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21.
公开(公告)号:US06596152B2
公开(公告)日:2003-07-22
申请号:US09779653
申请日:2001-02-09
申请人: Ching-Tang Yang , Hung-Yin Tsai , Tung-Chuan Wu
发明人: Ching-Tang Yang , Hung-Yin Tsai , Tung-Chuan Wu
IPC分类号: B23H300
CPC分类号: B23H5/02
摘要: The present invention relates to an arc processing method and device with simultaneous chemical etching wherein the device comprises a conductive electrode, being the cathode, an auxiliary electrode, being the anode, an conductive fluid, and an non-conductive work piece for processing. Processing, and precision processing in particular, of non-conductive materials is obtained by simultaneous arc discharge and etching that are brought about by chemical reactions associated with cathode and anode. Moreover, the present invention discloses simultaneous arc processing and chemical etching that offers improved processing efficiency over conventional arc processing.
摘要翻译: 本发明涉及具有同时化学蚀刻的电弧加工方法和装置,其中该装置包括作为阴极的导电电极,作为阳极的辅助电极,导电流体和用于加工的非导电工件。 通过与阴极和阳极相关的化学反应引起的同时电弧放电和蚀刻,可获得非导电材料的加工和精密加工。 此外,本发明公开了同时进行的电弧处理和化学蚀刻,其提供比常规电弧处理更高的处理效率。
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22.
公开(公告)号:US06503387B2
公开(公告)日:2003-01-07
申请号:US09779529
申请日:2001-02-09
申请人: Ching-Tang Yang , Hung-Yin Tsai , Tung-Chuan Wu
发明人: Ching-Tang Yang , Hung-Yin Tsai , Tung-Chuan Wu
IPC分类号: B23H500
摘要: The present invention relates to an electrochemical discharge method and device with self-acting bubble layers, wherein the device comprises an electrode, being the cathode, capable of supplying self-acting bubble layers, an auxiliary electrode, being the anode, an conducting fluid, and an non-conductive work piece for processing. Processing, and precision processing in particular, of non-conductive materials is obtained by arc discharge caused by high voltage application and chemical reactions associated with cathode and anode.
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公开(公告)号:US08985056B2
公开(公告)日:2015-03-24
申请号:US13419090
申请日:2012-03-13
申请人: Rong-Shun Chen , Jhih-Shun Yang , Yu-Ching Lin , Hung-Yin Tsai , Chien-Hung Lin , Hong Hocheng , Li-An Chu
发明人: Rong-Shun Chen , Jhih-Shun Yang , Yu-Ching Lin , Hung-Yin Tsai , Chien-Hung Lin , Hong Hocheng , Li-An Chu
IPC分类号: A01K1/03 , A01K67/033
CPC分类号: A01K67/033
摘要: A detecting platform for holding a tiny insect includes a main body forming a containing space, which passes through the main body and is surrounded by side walls of the main body. A first side wall and a second side wall of the side walls are opposite to each other, and the area of the second side wall is smaller than that of the first side wall. The main body forms a first opening and a second opening passing through the first side wall and the second side wall respectively for the tiny insects entering and leaving the containing space. A bottom plate covers a first through surface of the containing space to form a bottom surface and a detecting area is configured thereon to holding the tiny insects. Accordingly, the tiny insects can stay on the detecting area so as to detect the characteristics of the tiny insects expediently.
摘要翻译: 用于保持微小昆虫的检测平台包括形成容纳空间的主体,该主体穿过主体并被主体的侧壁包围。 侧壁的第一侧壁和第二侧壁彼此相对,并且第二侧壁的面积小于第一侧壁的面积。 主体分别形成通过第一侧壁和第二侧壁的第一开口和第二开口,用于进入和离开容纳空间的微小昆虫。 底板覆盖容纳空间的第一通过表面以形成底面,并且在其上构造检测区域以保持微小的昆虫。 因此,微小的昆虫可以留在检测区域,以方便地检测微小昆虫的特征。
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公开(公告)号:US08585390B2
公开(公告)日:2013-11-19
申请号:US12914240
申请日:2010-10-28
申请人: Hung-Yin Tsai , Tien-Li Chang , Shao-Wei Luo
发明人: Hung-Yin Tsai , Tien-Li Chang , Shao-Wei Luo
IPC分类号: B29C35/08
CPC分类号: G03F7/0017 , B23K26/0006 , B23K26/0624 , B23K26/352 , B23K2103/42 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/70375
摘要: A mold making system for surface patterning of a roller mold is provided. The roller mold includes a transparent hollow roller and a polymer layer disposed at an outer surface of the transparent hollow roller. The mold making system includes a laser generation device, an optical path changing device, and a control device connected to the optical path changing device. The laser generation device is used for generating an ultrafast laser. The optical path changing device is disposed at an inner space of the transparent hollow roller to receive the ultrafast laser. The control device controls the optical path changing device to guide the ultrafast laser to pass through the transparent hollow roller and to be focused at a focus position in the polymer layer.
摘要翻译: 提供了一种用于辊模的表面图案化的模具制造系统。 辊模具包括透明中空辊和设置在透明中空辊的外表面处的聚合物层。 模具制造系统包括激光产生装置,光路改变装置和连接到光路改变装置的控制装置。 激光产生装置用于产生超快激光。 光路改变装置设置在透明中空辊的内部空间以接收超快激光。 控制装置控制光路改变装置以引导超快激光穿过透明中空辊并聚焦在聚合物层中的聚焦位置。
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25.
公开(公告)号:US20130083974A1
公开(公告)日:2013-04-04
申请号:US13419155
申请日:2012-03-13
申请人: Hung-Yin Tsai , Yu-Ching Lin , Yu-Cheng Wu , Rong-Shun Chen , Hong Hocheng , Li-An Chu
发明人: Hung-Yin Tsai , Yu-Ching Lin , Yu-Cheng Wu , Rong-Shun Chen , Hong Hocheng , Li-An Chu
IPC分类号: G06K9/62
CPC分类号: G06K9/00 , G06K9/38 , G06K9/4642
摘要: An image method for classifying insects includes the following steps: obtaining detecting images of the insects in a detecting area; obtaining a first foreground image related to the insects by background subtraction; extracting the saturation from the first foreground image and eliminating the non-characteristic objects therein to obtain a second foreground image; extracting the characteristics related to the insects from the second foreground image according to a threshold; and, determining the classifications or the sexes of the insects according to the characteristics. Accordingly, the image method for classifying insects can be used for automatically classifying the insects so as to save the manpower and time.
摘要翻译: 用于分类昆虫的图像方法包括以下步骤:在检测区域中获取昆虫的检测图像; 通过背景减法获得与昆虫相关的第一个前景图像; 从第一前景图像提取饱和度并消除其中的非特征对象以获得第二前景图像; 根据阈值从第二前景图像提取与昆虫相关的特征; 并根据特征确定昆虫的分类或性别。 因此,用于分类昆虫的图像方法可以用于昆虫的自动分类,以节省人力和时间。
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公开(公告)号:US07309515B2
公开(公告)日:2007-12-18
申请号:US10770526
申请日:2004-02-04
申请人: Hung-Yin Tsai , Chih-Hung Wu , Chih-Yung Cheng
发明人: Hung-Yin Tsai , Chih-Hung Wu , Chih-Yung Cheng
IPC分类号: B05D3/00
CPC分类号: G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/30
摘要: The present invention is related to a method for fabricating an imprint mold which can be used in the field of nano-imprint lithography. Firstly, a diamond film and a photoresist film are successively formed onto a substrate; wherein the photoresist film is more capable of anticorrosion than the diamond film. Then an energy beam lithography system is provided to make the photoresist film form a photoresist mask with particularly arranged patterns. Because of the etching selectivity between the diamond film and the photoresist film, on the surface of the diamond film a pattern can be easily formed with recessions and protrusions according to the photoresist mask by dry etching method.
摘要翻译: 本发明涉及可用于纳米压印光刻领域的压印模具的制造方法。 首先,将金刚石膜和光致抗蚀剂膜依次形成在基板上; 其中光致抗蚀剂膜比金刚石膜更能耐腐蚀。 然后提供能量束光刻系统以使光致抗蚀剂膜形成具有特别布置图案的光致抗蚀剂掩模。 由于金刚石膜和光致抗蚀剂膜之间的蚀刻选择性,在金刚石膜的表面上,通过干蚀刻方法可以根据光致抗蚀剂掩模容易地形成具有凹陷和突起的图案。
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公开(公告)号:US20050028728A1
公开(公告)日:2005-02-10
申请号:US10635606
申请日:2003-08-07
申请人: Ping-Yin Liu , Chun-Hao Hsieh , Chin-Hon Fan , Hung-Yin Tsai , Chien-Chang Su
发明人: Ping-Yin Liu , Chun-Hao Hsieh , Chin-Hon Fan , Hung-Yin Tsai , Chien-Chang Su
摘要: A process for making a diamond film with low surface roughness. A substrate is provided. A diamond layer is deposited on the substrate. A binder layer is coated over the diamond layer. A carrier plate is provided to join with the binder layer, thereby forming a laminate structure. The substrate is then removed, thereby obtaining a diamond film with a low surface roughness with respect to the surface roughness of the removed substrate.
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公开(公告)号:US06656668B2
公开(公告)日:2003-12-02
申请号:US09934654
申请日:2001-08-23
申请人: Hung-Yin Tsai , Cheng-Tang Pan , Min-Chieh Chou , Shih-Chou Chen , Yuh-Sheng Lin
发明人: Hung-Yin Tsai , Cheng-Tang Pan , Min-Chieh Chou , Shih-Chou Chen , Yuh-Sheng Lin
IPC分类号: G03F700
CPC分类号: G03F7/0005 , G03F1/50 , Y10S430/146
摘要: A process method of using excimer laser for forming micro spherical and non-spherical polymeric structure array includes a photomask which has a selected curved pattern formed thereon. The curved pattern has non-constant widths along a straight line direction. An excimer laser beam source is deployed to project through the photomask on a substrate coated with a polymeric material while the substrate is moving in a direction normal to the straight line direction for the polymeric material to receive laser beam projection with different time period. The polymeric material thus may be etched to different depth to form a three dimensional pattern desired. By projecting and etching the polymeric material two times at different directions or through different photomask patterns, a sphere like or non-sphere like surface of micro array structure may be obtained.
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公开(公告)号:US06421224B1
公开(公告)日:2002-07-16
申请号:US09983259
申请日:2001-10-23
申请人: Hung-Yi Lin , Hung-Yin Tsai , Jung-Yen Huang , Chin-Hon Fan
发明人: Hung-Yi Lin , Hung-Yin Tsai , Jung-Yen Huang , Chin-Hon Fan
IPC分类号: H01G4228
CPC分类号: H01L27/0805
摘要: The invention discloses a micro-structure capacitor formed by joining the metal layer of a multi-porous micro-structure. A substrate is used as an etching stop layer when producing the capacitor. Therefore, pores with low aspect ratio and uniform size are formed on the surface of the substrate. The efficiency of the subsequent thin film coating process is increased. The porous three-dimensional structure increases the capacitance. Micro-structures are stacked up so the capacitor produced features small size and high capacitance.
摘要翻译: 本发明公开了一种通过连接多孔微结构的金属层形成的微结构电容器。 当制造电容器时,将衬底用作蚀刻停止层。 因此,在基板的表面上形成具有低纵横比和均匀尺寸的孔。 随后的薄膜涂覆过程的效率增加。 多孔三维结构增加电容。 微结构被堆叠起来,所以产生的电容器具有小尺寸和高电容。
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