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公开(公告)号：US20150268559A1
公开(公告)日：2015-09-24
申请号：US14439476
申请日：2013-10-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Ramin Badie , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Antonius Theodorus Wilhelmus Kempen , Andrei Mikhailovich Yakunin , Hendrikus Robertus Marie Van Greevenbroek , Koen Gerhardus Winkels
CPC classification number: G03F7/70033 , H05G2/003 , H05G2/006 , H05G2/008
Abstract: A radiation source (e.g., LPP— laser produced plasma source) for generation of extreme UV (EUV) radiation has at least two fuel particle streams having different trajectories. Each stream is directed to cross the path of an excitation (laser) beam focused at a plasma formation region, but the trajectories are spaced apart at the plasma formation region, and the streams phased, so that only one stream has a fuel particle in the plasma formation region at any time, and so that when a fuel particle from one stream is generating plasma and EUV radiation at the plasma generation region, other fuel particles are sufficiently spaced so as to be substantially unaffected by the plasma. The arrangement permits potential doubling of the radiation intensity achievable for a particular fuel particle size.
Abstract translation: 用于产生极端UV（EUV）辐射的辐射源（例如，LPP激光产生的等离子体源）具有至少两个具有不同轨迹的燃料粒子流。 每个流被引导以跨过等离子体形成区域聚焦的激发（激光）束的路径，但是轨迹在等离子体形成区域处被间隔开，并且流被相位化，使得仅一条流在 等离子体形成区域，并且使得当来自一个流的燃料粒子在等离子体产生区域产生等离子体和EUV辐射时，其它燃料颗粒被充分间隔开，以致基本上不受等离子体的影响。 该布置允许对于特定燃料粒子尺寸可实现的辐射强度的潜在加倍。
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22.发明申请Lithographic Apparatus Comprising a Support for Holding an Object, and a Support for Use therein 有权平版印刷设备包括用于保持物体的支撑件及其中使用的支撑件公开(公告)号：US20150002832A1
公开(公告)日：2015-01-01
申请号：US14377141
申请日：2013-02-04
Applicant: ASML Netherlands B.V.
Inventor： Theodorus Petrus Maria Cadee , Vadim Yevgenyevich Banine , Koen Jacobus Johannes Maria Zaal , Ramin Badie , Harmeet Singh
IPC: G03F7/20
CPC classification number: G03F7/70725 , G03F7/70708 , G03F7/70733 , H01L21/6875
Abstract: A lithographic apparatus has a support that is provided with burls for holding an object. The support has been fabricated with a lithographic manufacturing method, e.g., a MEMS-technology, so as to create burls whose orientations or positions are individually electrically controllable.
Abstract translation: 光刻设备具有一个支撑件，该支撑件设置有用于保持物体的毛刺。 已经利用诸如MEMS技术的光刻制造方法来制造支撑件，以便产生其取向或位置可单独地电可控制的孔。
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公开(公告)号：US10900829B2
公开(公告)日：2021-01-26
申请号：US16525641
申请日：2019-07-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Vadim Yevgenyevich Banine , Gerrit Jacobus Hendrik Brussaard , Willem Jakobus Cornelis Koppert , Otger Jan Luiten , Han-Kwang Nienhuys , Job Beckers , Ruud Martinus Van Der Horst
Abstract: A radiation sensor apparatus for determining a position and/or power of a radiation beam, the radiation sensor apparatus including a chamber to contain a gas, one or more sensors, and a processor. The chamber has a first opening and a second opening such that a radiation beam can enter the chamber through the first opening, propagate through the chamber generally along an axis, and exit the chamber through the second opening. Each of the one or more sensors is arranged to receive and detect radiation emitted from a region of the chamber around the axis. The processor is operable to use the radiation detected by the one or more sensors to determine a position and/or power of the radiation beam.
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公开(公告)号：US10712678B2
公开(公告)日：2020-07-14
申请号：US15046284
申请日：2016-02-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Yvonne Wendela Kruijt-Stegeman , Andre Bernardus Jeunink , Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Frederik Dijksman , Carolus Johannes Catharina Schoormans , Adrianus Hendrik Koevoets , Catharinus De Schiffart , Sander Frederik Wuister
IPC: B29C43/58 , G03F9/00 , B82Y10/00 , B82Y40/00 , G03F7/00 , G03F7/20 , B29C43/02 , B29C59/02 , B29C59/16
Abstract: An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.
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25.发明授权公开(公告)号：US10698312B2
公开(公告)日：2020-06-30
申请号：US16247179
申请日：2019-01-14
Applicant: ASML Netherlands B.V.
Inventor： Pieter-Jan Van Zwol , Vadim Yevgenyevich Banine , Jozef Petrus Henricus Benschop , Florian Didier Albin Dhalluin , Mária Péter , Luigi Scaccabarozzi , Willem Joan Van Der Zande
Abstract: A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane has one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 1017 cm−3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are within some or all of the additional layers.
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Patent Agency Ranking
公开(公告)号：US10001709B2
公开(公告)日：2018-06-19
申请号：US15432698
申请日：2017-02-14
Applicant: ASML Netherlands B.V.
Inventor： Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin , Antonius Johannes Josephus Van Dijsseldonk , Wilhelmus Petrus De Boeij
CPC classification number: G03F7/70191 , B82Y10/00 , G02B1/11 , G02B5/1838 , G02B5/281 , G02B5/283 , G03F7/70008 , G03F7/702 , G03F7/70308 , G03F7/70575 , G21K1/062 , G21K1/067 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
Abstract: A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
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公开(公告)号：US09964858B2
公开(公告)日：2018-05-08
申请号：US14807458
申请日：2015-07-23
Applicant: ASML NETHERLANDS B.V.
Inventor： Joannes Theodoor De Smit , Vadim Yevgenyevich Banine , Theodorus Hubertus Josephus Bisschops , Marcel Mathijs Theodore Marie Dierichs , Theodorus Marinus Modderman
CPC classification number: G03F7/70341 , G03F7/708 , G03F7/70858
Abstract: A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.
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28.发明授权Methods of providing patterned epitaxy templates for self-assemblable block copolymers for use in device lithography 有权提供用于自组装嵌段共聚物的图案化外延模板用于器件光刻的方法公开(公告)号：US09513553B2
公开(公告)日：2016-12-06
申请号：US14387186
申请日：2013-03-19
Applicant: ASML Netherlands B.V.
Inventor： Sander Frederik Wuister , Vadim Yevgenyevich Banine , Jozef Maria Finders , Roelof Koole , Emiel Peeters , Harmeet Singh
CPC classification number: G03F7/26 , B05D1/32 , B05D3/107 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/20 , G03F7/2022
Abstract: A method is disclosed to form a patterned epitaxy template, on a substrate, to direct self-assembly of block copolymer for device lithography. A resist layer on a substrate is selectively exposed with actinic (e.g. UV or DUV) radiation by photolithography to provide exposed portions in a regular lattice pattern of touching or overlapping shapes arranged to leave unexposed resist portions between the shapes. Exposed or unexposed resist is removed with remaining resist portions providing the basis for a patterned epitaxy template for the orientation of the self-assemblable block copolymer as a hexagonal or square array. The method allows for simple, direct UV lithography to form patterned epitaxy templates with sub-resolution features.
Abstract translation: 公开了一种在衬底上形成图案化外延模板以引导用于器件光刻的嵌段共聚物的自组装的方法。 基板上的抗蚀剂层通过光刻法选择性地用光化（例如UV或DUV）曝光，以提供布置成在形状之间留下未曝光的抗蚀剂部分的接触或重叠形状的规则格子图案的暴露部分。 用剩余的抗蚀剂部分除去曝光或未曝光的抗蚀剂，为用于可自组装嵌段共聚物取向的图案化外延模板提供六边形或正方形阵列的基础。 该方法允许简单的直接UV光刻形成具有亚分辨率特征的图案化外延模板。
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29.发明授权Source-collector device, lithographic apparatus, and device manufacturing method 有权源极集电极器件，光刻设备和器件制造方法公开(公告)号：US09411238B2
公开(公告)日：2016-08-09
申请号：US14372950
申请日：2013-01-10
Applicant: ASML Netherlands B.V.
Inventor： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Martinus Cornelis Maria Verhagen , Olav Waldemar Vladimir Frijns , Vladimir Mihailovitch Krivtsun , Gerardus Hubertus Petrus Maria Swinkels , Michel Riepen , Hendrikus Gijsbertus Schimmel , Viacheslav Medvedev
CPC classification number: G03F7/70033 , G03F7/70166 , G03F7/70191 , G03F7/70575 , G03F7/70916 , G21K1/067 , G21K2201/064 , H05G2/008
Abstract: A source-collector device includes a target unit having a target surface of plasma-forming material and a laser unit to generate a beam of radiation directed onto the target surface to form a plasma from said plasma-forming material. A contaminant trap is provided to reduce propagation of particulate contaminants generated by the plasma. A radiation collector includes a one or more grazing-incidence reflectors arranged to collect radiation emitted by the plasma and form a beam therefrom, and a filter is configured to attenuate at least one wavelength range of the beam.
Abstract translation: 源极 - 集电极器件包括具有等离子体形成材料的靶表面的靶单元和用于产生被引导到靶表面上的辐射束以形成来自所述等离子体形成材料的等离子体的激光单元。 提供污染物阱以减少由等离子体产生的颗粒污染物的传播。 辐射收集器包括一个或多个放射入射反射器，其布置成收集由等离子体发射的辐射并从其形成光束，并且滤光器被配置为衰减光束的至少一个波长范围。
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公开(公告)号：US20150296602A1
公开(公告)日：2015-10-15
申请号：US14440934
申请日：2013-10-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Erik Roelof Loopstra , Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Andrey Nikipelov , Edgar Alberto Osorio Oliveros , Alexander Matthijs Struycken , Bert Pieter Van Drieënhuizen , Jan Bernard Plechelmus Van Schoot
IPC: H05G2/00
CPC classification number: H05G2/006 , G03F7/70033 , G03F7/7085 , G21K1/062 , G21K2201/067 , H01S3/073 , H01S3/08059 , H01S3/0815 , H01S3/1307 , H01S3/2232 , H01S3/2383 , H05G2/008
Abstract: A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous-wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to generate a radiation generating plasma.
Abstract translation: 一种为光刻设备产生辐射的方法。 该方法包括在等离子体形成位置（12）处提供连续更新的燃料靶（50）并且引导等离子体形成位置处的连续波激发束（6），使得连续更新的燃料靶内的燃料被连续的 波激发光束产生辐射产生等离子体。
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