公开(公告)号：US06946657B2

公开(公告)日：2005-09-20

申请号：US10631748

申请日：2003-08-01

Applicant: Oliver Kienzle ,  Rainer Knippelmeyer ,  Heiko Müller

Inventor： Oliver Kienzle ,  Rainer Knippelmeyer ,  Heiko Müller

IPC: G01Q30/04 ,  H01J37/05 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28 ,  H01J37/256

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/1472 ,  H01J2237/2817

Abstract: A particle-optical apparatus is disclosed which combines the functions of an energy selector 27 and a beam splitter 21. The particle-optical apparatus is used in an electron microscopy system and serves to separate and superimpose, respectively, beam paths of a primary electron beam 11 and a secondary electron beam 13.

Abstract translation: 公开了一种组合了能量选择器27和分束器21的功能的粒子光学装置。该粒子光学装置用于电子显微镜系统中，用于分别并分别叠加一次电子束的光束路径 11和二次电子束13。

公开(公告)号：US06933500B2

公开(公告)日：2005-08-23

申请号：US10620958

申请日：2003-07-16

Applicant: Kazutoshi Kaji ,  Shohei Terada ,  Tadashi Otaka

Inventor： Kazutoshi Kaji ,  Shohei Terada ,  Tadashi Otaka

IPC: H01J37/26 ,  H01J37/05 ,  H01J37/28 ,  H01J27/26

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J2237/2594

Abstract: An electron microscope is provided, which enables an observation with high resolution. The electron microscope is able to detect the deviation of an electron beam relative to the opening of a slit quantitatively, thereby shifting the electron beam accurately to the center of the opening of slit so as to execute energy selection. The electron microscope has an energy filter control unit for adjusting a relative position between an electron beam and a slit by shifting the position of electron beam based on a signal delivered by an energy filter electron beam detector. Also a method for controlling an energy filter is provided, which includes the steps of shifting the position of an electron beam, determining the position of electron beam and letting the electron beam pass through the center of an opening of the slit by controlling the position of slit or position of electron beam.

公开(公告)号：US06930306B2

公开(公告)日：2005-08-16

申请号：US10807116

申请日：2004-03-24

Applicant: Kazutoshi Kaji ,  Yoshifumi Taniguchi ,  Shigeto Isakozawa

Inventor： Kazutoshi Kaji ,  Yoshifumi Taniguchi ,  Shigeto Isakozawa

IPC: H01J37/22 ,  H01J37/05 ,  H01J37/147 ,  H01J37/28 ,  H01J49/44 ,  H01J37/26

CPC classification number: H01J37/1471 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/2802

Abstract: A scanning transmission electron microscope has an electron beam energy analyzer (energy filter) to observe electron beam energy loss spectra and element distribution images. This electron microscope further includes a deflection coil provided on the upstream side of a magnetic sector to correct for the electron beam path in a plane normal to the optical axis and make the electron beam incident to the energy filter, a deflection coil for correcting for the electron beam path in the energy axis direction of an energy dispersion surface formed by the magnetic sector, and a control unit for controlling the exciting conditions of the deflection coils.

Abstract translation: 扫描透射电子显微镜具有电子束能量分析器（能量滤波器），用于观察电子束能量损失谱和元素分布图像。 该电子显微镜还包括设置在磁性扇区的上游侧的偏转线圈，以校正垂直于光轴的平面中的电子束路径，并使电子束入射到能量滤波器，偏转线圈用于校正 由磁扇形成的能量分散面的能量轴方向的电子束路径，以及用于控制偏转线圈的激励条件的控制单元。

公开(公告)号：US20050127295A1

公开(公告)日：2005-06-16

申请号：US11052586

申请日：2005-02-07

Applicant: Kazutoshi Kaji ,  Shohei Terada ,  Tadashi Otaka

Inventor： Kazutoshi Kaji ,  Shohei Terada ,  Tadashi Otaka

IPC: H01J37/26 ,  H01J37/05 ,  H01J37/28 ,  G01N23/00 ,  H01J49/42

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J2237/2594

Abstract: An electron microscope is provided, which enables an observation with high resolution. The electron microscope is able to detect the deviation of an electron beam relative to the opening of a slit quantitatively, thereby shifting the electron beam accurately to the center of the opening of slit so as to execute energy selection. The electron microscope has an energy filter control unit for adjusting a relative position between an electron beam and a slit by shifting the position of electron beam based on a signal delivered by an energy filter electron beam detector. Also a method for controlling an energy filter is provided, which includes the steps of shifting the position of an electron beam, determining the position of electron beam and letting the electron beam pass through the center of an opening of the slit by controlling the position of slit or position of electron beam.

公开(公告)号：US06847038B2

公开(公告)日：2005-01-25

申请号：US10643892

申请日：2003-08-20

Applicant: Hideo Todokoro ,  Makoto Ezumi ,  Yoichi Ose ,  Naomasa Suzuki

Inventor： Hideo Todokoro ,  Makoto Ezumi ,  Yoichi Ose ,  Naomasa Suzuki

IPC: G01N23/00 ,  G01Q30/02 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/244 ,  G01N23/225 ,  G01R31/307 ,  H01J37/05 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/053 ,  H01J2237/0535 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/24485 ,  H01J2237/2449 ,  H01J2237/24495 ,  H01J2237/24585 ,  H01J2237/24592 ,  H01J2237/281 ,  H01J2237/2817

Abstract: A scanning electron microscope with an energy filter which can positively utilize secondary electrons and/or reflected electrons which collide against a mesh electrode and are lost. The scanning electron microscope which has a porous electrode for producing an electric field for energy-filtering electrons produced by applying a primary electron beam to a sample and a 1st electron detector which detects electrons passing through the porous electrode is characterized by further having a porous structure provided near the sample, a deflector which deflects electrons from the axis of the primary electron beam, and a 2nd electron detector which detects the electrons deflected by the deflector.

公开(公告)号：US20040188607A1

公开(公告)日：2004-09-30

申请号：US10751907

申请日：2004-01-07

Inventor： Yoichi Ose ,  Shunroku Taya ,  Hideo Todokoro ,  Tadashi Otaka ,  Mitsugu Sato ,  Makoto Ezumi

IPC: H01J037/05

CPC classification number: H01J37/05 ,  H01J37/153 ,  H01J37/28

Abstract: An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.

Abstract translation: 本发明提供一种扫描电子显微镜，该扫描电子显微镜由能够高分辨率，单色化能量和降低色差的单色仪组成，而不会显着降低一次电子束的电流强度。 扫描电子显微镜安装有一对具有相反偏转方向的扇形磁场和电场，以聚焦电子束，然后通过狭缝限制能量宽度，并且安装相同形状的另一对扇形磁场和电场 在与包含狭缝的表面形成对称镜的位置处。 该结构用于抵消物点和对称镜位置的能量分散，并通过会聚透镜系统空间收缩点聚光点光束，提高扫描电子显微镜的图像分辨率。

公开(公告)号：US06770878B2

公开(公告)日：2004-08-03

申请号：US10258486

申请日：2002-10-25

Applicant: Stephan Uhlemann ,  Maximilian Haider

Inventor： Stephan Uhlemann ,  Maximilian Haider

IPC: H01J4000

CPC classification number: H01J37/05 ,  H01J49/46 ,  H01J2237/2602 ,  H01J2237/2823

Abstract: The invention relates to an electron/ion gun for electron or ion beams, including a beam source and a monochromator. According to the invention, the monochromator is equipped with an additional beam guidance system and a switchover element which are provided at the input of the monochromator, and which convey the particles coming from the beam source to either the monochromator or the rest of the beam guidance system.

Abstract translation: 本发明涉及一种用于电子或离子束的电子/离子枪，包括光束源和单色器。 根据本发明，单色仪配备有附加的光束引导系统和切换元件，其设置在单色器的输入端处，并且将来自光束源的粒子传送到单色器或者其余的光束引导 系统。

公开(公告)号：US06759665B2

公开(公告)日：2004-07-06

申请号：US09865155

申请日：2001-05-24

Applicant: Victor M. Benveniste ,  William F. DiVergilio ,  John Z. Ye

Inventor： Victor M. Benveniste ,  William F. DiVergilio ,  John Z. Ye

IPC: H01J37317

CPC classification number: H01J37/32623 ,  H01J37/05 ,  H01J37/3171 ,  H01J37/32678

Abstract: An apparatus and method for providing a low energy, high current ion beam for ion implantation applications are disclosed. The apparatus includes a mass analysis magnet mounted in a passageway along the path of an ion beam, and a magnetic device adapted to provide a multi-cusped magnetic field in the passageway, which may include a plurality of magnets mounted along at least a portion of the passageway. The magnets may cooperatively interact to provide a multi-cusped magnetic field along at least a portion of the passageway. The multi-cusped magnetic field may be superimposed on the dipole field at a specified field strength in a region of the mass analyzer passageway for a given low energy ion beam. The invention thus provides enhancement of beam plasma within a mass analyzer dipole magnetic field for low energy ion beams without the introduction of externally generated plasma. The invention further includes a method of providing ion beam containment in a low energy ion implantation system, as well as an ion implantation system.

Abstract translation: 公开了一种用于提供用于离子注入应用的低能量高电流离子束的装置和方法。 该设备包括安装在沿着离子束路径的通道中的质量分析磁体和适于在通道中提供多通道磁场的磁性装置，该磁性装置可以包括沿着至少一部分 通道。 磁体可以协同地相互作用以沿着通道的至少一部分提供多脉冲磁场。 对于给定的低能量离子束，多质量磁场可以在质量分析器通道的区域中以指定的场强叠加在偶极子场上。 因此，本发明在低能量离子束的质量分析器偶极磁场内提供束等离子体的增强，而不引入外部产生的等离子体。 本发明还包括一种在低能离子注入系统中提供离子束容纳的方法以及离子注入系统。

公开(公告)号：US06703613B2

公开(公告)日：2004-03-09

申请号：US09988339

申请日：2001-11-19

Applicant: Kazutoshi Kaji ,  Takashi Aoyama ,  Shunroku Taya ,  Shigeto Isakozawa

Inventor： Kazutoshi Kaji ,  Takashi Aoyama ,  Shunroku Taya ,  Shigeto Isakozawa

IPC: H01J4700

CPC classification number: G01N23/2251 ,  H01J37/05 ,  H01J37/244 ,  H01J37/252 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/24485 ,  H01J2237/24495 ,  H01J2237/2487 ,  H01J2237/262 ,  H01J2237/2802 ,  H05H1/0037

Abstract: An electron beam detector detects a peak of a spectrum, and when a peak position is deviated from a reference position on the electron beam detector, a controller for controlling an electron beam position on the electron beam detector is used to correct a deviation. An electron energy loss spectrum is measured while controlling correction a deviation between an electron beam position on a specimen, and a peak position of the spectrum, and a spectrum measuring with the electron beam detector.

Abstract translation: 电子束检测器检测光谱的峰值，并且当峰值位置偏离电子束检测器上的参考位置时，使用用于控制电子束检测器上的电子束位置的控制器来校正偏差。 测量电子能量损失谱，同时控制校正电子束在样本上的位置与光谱的峰值位置之间的偏差，以及用电子束检测器测量的光谱。

公开(公告)号：US06678932B1

公开(公告)日：2004-01-20

申请号：US10011007

申请日：2001-11-08

Applicant: Paul J. Duval ,  Vladimir Vayner

Inventor： Paul J. Duval ,  Vladimir Vayner

IPC: B25B2714

CPC classification number: H01J37/05 ,  H01J2237/057 ,  Y10T29/53961

Abstract: In instruments such as Wien filters, electrostatic and/or magnetic pole pieces must be mounted on and secured to a supporting structure with a very high degree of dimensional precision, usually by brazing. To that end, a fixture is provided for holding the parts to be assembled in precise relationship and to press the pole pieces into engagement with the supporting structure while the securing operation is being carried out. The pressing is accomplished by a gravity-produced force which is, therefore, independent of positional accuracies caused by very high temperatures, such as are encountered during brazing.

Abstract translation: 在诸如维恩滤波器的仪器中，静电和/或磁极片必须通过钎焊而以非常高的尺寸精度安装在支撑结构上并固定到支撑结构上。 为此，提供了一种固定装置，用于以精确的关系保持要组装的部件，并且在执行固定操作的同时将极片压在支撑结构上。 压制是通过重力产生的力来实现的，因此，这是与由诸如在钎焊期间遇到的非常高的温度引起的位置精度无关的。