公开(公告)号：US20170084424A1

公开(公告)日：2017-03-23

申请号：US15272194

申请日：2016-09-21

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Richard R. Simmons ,  Scott A. Young ,  Mark A. McCord ,  Rainer Knippelmeyer

IPC: H01J37/22 ,  H01J37/20 ,  H01J37/06 ,  H01J37/153 ,  H01J37/10 ,  H01J37/28 ,  H01J37/244

CPC classification number: H01J37/153 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/12 ,  H01J2237/1532 ,  H01J2237/216 ,  H01J2237/221

Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configured to form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding with the identified best focus image.

公开(公告)号：US10366862B2

公开(公告)日：2019-07-30

申请号：US15267223

申请日：2016-09-16

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Richard R. Simmons ,  Mark A. McCord ,  Rainer Knippelmeyer

IPC: H01J37/22 ,  H01J37/28 ,  H01J37/09

Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron beam source configured to generate a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly, and a detector assembly configured to detect a plurality of electron signal beams emanating from the surface of the sample to form a plurality of images, each image associated with an electron beam of the plurality of electron beams. The system includes a controller configured to receive the images from the detector assembly, compare two or more of the images to identify common noise components present in the two or more images, and remove the identified common noise components from one or more images of the plurality of images.

公开(公告)号：US10186396B2

公开(公告)日：2019-01-22

申请号：US15272194

申请日：2016-09-21

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Richard R. Simmons ,  Scott A. Young ,  Mark A. McCord ,  Rainer Knippelmeyer

IPC: H01J37/153 ,  H01J37/28 ,  H01J37/21

Abstract: A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configured to form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding with the identified best focus image.

公开(公告)号：US09666411B1

公开(公告)日：2017-05-30

申请号：US14929812

申请日：2015-11-02

Applicant: KLA-Tencor Corporation

Inventor： Mark A. McCord ,  Gabor D. Toth

IPC: G21K5/04 ,  H01J37/26 ,  H01J37/285 ,  H01J37/20

CPC classification number: H01J37/265 ,  H01J37/026 ,  H01J37/20 ,  H01J37/285 ,  H01J2237/0044 ,  H01J2237/28

Abstract: One embodiment relates to an apparatus for virtual grounding of a target substrate in a charged-particle beam apparatus. A primary gun generates charged particles for a process beam that is focused on a frontside surface of the target substrate, and the target substrate is held by a stage. An electrostatic voltmeter measures a voltage potential of the target substrate, and a charge-control gun impinges a beam of charged particles to the target substrate. A feedback control loop is used to control the flood gun depending on the voltage potential measured by the electrostatic voltmeter. Other embodiments, aspects and features are also disclosed.

公开(公告)号：US20170084422A1

公开(公告)日：2017-03-23

申请号：US15245911

申请日：2016-08-24

Applicant: KLA-Tencor Corporation

Inventor： Doug K. Masnaghetti ,  Mark A. McCord ,  Richard R. Simmons ,  Rainer Knippelmeyer

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/06 ,  H01J37/29

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/24465 ,  H01J2237/2804

Abstract: Multi-beam scanning electron microscope (SEM) inspection systems with dark field imaging capabilities are disclosed. An SEM inspection system may include an electron source and at least one optical device. The at least one optical device may be configured to produce a plurality of primary beamlets utilizing electrons provided by the electron source and deliver the plurality of primary beamlets toward a target. The apparatus may also include an array of detectors configured to receive a plurality of image beamlets emitted by the target in response to the plurality of primary beamlets and produce at least one dark field image of the target.

公开(公告)号：US09366524B2

公开(公告)日：2016-06-14

申请号：US14481076

申请日：2014-09-09

Applicant: KLA-Tencor Corporation

Inventor： Mark A. McCord ,  Joseph DiRegolo

IPC: G01B11/14 ,  G01B11/06 ,  G01B11/27 ,  G03F9/00

CPC classification number: G01B11/0608 ,  G01B11/27 ,  G03F9/7007 ,  G03F9/7034 ,  G03F9/7069 ,  H01J2237/2482 ,  H01J2237/30438 ,  H01J2237/31774

Abstract: One embodiment relates to a device that senses alignment and height of a work piece. The device may include both an alignment sensor and a height sensor. The alignment sensor generates a first illumination beam that illuminates an alignment mark on the work piece so as to create a first reflected beam, and determines the alignment of the work piece using the first reflected beam. The height sensor generates a second illumination beam that is directed to a surface of the work piece at an oblique angle so as to form a second illumination spot and images the second illumination spot to determine the height of the work piece. Other embodiments, aspects and features are also disclosed.

Abstract translation: 一个实施例涉及感测工件的对准和高度的装置。 该装置可以包括对准传感器和高度传感器。 对准传感器产生照亮工件上的对准标记的第一照明光束，以产生第一反射光束，并且使用第一反射光束确定工件的对准。 所述高度传感器产生第二照明光束，所述第二照明光束以斜角指向所述工件的表面，以便形成第二照明光点并且对所述第二照明光斑进行成像以确定所述工件的高度。 还公开了其它实施例，方面和特征。

公开(公告)号：US08957394B2

公开(公告)日：2015-02-17

申请号：US13679072

申请日：2012-11-16

Applicant: KLA-Tencor Corporation

Inventor： Alan D. Brodie ,  Joseph Maurino ,  Mark A. McCord ,  Paul F. Petric

IPC: H01J23/06 ,  H01J23/08 ,  G21K5/08 ,  H01J37/065 ,  H01J29/48

CPC classification number: H01J23/06 ,  G21K5/08 ,  H01J23/08 ,  H01J29/48 ,  H01J29/488 ,  H01J37/065 ,  H01J2237/038 ,  H01J2237/06341 ,  H01J2237/06375 ,  H01J2237/3175

Abstract: One embodiment relates to a high-voltage electron gun including an insulator stand-off having a resistive layer. The resistive layer is at least on an interior surface of the insulator stand-off. A cathode holder is coupled to one end of the insulator 115 stand-off, and an anode is coupled to the other end. The resistive layer advantageously increases the surface breakdown field strength for the insulator stand-off and so enables a compact design for the high-voltage electron gun. Other embodiments, aspects and feature are also disclosed.

Abstract translation: 一个实施例涉及一种包括具有电阻层的绝缘体支架的高压电子枪。 电阻层至少在绝缘体支架的内表面上。 阴极保持器联接到绝缘体115的一端，并且阳极耦合到另一端。 电阻层有利地增加了用于绝缘体间隔的表面击穿场强，因此能够实现高压电子枪的紧凑设计。 还公开了其它实施例，方面和特征。