Method for manufacturing thin film transistor array panel
    12.
    发明授权
    Method for manufacturing thin film transistor array panel 有权
    制造薄膜晶体管阵列面板的方法

    公开(公告)号:US09490275B2

    公开(公告)日:2016-11-08

    申请号:US14740484

    申请日:2015-06-16

    CPC classification number: H01L29/42356 H01L29/42384 H01L29/4908 H01L29/7869

    Abstract: A thin film transistor array panel includes: a gate line on a substrate and including a gate electrode; a first gate insulating layer on the substrate and the gate line, the first gate insulting layer including a first portion adjacent to the gate line and a second portion overlapping the gate line and having a smaller thickness than that of the first portion; a second gate insulating layer on the first gate insulating layer; a semiconductor layer on the second gate insulating layer; a source electrode and a drain electrode spaced apart from each other on the semiconductor layer; a passivation layer on the second gate insulating layer, the source electrode and the drain electrode; and a pixel electrode on the passivation layer and connected with the drain electrode. The first gate insulating layer and the second gate insulating layer have stress in opposite directions from each other.

    Abstract translation: 薄膜晶体管阵列面板包括:基板上的栅极线,并包括栅电极; 所述第一栅极绝缘层在所述基板和所述栅极线上,所述第一栅极绝缘层包括与所述栅极线相邻的第一部分和与所述栅极线重叠并且具有比所述第一部分的厚度小的第二部分; 第一栅极绝缘层上的第二栅极绝缘层; 在所述第二栅极绝缘层上的半导体层; 在半导体层上彼此隔开的源电极和漏电极; 第二栅极绝缘层上的钝化层,源电极和漏电极; 以及钝化层上的像素电极并与漏电极连接。 第一栅极绝缘层和第二栅极绝缘层在彼此相反的方向上具有应力。

    Substrate-treating apparatus and method for treating a substrate using the same

    公开(公告)号:US10535510B2

    公开(公告)日:2020-01-14

    申请号:US14809028

    申请日:2015-07-24

    Abstract: A substrate-treating apparatus includes a liquid-providing part, a first liquid-removing knife and a returning part. The liquid-providing part provides a first liquid chemical for cleaning a substrate that includes a metal pattern and a photoresist pattern on the metal pattern, and for removing an etchant that remains on the substrate. The first liquid-removing knife sprays a second liquid chemical in a direction inclined and opposite to a returning direction of the substrate, so as to remove the first liquid chemical, the first liquid chemical including a metal precipitate. The returning part returns the substrate from the liquid-providing part toward the first liquid-removing knife in the returning direction.

    Thin film transistor substrate
    15.
    发明授权
    Thin film transistor substrate 有权
    薄膜晶体管基板

    公开(公告)号:US09502579B2

    公开(公告)日:2016-11-22

    申请号:US14717734

    申请日:2015-05-20

    Abstract: A thin film transistor substrate includes a gate electrode disposed on a substrate; a semiconductor layer disposed on the substrate that partially overlaps the gate electrode and includes an oxide semiconductor material; and a source electrode and a drain electrode disposed on the semiconductor layer, where the drain electrode is spaced apart from the source electrode. The source electrode and the drain electrode each include a barrier layer and a main wiring layer, the a main wiring layer is disposed on the barrier layer, and the barrier layer includes a first metal layer disposed on the semiconductor layer, and a second metal layer disposed on the first metal layer.

    Abstract translation: 薄膜晶体管基板包括设置在基板上的栅电极; 半导体层,其设置在与所述栅电极部分重叠并且包括氧化物半导体材料的所述基板上; 以及设置在半导体层上的源电极和漏电极,其中漏电极与源电极间隔开。 源电极和漏极各自包括阻挡层和主布线层,主布线层设置在阻挡层上,阻挡层包括设置在半导体层上的第一金属层和第二金属层 设置在第一金属层上。

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