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    OPTICAL PHASE MEASUREMENT METHOD AND SYSTEM
    11.
    发明申请
    OPTICAL PHASE MEASUREMENT METHOD AND SYSTEM 审中-公开
    光学相位测量方法与系统

    公开(公告)号：US20170016835A1

    公开(公告)日：2017-01-19

    申请号：US15300768

    申请日：2015-04-12

    Applicant: Nova Measuring Instruments Ltd.

    Inventor： Gilad BARAK ,  Danny GROSSMAN ,  Dror SHAFIR ,  Yoav BERLATZKY ,  Yanir HAINICK

    IPC: G01N21/956 ,  G01B9/02 ,  G01B11/06 ,  G01N21/88

    CPC classification number: G01N21/956 ,  G01B9/02007 ,  G01B9/02032 ,  G01B9/02072 ,  G01B9/0209 ,  G01B11/0675 ,  G01B2210/56 ,  G01B2290/70 ,  G01N21/8806 ,  G01N2021/8848

    Abstract: A measurement system for use in measuring parameters of a patterned sample is presented. The system comprises: a broadband light source; an optical system configured as an interferometric system; a detection unit; and a control unit. The interferometric system defines illumination and detection channels having a sample arm and a reference arm comprising a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms; the detection unit comprises a configured and operable for detecting a combined light beam formed by a light beam reflected from said reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by at least two spectral interference signatures. The control unit is configured and operable for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.

    Abstract translation: 提出了一种用于测量图案样品参数的测量系统。 该系统包括：宽带光源; 配置为干涉系统的光学系统; 检测单元; 和控制单元。 所述干涉仪系统定义具有采样臂和参考臂的照明和检测通道，所述参考臂包括参考反射器，并且被配置为用于诱导所述样本和参考臂之间的光程差; 检测单元包括被配置和可操作以检测由从所述反射器反射的光束形成的组合光束和从样本支架传播的光束，并且生成指示由至少两个光谱干涉特征形成的光谱干涉图案的测量数据 。 控制单元被配置和操作用于接收测量数据，并将基于模型的处理应用于频谱干涉图案，以确定样本中的图案的一个或多个参数。

    OPTICAL PHASE MEASUREMENT METHOD AND SYSTEM
    12.
    发明申请
    OPTICAL PHASE MEASUREMENT METHOD AND SYSTEM 有权
    光学相位测量方法与系统

    公开(公告)号：US20150377799A1

    公开(公告)日：2015-12-31

    申请号：US14769170

    申请日：2014-02-20

    Applicant: NOVA MEASURING INSTRUMENTS LTD.

    Inventor： Gilad BARAK ,  Dror SHAFIR ,  Yanir HAINICK ,  Shahar GOV

    IPC: G01N21/956 ,  G01N21/95

    CPC classification number: G01N21/956 ,  G01B2210/56 ,  G01N21/9501 ,  G03F7/70625

    Abstract: A method and system are presented for use in optical measurements on patterned structures. The method comprises performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure. The measurements include detection of light reflected from said at least part of the at least two different regions comprising interference of at least two complex electric fields reflected from said at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.

    Abstract translation: 提出了一种用于图案化结构的光学测量的方法和系统。 该方法包括对具有测量点的结构执行多个光学测量，所述测量点被配置为提供对从至少部分地覆盖结构的至少两个不同区域的照明点反射的光的检测。 所述测量包括从所述至少两个不同区域的所述至少一部分反射的光的检测，包括从所述至少两个不同区域的所述至少一部分反射的至少两个复电场的干涉，并因此指示相位响应 的结构，携带关于结构的属性的信息。

    OPTICAL PHASE MEASUREMENT METHOD AND SYSTEM
    14.
    发明申请
    OPTICAL PHASE MEASUREMENT METHOD AND SYSTEM 审中-公开

    公开(公告)号：US20180128753A1

    公开(公告)日：2018-05-10

    申请号：US15866768

    申请日：2018-01-10

    Applicant: NOVA MEASURING INSTRUMENTS LTD.

    Inventor： Gilad BARAK ,  Dror SHAFIR ,  Yanir HAINICK ,  Shahar GOV

    IPC: G01N21/956 ,  G01N21/95 ,  G03F7/20

    CPC classification number: G01N21/956 ,  G01B2210/56 ,  G01N21/9501 ,  G03F7/70616 ,  G03F7/70625

    Abstract: A method and system are presented for use in optical measurements on patterned structures. The method comprises performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure. The measurements include detection of light reflected from said at least part of the at least two different regions comprising interference of at least two complex electric fields reflected from said at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.

    OPTICAL CRITICAL DIMENSION METROLOGY
    16.
    发明申请
    OPTICAL CRITICAL DIMENSION METROLOGY 审中-公开
    光学关键尺寸计量学

    公开(公告)号：US20160363484A1

    公开(公告)日：2016-12-15

    申请号：US15120847

    申请日：2015-02-23

    Applicant: NOVA MEASURING INSTRUMENTS LTD.

    Inventor： Gilad BARAK ,  Dror SHAFIR ,  Danny GROSSMAN

    IPC: G01J9/00 ,  G01N21/21 ,  G01B11/02

    CPC classification number: G01J9/00 ,  G01B11/02 ,  G01B2210/56 ,  G01J9/02 ,  G01N21/21 ,  G01N21/9501 ,  G01N21/956 ,  G01N2201/12

    Abstract: A metrology system is presented for measuring parameters of a structure. The system comprises: an optical system and a control unit. The optical system is configured for detecting light reflection of incident radiation from the structure and generating measured data indicative of angular phase of the detected light components corresponding to reflections of illuminating light components having different angles of incidence. The control unit is configured for receiving and processing the measured data and generating a corresponding phase map indicative of the phase variation along at least two dimensions, and analyzing the phase map using modeled data for determining one or more parameters of the structure.

    Abstract translation: 提出了一种用于测量结构参数的计量系统。 该系统包括：光学系统和控制单元。 光学系统被配置用于检测来自结构的入射辐射的光反射，并产生指示与具有不同入射角的照明光分量的反射相对应的检测到的光分量的角相位的测量数据。 控制单元被配置为接收和处理测量数据并且沿着至少两个维度生成指示相位变化的对应相位图，并且使用用于确定结构的一个或多个参数的建模数据来分析相位图。

    OPTICAL METHOD AND SYSTEM FOR CRITICAL DIMENSIONS AND THICKNESS CHARACTERIZATION
    17.
    发明申请
    OPTICAL METHOD AND SYSTEM FOR CRITICAL DIMENSIONS AND THICKNESS CHARACTERIZATION 审中-公开
    用于关键尺寸和厚度特性的光学方法和系统

    公开(公告)号：US20150345934A1

    公开(公告)日：2015-12-03

    申请号：US14655791

    申请日：2013-12-26

    Applicant: NOVA MEASURING INSTRUMENTS LTD.

    Inventor： Dror SHAFIR ,  Gilad BARAK ,  Shay WOLFLING

    IPC: G01B11/02 ,  G01N21/47

    CPC classification number: G01B11/02 ,  G01B2210/56 ,  G01N21/4738 ,  G01N21/956 ,  G01N2201/06113 ,  G01N2201/12 ,  G02B21/365

    Abstract: Method and system for measuring one or more parameters of a patterned structure, using light source producing an input beam of at least partially coherent light in spatial and temporal domains, a detection system comprising a position sensitive detector for receiving light and generating measured data indicative thereof, an optical system configured for focusing the input light beam onto a diffraction limited spot on a sample's surface, collecting an output light returned from the illuminated spot, and imaging the collected output light onto a light sensitive surface of the position sensitive detector, where an image being indicative of coherent summation of output light portions propagating from the structure in different directions.

    Abstract translation: 用于测量图案化结构的一个或多个参数的方法和系统，使用在空间和时间域中产生至少部分相干光的输入光束的光源，包括用于接收光并且产生指示其的测量数据的位置敏感检测器的检测系统 ，配置成将输入光束聚焦到样品表面上的衍射限制光斑上的光学系统，收集从照明光点返回的输出光，并将收集的输出光成像到位置敏感检测器的光敏表面上，其中 图像表示从结构沿不同方向传播的输出光部分的相干相加。

    METHOD AND SYSTEM FOR OPTICAL CHARACTERIZATION OF PATTERNED SAMPLES
    18.
    发明申请
    METHOD AND SYSTEM FOR OPTICAL CHARACTERIZATION OF PATTERNED SAMPLES 审中-公开
    用于模式样本的光学表征的方法和系统

    公开(公告)号：US20150316468A1

    公开(公告)日：2015-11-05

    申请号：US14265771

    申请日：2014-04-30

    Applicant: Nova Measuring Instruments Ltd.

    Inventor： Dror SHAFIR ,  Gilad BARAK ,  Shay WOLFLING ,  Michal Haim YACHINIA ,  Matthew SENDELBACH ,  Cornel BOZDOG

    IPC: G01N21/21

    CPC classification number: G01N21/21 ,  G01N2021/4792 ,  G01N2201/061 ,  G01N2201/0683

    Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.

    Abstract translation: 提出了一种用于测量图案样品的方法和系统，旨在确定图案的不对称性。 执行在样本的图案化区域上的一组至少第一和第二测量，其中每个测量包括：沿着照明通道将照明光引导到图案化区域上，并收集从沿着收集通道传播的照明区域反射的光 以使得来自相同图案化区域的检测光具有不同于照明光的偏振的不同偏振态，并且产生指示在测量中检测到的光的测量数据。 因此，至少在相同图案区域上的至少第一和第二测量产生第一测量数据和第二测量数据。 分析至少第一和第二测量数据片段，并且生成指示图案化区域中的不对称条件的输出数据。

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