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    Canister
    2.
    发明授权
    Canister 有权
    罐

    公开(公告)号：US09057125B2

    公开(公告)日：2015-06-16

    申请号：US13710310

    申请日：2012-12-10

    Applicant: SAMSUNG DISPLAY CO., LTD.

    Inventor： Choel-Min Jang ,  Myung-Soo Huh ,  Suk-Won Jung ,  Sung-Yong Lee ,  Cheol-Rae Jo ,  In-Kyo Kim ,  Sung-Hun Key

    IPC: B01F3/04 ,  C23C16/00 ,  C23C16/448

    CPC classification number: C23C16/00 ,  B01F3/04 ,  C23C16/4481 ,  C23C16/4482

    Abstract: A canister includes an accommodation portion for accommodating a liquid material; an outlet pipe that is connected to the accommodation portion so as to discharge a gas material obtained by vaporizing the liquid material; a blocking cover that is connected to an upper surface of the accommodation portion; and a plurality of baffle plates that are disposed in the accommodation portion and are spaced apart from each other. The canister further includes a restrictor including a main body member that is disposed between the plurality of baffle plates and the blocking cover and is connected to an internal surface of the accommodation portion, an extension member extending from the main body member, and a through portion that is formed through the main body member and the extension member. A deposition procedure using the canister is efficiently performed and characteristics of a deposition layer are easily improved.

    Abstract translation: 罐包括用于容纳液体材料的容纳部分; 出口管，其连接到容纳部分，以排出通过汽化液体材料获得的气体材料; 阻挡盖，其连接到所述容纳部的上表面; 以及设置在容纳部分中并彼此间隔开的多个挡板。 所述罐还包括限制器，所述限制器包括主体部件，所述主体部件设置在所述多个挡板和所述阻挡盖之间，并且连接到所述容纳部的内表面，从所述主体部件延伸的延伸部件， 其通过主体构件和延伸构件形成。 可以有效地进行使用罐的沉积工序，容易地提高沉积层的特性。

    VAPOR DEPOSITION APPARATUS
    3.
    发明申请
    VAPOR DEPOSITION APPARATUS 审中-公开
    蒸气沉积装置

    公开(公告)号：US20150027371A1

    公开(公告)日：2015-01-29

    申请号：US14161984

    申请日：2014-01-23

    Applicant: SAMSUNG DISPLAY CO., LTD.

    Inventor： Jin-Kwang Kim ,  Seung-Yong Song ,  Myung-Soo Huh ,  Suk-Won Jung ,  Choel-Min Jang ,  Jae-Hyun Kim ,  Sung-Chul Kim

    IPC: C23C16/455

    CPC classification number: C23C16/45574 ,  C23C16/45536 ,  C23C16/45551

    Abstract: A vapor deposition apparatus for providing a deposition film on a substrate, the vapor deposition apparatus includes a plurality of first nozzle parts which injects a first raw material toward the substrate; a plurality of second nozzle parts which is alternately disposed together with the plurality of first nozzle parts and injects a second raw material toward the substrate; a diffuser unit which distributes the second raw material to the plurality of second nozzle parts; and a supply unit which supplies the second raw material to the diffuser unit.

    Abstract translation: 一种用于在基板上提供沉积膜的气相沉积设备，所述气相沉积设备包括多个第一喷嘴部分，其向所述基板注入第一原料; 多个第二喷嘴部，与所述多个第一喷嘴部交替地配置，向所述基板喷射第二原料; 扩散器单元，其将所述第二原料分配到所述多个第二喷嘴部分; 以及将第二原料供给到扩散器单元的供给单元。

    VAPOR DEPOSITION APPARATUS
    5.
    发明申请
    VAPOR DEPOSITION APPARATUS 审中-公开

    公开(公告)号：US20190169747A1

    公开(公告)日：2019-06-06

    申请号：US16271189

    申请日：2019-02-08

    Applicant: SAMSUNG DISPLAY CO., LTD.

    Inventor： Jin-Kwang Kim ,  Seung-Yong Song ,  Myung-Soo Huh ,  Suk-Won Jung ,  Choel-Min Jang ,  Jae-Hyun Kim ,  Sung-Chul Kim

    IPC: C23C16/455

    Abstract: A vapor deposition apparatus for providing a deposition film on a substrate, the vapor deposition apparatus includes a plurality of first nozzle parts which injects a first raw material toward the substrate; a plurality of second nozzle parts which is alternately disposed together with the plurality of first nozzle parts and injects a second raw material toward the substrate; a diffuser unit which distributes the second raw material to the plurality of second nozzle parts; and a supply unit which supplies the second raw material to the diffuser unit.

    Vapor deposition apparatus
    7.
    发明授权
    Vapor deposition apparatus 有权

    公开(公告)号：US10944082B2

    公开(公告)日：2021-03-09

    申请号：US16045909

    申请日：2018-07-26

    Applicant: SAMSUNG DISPLAY CO., LTD.

    Inventor： Myung-Soo Huh ,  Suk-Won Jung ,  Jin-Kwang Kim ,  In-Kyo Kim ,  Choel-Min Jang

    IPC: H01L51/56 ,  H01J37/32 ,  C23C16/452

    Abstract: A vapor deposition apparatus for forming a deposition layer on a substrate, the vapor deposition apparatus includes a supply unit configured to receive a first source gas, a reaction space connected to the supply unit, a plasma generator in the reaction space, a first injection unit configured to inject a deposition source material to the substrate, the deposition source material including the first source gas, and a filament unit in the reaction space, the filament unit being connected to a power source.

    Method of depositing an atomic layer
    9.
    发明授权
    Method of depositing an atomic layer 有权
    沉积原子层的方法

    公开(公告)号：US09556520B2

    公开(公告)日：2017-01-31

    申请号：US14296029

    申请日：2014-06-04

    Applicant: Samsung Display Co., Ltd.

    Inventor： Choel-Min Jang ,  Sung-Hun Key ,  In-Kyo Kim ,  Suk-Won Jung ,  Myung-Soo Huh

    IPC: C23C16/455 ,  C23C16/458

    CPC classification number: C23C16/45574 ,  C23C16/45551 ,  C23C16/458

    Abstract: A method of depositing a layer includes spraying a source gas and a reactant gas onto a substrate disposed on a susceptor unit using at least one source gas spray nozzle and at least one reactant gas nozzle to form a first source gas region and a first reactant gas region on the substrate, respectively, moving the susceptor unit by a distance corresponding to a width of the source gas spray nozzle or a width of the reactant gas spray nozzle in a first direction, and spraying the source gas and the reactant gas onto the first reactant gas region and the first source gas region using the source gas spray nozzle and the reactant gas nozzle, respectively, to form a first monolayer.

    Abstract translation: 沉积层的方法包括使用至少一个源气体喷嘴和至少一个反应气体喷嘴将源气体和反应气体喷射到设置在基座单元上的基板上，以形成第一源气体区域和第一反应气体 区域，分别使基座单元沿着第一方向移动对应于源气体喷嘴的宽度的距离或反应气体喷嘴的宽度，并将源气体和反应气体喷射到第一方向上 反应气体区域和第一源气体区域分别使用源气体喷嘴和反应气体喷嘴形成第一单层。

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