公开(公告)号：US20250037966A1

公开(公告)日：2025-01-30

申请号：US18910626

申请日：2024-10-09

Applicant: ASML Netherlands B.V.

Inventor： Jinmei YANG ,  Jian ZHANG ,  Zhiwen KANG ,  Yixiang WANG

IPC: H01J37/28 ,  G01N23/2251 ,  H01J37/26

Abstract: A sensor may be used to measure a degree of tilt of a sample. The sensor may include an apparatus having a light source, first, second, and third optical elements, a lens, and an aperture. The first optical element may supply light from the light source toward the sample, and may supply light input into the first optical element from the sample toward the second optical element. The second optical element may supply light toward first and second sensing elements. An aperture may be arranged on a focal plane of the lens. A light beam incident on the first sensing element may be a reference beam.

公开(公告)号：US20240369356A1

公开(公告)日：2024-11-07

申请号：US18776207

申请日：2024-07-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Yan WANG ,  Jian ZHANG ,  Zhiwen KANG ,  Yixiang WANG

IPC: G01B15/08 ,  H01J37/20 ,  H01J37/21 ,  H01J37/22 ,  H01J37/28

Abstract: An inspection apparatus for adjusting a working height for a substrate for multiple target heights is disclosed. The inspection apparatus includes a radiation source configured to provide a radiation beam and a beam splitter configured to split the radiation beam into multiple beamlets that each reflect off a substrate. Each beamlet contains light of multiple wavelengths. The inspection apparatus includes multiple light reflecting components, wherein each light reflecting component is associated with one of the beamlets reflecting off the substrate and is configured to support a different target height for the substrate by detecting a height or a levelness of the substrate based on the beamlet reflecting off the substrate.

公开(公告)号：US20230335374A1

公开(公告)日：2023-10-19

申请号：US18019088

申请日：2021-07-27

Applicant: ASML Netherlands B.V.

Inventor： Benoit Herve GAURY ,  Jun JIANG ,  Bruno LA FONTAINE ,  Shakeeb Bin HASAN ,  Kenichi KANAI ,  Jasper Frans Mathijs VAN RENS ,  Cyrus Emil TABERY ,  Long MA ,  Oliver Desmond PATTERSON ,  Jian ZHANG ,  Chih-Yu JEN ,  Yixiang WANG

IPC: H01J37/26 ,  G01N23/2251 ,  H01J37/244 ,  H01J37/22

CPC classification number: H01J37/265 ,  G01N23/2251 ,  H01J37/244 ,  H01J37/228 ,  H01J2237/2482

Abstract: Systems and methods of observing a sample using a charged-particle beam apparatus in voltage contrast mode are disclosed. The charged-particle beam apparatus comprises a charged-particle source, an optical source, a charged-particle detector configured to detect charged particles, and a controller having circuitry configured to apply a first signal to cause the optical source to generate the optical pulse, apply a second signal to the charged-particle detector to detect the second plurality of charged particles, and adjust a time delay between the first and the second signals. In some embodiments, the controller having circuitry may be further configured to acquire a plurality of images of a structure, to determine an electrical characteristic of the structure based on the rate of gray level variation of the plurality of images of the structure, and to simulate, using a model, a physical characteristic of the structure based on the determined electrical characteristic.

公开(公告)号：US20230005698A1

公开(公告)日：2023-01-05

申请号：US17778579

申请日：2020-10-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Tianming CHEN ,  Chiyan KUAN ,  Yixiang WANG ,  Zhi Po WANG

IPC: H01J37/02 ,  G03F7/20

Abstract: A system for grounding a mask using a grounding component are provided. Some embodiments of the system include a grounding component comprising a base and an extension protruding from the base and comprising a conductive prong configured to contact a conductive layer of the mask. Some embodiments of the system include a plurality of conductive prongs configured to contact multiple positions of a conductive layer of the mask. Some other embodiments of the system include an extension comprising various shapes.

公开(公告)号：US20220351932A1

公开(公告)日：2022-11-03

申请号：US17633556

申请日：2020-08-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Jian ZHANG ,  Ning YE ,  Zhiwen KANG ,  Yixiang WANG

IPC: H01J37/02 ,  G02B27/09

Abstract: A system and a method for manipulating a beam of an Advanced Charge Controller module in different planes in an e-beam system are provided. Some embodiments of the system include a lens system configured to manipulate a beam in the tangential plane and the sagittal plane such that the beam spot is projected onto the wafer with high luminous energy. Some embodiments of the system include a lens system comprising at least two cylindrical lens.

公开(公告)号：US20220277926A1

公开(公告)日：2022-09-01

申请号：US17753298

申请日：2020-08-25

Applicant: ASML Netherlands B.V.

Inventor： Yixiang WANG ,  Shibing LIU ,  Shanhui CAO ,  Kangsheng QIU ,  Juying DOU ,  Ying LUO ,  Yinglong LI ,  Qiang LI ,  Ronald VAN DER WILK ,  Jan-Gerard Cornelis VAN DER TOORN

IPC: H01J37/20 ,  H01L21/683

Abstract: Systems and methods for wafer grounding and wafer grounding location adjustment are disclosed. A first method may include receiving a first value of an electric characteristic associated with the wafer being grounded by an electric signal; determining a first control parameter using at least the first value; and controlling a characteristic of the electric signal using the first control parameter and the first value. A second method for adjusting a grounding location for a wafer may include terminating an electric connection between the wafer and at least one grounding pin in contact the wafer; adjusting a relative position between the wafer and the grounding pin; and restoring the electric connection between the grounding pin and the wafer. A third method may include causing a grounding pin to penetrate through a coating on the wafer by impact; and establishing an electrical connection between the grounding pin and the wafer.

公开(公告)号：US20220107176A1

公开(公告)日：2022-04-07

申请号：US17487896

申请日：2021-09-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Yan WANG ,  Jian ZHANG ,  Zhiwen KANG ,  Yixiang WANG

IPC: G01B15/08 ,  H01J37/22 ,  H01J37/20 ,  H01J37/21

Abstract: An inspection apparatus for adjusting a working height for a substrate for multiple target heights is disclosed. The inspection apparatus includes a radiation source configured to provide a radiation beam and a beam splitter configured to split the radiation beam into multiple beamlets that each reflect off a substrate. Each beamlet contains light of multiple wavelengths. The inspection apparatus includes multiple light reflecting components, wherein each light reflecting component is associated with one of the beamlets reflecting off the substrate and is configured to support a different target height for the substrate by detecting a height or a levelness of the substrate based on the beamlet reflecting off the substrate.

公开(公告)号：US20210396683A1

公开(公告)日：2021-12-23

申请号：US17283930

申请日：2019-09-20

Applicant: ASML Netherlands B.V.

Inventor： Jian ZHANG ,  Yixiang WANG ,  Zhiwen KANG

IPC: G01N21/95 ,  G01N21/88

Abstract: An illumination unit comprising a first electromagnetic wave source including circuitry for outputting a first electromagnetic wave in a first direction to illuminate a first region of a sample; a second electromagnetic wave source including circuitry for outputting a second electromagnetic wave in a second direction substantially opposite to the first direction; and a reflector configured to reflect the second electromagnetic wave substantially in the first direction to illuminate a second region of the sample.

公开(公告)号：US20200279715A1

公开(公告)日：2020-09-03

申请号：US16650840

申请日：2018-09-21

Applicant: ASML Netherlands B.V.

Inventor： Jian ZHANG ,  Zhiwen KANG ,  Yixiang WANG

IPC: H01J37/22 ,  G02B27/42 ,  G01C3/08

Abstract: An optical height detection system in a charged particle beam inspection system. The optical height detection system includes a projection unit including a modulated illumination source, a projection grating mask including a projection grating pattern, and a projection optical unit for projecting the projection grating pattern to a sample; and a detection unit including a first detection grating mask including a first detection grating pattern, a second detection grating mask including a second detection grating pattern, and a detection optical system for forming a first grating image from the projection grating pattern onto the first detection grating mask and forming a second grating image from the projection grating pattern onto the second detection grating masks. The first and second detection grating patterns at least partially overlap the first and second grating images, respectively.

公开(公告)号：US20200271598A1

公开(公告)日：2020-08-27

申请号：US16812109

申请日：2020-03-06

Applicant: ASML Netherlands B.V.

Inventor： Kuo-Feng TSENG ,  Zhonghua DONG ,  Yixiang WANG ,  Zhong-wei CHEN

IPC: G01N23/203 ,  G01N23/2276 ,  G01N23/2254 ,  G01N23/2252

Abstract: Disclosed herein is an apparatus comprising: a source configured to emit charged particles, an optical system and a stage; wherein the stage is configured to support a sample thereon and configured to move the sample by a first distance in a first direction; wherein the optical system is configured to form probe spots on the sample with the charged particles; wherein the optical system is configured to move the probe spots by the first distance in the first direction and by a second distance in a second direction, simultaneously, while the stage moves the sample by the first distance in the first direction; wherein the optical system is configured to move the probe spots by the first distance less a width of one of the probe spots in an opposite direction of the first direction, after the stage moves the sample by the first distance in the first direction.