Abstract:
A charged particle beam apparatus includes: a charged particle beam column; a detector configured to detect secondary charged particles; an image processor; a display device; a needle arranged in an irradiation area of charged particle beam; a needle actuator; a user interface; and a controller configured to control the needle actuator to actuate the needle in accordance with a target position that is set by the user interface. The controller controls the needle actuator to move the needle to track a change of the target position that is set by the user interface.
Abstract:
System for performing in-line nanoprobing on semiconductor wafer. A wafer support or vertical wafer positioner is attached to a wafer stage. An SEM column, an optical microscope and a plurality of nanoprobe positioners are all attached to the ceiling. The nanoprobe positioners have one nanoprobe configured for physically contacting selected points on the wafer. A force (or touch) sensor measures contact force applied by the probe to the wafer (or the moment) when the probe physically contacts the wafer. A plurality of drift sensors are provided for calculating probe vs. wafer alignment drift in real-time during measurements.
Abstract:
An improved method and apparatus for S/TEM sample preparation and analysis. Preferred embodiments of the present invention provide improved methods for TEM sample creation, especially for small geometry (
Abstract:
With a scanning electron microscope (SEM) adopting a commonly available exhaust system such as a turbo-molecular pump, an ion pump, or a rotary pump, and so forth, there is realized an apparatus capable of safely executing observation, or adsorption of a target substance that is high in rarity. Further, there is realized a safe SEM low in the risk of an electrical discharge by providing the apparatus with a probe, a means for replacing an atmosphere in a specimen chamber, with a predetermined gas, and a means for forming an image by detection of an ion current, and detection of an absorption current. Further, there is provided a means for controlling the polarity of a voltage applied to the probe. Still further, there is provided a control means for controlling a value of the voltage applied to the probe according to a degree of vacuum.
Abstract:
Described is a system and method for in situ sample preparation and imaging. The system includes a multi-axis stage 100 having a bulk stage 110 and a grid stage 150 with various degrees of freedom to allow for sample preparation. In some embodiments, a focused ion beam system is used to prepare a lamella on the bulk stage 110. The lamella can then be transferred to the grid stage 150 from the bulk stage 110 without needing to move the multi-axis stage 100 from the focused ion beam system.
Abstract:
A focused ion beam system includes a sample holder having a fixing plane for fixing a sample, a sample base on which the sample holder is provided, a focused ion beam irradiating mechanism that irradiates a focused ion beam to the sample, microtweezers that hold the sample and have the axial direction at a predetermined angle to a surface of the sample base, an opening/closing mechanism that opens and closes the microtweezers, a rotating mechanism that rotates the microtweezers about the axial direction, and a moving mechanism that moves the position of the microtweezers.
Abstract:
With a scanning electron microscope (SEM) adopting a commonly available exhaust system such as a turbo-molecular pump, an ion pump, or a rotary pump, and so forth, there is realized an apparatus capable of safely executing observation, or adsorption of a target substance that is high in rarity. Further, there is realized a safe SEM low in the risk of an electrical discharge by providing the apparatus with a probe, a means for replacing an atmosphere in a specimen chamber, with a predetermined gas, and a means for forming an image by detection of an ion current, and detection of an absorption current. Further, there is provided a means for controlling the polarity of a voltage applied to the probe. Still further, there is provided a control means for controlling a value of the voltage applied to the probe according to a degree of vacuum.
Abstract:
An improved method and apparatus for S/TEM sample preparation and analysis. Preferred embodiments of the present invention provide improved methods for TEM sample creation, especially for small geometry (
Abstract:
Embodiments of the present invention provide method and apparatus of restoring probes attached to the manipulator in a control environment (e.g. vacuum chamber of an focus ion beam) without a need to open the vacuum chamber. Another embodiment of the present invention teaches construction and application of various shapes of nanoforks from a nanoneedles array inside a FIB vacuum chamber. In another embodiment, the present invention teaches edition and correction of completed and oxide-coated circuit boards by re-nano-wiring using nanoneedles of a nanoneedles array (as nanowire supply), contained in the same controlled space. In this embodiment, individual nanoneedles in a nanoneedle array are manipulated by a manipulator and placed in such a way to make electrical contact between the desired points.
Abstract:
A method for sample examination in a dual-beam FIB calculates a first angle as a function of second, third and fourth angles defined by the geometry of the FIB and the tilt of the specimen stage. A fifth angle is calculated as a function of the stated angles, where the fifth angle is the angle between the long axis of an excised sample and the projection of the axis of the probe shaft onto the X-Y plane. The specimen stage is rotated by the calculated fifth angle, followed by attachment to the probe tip and lift-out. The sample may then be positioned perpendicular to the axis of the FIB electron beam for STEM analysis by rotation of the probe shaft through the first angle.