公开(公告)号：US20140053777A1

公开(公告)日：2014-02-27

申请号：US13689638

申请日：2012-11-29

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jai-Hyuk Choi ,  Myung-Soo Huh ,  Choel-Min Jang ,  Dong-Kyun Ko ,  In-Kyu Kim ,  Sung-Hun Key

IPC: C23C16/50

CPC classification number: C23C16/50 ,  C23C16/45519 ,  C23C16/45536 ,  C23C16/45551

Abstract: A vapor deposition apparatus that includes a first region having a first injecting unit for injecting a first raw material and a second region having a second injecting unit for injecting a second raw material, wherein the second injecting unit comprises a plasma generation unit, wherein the plasma generation unit comprises a plasma generator, a corresponding surface surrounding the plasma generator, and a plasma generation space formed between the plasma generator and the corresponding surface, and wherein distances between the plasma generator and the corresponding surface periodically vary along an outer circumference of the plasma generator. In the vapor deposition apparatus, the quality of thin film is increased by forming stable volume plasma through set positions where the plasma is generated in the plasma generation space.

Abstract translation: 一种蒸镀装置，其特征在于，具备：第一区域，具有用于注入第一原料的第一注入单元和具有用于注入第二原料的第二注入单元的第二区域，其中，所述第二注入单元包括等离子体产生单元， 生成单元包括等离子体发生器，围绕等离子体发生器的对应表面以及形成在等离子体发生器和对应表面之间的等离子体产生空间，并且其中等离子体发生器与对应表面之间的距离周期性地沿等离子体的外周变化 发电机。 在气相沉积装置中，通过在等离子体产生空间中产生等离子体的设定位置形成稳定的体积等离子体来提高薄膜的质量。