THIN FILM DEPOSITION DEVICE INCLUDING DEPOSITION-PREVENTING UNIT AND METHOD OF REMOVING DEPOSITS THEREOF
    1.
    发明申请
    THIN FILM DEPOSITION DEVICE INCLUDING DEPOSITION-PREVENTING UNIT AND METHOD OF REMOVING DEPOSITS THEREOF 审中-公开
    薄膜沉积装置,包括沉积单元及其沉积物的方法

    公开(公告)号:US20140227442A1

    公开(公告)日:2014-08-14

    申请号:US13924456

    申请日:2013-06-21

    CPC classification number: C23C16/4407 C23C14/564 C23C16/4401

    Abstract: Provided is a thin film deposition device including a deposition-preventing unit and a method of removing deposits thereof. The method includes: separating a deposition-preventing unit including at least one deposition-preventing plate and a deformation unit coupled to an outer surface of the at feast one deposition-preventing plate from a chamber of the thin film deposition device; and removing a film formation layer from the deposition-preventing plate.

    Abstract translation: 本发明提供一种薄膜沉积装置,其包括防沉积单元及其沉积物的去除方法。 该方法包括:将包括至少一个防沉积板和变形单元的沉积防止单元与薄膜沉积装置的室耦合到一个防沉积板的外表面; 以及从防沉积板去除成膜层。

    DEPOSITION APPARATUS, METHOD FOR FORMING THIN FILM USING THE SAME, ORGANIC LIGHT EMITTING DISPLAY APPARATUS AND METHOD FOR MANUFACTURING THE SAME
    2.
    发明申请
    DEPOSITION APPARATUS, METHOD FOR FORMING THIN FILM USING THE SAME, ORGANIC LIGHT EMITTING DISPLAY APPARATUS AND METHOD FOR MANUFACTURING THE SAME 有权
    沉积装置,使用其形成薄膜的方法,有机发光显示装置及其制造方法

    公开(公告)号:US20160197305A1

    公开(公告)日:2016-07-07

    申请号:US15073354

    申请日:2016-03-17

    Abstract: A deposition apparatus is configured to form a deposition layer on a substrate. The deposition apparatus includes a deposition source configured to face a first side of the substrate and to spray one or more depositing materials toward the substrate, a cooling stage configured to support a second side of the substrate that is opposite from the first side of the substrate, and a hardening unit configured to harden the one or more depositing materials sprayed from the deposition source and that have reached the substrate. A method of forming a thin film deposition layer on a substrate by using a deposition apparatus is also provided. The method includes spraying one or more depositing materials toward the substrate by using a deposition source of the deposition apparatus while the substrate is on a cooling stage of the deposition apparatus.

    Abstract translation: 沉积装置被配置为在基底上形成沉积层。 沉积设备包括沉积源,其构造成面向基板的第一侧并且向基板喷射一个或多个沉积材料;冷却台,被配置为支撑基板的与基板的第一侧相对的第二面 以及硬化单元,其被配置为硬化从沉积源喷射并且已经到达基板的一个或多个沉积材料。 还提供了通过使用沉积设备在基板上形成薄膜沉积层的方法。 该方法包括通过使用沉积设备的沉积源将一种或多种沉积材料喷射到衬底,同时衬底位于沉积设备的冷却台上。

    Deposition apparatus, method for forming thin film using the same, organic light emitting display apparatus and method for manufacturing the same
    3.
    发明授权
    Deposition apparatus, method for forming thin film using the same, organic light emitting display apparatus and method for manufacturing the same 有权
    沉积装置,使用其形成薄膜的方法,有机发光显示装置及其制造方法

    公开(公告)号:US09590207B2

    公开(公告)日:2017-03-07

    申请号:US15073354

    申请日:2016-03-17

    Abstract: A deposition apparatus is configured to form a deposition layer on a substrate. The deposition apparatus includes a deposition source configured to face a first side of the substrate and to spray one or more depositing materials toward the substrate, a cooling stage configured to support a second side of the substrate that is opposite from the first side of the substrate, and a hardening unit configured to harden the one or more depositing materials sprayed from the deposition source and that have reached the substrate. A method of forming a thin film deposition layer on a substrate by using a deposition apparatus is also provided. The method includes spraying one or more depositing materials toward the substrate by using a deposition source of the deposition apparatus while the substrate is on a cooling stage of the deposition apparatus.

    Abstract translation: 沉积装置被配置为在基底上形成沉积层。 沉积设备包括沉积源,其构造成面向基板的第一侧并且向基板喷射一个或多个沉积材料;冷却台,被配置为支撑基板的与基板的第一侧相对的第二面 以及硬化单元,其被配置为硬化从沉积源喷射并且已经到达基板的一个或多个沉积材料。 还提供了通过使用沉积设备在基板上形成薄膜沉积层的方法。 该方法包括通过使用沉积设备的沉积源将一种或多种沉积材料喷射到衬底,同时衬底位于沉积设备的冷却台上。

    Deposition apparatus, method for forming thin film using the same, organic light emitting display apparatus and method for manufacturing the same
    4.
    发明授权
    Deposition apparatus, method for forming thin film using the same, organic light emitting display apparatus and method for manufacturing the same 有权
    沉积装置,使用其形成薄膜的方法,有机发光显示装置及其制造方法

    公开(公告)号:US09306192B2

    公开(公告)日:2016-04-05

    申请号:US13965182

    申请日:2013-08-12

    Abstract: A deposition apparatus is configured to form a deposition layer on a substrate. The deposition apparatus includes a deposition source configured to face a first side of the substrate and to spray one or more depositing materials toward the substrate, a cooling stage configured to support a second side of the substrate that is opposite from the first side of the substrate, and a hardening unit configured to harden the one or more depositing materials sprayed from the deposition source and that have reached the substrate. A method of forming a thin film deposition layer on a substrate by using a deposition apparatus is also provided. The method includes spraying one or more depositing materials toward the substrate by using a deposition source of the deposition apparatus while the substrate is on a cooling stage of the deposition apparatus.

    Abstract translation: 沉积装置被配置为在基底上形成沉积层。 沉积设备包括沉积源,其构造成面向基板的第一侧并且向基板喷射一个或多个沉积材料;冷却台,被配置为支撑基板的与基板的第一侧相对的第二面 以及硬化单元,其被配置为硬化从沉积源喷射并且已经到达基板的一个或多个沉积材料。 还提供了通过使用沉积设备在基板上形成薄膜沉积层的方法。 该方法包括通过使用沉积设备的沉积源将一种或多种沉积材料喷射到衬底,同时衬底位于沉积设备的冷却台上。

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