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公开(公告)号:US20150296602A1
公开(公告)日:2015-10-15
申请号:US14440934
申请日:2013-10-10
Applicant: ASML NETHERLANDS B.V.
Inventor: Erik Roelof Loopstra , Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Andrey Nikipelov , Edgar Alberto Osorio Oliveros , Alexander Matthijs Struycken , Bert Pieter Van Drieënhuizen , Jan Bernard Plechelmus Van Schoot
IPC: H05G2/00
CPC classification number: H05G2/006 , G03F7/70033 , G03F7/7085 , G21K1/062 , G21K2201/067 , H01S3/073 , H01S3/08059 , H01S3/0815 , H01S3/1307 , H01S3/2232 , H01S3/2383 , H05G2/008
Abstract: A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous-wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to generate a radiation generating plasma.
Abstract translation: 一种为光刻设备产生辐射的方法。 该方法包括在等离子体形成位置(12)处提供连续更新的燃料靶(50)并且引导等离子体形成位置处的连续波激发束(6),使得连续更新的燃料靶内的燃料被连续的 波激发光束产生辐射产生等离子体。
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公开(公告)号:US09986628B2
公开(公告)日:2018-05-29
申请号:US14440934
申请日:2013-10-10
Applicant: ASML Netherlands B.V.
Inventor: Erik Roelof Loopstra , Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Andrey Nikipelov , Edgar Alberto Osorio Oliveros , Alexander Matthijs Struycken , Bert Pieter Van Drieënhuizen , Jan Bernard Plechelmus Van Schoot
IPC: H05G2/00 , G03F7/20 , H01S3/08 , G21K1/06 , H01S3/23 , H01S3/07 , H01S3/081 , H01S3/13 , H01S3/223
CPC classification number: H05G2/006 , G03F7/70033 , G03F7/7085 , G21K1/062 , G21K2201/067 , H01S3/073 , H01S3/08059 , H01S3/0815 , H01S3/1307 , H01S3/2232 , H01S3/2383 , H05G2/008
Abstract: A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous-wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to a radiation generating plasma.
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