公开(公告)号：US20190262881A1

公开(公告)日：2019-08-29

申请号：US16408648

申请日：2019-05-10

Applicant: MESTEK MACHINERY, INC.

Inventor： STEVEN KERSKA

IPC: B21C37/10 ,  B05C5/02 ,  B05C9/04 ,  B05C11/10 ,  B05B7/16

Abstract: A sealant system for operation with a metal workpiece comprises a frame, a cam assembly mounted to said frame, a sealant reservoir, a sealant application unit connected to said sealant reservoir, and a control module for coordinating operation of said cam assembly and said sealant reservoir, wherein said control module comprises a temperature sensor for monitoring the temperature of said sealant, an integrated heating system for heating said sealant and a controller in communication with said temperature sensor and said integrated heating system.

公开(公告)号：US20180301358A1

公开(公告)日：2018-10-18

申请号：US16012337

申请日：2018-06-19

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Hitoshi NAKAI ,  Yasuhiko OHASHI

IPC: H01L21/67 ,  H01L21/687 ,  H01L21/02 ,  B05C11/10 ,  B08B3/04 ,  H01L21/306 ,  B08B11/00 ,  B05C9/04 ,  H01L21/00 ,  B05C5/02

Abstract: A substrate processing apparatus includes a chamber, a substrate holding part, a substrate rotating mechanism, and a processing liquid supply part. The chamber includes a chamber body and a chamber cover, and the chamber cover is moved up and down by a chamber opening and closing mechanism. A top plate is attached to the chamber cover. While the chamber cover is in contact with the chamber body, a sealed space is formed and processing is performed. When the chamber cover is moved up, an annular opening is formed between the chamber cover and the chamber body. A cup part is positioned outside the annular opening. A processing liquid spattering from a substrate is received by the cup part.

公开(公告)号：US20180301356A1

公开(公告)日：2018-10-18

申请号：US16012073

申请日：2018-06-19

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Hitoshi Nakai ,  Yasuhiko Ohashi

IPC: H01L21/67 ,  H01L21/687 ,  H01L21/02 ,  B05C11/10 ,  B08B3/04 ,  H01L21/306 ,  B08B11/00 ,  B05C9/04 ,  H01L21/00 ,  B05C5/02

Abstract: A substrate processing apparatus includes a chamber, a substrate holding part, a substrate rotating mechanism, and a processing liquid supply part. The chamber includes a chamber body and a chamber cover, and the chamber cover is moved up and down by a chamber opening and closing mechanism. A top plate is attached to the chamber cover. While the chamber cover is in contact with the chamber body, a sealed space is formed and processing is performed. When the chamber cover is moved up, an annular opening is formed between the chamber cover and the chamber body. A cup part is positioned outside the annular opening. A processing liquid spattering from a substrate is received by the cup part.

公开(公告)号：US20180222630A1

公开(公告)日：2018-08-09

申请号：US15940992

申请日：2018-03-30

Applicant: Naofumi TAKEMOTO

Inventor： Naofumi TAKEMOTO

IPC: B65D19/00 ,  B05D3/02 ,  B05D1/02 ,  B05C9/04 ,  C08J9/36

CPC classification number: B65D19/0028 ,  B05B13/02 ,  B05C9/04 ,  B05D1/02 ,  B05D3/0218 ,  B05D2201/02 ,  B05D2518/00 ,  B32B5/245 ,  B65D19/0018 ,  B65D2203/10 ,  B65D2519/00034 ,  B65D2519/00044 ,  B65D2519/00069 ,  B65D2519/00079 ,  B65D2519/00139 ,  B65D2519/00268 ,  B65D2519/00273 ,  B65D2519/00288 ,  B65D2519/00293 ,  B65D2519/00318 ,  B65D2519/00323 ,  B65D2519/00338 ,  B65D2519/00437 ,  B65D2519/00562 ,  B65D2519/0096 ,  C08J9/365 ,  C08J2323/06 ,  C08J2323/12 ,  C08J2325/06 ,  C08J2375/04 ,  C08J2475/02

Abstract: To provide a palette, etc. on which an article is placed, including: a foamed synthetic resin-base material; and a polyurea-resin coating layer covering a front surface of the base material; and manufactured by a method including: injecting a polyurea-resin coating material onto a front surface of a foamed synthetic resin-base material; and drying the coating material after the injecting. The injecting may have injecting the coating material onto all surfaces of the base material. A thickness of the coating material formed on a front surface of the base material in the injecting may be controlled proportionally to an expansion ratio of the foamed synthetic resin. The thickness of the coating material may be controlled by adjusting a speed of conveyance of the base material and/or a distance between an injection port for the coating material and the base material. Heating-pressing the base material may further be included before the injecting.

公开(公告)号：US09555437B2

公开(公告)日：2017-01-31

申请号：US13969995

申请日：2013-08-19

Applicant: DAINIPPON SCREEN MFG. CO., LTD.

Inventor： Hitoshi Nakai ,  Yasuhiko Ohashi

IPC: B05C11/10 ,  H01L21/687 ,  B05C5/02 ,  H01L21/67 ,  B05C9/04 ,  H01L21/00

CPC classification number: H01L21/67023 ,  B05C5/02 ,  B05C9/04 ,  B05C11/1039 ,  B05C11/1044 ,  B08B3/041 ,  B08B11/00 ,  H01L21/00 ,  H01L21/02057 ,  H01L21/30604 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/67178 ,  H01L21/68728 ,  H01L21/68764

Abstract: A substrate processing apparatus includes a chamber, a substrate holding part, a substrate rotating mechanism, a liquid receiving part, and an upper nozzle. The chamber includes a chamber body and a chamber cover, and the chamber cover is moved up and down. While the chamber cover is in contact with the chamber body, a small sealed space is formed and some processings involving pressure reduction or pressurization are performed. When the chamber cover is moved up, an annular opening is formed between the chamber cover and the chamber body. On an outer side relative to the annular opening, positioned are a first cup part and a second cup part. A processing liquid spattering from a substrate is received by the first cup part or the second cup part. In the substrate processing apparatus, it is possible to perform various processings in the small chamber.

Abstract translation: 基板处理装置包括室，基板保持部，基板旋转机构，液体接收部和上喷嘴。 该室包括一个室主体和一个室盖，室盖上下移动。 当室盖与室主体接触时，形成小的密封空间，并且执行包括减压或加压的一些处理。 当室盖向上移动时，在室盖和室主体之间形成一个环形开口。 在相对于环形开口的外侧，定位为第一杯部分和第二杯部分。 从基板溅射的处理液体被第一杯部或第二杯部接收。 在基板处理装置中，可以在小室中进行各种处理。

公开(公告)号：US09486828B2

公开(公告)日：2016-11-08

申请号：US14497851

申请日：2014-09-26

Applicant: Fuji Kikai Kogyo Co., LTD. ,  Toyota Jidosha Kabushiki Kaisha

Inventor： Hidenobu Miura ,  Masakazu Umehara

IPC: B05C9/04 ,  B05C5/00 ,  B05C9/12 ,  B65H23/032 ,  B05C1/08 ,  B05C11/10 ,  H01M4/04 ,  H01M4/36

CPC classification number: B05C9/04 ,  B05C1/0817 ,  B05C1/0826 ,  B05C1/0839 ,  B05C5/005 ,  B05C9/12 ,  B05C11/1018 ,  B05C11/1023 ,  B65H23/0324 ,  B65H23/0326 ,  B65H2301/5114 ,  B65H2553/414 ,  B65H2557/264 ,  B65H2801/72 ,  H01M4/0402 ,  H01M4/366 ,  Y02E60/122 ,  Y02P70/54

Abstract: First and second coaters, first and second edge determiners, and first and second moving mechanisms are provided. The first and second coaters apply a coating solution for forming a heat-resistant protection layer onto both surfaces of a substrate on each of which an active material layer is previously formed. The first and second edge determiners determine the locations of lateral edges of the active material layers formed on both surfaces of the substrate to be coated by the respective first and second coaters. The first and second moving mechanisms move the location of the substrate along the width thereof based on the locations of the lateral edges determined by the first and second edge determiners, respectively. The locations of regions of both surfaces of the substrate to be coated are separately adjusted.

Abstract translation: 提供第一和第二涂布机，第一和第二边缘确定器以及第一和第二移动机构。 第一和第二涂布机在其中预先形成活性物质层的基板的两个表面上施加用于形成耐热保护层的涂布溶液。 第一和第二边缘确定器确定形成在待涂覆的基底的两个表面上的各个第一和第二涂层的横向边缘的位置。 基于由第一和第二边缘确定器确定的横向边缘的位置，第一和第二移动机构沿其宽度移动基板的位置。 要涂覆的基底的两个表面的区域的位置被单独调节。

公开(公告)号：US09205448B2

公开(公告)日：2015-12-08

申请号：US14007143

申请日：2011-03-25

Applicant: Palanisami Karunakaran

Inventor： Palanisami Karunakaran

IPC: B08B1/00 ,  D21G3/00 ,  B41F35/00 ,  B05C1/08 ,  B05C9/04 ,  B05C11/04

CPC classification number: B05C1/0817 ,  B05C1/0813 ,  B05C9/04 ,  B05C11/041 ,  B08B1/00 ,  B41P2235/21 ,  D21G3/00

Abstract: A roller cleaning assembly including: a main body support; and, a contact portion including an elongate cleaning surface for contacting an outside cylindrical surface of a roller, the contact portion being coupled to the main body support and moveable therefrom between a retracted position where the cleaning surface is remote from the roller and an engaged position where the cleaning surface is in contact with an outside cylindrical surface of the roller.

Abstract translation: 一种辊清洁组件，包括：主体支撑件; 以及接触部分，其包括用于接触滚筒的外圆柱形表面的细长清洁表面，所述接触部分联接到所述主体支撑件并且在所述清洁表面远离所述滚子的缩回位置与所述接合位置之间可移动 其中清洁表面与辊的外圆柱表面接触。

公开(公告)号：US20150239000A1

公开(公告)日：2015-08-27

申请号：US14710003

申请日：2015-05-12

Applicant: Christopher Cunningham

Inventor： Christopher Cunningham ,  David Barnsdale

IPC: B05C9/10 ,  B05C9/04

CPC classification number: B05B11/3001 ,  B05C9/04 ,  B05C9/10 ,  B63B23/64 ,  F16B33/00 ,  F16B33/008

Abstract: There is provided in a preferred embodiment of the present invention a maintenance device having a lubricant reservoir attached to the upper end of a fixed body, and a dynamic body that is slidably engaged and disposed within the fixed body at the lower end thereof. Attached to the base of dynamic body is a trio of cleaning arms. A spring that is internally positioned between the dynamic body and the fixed body biases the dynamic body downward and the cleaning arms to a relaxed position. As the dynamic body retracts upon the application of force by a user, lubricant is released and pumped from the lubricant reservoir and each of the cleaning arms pivot and engage the side wall of the male connector.

Abstract translation: 在本发明的优选实施例中提供了一种维护装置，其具有附接到固定体的上端的润滑剂储存器，以及动态体，其在其下端可滑动地接合并设置在固定体内。 附着在动物身体的基础上，是一个三重的清洁武器。 内部定位在动力体和固定体之间的弹簧将动态体向下偏压并将清洁臂偏向松弛位置。 随着使用者在施加力时动力体缩回，润滑剂从润滑剂储存器被释放并被泵送，并且每个清洁臂枢转并接合阳连接器的侧壁。

公开(公告)号：US09010270B2

公开(公告)日：2015-04-21

申请号：US13116941

申请日：2011-05-26

Applicant: Futoshi Shimai ,  Akihiko Sato ,  Tsutomu Sahoda ,  Kenji Maruyama

Inventor： Futoshi Shimai ,  Akihiko Sato ,  Tsutomu Sahoda ,  Kenji Maruyama

IPC: B05C5/00 ,  B05D3/00 ,  H01L21/67 ,  H01L21/677 ,  B05C5/02 ,  B05C9/04 ,  B05B13/02 ,  B05D1/00 ,  B05D1/26 ,  G11B5/842

CPC classification number: B05C5/02 ,  B05B13/02 ,  B05B13/0228 ,  B05B13/0278 ,  B05C9/04 ,  B05D1/002 ,  B05D1/26 ,  B05D3/007 ,  G11B5/842 ,  H01L21/67051 ,  H01L21/67155

Abstract: Provided is a coating device including: a substrate carrying unit which rotatably holds a substrate while the substrate is upright and is able to dispose the held substrate at a first position and a second position; an application unit which includes a liquid material nozzle ejecting a liquid material to each of first and second surfaces of the substrate disposed at the first position; and a removal unit which includes an accommodation mechanism accommodating a part of the peripheral edge portion of the substrate disposed at the second position and a cleaning liquid ejection mechanism ejecting a cleaning liquid to the peripheral edge portion and removes the liquid material of the peripheral edge portion.

Abstract translation: 本发明提供一种涂布装置，包括：基板承载单元，其在基板竖立时可旋转地保持基板，并且能够将保持的基板设置在第一位置和第二位置; 应用单元，其包括将液体材料喷射到布置在第一位置的基板的第一和第二表面中的液体材料喷嘴; 以及拆卸单元，其包括容纳机构，该容纳机构容纳设置在第二位置的基板的周缘部的一部分，以及清洗液喷出机构，其向周缘部喷射清洗液，除去周缘部的液体材料 。

公开(公告)号：US08875626B2

公开(公告)日：2014-11-04

申请号：US12908525

申请日：2010-10-20

Applicant: Keiichi Morishita ,  Masaki Uehara ,  Toshiyuki Nanaarashi ,  Akio Ueda

Inventor： Keiichi Morishita ,  Masaki Uehara ,  Toshiyuki Nanaarashi ,  Akio Ueda

IPC: B30B15/00 ,  B05C1/06 ,  B05C9/04

CPC classification number: B05C1/06 ,  B05C9/04

Abstract: A machining oil applying apparatus that applies machining oil onto a thin metal plate that is being conveyed toward a press apparatus includes: an upper surface applying unit that is impregnated with machining oil, contacts an upper surface of the thin plate and applies the machining oil onto the upper surface; a lower surface applying unit that is impregnated with the machining oil, contacts an lower surface of the thin plate and applies the machining oil onto the lower surface; and an applying unit moving portion that causes the upper surface applying unit and the lower surface applying unit to move reciprocally in a direction perpendicular to a conveying direction of the thin plate, wherein the upper surface applying unit and the lower surface applying unit always move in respectively opposite directions perpendicular to the conveying direction.

Abstract translation: 将加工油施加到向冲压装置输送的薄金属板上的机械加油装置包括：浸渍有机械油的上表面施加单元，与薄板的上表面接触并将加工油施加到 上表面 浸渍有机械油的下表面施加单元接触薄板的下表面并将加工油施加到下表面上; 以及施加单元移动部，其使所述上表面施加单元和所述下表面施加单元沿与所述薄板的输送方向垂直的方向往复移动，其中所述上表面施加单元和所述下表面施加单元总是在 分别与传送方向垂直的相反方向。