沉积板的外表面; 以及从防沉积板去除成膜层。

公开(公告)号：US20140161966A1

公开(公告)日：2014-06-12

申请号：US14010769

申请日：2013-08-27

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Yong-Suk Lee ,  Myung-Soo Huh ,  Suk-Won Jung ,  Jeong-Ho Yi ,  Mi-Ra An

IPC: C23C16/52

CPC classification number: C23C14/543 ,  B05D1/60 ,  C23C14/12 ,  C23C14/246 ,  C23C14/544 ,  C23C16/4481

Abstract: A monomer vaporizing device and a method of controlling the same are disclosed. The monomer vaporizing device includes: a first vaporizer and a second vaporizer that receive a purge gas and vaporize a first monomer and a second monomer, respectively; a first flow pipe and a second flow pipe that are connected to the respective vaporizers and allow the first monomer and the second monomer, vaporized by the respective vaporizers, to flow therethrough; a transition tube that is connected to the first flow pipe and the second flow pipe and supplies at least one of the first monomer and the second monomer to a deposition chamber; and a control valve apparatus that regulates monomer flow into the deposition chamber. The device facilitates smooth and uninterrupted application of monomer to the interior of a deposition chamber.

Abstract translation: 公开了一种单体蒸发装置及其控制方法。 单体蒸发装置包括：第一蒸发器和第二蒸发器，其分别接收吹扫气体并蒸发第一单体和第二单体; 第一流管和第二流管，其连接到相应的蒸发器并允许由各蒸发器蒸发的第一单体和第二单体流过其中; 过渡管，其连接到所述第一流管和所述第二流管，并且将至少一个所述第一单体和所述第二单体供应到沉积室; 以及调节单体流入沉积室的控制阀装置。 该装置有助于将单体平滑且不间断地应用于沉积室的内部。

公开(公告)号：US20140053777A1

公开(公告)日：2014-02-27

申请号：US13689638

申请日：2012-11-29

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jai-Hyuk Choi ,  Myung-Soo Huh ,  Choel-Min Jang ,  Dong-Kyun Ko ,  In-Kyu Kim ,  Sung-Hun Key

IPC: C23C16/50

CPC classification number: C23C16/50 ,  C23C16/45519 ,  C23C16/45536 ,  C23C16/45551

Abstract: A vapor deposition apparatus that includes a first region having a first injecting unit for injecting a first raw material and a second region having a second injecting unit for injecting a second raw material, wherein the second injecting unit comprises a plasma generation unit, wherein the plasma generation unit comprises a plasma generator, a corresponding surface surrounding the plasma generator, and a plasma generation space formed between the plasma generator and the corresponding surface, and wherein distances between the plasma generator and the corresponding surface periodically vary along an outer circumference of the plasma generator. In the vapor deposition apparatus, the quality of thin film is increased by forming stable volume plasma through set positions where the plasma is generated in the plasma generation space.

Abstract translation: 一种蒸镀装置，其特征在于，具备：第一区域，具有用于注入第一原料的第一注入单元和具有用于注入第二原料的第二注入单元的第二区域，其中，所述第二注入单元包括等离子体产生单元， 生成单元包括等离子体发生器，围绕等离子体发生器的对应表面以及形成在等离子体发生器和对应表面之间的等离子体产生空间，并且其中等离子体发生器与对应表面之间的距离周期性地沿等离子体的外周变化 发电机。 在气相沉积装置中，通过在等离子体产生空间中产生等离子体的设定位置形成稳定的体积等离子体来提高薄膜的质量。

公开(公告)号：US20190169747A1

公开(公告)日：2019-06-06

申请号：US16271189

申请日：2019-02-08

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jin-Kwang Kim ,  Seung-Yong Song ,  Myung-Soo Huh ,  Suk-Won Jung ,  Choel-Min Jang ,  Jae-Hyun Kim ,  Sung-Chul Kim

IPC: C23C16/455

Abstract: A vapor deposition apparatus for providing a deposition film on a substrate, the vapor deposition apparatus includes a plurality of first nozzle parts which injects a first raw material toward the substrate; a plurality of second nozzle parts which is alternately disposed together with the plurality of first nozzle parts and injects a second raw material toward the substrate; a diffuser unit which distributes the second raw material to the plurality of second nozzle parts; and a supply unit which supplies the second raw material to the diffuser unit.

公开(公告)号：US09673265B2

公开(公告)日：2017-06-06

申请号：US14020849

申请日：2013-09-08

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Myung-Soo Huh ,  Suk-Won Jung ,  Jeong-Ho Yi ,  Sang-Hyuk Hong ,  Yong-Suk Lee

IPC: H01L21/68 ,  H01L27/32 ,  C23C16/04 ,  C23C16/458 ,  H01L21/687

CPC classification number: C23C16/042 ,  C23C16/4405 ,  C23C16/4585 ,  C23C16/50 ,  C23C16/52 ,  H01L21/681 ,  H01L21/682 ,  H01L21/68735 ,  H01L21/68742 ,  H01L27/3244 ,  H01L51/0012 ,  H01L51/56

Abstract: A deposition apparatus for performing a deposition process by using a mask with respect to a substrate, the deposition apparatus includes a chamber, a support unit in the chamber, the support unit including first holes and being configured to support the substrate, a supply unit configured to supply at least one deposition raw material toward the substrate, and movable alignment units through the first holes of the support unit, the alignment units being configured to support the mask and to align the mask with respect to the substrate.

公开(公告)号：US09590207B2

公开(公告)日：2017-03-07

申请号：US15073354

申请日：2016-03-17

Applicant: Samsung Display Co., Ltd.

Inventor： Myung-Soo Huh ,  Sun-Ho Kim ,  Hyun-Woo Joo ,  Jae-Hyun Kim

IPC: H01L51/52 ,  H01L51/56 ,  H01L51/00 ,  H01L27/32 ,  H01L51/50

CPC classification number: H01L51/5253 ,  H01L27/3244 ,  H01L51/001 ,  H01L51/5012 ,  H01L51/56 ,  H01L2251/558

Abstract: A deposition apparatus is configured to form a deposition layer on a substrate. The deposition apparatus includes a deposition source configured to face a first side of the substrate and to spray one or more depositing materials toward the substrate, a cooling stage configured to support a second side of the substrate that is opposite from the first side of the substrate, and a hardening unit configured to harden the one or more depositing materials sprayed from the deposition source and that have reached the substrate. A method of forming a thin film deposition layer on a substrate by using a deposition apparatus is also provided. The method includes spraying one or more depositing materials toward the substrate by using a deposition source of the deposition apparatus while the substrate is on a cooling stage of the deposition apparatus.

Abstract translation: 沉积装置被配置为在基底上形成沉积层。 沉积设备包括沉积源，其构造成面向基板的第一侧并且向基板喷射一个或多个沉积材料;冷却台，被配置为支撑基板的与基板的第一侧相对的第二面 以及硬化单元，其被配置为硬化从沉积源喷射并且已经到达基板的一个或多个沉积材料。 还提供了通过使用沉积设备在基板上形成薄膜沉积层的方法。 该方法包括通过使用沉积设备的沉积源将一种或多种沉积材料喷射到衬底，同时衬底位于沉积设备的冷却台上。

公开(公告)号：US20160348241A1

公开(公告)日：2016-12-01

申请号：US15231647

申请日：2016-08-08

Applicant: Samsung Display Co., Ltd.

Inventor： Cheol-Min Jang ,  Myung-Soo Huh ,  Suk-Won Jung ,  Jae-Hyun Kim ,  Sung-Chul Kim ,  Jin-Kwang Kim ,  Chang-Woo Shim ,  Sung-Hun Key ,  In-Kyo Kim

IPC: C23C16/455 ,  H01L51/00 ,  C23C16/44 ,  H01L51/56

CPC classification number: C23C16/45544 ,  C23C16/403 ,  C23C16/4412 ,  C23C16/45519 ,  C23C16/45563 ,  H01L27/3244 ,  H01L51/001 ,  H01L51/0011 ,  H01L51/50 ,  H01L51/56

Abstract: A vapor deposition apparatus for depositing a thin film on a substrate, by which a deposition process is efficiently performed and deposition film characteristics are easily improved, and a vapor deposition apparatus including: a stage onto which a substrate is disposed; and a supply unit disposed to face the substrate and having a main body member and a nozzle member disposed on one surface of the main body member facing the substrate, to sequentially supply a plurality of gases towards the substrate, and a method of manufacturing an organic light-emitting display apparatus using the same.

Abstract translation: 一种用于在基板上沉积薄膜的气相沉积设备，通过该气相沉积设备有效地进行沉积工艺并容易地改善沉积膜特性;以及气相沉积设备，包括：设置有基板的平台; 以及供给单元，其配置成面对基板，具有主体部件和喷嘴部件，所述主体部件和喷嘴部件配置在与所述基板相对的所述主体部件的一个表面上，以顺序向所述基板供给多个气体;以及制造有机物的方法 发光显示装置。