公开(公告)号：US07961297B2

公开(公告)日：2011-06-14

申请号：US12065451

申请日：2006-09-02

申请人： Joern Greif-Wuestenbecker ,  Beate Boehme ,  Ulrich Stroessner ,  Michael Totzeck ,  Vladimir Kamenov ,  Olaf Dittmann ,  Daniel Kraehmer ,  Toralf Gruner ,  Bernd Geh

发明人： Joern Greif-Wuestenbecker ,  Beate Boehme ,  Ulrich Stroessner ,  Michael Totzeck ,  Vladimir Kamenov ,  Olaf Dittmann ,  Daniel Kraehmer ,  Toralf Gruner ,  Bernd Geh

IPC分类号： G03B27/72 ,  G03B27/32 ,  G03B27/68 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70666 ,  G03F7/70308

摘要： A method for determining intensity distribution in the focal plane of a projection exposure arrangement, in which a large aperture imaging system is emulated and a light from a sample is represented on a local resolution detector by an emulation imaging system. A device for carrying out the method and emulated devices are also described. The invention makes it possible to improve a reproduction quality since the system apodisation is taken into consideration. The inventive method includes determining the integrated amplitude distribution in an output pupil, combining the integrated amplitude distribution with a predetermined apodization correction and calculating a corrected apodization image according to the modified amplitude distribution.

摘要翻译： 一种用于确定投影曝光装置的焦平面中的强度分布的方法，其中大面积成像系统被仿真并且来自样品的光由仿真成像系统在局部分辨率检测器上表示。 还描述了用于执行该方法和仿真装置的装置。 由于考虑到系统变迹，本发明使得可以提高再现质量。 本发明的方法包括确定输出光瞳中的积分幅度分布，将积分幅度分布与预定的变迹校正相结合，并根据修改的振幅分布计算校正的变迹图像。

公开(公告)号：US07952685B2

公开(公告)日：2011-05-31

申请号：US11724331

申请日：2007-03-15

申请人： Michel Fransois Hubert Klaassen ,  Hendrikus Robertus Marie Van Greevenbroek ,  Bernd Geh ,  Emil Peter Schmitt-Weaver

发明人： Michel Fransois Hubert Klaassen ,  Hendrikus Robertus Marie Van Greevenbroek ,  Bernd Geh ,  Emil Peter Schmitt-Weaver

IPC分类号： G03B27/72 ,  G03B27/42

CPC分类号： G03F7/701 ,  G03F7/70566

摘要： An illuminator for a lithographic apparatus, the illuminator including an illumination mode defining element and a plurality of polarization modifiers, the polarization modifiers being moveable into or out of partial intersection with a radiation beam having an angular and spatial distribution as governed by an illumination mode defining element.

摘要翻译： 一种用于光刻设备的照明器，所述照明器包括照明模式限定元件和多个偏振调节器，所述偏振调节器可移动到与具有角度和空间分布的辐射束的部分交叉中，所述辐射束具有由限定 元件。

公开(公告)号：US07581305B2

公开(公告)日：2009-09-01

申请号：US10821959

申请日：2004-04-12

申请人： Bernhard Geuppert ,  Jens Kugler ,  Thomas Ittner ,  Bernd Geh ,  Rolf Freimann ,  Guenther Seitz ,  Bernhard Fellner ,  Bernd Doerband ,  Stefan Schulte

发明人： Bernhard Geuppert ,  Jens Kugler ,  Thomas Ittner ,  Bernd Geh ,  Rolf Freimann ,  Guenther Seitz ,  Bernhard Fellner ,  Bernd Doerband ,  Stefan Schulte

IPC分类号： G01R31/28

CPC分类号： G03F7/706 ,  B24B13/0055 ,  G03F7/70825 ,  Y10T29/49002 ,  Y10T29/49004 ,  Y10T29/4902 ,  Y10T29/49131 ,  Y10T29/49171

摘要： A method of manufacturing an optical component comprising a substrate and a mounting frame with plural contact portions disposed at predetermined distances from each other is provided. The method comprises providing a measuring frame separate from the mounting frame for mounting the substrate, which measuring frame comprises a number of contact portions equal to a number of the contact portions of the mounting frame, wherein respective distances between the contact portions of the measuring frame are substantially equal to the corresponding distances between those of the mounting frame, measuring a shape of the optical surface of the substrate, while the substrate is mounted on the measuring frame, and mounting the substrate on the mounting frame such that the contact portions of the mounting frame are attached to the substrate at regions which are substantially the same as contact regions at which the substrate was attached to the measuring frame.

摘要翻译： 提供了一种制造光学部件的方法，该光学部件包括基板和安装框架，所述安装框架具有彼此以预定距离设置的多个接触部分。 该方法包括提供与用于安装基板的安装框架分离的测量框架，该测量框架包括等于安装框架的多个接触部分的多个接触部分，其中测量框架的接触部分之间的相应距离 基本上等于安装框架的相应距离，测量基板的光学表面的形状，同时将基板安装在测量框架上，以及将基板安装在安装框架上，使得接触部分 安装框架在与基板附接到测量框架的接触区域基本相同的区域处附接到基板。

公开(公告)号：US20080284998A1

公开(公告)日：2008-11-20

申请号：US12061339

申请日：2008-04-02

申请人： Bernd Geh ,  Erik Roelof Loopstra ,  Donis Flagello

发明人： Bernd Geh ,  Erik Roelof Loopstra ,  Donis Flagello

IPC分类号： G03B27/42 ,  G03B27/72

CPC分类号： G03F7/70966 ,  G03F7/70191 ,  G03F7/70558 ,  G03F7/70625

摘要： A system and method for controlling exposure in a lithographic apparatus are disclosed. The system can have adjustable optical elements capable of being decentered to adjust an illumination distribution. Embodiments include a lithographic apparatus structure configured to allow for spatial dose control, for example as a function of X and Y in response to spatial variation in polarization state and birefringence of optical components of the lithographic system.

摘要翻译： 公开了一种用于控制光刻设备中的曝光的系统和方法。 该系统可以具有能够偏心调节照明分布的可调光学元件。 实施例包括光刻设备结构，其被配置为响应于光刻系统的光学部件的偏振状态和双折射的空间变化而允许空间剂量控制，例如作为X和Y的函数。

公开(公告)号：US20080204692A1

公开(公告)日：2008-08-28

申请号：US12054991

申请日：2008-03-25

申请人： Toralf Gruner ,  Bernd Geh

发明人： Toralf Gruner ,  Bernd Geh

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G03F7/70441 ,  G03F7/70083 ,  G03F7/70141 ,  G03F7/70391 ,  G03F7/70566 ,  G03F7/70941

摘要： A method for producing microstructured components in a microlithographic projection exposure apparatus is disclosed. The method includes imaging a pattern of structures into an image plane of a projection objective. The dose distribution of projection light in the image plane can be influenced so that the image of a structure is at least essentially independent of the topography of structures which lie inside a region surrounding the structure.

摘要翻译： 公开了一种在微光刻投影曝光装置中制造微结构元件的方法。 该方法包括将结构图案成像到投影物镜的像平面中。 可以影响投影光在图像平面中的剂量分布，使得结构的图像至少基本上独立于位于围绕结构的区域内的结构的形貌。

公开(公告)号：US20050254042A1

公开(公告)日：2005-11-17

申请号：US11187730

申请日：2005-07-22

申请人： Bernd Geh ,  Paul Graupner ,  Thomas Stammler ,  Dirk Stenkamp ,  Jochen Stuhler ,  Klaus Wurmbrand

发明人： Bernd Geh ,  Paul Graupner ,  Thomas Stammler ,  Dirk Stenkamp ,  Jochen Stuhler ,  Klaus Wurmbrand

IPC分类号： G02B7/02 ,  G01B11/00 ,  G02B13/00 ,  G02B27/00 ,  G03F7/20 ,  G03F7/207 ,  H01L21/027

CPC分类号： G03F7/706 ,  G01M11/0207 ,  G01M11/0242 ,  G01M11/0257 ,  G02B27/0012 ,  G03F7/70225 ,  G03F7/70258 ,  G03F7/70666

摘要： In order to optimize the image properties of several optical elements of which at least one is moved relative to at least one stationary optical element, the overall image defect resulting from the interaction of all optical elements is first of all measured. This is represented as a linear combination of the base functions of an orthogonal function set. The movable element is then moved to a new measurement position and the overall image defect is measured once again. After the linear combination representation of the new overall image defect, the image defects of the movable element and of the stationary element are calculated from the data thereby obtained. With only one movable optical element a target position in which the overall image defect is minimized can be directly calculated and adjusted there from. If several movable optical elements are available, methods are given for the efficient determination of the respective target position.

摘要翻译： 为了优化其中至少一个相对于至少一个固定光学元件移动的多个光学元件的图像特性，首先测量由所有光学元件的相互作用产生的整体图像缺陷。 这被表示为正交函数集的基函数的线性组合。 然后将可移动元件移动到新的测量位置，并再次测量整个图像缺陷。 在新的整体图像缺陷的线性组合表示之后，根据获得的数据计算可移动元件和静止元件的图像缺陷。 只有一个可移动光学元件可以直接计算和调整整个图像缺陷最小化的目标位置。 如果有多个可移动的光学元件可用，则给出用于有效确定各个目标位置的方法。

公开(公告)号：US20050223539A1

公开(公告)日：2005-10-13

申请号：US10821959

申请日：2004-04-12

申请人： Bernhard Geuppert ,  Jens Kugler ,  Thomas Ittner ,  Bernd Geh ,  Rolf Freimann ,  Guenther Seitz ,  Bernhard Fellner ,  Bernd Doerband ,  Stefan Schulte

发明人： Bernhard Geuppert ,  Jens Kugler ,  Thomas Ittner ,  Bernd Geh ,  Rolf Freimann ,  Guenther Seitz ,  Bernhard Fellner ,  Bernd Doerband ,  Stefan Schulte

IPC分类号： B24B13/005 ,  G02B7/00 ,  G03F7/20 ,  G11B7/24

CPC分类号： G03F7/706 ,  B24B13/0055 ,  G03F7/70825 ,  Y10T29/49002 ,  Y10T29/49004 ,  Y10T29/4902 ,  Y10T29/49131 ,  Y10T29/49171

摘要： A method of manufacturing an optical component comprising a substrate and a mounting frame with plural contact portions disposed at predetermined distances from each other is provided. The method comprises providing a measuring frame separate from the mounting frame for mounting the substrate, which measuring frame comprises a number of contact portions equal to a number of the contact portions of the mounting frame, wherein respective distances between the contact portions of the measuring frame are substantially equal to the corresponding distances between those of the mounting frame, measuring a shape of the optical surface of the substrate, while the substrate is mounted on the measuring frame, and mounting the substrate on the mounting frame such that the contact portions of the mounting frame are attached to the substrate at regions which are substantially the same as contact regions at which the substrate was attached to the measuring frame.

摘要翻译： 提供了一种制造光学部件的方法，该光学部件包括基板和安装框架，所述安装框架具有彼此以预定距离设置的多个接触部分。 该方法包括提供与用于安装基板的安装框架分离的测量框架，该测量框架包括等于安装框架的多个接触部分的多个接触部分，其中测量框架的接触部分之间的相应距离 基本上等于安装框架的相应距离，测量基板的光学表面的形状，同时将基板安装在测量框架上，以及将基板安装在安装框架上，使得接触部分 安装框架在与基板附接到测量框架的接触区域基本相同的区域处附接到基板。