Abstract:
A non-volatile memory device including a memory cell array including a plurality of word lines stacked on a substrate in a first direction perpendicular to an upper surface of the substrate, and a common source line below the plurality of word lines, a plurality, of driving signal lines connected to a row decoder, and a plurality of pass transistor arrays each including a plurality of vertical pass transistors respectively connected the plurality of driving signal lines and the plurality of word lines, wherein each of the plurality of pass transistor arrays further include an active region including a drain to which at least two of the plurality of vertical pass transistors are simultaneously bonded, and a main contact applying a signal to the active region.
Abstract:
A mounting apparatus may include: a mounting part on which a part of an external electronic apparatus is mounted; a film part connected to the mounting part; a near field wireless communication module; and a processor, wherein the processor may be configured to: detect a mounting state of the external electronic apparatus; determine whether the mounted external electronic apparatus is an apparatus supporting a holographic mode; and on the basis of the determined result, control to transmit a transmission signal to the external electronic apparatus by using the near field wireless communication module so that the external electronic apparatus outputs a hologram content by using at least a part of a display of the external electronic apparatus, and the hologram content output by the external electronic apparatus can be projected on the film part. Various other embodiments may be possible.
Abstract:
The present document relates to an electronic device, a method for providing personal information using same, and a computer-readable recording medium for recording same, wherein the electronic device may include a communication circuit, a storage, a display, and a processor. According to various embodiments, the processor may be configured to generate a smart contract comprising information on categories of personal information to be provided to an external user, information about the external user, and information about a de-identification level of the personal information to be provided; transfer the smart contract to a block chain; receive a request for provision of personal information from the block chain; process personal information of a user on the basis of the smart contract; and transfer the processed personal information to the block chain. Other various embodiments are possible.
Abstract:
According to an embodiment, an electronic device comprises: at least one processor, wherein the at least one processor may be configured to: receive a first message indicating a packet data convergence protocol (PDCP) state of a network from the network, identify a first missing count (FMC) of the network based on the first message, identify a count of a message scheduled to be transmitted by the electronic device, compare the count of the message scheduled to be transmitted with the FMC, and adjust the count of the message scheduled to be transmitted based on a result of the comparison.
Abstract:
A composite membrane for a lithium battery, a cathode for a lithium battery, and a lithium battery including the composite membrane. The composite membrane includes a copolymer including a first repeating unit represented by Formula 1 and a second repeating unit represented by Formula 2: wherein Ar1, R1, R2, R3, A, Y−, and m in Formula 1, and R4 to R7, a, and n in Formula 2, are the same as defined in the specification.
Abstract:
A semiconductor device may include a device isolation region configured to define an active region in a substrate, an active gate structure disposed in the active region, and a field gate structure disposed in the device isolation region. The field gate structure may include a gate conductive layer. The active gate structure may include an upper active gate structure including a gate conductive layer and a lower active gate structure formed under the upper active gate structure and vertically spaced apart from the upper active gate structure. The lower active gate structure may include a gate conductive layer. A top surface of the gate conductive layer of the field gate structure is located at a lower level than a bottom surface of the gate conductive layer of the upper active gate structure.
Abstract:
An operation method of a server in a communication system, an operation method of an electronic device, the server, and the electronic device are provided. The operation method of the server includes determining a variation type of a buffering delay based on a packet transmission delay of a terminal, determining control information for controlling an uplink transmission rate of the terminal according to the variation type, and transmitting the control information.
Abstract:
Semiconductor devices, and methods for forming the same, include forming a first wiring film and an etching buffer film in a cell array region and a peripheral circuit region of a substrate, and forming a contact hole by selectively etching the etching buffer film and the first wiring film so as to expose an active region of the cell array region and at least a part of a field isolation region adjacent thereto. A bit line contact is formed in the contact hole to be in contact with the active region, and a second wiring film is formed over the substrate. By patterning the second wiring film, the bit line contact, the etching buffer film, and the first wiring film, a bit line is formed in the cell array region and a peripheral gate is formed in the peripheral circuit region.
Abstract:
A semiconductor device includes a peripheral circuit region including a first substrate, circuit elements on the first substrate, a first interconnection structure electrically connected to the circuit elements, first to fourth peripheral region insulating layer; and a memory cell region including a second substrate on the peripheral circuit region and having a first region and a second region, gate electrodes stacked on the first region, a cell region insulating layer covering the gate electrodes, channel structures passing through the gate electrodes, and a second interconnection structure electrically connected to the gate electrodes and the channel structures. The peripheral circuit region further includes first to fourth lower protective layers, at least one of the first, second, third and fourth lower protective layers includes a hydrogen diffusion barrier layer configured to inhibit a hydrogen element included in the cell region insulating layer from diffusing to the circuit elements, and including aluminum oxide.
Abstract:
A semiconductor device and a method of manufacturing the same are provided. The semiconductor device includes a substrate including a trench. The semiconductor device further includes a gate electrode disposed in the trench, and a gate insulating film disposed between the substrate and the gate electrode. The gate electrode includes a gate conductor and a metal element, and an effective work function of the gate electrode is less than an effective work function of the gate conductor.