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    Illumination deflection system for E-beam projection
    12.
    发明授权
    Illumination deflection system for E-beam projection 失效
    用于电子束投影的照明偏转系统

    公开(公告)号：US6005250A

    公开(公告)日：1999-12-21

    申请号：US138595

    申请日：1998-08-22

    Applicant: Werner Stickel ,  Steven Douglas Golladay

    Inventor： Werner Stickel ,  Steven Douglas Golladay

    IPC: H01L21/027 ,  G03F7/20 ,  H01J37/30 ,  H01J37/09

    CPC classification number: H01J37/3007 ,  H01J2237/04928 ,  H01J2237/3175

    Abstract: An electron beam projection system comprises a source of an electron beam, a first doublet of condenser lenses with a first symmetry plane, a first aperture comprising a trim aperture located at the first symmetry plane of the first doublet also serving as a first blanking aperture. A second aperture comprises a shaping aperture located below the trim aperture. A second doublet of condenser lenses with a second symmetry plane is located below the second aperture, the second doublet having a symmetry plane. A third aperture is located at the symmetry plane of the second doublet wherein the third aperture comprises another blanking aperture. There are first blanking plates between the first condenser lens and the trim aperture, and second electrostatic alignment plates between the trim aperture and the second aperture. The second doublet comprises a pair of illuminator lenses including deflectors coaxial therewith and located inside the radius of the lenses and shielding rings located along the inner surfaces of the lenses, and correctors located coaxial with the deflectors and inside or outside of the radii thereof including stigmators, focus coils and a hexapole.

    Abstract translation: 电子束投影系统包括电子束源，具有第一对称平面的聚光透镜的第一双重透镜，第一孔包括位于第一双峰的第一对称平面处的微调孔，其也用作第一消隐孔。 第二孔包括位于修剪孔下方的成形孔。 具有第二对称平面的第二个具有第二对称平面的聚光透镜位于第二孔的下方，第二双峰具有对称平面。 第三孔位于第二双层的对称平面处，其中第三孔包括另一消隐孔。 在第一聚光透镜和调节孔之间存在第一遮挡板，以及在修剪孔和第二孔之间的第二静电对准板。 第二双层包括一对照明器透镜，其包括与其同轴的偏转器，位于透镜的半径内并且沿着透镜的内表面定位的屏蔽环，以及与偏转器同轴并且其半径的内部或外部的校正器包括标示器 ，聚焦线圈和六极。

    Particle beam, in particular ionic optic imaging system
    13.
    发明授权
    Particle beam, in particular ionic optic imaging system 失效
    粒子束，特别是离子光学成像系统

    公开(公告)号：US5801388A

    公开(公告)日：1998-09-01

    申请号：US669481

    申请日：1996-09-17

    Applicant: Gerhard Stengl ,  Alfred Chalupka ,  Herbert Vonach

    Inventor： Gerhard Stengl ,  Alfred Chalupka ,  Herbert Vonach

    IPC: H01J37/12 ,  H01J37/30 ,  H01J37/305 ,  H01L21/027

    CPC classification number: H01J37/3007 ,  H01J37/12 ,  H01J2237/04924 ,  H01J2237/04928 ,  H01J2237/31755

    Abstract: A particle beam, in particular in ionic on the reproduction system, preferably for lithographic purposes, has a particle source, in particular an ion source for reproducing on a wafer a structure designed in a masking foil as one or several transparent spots, in particular openings, through at least two electrostatic lenses arranged upstream of the wafer. One of the lenses is a grating lens constituted by one or two tubular electrodes and by a perforated plate arranged in the path of the beam perpendicularly to the optical axis. The plate is formed by a masking foil which forms the central or first electrode of the granting lens, in the direction of propagation of the beam.

    Abstract translation: PCT No.PCT / AT95 / 00003 Sec。 371日期1996年9月17日 102（e）1996年9月17日PCT 1995年1月12日PCT PCT。 公开号WO95 / 19637 日期1995年7月20日粒子束，特别是在再生系统上的离子，优选用于光刻目的，具有粒子源，特别是用于在晶片上再现设计在掩模箔中的结构作为一个或多个透明的离子源 斑点，特别是开口，通过布置在晶片上游的至少两个静电透镜。 其中一个透镜是由一个或两个管状电极和布置在垂直于光轴的光束路径中的多孔板构成的光栅透镜。 该板由掩模箔形成，该掩模箔沿着光束的传播方向形成准许透镜的中心或第一电极。

    MULTI-BEAM SOURCE
    15.
    发明申请
    MULTI-BEAM SOURCE 有权
    多波束源

    公开(公告)号：US20090026389A1

    公开(公告)日：2009-01-29

    申请号：US12178153

    申请日：2008-07-23

    Applicant: Elmar Platzgummer

    Inventor： Elmar Platzgummer

    IPC: A61N5/00

    CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3007 ,  H01J2237/0437 ,  H01J2237/0453 ,  H01J2237/04928 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/151 ,  H01J2237/3045

    Abstract: A multi-beam source for generating a plurality of beamlets of energetic electrically charged particles. The multi-beam source includes an illumination system generating an illuminating beam of charged particles and a beam-forming system being arranged after the illumination system as seen in the direction of the beam, adapted to form a plurality of telecentric or homocentric beamlets out of the illuminating beam. The beam forming system includes a beam-splitter and an electrical zone device, the electrical zone having a composite electrode composed of a plurality of substantially planar partial electrodes, adapted to be applied different electrostatic potentials and thus influencing the beamlets.

    Abstract translation: 一种用于产生能量带电粒子的多个子束的多光束源。 多光束源包括产生带电粒子的照明光束的照明系统，以及沿着光束的方向被布置在照明系统之后的束形成系统，适于在多个远心或同心圆的子束之外形成 照明光束。 光束形成系统包括分光器和电区设备，电区具有由多个基本上平面的部分电极组成的复合电极，其适于施加不同的静电电势并因此影响子束。

    Projection imaging type electron microscope
    16.
    发明授权
    Projection imaging type electron microscope 有权
    投影成像式电子显微镜

    公开(公告)号：US07423268B2

    公开(公告)日：2008-09-09

    申请号：US11177140

    申请日：2005-07-08

    Applicant: Weiming Ren

    Inventor： Weiming Ren

    IPC: G01N21/00 ,  G21K7/00

    CPC classification number: H01J37/04 ,  H01J37/26 ,  H01J2237/04928 ,  H01J2237/262

    Abstract: It is an object of the present invention to provide an projection imaging type electron microscope in which the imposition of restrictions on the design of the illumination electron optical system by the conditions of the projection electron optical system is alleviated, so that the degree of freedom in the design of the illumination electron optical system is increased. Generated electrons 6b (principal rays) emitted from the sample 5 parallel to the optical axis are focused by a cathode lens so that these electrons cross the optical axis 3 at one point. This point is the first crossover. The generated electrons 6b are oriented parallel to the optical axis by the cathode lens 4a, and are focused as an image at the position of the electromagnetic prism 2; these electrons pass through the stigmator 7, and are incident on the relay lens 8a. These electrons are again focused, and cross the optical axis 3 at one point. This position is the second crossover. An aperture diaphragm 11 is disposed in this second crossover position. As a result, the need to install an aperture diaphragm in the first crossover position is eliminated, so that design of the illumination electron optical system is facilitated.

    Abstract translation: 本发明的目的是提供一种投影成像型电子显微镜，其中通过投影电子光学系统的条件对照明电子光学系统的设计施加限制，使得自由度 照明电子光学系统的设计增加。 从样品5发射的与光轴平行的发生的电子6b（主光线）被阴极透镜聚焦，使得这些电子在一个点处与光轴3交叉。 这一点是第一个交叉。 所产生的电子6b通过阴极透镜4a与光轴平行定向，并且作为图像聚焦在电磁棱镜2的位置处; 这些电子通过标示器7，并入射到中继透镜8a上。 这些电子再次被聚焦，并且在一个点处与光轴3交叉。 这个位置是第二个交叉。 孔径光阑11设置在该第二交叉位置。 结果，消除了在第一交叉位置安装孔径光阑的需要，从而便于照明电子光学系统的设计。

    Projection imaging type electron microscope
    17.
    发明申请
    Projection imaging type electron microscope 有权
    投影成像式电子显微镜

    公开(公告)号：US20060011833A1

    公开(公告)日：2006-01-19

    申请号：US11177140

    申请日：2005-07-08

    Applicant: Weiming Ren

    Inventor： Weiming Ren

    IPC: G21K7/00

    CPC classification number: H01J37/04 ,  H01J37/26 ,  H01J2237/04928 ,  H01J2237/262

    Abstract: It is an object of the present invention to provide an projection imaging type electron microscope in which the imposition of restrictions on the design of the illumination electron optical system by the conditions of the projection electron optical system is alleviated, so that the degree of freedom in the design of the illumination electron optical system is increased. Generated electrons 6b (principal rays) emitted from the sample 5 parallel to the optical axis are focused by a cathode lens so that these electrons cross the optical axis 3 at one point. This point is the first crossover. The generated electrons 6b are oriented parallel to the optical axis by the cathode lens 4a, and are focused as an image at the position of the electromagnetic prism 2; these electrons pass through the stigmator 7, and are incident on the relay lens 8a. These electrons are again focused, and cross the optical axis 3 at one point. This position is the second crossover. An aperture diaphragm 11 is disposed in this second crossover position. As a result, the need to install an aperture diaphragm in the first crossover position is eliminated, so that design of the illumination electron optical system is facilitated.

    Abstract translation: 本发明的目的是提供一种投影成像型电子显微镜，其中通过投影电子光学系统的条件对照明电子光学系统的设计施加限制，使得自由度 照明电子光学系统的设计增加。 从样品5发射的与光轴平行的发生的电子6b（主光线）被阴极透镜聚焦，使得这些电子在一个点处与光轴3交叉。 这一点是第一个交叉。 所产生的电子6b通过阴极透镜4a与光轴平行定向，并且作为图像聚焦在电磁棱镜2的位置处; 这些电子通过标示器7，并入射到中继透镜8a上。 这些电子再次被聚焦，并且在一个点处与光轴3交叉。 这个位置是第二个交叉。 孔径光阑11设置在该第二交叉位置。 结果，消除了在第一交叉位置安装孔径光阑的需要，从而便于照明电子光学系统的设计。

    Projection lithography device utilizing charged particles
    18.
    发明授权
    Projection lithography device utilizing charged particles 失效
    投影光刻装置利用带电粒子

    公开(公告)号：US06326629B1

    公开(公告)日：2001-12-04

    申请号：US09392685

    申请日：1999-09-09

    Applicant: Marcellinus P. C. M. Krijn

    Inventor： Marcellinus P. C. M. Krijn

    IPC: H01J37302

    CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J37/3175 ,  H01J2237/04928 ,  H01J2237/31788

    Abstract: An object (14) is imaged on an imaging surface (16) by means of a telescopic system of rotationally symmetrical electron lenses (10, 12). The imaging system includes two quadrupoles, each of which coincides with one of the two round lenses (10, 12), so that the electrons are concentrated in line-shaped focal spots instead of a (small) circular cross-over (18). The system remains telescopic to a high degree and the imaging remains stigmatic.

    Abstract translation: 物体（14）通过旋转对称电子透镜（10,12）的伸缩系统成像在成像表面（16）上。 成像系统包括两个四极，每个四极都与两个圆形透镜（10,12）中的一个重合，使得电子集中在线状焦点而不是（小）圆形交叉（18）。 该系统保持高度的伸缩性，并且成像仍然是肮脏的。

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