公开(公告)号：US20200303152A1

公开(公告)日：2020-09-24

申请号：US16089281

申请日：2016-03-29

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Takashi OHSHIMA ,  Hiroyuki MINEMURA ,  Yumiko ANZAI ,  Momoyo ENYAMA ,  Yoichi OSE ,  Toshihide AGEMURA

IPC: H01J37/073 ,  H01J37/22

Abstract: To provide an electron microscope capable of performing the switching-over between normal illumination and annular illumination, wide-area irradiation, an interference pattern as desired or normal illumination in an expeditious and readily manner or achieving a better S/N ratio, the electron microscope comprises a photocathode 101 with negative electron affinity in use; an excitation optical system to excite the photocathode; and an electron optics system to irradiate an electron beam 13 generated from the photocathode by excitation light 12 irradiated through the excitation optical system onto a sample, the excitation optical system including a light source device 107 for the excitation light; and an optical modulation means 108 which is disposed in an optical path of the excitation light to perform spatial phase modulation to the excitation light.

公开(公告)号：US20180025885A1

公开(公告)日：2018-01-25

申请号：US15548321

申请日：2016-02-04

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta IMAI ,  Hideo MORISHITA ,  Toshihide AGEMURA

IPC: H01J37/12 ,  H01J37/20 ,  H01J37/08 ,  H01J37/28 ,  H01J37/06

CPC classification number: H01J37/12 ,  H01J37/06 ,  H01J37/08 ,  H01J37/145 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/08 ,  H01J2237/121 ,  H01J2237/244 ,  H01J2237/2801

Abstract: This composite charged particle beam device comprises a first charged particle beam column (6), a second charged particle beam column (1) which is equipped with a deceleration system, and is equipped with a detector (3) inside the column, a test piece stage (10) on which a test piece (9) is placed, and an electric field correction electrode (13) which is provided around the tip of the first charged particle beam column, wherein the electric field correction electrode is an electrode that corrects the electric field distribution formed in the vicinity of the test piece, and the electric field correction electrode is positioned between the test piece and the first charged particle beam column, and on the opposite side from the second charged particle beam column with respect to the optical axis of the first charged particle beam column.

公开(公告)号：US20170040139A1

公开(公告)日：2017-02-09

申请号：US15303282

申请日：2015-04-22

Applicant: Hitachi High-Technologies Corporation

Inventor： Tsunenori NOMAGUCHI ,  Toshihide AGEMURA

IPC: H01J37/04 ,  H01J37/14 ,  H01J37/145 ,  H01J37/28 ,  H01J37/12 ,  H01J37/065 ,  H01J37/244

CPC classification number: H01J37/04 ,  H01J37/065 ,  H01J37/09 ,  H01J37/12 ,  H01J37/14 ,  H01J37/141 ,  H01J37/145 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/04756 ,  H01J2237/14

Abstract: The present invention provides an electron beam device that achieves high spatial resolution and high luminance, while remaining insusceptible to the effects of external disturbance. The present invention relates to an electron beam device, wherein, between, e.g., an electron source for generating an electron beam and an objective lens for focusing the electron beam onto a sample, a high voltage beam tube is disposed close to the electron source and a low voltage beam tube is disposed close to the objective lens. This makes it possible to achieve high luminance while maintaining spatial resolution, even with an SEM that is provided with a type of objective lens that actively leaks a magnetic field onto a sample.

Abstract translation: 本发明提供一种实现高空间分辨率和高亮度的电子束装置，同时不受外部干扰的影响。 电子束装置技术领域本发明涉及一种电子束装置，其中，在例如用于产生电子束的电子源和用于将电子束聚焦到样品上的物镜之间，高压束管靠近电子源设置， 低压射束管靠近物镜设置。 这使得即使使用设置有主动地将磁场泄漏到样品上的物镜的类型的SEM，也可以在保持空间分辨率的同时实现高亮度。

公开(公告)号：US20160148782A1

公开(公告)日：2016-05-26

申请号：US14899795

申请日：2014-07-11

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Toshihide AGEMURA ,  Hideo MORISHITA

IPC: H01J37/26 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/265 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0475 ,  H01J2237/103 ,  H01J2237/1534 ,  H01J2237/24475 ,  H01J2237/2448

Abstract: This scanning electron microscope is provided with: a deceleration means that decelerates an electron beam (5) when the electron beam is passing through an objective lens; and a first detector (8) and a second detector (7) that are disposed between the electron beam and the objective lens and have a sensitive surface having an axially symmetric shape with respect to the optical axis of the electron beam. The first detector is provided at the sample side with respect to the second detector, and exclusively detects the signal electrons having a high energy that have passed through a retarding field energy filter (9A). When the distance between the tip (13) at the sample side of the objective lens and the sensitive surface of the first detector is L1 and the distance between the tip at the sample side of the objective lens and the sensitive surface of the second detector is L2, then L1/L2≦5/9. As a result, when performing low-acceleration observation using a deceleration method by means of a scanning electron microscope, it is possible to detect signal electrons without the effect of shading in a magnification range of a low magnification on the order of hundreds of times to a high magnification of at least 100,000×. Also, it is possible to highly efficiently detect backscattered electrons, of which the amount generated is less than that of secondary electrons.

Abstract translation: 该扫描电子显微镜具备：当电子束通过物镜时减速电子束（5）的减速装置; 以及设置在电子束和物镜之间并且具有相对于电子束的光轴具有轴对称形状的敏感表面的第一检测器（8）和第二检测器（7）。 第一检测器相对于第二检测器在样本侧设置，并且专门检测已经通过延迟场能量滤波器（9A）的具有高能量的信号电子。 当物镜的样品侧的尖端（13）和第一检测器的敏感表面之间的距离为L1，物镜的样品侧的尖端与第二检测器的敏感表面之间的距离为 L2，然后L1 / L2＆nlE; 5/9。 结果，当利用扫描电子显微镜使用减速方法进行低加速度观察时，可以在几百倍数倍的低倍数的倍率范围内检测信号电子而不影响阴影效果 高倍数至少为100,000×。 此外，可以高效地检测产生的量小于二次电子的反向散射电子。